| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/24/1999 | WO1999031190A1 Liquid curable resin composition, coating, and cured coating therefrom |
| 06/24/1999 | WO1999031157A1 Fractionated novolak resin and photoresist composition therefrom |
| 06/24/1999 | WO1999019950A8 Pulse energy control for excimer laser |
| 06/24/1999 | DE19755131A1 Lösung von Tetramethylammoniumhydroxid in Wasser und Verfahren zur Herstellung der Lösung Solution of tetramethylammonium hydroxide in water, and methods of preparation of the solution |
| 06/23/1999 | WO2000001752A1 Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefrom |
| 06/23/1999 | EP0924758A2 Method and apparatus for quantifying proximity effect by measuring device performance |
| 06/23/1999 | EP0924571A2 Exposing apparatus and method |
| 06/23/1999 | EP0924570A1 Photopolymerizable composition |
| 06/23/1999 | EP0924569A1 Fast-curing photosensitive composition and recording sheet |
| 06/23/1999 | EP0924568A1 Radiation-sensitive material containing a multilayer support material |
| 06/23/1999 | EP0924550A2 Method of producing a display having patternable conductive traces |
| 06/23/1999 | EP0923613A1 Aqueous developable photosensitive polyurethane-methacrylate |
| 06/23/1999 | EP0797791A4 Photosensitive compositions and clean running photopolymer printing plates therefrom |
| 06/23/1999 | CN1220666A Processes for preparing thioxanthone and derivatives thereof |
| 06/23/1999 | CN1220632A Imaging device, imaging method and printing device |
| 06/23/1999 | CN1220415A Photosensitive composition for sandblasting and photosensitive film comprising the same |
| 06/23/1999 | CN1220414A Chemically amplified resist |
| 06/23/1999 | CN1220413A Dry film photoresist |
| 06/22/1999 | US5914774 Projection exposure apparatus with function to measure imaging characteristics of projection optical system |
| 06/22/1999 | US5914773 Exposure apparatus and method using pulsed light and changing means to control both the light intensity and light emission timing |
| 06/22/1999 | US5914558 Cathode ray tube with color filters aligned with phosphors |
| 06/22/1999 | US5914521 Semiconductor device |
| 06/22/1999 | US5914493 Charged-particle-beam exposure apparatus and methods with substrate-temperature control |
| 06/22/1999 | US5914359 Coloring composition for use in formation of transparent colored micro-patterns and application thereof |
| 06/22/1999 | US5914354 Radiation-sensitive resin composition |
| 06/22/1999 | US5914219 Radiation-sensitive mixture and the production of relief structures having improved contrast |
| 06/22/1999 | US5914217 Alkaline developing composition and method of use to process lithographic printing plates |
| 06/22/1999 | US5914216 Multilayer circuit board and photosensitive resin composition used therefor |
| 06/22/1999 | US5914215 Sensitized photopolymerizable compositions and use thereof in lithographic printing plates |
| 06/22/1999 | US5914213 Process and composition for generation of acid |
| 06/22/1999 | US5914207 A first scanning stage for scanning ultraviolet beam parallel to the x-axis, a second scanning stage for scanning ultraviolet beam parallel to y-axis, third stage perpendicular to x and y-axis, detecting the reverse light |
| 06/22/1999 | US5914205 Method of manufacturing a semiconductor device whereby photomasks comprising partial patterns are projected onto a photoresist layer so as to merge into one another |
| 06/22/1999 | CA2021387C Lithographic aluminium offset printing plate made according to the dtr-process |
| 06/17/1999 | WO1999030392A1 Narrow band laser with etalon based output coupler |
| 06/17/1999 | WO1999030356A1 Exposure method and exposure device |
| 06/17/1999 | WO1999030348A1 Electron sources utilizing patterned negative electron affinity photocathodes |
| 06/17/1999 | WO1999030210A1 Solution of tetramethyl ammonium hydroxide in water and process for preparing the solution |
| 06/17/1999 | WO1999030189A1 Amplitude mask, and apparatus and method for manufacturing long period grating filter using the same |
| 06/17/1999 | WO1999029498A1 Designer particles of micron and submicron dimension |
| 06/17/1999 | WO1999029439A1 Photoresist coating process control with solvent vapor sensor |
| 06/17/1999 | DE19803186C1 Structured wafer production used in micro-mechanical sensor structure manufacture, without need for wafer edge lacquering or doping |
| 06/17/1999 | DE19753696A1 Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung Apparatus and method for generating extreme ultraviolet radiation and soft x-ray radiation from a gas discharge |
| 06/16/1999 | EP0923115A1 Method for etching a silicon dioxide layer with a fluorocarbon plasma |
| 06/16/1999 | EP0923112A1 Detergent for lithography |
| 06/16/1999 | EP0923001A1 Developer for radiation exposed photoimageable materials |
| 06/16/1999 | EP0923000A2 Stage apparatus, exposure apparatus and device manufacturing method |
| 06/16/1999 | EP0922999A2 Illumination optical system and illumination method |
| 06/16/1999 | EP0922998A1 Radiation-sensitive resist composition with high heat resistance |
| 06/16/1999 | EP0922983A1 Connection technique for lenses and mountings suitable for VUV light |
| 06/16/1999 | EP0680626B1 Photopolymerizable composition of high sensitivity and method for obtaining images therewith |
| 06/16/1999 | EP0648232B1 High purity thiol-ene composition |
| 06/16/1999 | CN1219754A Mask blank and method of producing mask |
| 06/16/1999 | CN1219687A Photoimageable compositions containing photopolymerizable urethane oligomers and low Tg binder polymers |
| 06/15/1999 | US5913102 Method for forming patterned photoresist layers with enhanced critical dimension uniformity |
| 06/15/1999 | US5912727 Projection exposure method in which mask patterns are imaged on photosensitive substrates with adjustment of illumination and projection parameters corresponding to the mask pattern |
| 06/15/1999 | US5912726 Projection exposure apparatus and method having a positional deviation detection system that employs light from an exposure illumination system |
| 06/15/1999 | US5912725 Illumination optical system to be used in an exposure apparatus and a method of manufacturing a semiconductor structure using the exposure apparatus |
| 06/15/1999 | US5912468 Charged particle beam exposure system |
| 06/15/1999 | US5912106 Method for improving photoimage quality |
| 06/15/1999 | US5912105 Thermally imageable material |
| 06/15/1999 | US5912102 Positive resist composition |
| 06/15/1999 | US5912096 Accuracy |
| 06/15/1999 | US5912056 Black matrix with conductive coating |
| 06/15/1999 | US5912054 Coating method and apparatus |
| 06/15/1999 | US5912049 Process liquid dispense method and apparatus |
| 06/15/1999 | US5912043 Wafer spin coating system with photoresist pumping unit check function |
| 06/15/1999 | US5911858 Scanning the position of the substrate with respect to the sputter target during deposition |
| 06/15/1999 | US5911836 Multilayer conductive metal on wafer with photoresists film |
| 06/15/1999 | US5911835 Treatment of substrates with oxyamines, hydrazines, alkanolamines and water |
| 06/15/1999 | CA2133148C Waterborne photoresists having binders neutralized with amino acrylates |
| 06/10/1999 | WO1999029145A1 Method and device for producing extreme ultraviolet and soft x-rays from a gaseous discharge |
| 06/10/1999 | WO1999028957A1 Substrate retaining apparatus and exposure apparatus using the same |
| 06/10/1999 | WO1999028956A1 Illumination control method and illumination control device for pulse light source used in aligner |
| 06/10/1999 | WO1999028790A1 Interferometer system and lithographic apparatus comprising such a system |
| 06/10/1999 | WO1999028789A1 Uv optical system with reduced ageing |
| 06/10/1999 | WO1999028788A1 Photopolymer plate for letterpress printing |
| 06/10/1999 | WO1999028787A2 High optical density ultra thin organic black matrix system |
| 06/10/1999 | WO1999028786A1 Extreme ultraviolet lithography mask blank and manufacturing method therefor |
| 06/10/1999 | WO1999028295A1 Novel aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process |
| 06/10/1999 | WO1999028292A1 Perfluorynated sulphone salts, and their uses as ionic conduction materials |
| 06/10/1999 | WO1999028220A1 Substrate transferring device and method |
| 06/10/1999 | WO1999028219A1 Substrate-holding device, substrate-holding method and exposure device |
| 06/10/1999 | DE19853216A1 Production of lithographic printing plates with silver halide emulsion |
| 06/10/1999 | DE19845444A1 High pressure discharge lamp cathode has a locally carbonized conical front end portion |
| 06/10/1999 | DE19753596A1 Application of thin film of lacquer to substrate |
| 06/09/1999 | EP0921440A1 Methods of forming raised and recessed patterns and use of the patterns in the manufacture of liquid crystal display color filters |
| 06/09/1999 | EP0921439A1 Photosensitive polymer and chemically amplified resist composition using the same |
| 06/09/1999 | EP0921438A1 Positive working peel-developable color proofing system |
| 06/09/1999 | EP0921418A2 Diffractive optical element and optical system having the same |
| 06/09/1999 | EP0921215A1 Electromagnetic radiation absorbant crystals of lithium niobate and lithium tantalate and methods of preparing the same |
| 06/09/1999 | EP0920655A1 Baths for producing microstructures |
| 06/09/1999 | EP0920654A1 Production of color proofs and printing plates |
| 06/09/1999 | EP0920386A1 Laser absorbable photobleachable compositions |
| 06/09/1999 | EP0671024B1 Method for fabricating microlenses |
| 06/09/1999 | CN2323117Y Member connection device for grille window |
| 06/09/1999 | CN1218983A Process for accurity changing sub-image in non-even thickness photoetching substratum |
| 06/09/1999 | CN1218918A Photoimageable compositions for improved adhesion and processing times |
| 06/09/1999 | CN1218916A Method for fabricating screens and apparatus for carrying out the method |
| 06/08/1999 | US5911090 Process and system for flattening secondary edgebeads on resist coated wafers |
| 06/08/1999 | US5910847 For producing a pattern on a substrate |