| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/05/1999 | US5856058 Halation inhibitor which is an esterification product between a specified phenolic compound and a naphthoquinone-1,2-diazide sulfonic acid. |
| 01/05/1999 | US5856054 Method of alignment in exposure step through array error and shot error determinations |
| 01/05/1999 | US5856053 Method for estimating optimum position of a wafer for forming image patterns thereon |
| 01/05/1999 | US5856052 Used to calibrate the photostepper's focus and exposure time settings. |
| 01/05/1999 | US5856050 For color liquid crystal display device. |
| 01/05/1999 | US5855802 Method and apparatus for forming a tubular article having a perforated annular wall |
| 01/05/1999 | US5855755 Photopolymerization |
| 01/05/1999 | US5855173 Zirconia alloy cylinders and sleeves for imaging and lithographic printing methods |
| 12/30/1998 | WO1998059364A1 Projection aligner, method of manufacturing the aligner, method of exposure using the aligner, and method of manufacturing circuit devices by using the aligner |
| 12/30/1998 | WO1998059363A1 Detergent for lithography |
| 12/30/1998 | WO1998058980A1 Use of oxime-protected isocyanate groups in the uv curing of resins at low temperature, and uv-curable resins that contain such oxime-protected isocyanate groups, and the use thereof in uv-curable coating compositions |
| 12/30/1998 | WO1998058967A1 Self-assembling peptide surfaces for cell patterning and interactions |
| 12/30/1998 | EP0887710A2 Resist development process |
| 12/30/1998 | EP0887709A2 Method and appartus for manufacturing a device using a photolithograpic mask |
| 12/30/1998 | EP0887708A2 An exposure system |
| 12/30/1998 | EP0887707A1 Positive photoresist composition |
| 12/30/1998 | EP0887706A1 Resist composition containing specific cross-linking agent |
| 12/30/1998 | EP0887705A1 Resist compositions |
| 12/30/1998 | EP0887704A1 A method for producing a positive or negative colour-proof using the same materials |
| 12/30/1998 | EP0887204A2 Method for cleaning printing forms |
| 12/30/1998 | EP0887203A1 Manufacturing method of planographic printing plate support and presensitized planographic printing plate |
| 12/30/1998 | EP0887182A1 Heat-sensitive composition and method of making a lithographic printing form with it |
| 12/30/1998 | EP0887181A2 Imaging system with high efficiency media loading |
| 12/30/1998 | EP0886807A1 Color filter |
| 12/30/1998 | EP0886806A1 2-substituted malondialdehyde compounds as co-developers for black-and-white photothermographic and thermographic elements |
| 12/30/1998 | EP0886667A1 Initiators for the cationic crosslinking of polymers containing organofunctional groups |
| 12/30/1998 | EP0610256B1 Polyamide materials |
| 12/30/1998 | CN1203607A Isolation of novolak resin without high temp distillation and photoresist composition therefrom |
| 12/30/1998 | CN1203511A Circuit substrate, circuit-formed suspension substrate, and production method thereof |
| 12/30/1998 | CN1203381A Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of compounds or compositions |
| 12/30/1998 | CN1203148A Micro structure and its manufacture method |
| 12/29/1998 | US5854953 Method for developing treatment |
| 12/29/1998 | US5854819 Mask supporting device and correction method therefor, and exposure apparatus and device producing method utilizing the same |
| 12/29/1998 | US5854748 Boolean layer comparison slice |
| 12/29/1998 | US5854672 In an exposure frame useful in lithography and the printing arts |
| 12/29/1998 | US5854671 Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure |
| 12/29/1998 | US5854357 Process for the production of polyhydroxstyrene |
| 12/29/1998 | US5854325 Photosensitive adhesive composition for additive plating |
| 12/29/1998 | US5854302 Partially polymerized divinylsiloxane linked bisbenzocyclobutene resins and methods for making said resins |
| 12/29/1998 | US5854132 Method for exposing photoresist |
| 12/29/1998 | US5853963 Life extension of photoresist developer solutions |
| 12/29/1998 | US5853962 Photoresist and redeposition removal using carbon dioxide jet spray |
| 12/29/1998 | US5853961 Method of processing substrate and apparatus for processing substrate |
| 12/29/1998 | US5853958 Lithographic plate with disperse particulate rubber additive |
| 12/29/1998 | US5853957 Photosensitive resin compositions, cured films thereof, and circuit boards |
| 12/29/1998 | US5853954 Fractionated novolak resin and photoresist composition therefrom |
| 12/29/1998 | US5853953 Polymers and photoresist compositions comprising same |
| 12/29/1998 | US5853952 Color developing organic material, color developing resin composition and colored thin film pattern |
| 12/29/1998 | US5853950 Process for making lithographic printing plate |
| 12/29/1998 | US5853949 Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound |
| 12/29/1998 | US5853948 Positive photoresist compositions and multilayer resist materials using the same |
| 12/29/1998 | US5853947 Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate |
| 12/29/1998 | US5853927 Method of aligning a mask in photolithographic process |
| 12/29/1998 | US5853925 Lateral diffusion confirming pattern and a method of measuring a lateral diffusion |
| 12/29/1998 | US5853922 Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask |
| 12/29/1998 | US5853812 Method and apparatus for processing substrates |
| 12/29/1998 | US5853803 Resist processing method and apparatus |
| 12/29/1998 | US5853555 Synthesis of onium hydroxides from onium salts |
| 12/29/1998 | US5853471 Composition for anti-reflection coating |
| 12/29/1998 | CA2057736C Printing screen and method and apparatus for its manufacture |
| 12/24/1998 | DE19726634A1 Verfahren und Vorrichtung zur Immobilisierung von Makromolekülen Method and device for the immobilization of macromolecules |
| 12/23/1998 | WO1998058296A1 Photosensitive polymer composition and element containing photosensitive polyamide and mixture of acrylates |
| 12/23/1998 | WO1998058295A1 A PHOTORESIST DEVELOPABLE IN AQUEOUS BASE MADE FROM AN ACID FUNCTIONAL β-HYDROXY THIOL RESIN AND AN UNSATURATED RESIN |
| 12/23/1998 | WO1998058294A1 Photocurable composition based on acid functional, primary resinous mercaptans |
| 12/23/1998 | WO1998058293A2 Method and device for immobilizing macromolecules |
| 12/23/1998 | WO1998058030A1 Matting paste for cationic systems |
| 12/23/1998 | WO1998058000A1 A curable, water-borne one-component coating system using thermally labile hydrophilic groups |
| 12/23/1998 | WO1998057943A1 Chromene compounds |
| 12/23/1998 | WO1998057757A1 High efficiency photoresist coating |
| 12/23/1998 | EP0886185A2 Process for manufacturing an embossing cylinder |
| 12/23/1998 | EP0886184A2 Vacuum assisted debris removal system |
| 12/23/1998 | EP0886183A1 Positive-working photoresist composition |
| 12/23/1998 | EP0886182A1 Positive photoresist composition |
| 12/23/1998 | EP0886181A2 Micro structure and its manufacture method |
| 12/23/1998 | EP0886152A1 Delocalisation of stitch errors in the writing of gratings |
| 12/23/1998 | EP0885410A1 Thermal treatment process of positive photoresist composition |
| 12/23/1998 | EP0885409A2 Thermal treatment process of positive photoresist composition |
| 12/23/1998 | EP0885408A1 A screen printing stencil |
| 12/23/1998 | EP0885407A1 Bottom antireflective coatings through refractive index modification by anomalous dispersion |
| 12/23/1998 | EP0885406A1 Light-absorbing antireflective layers with improved performance due to refractive index optimization |
| 12/23/1998 | EP0885405A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| 12/23/1998 | EP0779891B1 Novel acylphosphine oxides |
| 12/23/1998 | EP0686274B1 Novel matrix resin for high-temperature stable photoimageable compositions |
| 12/23/1998 | EP0607236B1 Processing waste washout liquid containing photopolymer from printing plate manufacture |
| 12/23/1998 | EP0557079B1 Discretionary lithography for integrated circuits |
| 12/23/1998 | CN1202913A Metal ion reduction in photoresist compositions by chelating ion exchange resin |
| 12/23/1998 | CN1202638A Production of photosensitive recording material |
| 12/23/1998 | CA2293290A1 Matting paste for cationic systems |
| 12/23/1998 | CA2290661A1 A curable, water-borne one-component coating system using thermally labile hydrophilic groups |
| 12/22/1998 | US5852693 Low-loss light redirection apparatus |
| 12/22/1998 | US5852627 Laser with line narrowing output coupler |
| 12/22/1998 | US5852518 Projection optical unit and projection exposure apparatus comprising the same |
| 12/22/1998 | US5852490 Projection exposure method and apparatus |
| 12/22/1998 | US5852293 Raster data drawing apparatus for correcting image starting position |
| 12/22/1998 | US5851739 Quinonediazide/novolak positive electron beam resist developer |
| 12/22/1998 | US5851738 Method comprising substrates coated with an antihalation layer that contains a resin binder comprising anthracene units |
| 12/22/1998 | US5851737 Spatially varied interfaces for composite materials |
| 12/22/1998 | US5851736 Heat-resistant photoresist composition, photosensitive substrate, and process for forming heat-resistant positive or negative pattern |
| 12/22/1998 | US5851735 Alkaline developing composition and method of use to process lithographic printing plates |
| 12/22/1998 | US5851734 Process for defining resist patterns |