| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/03/1999 | EP0899614A1 Image recording material |
| 03/03/1999 | EP0899125A1 Cyan dye mixtures for thermal color proofing |
| 03/03/1999 | EP0898735A1 Holographic medium and process |
| 03/03/1999 | EP0898734A1 Compositions and processes for photogeneration of acid |
| 03/03/1999 | EP0898732A1 Black-and-white photothermographic and thermographic elements comprising 3-heteroaromatic-substituted acrylonitrile compounds as co-developers |
| 03/03/1999 | EP0898499A1 Insulator cure process for giant magnetoresistive heads |
| 03/03/1999 | EP0702806B1 Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material |
| 03/03/1999 | CN1209888A Pressure-developing device and recording device |
| 03/03/1999 | CN1209821A Polymerizable substances based on epoxides |
| 03/03/1999 | CN1209641A Antistatic method for using conductive needle to photomask |
| 03/03/1999 | CN1209637A Developing method for cathode-ray tube screen |
| 03/03/1999 | CN1209570A Negative photo slushing compound composition for short-wave long light and method for forming image |
| 03/03/1999 | CN1209442A Photogeneration of amine by using alpha-amino acetophenone |
| 03/03/1999 | CN1209313A Compositions which undergo light-induced cationic curing and their use |
| 03/02/1999 | US5878105 X-ray mask |
| 03/02/1999 | US5878068 Energy quantity control method |
| 03/02/1999 | US5877924 Thin film magnetic head including negative photoresist |
| 03/02/1999 | US5877861 Method for overlay control system |
| 03/02/1999 | US5877848 Continuous production of cross-linked resin relief images for printing plates |
| 03/02/1999 | US5877845 Scanning exposure apparatus and method |
| 03/02/1999 | US5877843 Exposure apparatus |
| 03/02/1999 | US5877230 Using ferrocene compound |
| 03/02/1999 | US5877036 Overlay measuring method using correlation function |
| 03/02/1999 | US5876904 Irradiation; development |
| 03/02/1999 | US5876903 Virtual hard mask for etching |
| 03/02/1999 | US5876901 Method for fabricating semiconductor device |
| 03/02/1999 | US5876900 Polyhydroxystyrene polymer |
| 03/02/1999 | US5876899 Polymerization of acrylic monomers in ethyl lactate |
| 03/02/1999 | US5876897 Diazaquinone derivatives of chromone, thiochromone, or quinolinone |
| 03/02/1999 | US5876895 Photosensitive resin composition for color filter |
| 03/02/1999 | US5876885 Profile simulation method, dependent on curvature of processed surface, and mask design method utilizing simulation |
| 03/02/1999 | US5876884 Method of fabricating a flat-panel display device and an apparatus therefore |
| 03/02/1999 | US5876883 Method forming focus/exposure matrix on a wafer using overlapped exposures |
| 03/02/1999 | US5876882 Method for producing a color filter with a photosensitive coating film |
| 03/02/1999 | US5876875 Enhancing the solution diffusibility of a developing liquid in a semiconductor wafer developing unit through the agitation of the liquid by acoustic power. |
| 03/02/1999 | US5876280 Substrate treating system and substrate treating method |
| 03/02/1999 | US5875717 Assembly and method for producing flat printing plates |
| 03/02/1999 | US5875712 Methods and arrangement for the production of a stencil by a modified laser printer |
| 02/25/1999 | WO1999009793A1 Compton backscattered collimated x-ray source |
| 02/25/1999 | WO1999009457A1 Resist resin, resist resin composition, and process for patterning therewith |
| 02/25/1999 | WO1999009456A1 Multiple image reticle for forming layers |
| 02/25/1999 | WO1999009449A1 Method and device for producing an image which can be represented in 3-d |
| 02/25/1999 | WO1999008879A1 Method of making masks and electronic parts |
| 02/25/1999 | WO1999008717A2 Latent reactive polymers with biologically active moieties |
| 02/25/1999 | DE19736158A1 Spatially reproducible image generation method |
| 02/24/1999 | EP0898202A1 Photogeneration of amines from alpha-aminoacetophenones |
| 02/24/1999 | EP0898201A1 Radiation sensitive resin composition |
| 02/24/1999 | EP0897810A1 Process for the surface treatment of aluminium support for printing plate |
| 02/24/1999 | EP0897710A2 Light-initiated cationic curable compositions and their use |
| 02/24/1999 | EP0897577A1 Photorefractive composite |
| 02/24/1999 | EP0897558A1 Photosensitive resin composition for rapid prototyping and a process for the manufacture of 3-dimensional objects |
| 02/24/1999 | EP0897557A1 Lithographical process for production of nanostructures on surfaces |
| 02/24/1999 | EP0897420A1 Photoresist stripping compositions |
| 02/24/1999 | EP0800541B1 Siloxane-containing networks |
| 02/24/1999 | EP0706678B1 Method of photolithographically producing a copper pattern on a plate of an electrically insulating material |
| 02/24/1999 | CN1209216A Shape memory alloy lift pins for semiconductor processing equipment |
| 02/23/1999 | USRE36113 Producing two dimensional complex pattern on photosensitive layer by exposing layer to two beams of coherent radiation which form image of interference pattern, repeating to form different pattern, isolating desired region of pattern |
| 02/23/1999 | US5875023 Dual-sided expose mechanism for web product |
| 02/23/1999 | US5874929 Apparatus for producing an image |
| 02/23/1999 | US5874820 Window frame-guided stage mechanism |
| 02/23/1999 | US5874739 Arrangement for shadow-casting lithography |
| 02/23/1999 | US5874202 Process and system for flattening secondary edgebeads on resist coated wafers |
| 02/23/1999 | US5874200 Method for forming a pattern preventing water mark formation |
| 02/23/1999 | US5874198 Charged particle beam transfer method |
| 02/23/1999 | US5874197 Thermal assisted photosensitive composition and method thereof |
| 02/23/1999 | US5874195 Positive-working photoresist composition |
| 02/23/1999 | US5874189 Coating a layer of photoresist to the wafer, optimizing the number of semiconductors imprinted on a wafer in symmetrical arrangement in order to optimize fabrication cost by varying the side/length ratio, aligning mask over wafer for etching |
| 02/23/1999 | US5874188 Forming two sets of openings, the second being wider; depositing an organic pigment over the photoresist, lifting off photoresist, overlying pigment layer and intermediate layer to leave pigment in second opening; uniform thickness |
| 02/23/1999 | US5874187 Photo recording medium |
| 02/23/1999 | US5874128 First and second rotation devices for rotating connectors and wafers about first and second parallel axes; for photoetching |
| 02/23/1999 | US5874041 Monomeric urethane-bond polyfunctional (meth)acrylate and an ethylenically unsaturated monomer containing a cyclic structure |
| 02/23/1999 | US5873948 Method for removing etch residue material |
| 02/23/1999 | US5873308 Stamp making assembly with two directions of irradiation |
| 02/18/1999 | WO1999008315A1 Scanning exposure method, scanning aligner, method of manufacturing the scanning aligner, and synchronization error analysing method |
| 02/18/1999 | WO1999008158A1 Pattern forming body, pattern forming method, and their applications |
| 02/18/1999 | WO1999008157A2 Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic ir absorbing material and methods of use |
| 02/18/1999 | WO1999008156A1 Laser-illuminated stepper or scanner with energy sensor feedback |
| 02/18/1999 | WO1999008134A2 Ultra-broadband uv microscope imaging system with wide range zoom capability |
| 02/18/1999 | WO1999008133A2 Stepper or scanner having two energy monitors for a laser |
| 02/18/1999 | WO1999008070A1 Method for correcting measurement errors in a machine measuring co-ordinates |
| 02/18/1999 | DE19719230C1 Arrangement for manufacturing printing plates |
| 02/17/1999 | EP0897136A1 Developing solution for photosensitive resin plate |
| 02/17/1999 | EP0897135A1 Process and apparatus for treating development waste liquor |
| 02/17/1999 | EP0897134A2 Positive photosensitive composition, photosensitive lithographic printing plate and method for forming a positive image |
| 02/17/1999 | EP0896974A2 Stabilzed cationically-curable compositions |
| 02/17/1999 | EP0896968A1 Modified copolymer, process for preparing the same, and curable resin composition |
| 02/17/1999 | EP0896587A1 Polymerisable composition |
| 02/17/1999 | EP0649061B1 Positive electron-beam resist composition |
| 02/17/1999 | CN1208362A Method of filtering the organic solutions arising in the production of circuit boards |
| 02/16/1999 | US5872618 For projecting a transfer pattern on a mask onto a photosensitive substrate |
| 02/16/1999 | US5872617 Scanning type exposure apparatus and device manufacturing method |
| 02/16/1999 | US5872367 High precision mount |
| 02/16/1999 | US5872365 UV irradiation apparatus |
| 02/16/1999 | US5872054 Anti-reflection film and method of manufacturing |
| 02/16/1999 | US5871928 Methods for nucleic acid analysis |
| 02/16/1999 | US5871889 Semiconductor integrated circuits and photolithographic manufacturing process foe elimination of defects |
| 02/16/1999 | US5871888 Crystallization of a transparent layer on a substrate |
| 02/16/1999 | US5871886 Patterning, dry etching, using photoresist mask; integrated circuit wafers |
| 02/16/1999 | US5871885 Inclined wall made less steep by controlling ratio of etching rate |
| 02/16/1999 | US5871884 On-demand production of LAT imaging films |