Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/1998
11/25/1998EP0879400A1 Multiple field of view calibration plate for use in semiconductor manufacturing
11/25/1998EP0879304A2 Production of bevelled galvanic structures
11/25/1998EP0879257A1 Polymerizable substances based on epoxides
11/25/1998EP0879113A1 Damage-free laser surface treatment method
11/25/1998EP0800657B1 Polymers based on block copolymers
11/25/1998CN1199922A Material for forming fine pattern and method for manufacturing semiconductor device using the same
11/25/1998CN1199875A Liquid photo-polymerizable solder mask composition containing UV reactive polymeric binder
11/25/1998CN1199874A Positive-tone photoimageable crosslinkable coating
11/24/1998US5842075 Developing solution feed system for semiconductor photolithography process having a gas removal device in a high solution feed pressure pipe section
11/24/1998US5841567 Method and apparatus for imaging at a plurality of wavelengths
11/24/1998US5841521 Silver salt diffusion transfer
11/24/1998US5841520 Exposure apparatus and method that use mark patterns to determine image formation characteristics of the apparatus prior to exposure
11/24/1998US5841515 Substrate container cassette, interface mechanism, and substrate processing
11/24/1998US5841250 Stage apparatus and linear motor, and exposure apparatus and device production method using the stage apparatus
11/24/1998US5841242 Electrodeless lamp with elimination of arc attachment
11/24/1998US5840622 Phase mask laser fabrication of fine pattern electronic interconnect structures
11/24/1998US5840593 Membrane dielectric isolation IC fabrication
11/24/1998US5840467 Image recording materials
11/24/1998US5840463 Useful in the fabrication of photomasks on flexographic printing plates and photoresists
11/24/1998US5840451 Without using reticle or mask
11/24/1998US5840203 In-situ bake step in plasma ash process to prevent corrosion
11/24/1998US5839324 Stage apparatus and exposure apparatus provided with the stage apparatus
11/24/1998CA2145018C Scanning near-field optic/atomic force microscope
11/19/1998WO1998052389A1 Plasma focus high energy photon source
11/19/1998WO1998052101A1 Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass
11/19/1998WO1998052086A1 Wavelength-selective opto-mechanical scanner and its applications
11/19/1998WO1998051718A1 Alkali-soluble resins and image-forming material prepared by using the same
11/18/1998EP0878822A1 Charged Particle beam exposure apparatus having a stage position measurement device
11/18/1998EP0878740A1 Radiation sensitive polymer composition
11/18/1998EP0878739A1 Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
11/18/1998EP0878738A2 Positive resist composition
11/18/1998EP0878473A1 Derivatives of styrene oxide in cationically-curable compositions
11/18/1998EP0877972A1 Covered microchannels and the microfabrication thereof
11/18/1998EP0800706B1 Forming polyimide and polyimidesiloxane coatings by screen printing
11/18/1998EP0797792B1 Photolithographic method of producing structural features
11/18/1998EP0781424B1 Photolithographic method of producing structural features
11/18/1998EP0681713B1 Sulphonic acid esters, radiation-sensitive mixtures made therewith, and their use
11/17/1998US5839011 Apparatus for processing photosensitive material
11/17/1998US5838595 Apparatus for controlling a factory
11/17/1998US5838529 Low voltage electrostatic clamp for substrates such as dielectric substrates
11/17/1998US5838450 Direct reticle to wafer alignment using fluorescence for integrated circuit lithography
11/17/1998US5838449 Optical apparatus
11/17/1998US5838443 Exposure apparatus implementing priority speed setting arrangement
11/17/1998US5838426 Exposure apparatus and method which changes wavelength of illumination light in accordance with pressure changes occurring around projection optical system
11/17/1998US5837748 Photopolymerizable composition
11/17/1998US5837746 Coreactive photoinitiators
11/17/1998US5837586 4-(alkoxyhydroxy)styryl triazine photinitiators and photo sensitive composition
11/17/1998US5837428 Etching method for extending i-line photolithography to 0.25 micron linewidth
11/17/1998US5837426 Photolithographic process for mask programming of read-only memory devices
11/17/1998US5837425 Presensitization of plates, supports, multilayer, exposure to actinic radiation of films, development of plates with alkali
11/17/1998US5837423 Plates with photoresists patterns with masking and etching of polymers
11/17/1998US5837422 On a sustrate contatining addition polymerizable unsaturated bonds with and without urethane bonds; high sensitivity to lignt in visible region and excellent developability
11/17/1998US5837421 Polymers for flexographic printing plates made from diene monomers and acrylate monomers for impact strength
11/17/1998US5837420 Positive working photosensitive composition
11/17/1998US5837419 Acid decomposable resin, photo-acid generating agent and naphthol novolak
11/17/1998US5837417 Producing positive photoresist compositions comprising p-cresol oligomers esterified wtih diazo sulfonyl chlorides and water insoluble novolak resin
11/17/1998US5837407 Method for making a screen panel for a color CRT
11/17/1998US5837404 Wafer moves back and forth in x and y directions to match previously recorded alignment marks; vernier keys disposed on intersecting edges; integrated circuits
11/17/1998CA2061623C Sub-micron imaging
11/16/1998CA2237535A1 Radiation-or thermally-initiated cationically-curable epoxide compounds and compositions made from those compounds
11/12/1998WO1998050516A1 Non-corrosive stripping and cleaning composition
11/12/1998WO1998050437A1 Biradical photoinitiators
11/12/1998DE19719229C1 Printing plate production
11/12/1998DE19718983A1 Application especially of photolithographic developer to surface
11/11/1998EP0877417A1 Method for fabrication of electrodes and other electrically-conductive structures
11/11/1998EP0877297A2 Exposure method and device manufacturing method
11/11/1998EP0877296A2 Transmission system for synchrotron radiation
11/11/1998EP0877295A2 Patterning material and patterning method
11/11/1998EP0877294A1 Resist composition
11/11/1998EP0877293A2 Positive photosensitive composition
11/11/1998EP0877271A2 A projection optical system and method of using such system for manufacturing devices
11/11/1998EP0877067A2 Aqueous, radiation curable coating compositions
11/11/1998EP0876666A1 Collimator for x-ray spectroscopy
11/11/1998EP0876631A2 System for producing 3-dimensional photon crystals
11/11/1998EP0876195A1 Method of filtering the organic solutions arising in the production of circuit boards
11/11/1998EP0788620B1 Positive photosensitive composition
11/10/1998US5835837 Apparatus for removing image forming substance from image holding member
11/10/1998US5835560 Exposure apparatus
11/10/1998US5835520 Having high reflectance output coupler, calcium fluoride prisms, low fluorine gas partial pressure; high resolution integrated circuit lithography
11/10/1998US5835285 Projection optical system and exposure apparatus using the same
11/10/1998US5835284 Catadioptric optical system and adjusting method
11/10/1998US5835275 For projecting an image of an object onto a substrate
11/10/1998US5835274 Mask for patterning a microlens
11/10/1998US5835227 Method and apparatus for determining performance characteristics in lithographic tools
11/10/1998US5835225 Surface properties detection by reflectance metrology
11/10/1998US5835217 Phase-shifting point diffraction interferometer
11/10/1998US5835198 Articulated platform mechanism for laser pattern generation on a workpiece
11/10/1998US5835196 System and method for alignment of integrated circuits multiple layers
11/10/1998US5835195 Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
11/10/1998US5834895 Mercury free, high power, emitting in wavelengths longer than 400nm
11/10/1998US5834799 Semiconductor device assembly
11/10/1998US5834785 Method and apparatus to compensate for thermal expansion in a lithographic process
11/10/1998US5834769 Atomic beam pattern forming method using atomic beam holography
11/10/1998US5834767 For detecting a surface position of an object
11/10/1998US5834737 Heat treating apparatus
11/10/1998US5834531 Positive photoresists of hydroxystyrene-hydroxyvinylcyclo-hexane copolymer crosslinked with an aliphatic vinyl ether to provide acid-labile acetal and/or ketal protective groups; heat resistance; resolution, uv radiation
11/10/1998US5834334 Method of forming a multi-chip module from a membrane circuit
11/10/1998US5834162 Process for 3D chip stacking
11/10/1998US5834161 Method for fabricating word lines of a semiconductor device
11/10/1998US5834160 Method and apparatus for forming fine patterns on printed circuit board
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