| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/20/1999 | US5895736 Radiating beam uniform in current density through aperture plate to electron resist layer |
| 04/20/1999 | US5895541 Parting layer, colored layer, reflective layer, and photosensitive resin layer are laminated to base film of relief pattern transfer sheet, forming letters on the face of a timepiece |
| 04/20/1999 | US5895272 Ion-implanted resist removal method |
| 04/15/1999 | WO1999018650A1 Magnetic positioner having a single moving part |
| 04/15/1999 | WO1999018604A1 Projection exposure method and apparatus |
| 04/15/1999 | WO1999018572A1 A method of manufacturing a stamper for producing optical discs, a stamper thus obtained and an optical disc obtained by using such a stamper |
| 04/15/1999 | WO1999018478A1 Antireflection or light-absorbing coating composition and polymer therefor |
| 04/15/1999 | WO1999008157A3 Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic ir absorbing material and methods of use |
| 04/15/1999 | WO1999005572A3 Viscosity stabilization of radiation-curable compositions |
| 04/15/1999 | WO1999001795A3 Pattern-forming methods and radiation sensitive materials |
| 04/15/1999 | WO1999000706A9 Transferring a programmable pattern by photon lithography |
| 04/15/1999 | WO1998058293A3 Method and device for immobilizing macromolecules |
| 04/15/1999 | DE19846851A1 Photosensitive composition and film for sand blasting for making printed circuit or insulation of plasma display panel |
| 04/15/1999 | DE19743506A1 Laminate with adhesion-promoting and photopolymerizable layers for making printing plate or relief |
| 04/14/1999 | EP0908901A1 A method for permanently marking X-ray screens |
| 04/14/1999 | EP0908786A2 Process for reducing shrinkage of features formed in a photoresist by treatment with an amine, an amide or an aldehyde |
| 04/14/1999 | EP0908785A2 Etch inhibitors in developer for lithographic printing plates |
| 04/14/1999 | EP0908784A1 A method of making positive working printing plates from a light sensitive imaging element |
| 04/14/1999 | EP0908783A1 Resist compositions, their preparation and use for patterning processes |
| 04/14/1999 | EP0908782A1 Photolithographic processing method |
| 04/14/1999 | EP0908781A2 Photolithographic processing method and apparatus |
| 04/14/1999 | EP0908780A1 Process for forming a cured film of a thermosetting resin |
| 04/14/1999 | EP0908473A1 Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process |
| 04/14/1999 | EP0908325A1 Improved rendering of continuous tone images by reducing clustering of halftone dots |
| 04/14/1999 | EP0908308A1 Positive working radiation sensitive compositions containing a large proportion of carbon black which are laser imageable |
| 04/14/1999 | EP0907906A1 Lithography exposure device and lithography procedures |
| 04/14/1999 | EP0907905A1 Process for modulating interferometric lithography patterns to record selected discrete patterns in photoresist |
| 04/14/1999 | EP0620931B1 Mask for photolithography |
| 04/14/1999 | CN1214129A Ultra thin organic black matix |
| 04/14/1999 | CN1213823A Manufacturing method of master disk for forming optical disk |
| 04/14/1999 | CN1213789A Improved deep ultra violet photolithography |
| 04/14/1999 | CN1213788A Resist development process |
| 04/14/1999 | CN1213778A Semiconductor device and method for making the same |
| 04/13/1999 | US5894350 Method of in line intra-field correction of overlay alignment |
| 04/13/1999 | US5894341 Exposure apparatus and method for measuring a quantity of light with temperature variations |
| 04/13/1999 | US5894319 Exposure drum for a newspaper print-plate making apparatus |
| 04/13/1999 | US5894132 Charged-particle-beam projection-exposure apparatus with focus and tilt adjustments |
| 04/13/1999 | US5894058 Providing a target surface of the target object with a photoresist film defining a pattern of a specific width, generating a large diameter fast atomic beam from a source, radiating the beam through pattern towards target surface |
| 04/13/1999 | US5894057 Defining the positin of stripe field and sub-field, with respect to mask or wafer surface, developing drawing pattern definition data overlapping the stripe field defined |
| 04/13/1999 | US5894056 Mask substrate, projection exposure apparatus equipped with the mask substrate, and a pattern formation method utilizing the projection exposure apparatus |
| 04/13/1999 | US5893981 Method of making stabilized MR sensor and flux guide joined by contiguous junction |
| 04/13/1999 | US5893974 Inorganic porous shell provoding a selective molecular barrier between interior and exterior |
| 04/13/1999 | US5893957 Multilayer sheet having a coated fluororesin |
| 04/13/1999 | US5893662 Image forming device |
| 04/10/1999 | CA2218273A1 Solvent-assisted lithographic process using photosensitive sol-gel derived glass for depositing ridge waveguides on silicon |
| 04/08/1999 | WO1999017167A1 Raster-scan photolithographic reduction system |
| 04/08/1999 | WO1999017166A1 Fractionated novolak resin copolymer and photoresist composition therefrom |
| 04/08/1999 | WO1999017162A1 Multi-level conductive matrix formation method |
| 04/08/1999 | WO1999017161A1 Improved thermosetting anti-reflective coatings at deep ultraviolet |
| 04/08/1999 | WO1999016621A1 Planographic printing |
| 04/08/1999 | WO1999016555A1 Protective overcoat for replicated diffraction gratings |
| 04/08/1999 | WO1999016554A1 Spin coating method and coating apparatus |
| 04/08/1999 | WO1999008133A3 Stepper or scanner having two energy monitors for a laser |
| 04/08/1999 | DE19822764A1 Correcting alignment method for system for producing semiconductors |
| 04/08/1999 | DE19805875C1 Photo mask carrier table for micro-chip manufacture |
| 04/08/1999 | CA2301020A1 Improved thermosetting anti-reflective coatings at deep ultraviolet |
| 04/07/1999 | EP0907111A2 Exposure method and method of producing a photolithographic mask |
| 04/07/1999 | EP0907110A2 Multi-layer element for the production of lithographic or relief printing plates |
| 04/07/1999 | EP0907109A1 Process for device fabrication using a radiation-sensitive resist material |
| 04/07/1999 | EP0907108A1 Radiation-sensitive resin composition |
| 04/07/1999 | EP0907107A2 Package of photosensitive planographic printing plates and photosensitive planographic printing plate |
| 04/07/1999 | EP0906903A2 Bis-o-amino(thio)phenols and their preparartion |
| 04/07/1999 | EP0906589A1 Apertured nonplanar electrodes and forming methods |
| 04/07/1999 | EP0906588A1 Photodefinable dielectric compositions |
| 04/07/1999 | CN1213456A Pattern forming method |
| 04/07/1999 | CN1213437A Bottom antireflective coatings through refractive index modification by anomalous dispersion |
| 04/06/1999 | US5893004 Developing unit |
| 04/06/1999 | US5892810 X-ray source for lithography |
| 04/06/1999 | US5892611 Laser drawing apparatus |
| 04/06/1999 | US5892574 Plate exposing apparatus and method |
| 04/06/1999 | US5892573 Exposure apparatus and method with multiple light receiving means |
| 04/06/1999 | US5892572 Projection exposure apparatus and method |
| 04/06/1999 | US5892291 Registration accuracy measurement mark |
| 04/06/1999 | US5892241 Apparatus and method for the inspection of scattered resist |
| 04/06/1999 | US5892231 Virtual mask digital electron beam lithography |
| 04/06/1999 | US5892224 Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams |
| 04/06/1999 | US5892096 Non-subliming mid-UV dyes and ultra-thin organic arcs having differential solubility |
| 04/06/1999 | US5892095 Cyano group-containing oxime sulfonate compounds |
| 04/06/1999 | US5891959 Photolithography, styrenic copolymer, curable copolymer |
| 04/06/1999 | US5891806 Proximity-type microlithography apparatus and method |
| 04/06/1999 | US5891605 Stress resistance for devices used in optical lithography |
| 04/06/1999 | US5891604 Poyvinyl alcohol, photosensitive solution, glass powders as binders and conductive powders |
| 04/06/1999 | US5891603 N-hydrocarbylsulfonyloxy-substituted cyclic imide sulfonic acid generators, polyvinylphenol derivatives |
| 04/06/1999 | US5891601 Dipyridyl compound |
| 04/06/1999 | US5891529 Radiation-curable, silicon-containing resin compositions that can be used to fabricate films used as dielectric films in semiconductor devices |
| 04/06/1999 | US5891352 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
| 04/06/1999 | US5891351 Method for forming pattern on steel substrate by reactive ion etching |
| 04/06/1999 | CA2249651A1 Laser induced imaging of positive working radiation sensitive compositions containing a large proportion of carbon black |
| 04/06/1999 | CA2249647A1 Etch inhibitors in developer for lithographic printing plates |
| 04/01/1999 | WO1999016113A1 Stage device, a scanning aligner and a scanning exposure method, and a device manufactured thereby |
| 04/01/1999 | WO1999016112A1 Aligner, scanning aligner and scanning exposure method |
| 04/01/1999 | WO1999016080A1 Stage driving method, stage device and exposure device |
| 04/01/1999 | WO1999015939A1 Volume phase hologram and method for producing the same |
| 04/01/1999 | WO1999015936A1 Photosensitive element comprising a protective film |
| 04/01/1999 | WO1999015935A1 Novel process for preparing resists |
| 04/01/1999 | WO1999015934A1 Techniques for fabricating and packaging multi-wavelength semiconductor laser array devices (chips) and their applications in system architectures |
| 04/01/1999 | WO1999015933A1 Optical lithography beyond conventional resolution limits |
| 04/01/1999 | WO1999015609A1 Aqueous rinsing composition |
| 04/01/1999 | WO1999015345A1 Process for removing residues from a semiconductor substrate |
| 04/01/1999 | DE19838650A1 Negative photoresist composition useful for highly integrated electronic circuits |