Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/1999
02/16/1999US5871883 Excellent in image reproduction and scratch resistance; light heat conversion layer contains an addition polymer having groups capable of reacting with silicon crosslinker contained in silicon rubber layer
02/16/1999US5871874 Mask pattern forming method capable of correcting errors by proximity effect and developing process
02/16/1999US5871872 Dye incorporated pigments and products made from same
02/16/1999US5871672 Polypyrroles, polyanilines or polythiophenes with silver salts and ionic conducting exchange polymers
02/16/1999US5871587 Processing system for semiconductor device manufacture of otherwise
02/16/1999US5871584 Processing apparatus and processing method
02/16/1999US5871028 Photoresist solution storage and supply device
02/11/1999WO1999006890A1 Overcoat for light-sensitive materials comprising a (1-vinylimidazole) polymer or copolymer
02/11/1999WO1999006889A1 Rubber-based aqueous developable photopolymers and photocurable elements comprising same
02/11/1999WO1999006888A1 Radiation curable resin composition
02/11/1999WO1999006887A1 Method and composition for producing activating light absorbing lenses
02/11/1999WO1999006886A1 Latex-based, aqueous developable photopolymers and use thereof in printing plates
02/11/1999WO1999006419A1 Novel crystalline ion-association substance, process for producing the same, and latent photopolymerization initiator
02/11/1999WO1999006336A1 Glass decorating compositions using bisphenol a epoxies
02/11/1999WO1998049763A3 Magnetically-positioned x-y stage having six-degrees of freedom
02/11/1999CA2297004A1 Method and composition for producing activating light absorbing lenses
02/11/1999CA2286058A1 Rubber-based aqueous developable photopolymers and photocurable elements comprising same
02/11/1999CA2285945A1 Latex-based, aqueous developable photopolymers and use thereof in printing plates
02/10/1999EP0896362A1 Semiconductor supporting device
02/10/1999EP0896251A1 Method of making a lithographic printing plate
02/10/1999EP0896250A2 Hardenable photoimageable compositions
02/10/1999EP0895706A1 Method and apparatus for generating x-ray or euv radiation
02/10/1999CN1207576A Resist developing process
02/10/1999CN1207506A Composition for photo-conductive layer and method for preparing fluorescent layer on CRT panel
02/10/1999CN1207505A Hardenable photoimageable compositions
02/10/1999CN1042074C Method and compositions for diffusion patterning
02/09/1999US5870307 Method and apparatus for production of high resolution three-dimensional objects by stereolithography
02/09/1999US5870201 Magnification measuring mark
02/09/1999US5870198 Stage position measuring apparatus capable of restricting generation of temperature fluctuations to a measured value
02/09/1999US5870197 Air circulation system for use with a location apparatus in an enclosure
02/09/1999US5870176 Maskless lithography
02/09/1999US5869906 Registration accuracy measurement mark for semiconductor devices
02/09/1999US5869383 High contrast, low noise alignment mark for laser trimming of redundant memory arrays
02/09/1999US5869354 Forming a etch stop layer in the substrate parallel to the principal surface, forming semiconductor on the principal surface, depositing a low stress dielectric membranes over semiconductor, etching etch barrier and a substrate portion
02/09/1999US5869220 Waterborne photoresist emulsions and methods of preparation thereof
02/09/1999US5869219 Purging deposition chamber with inert gas during coating of wafer with polyimide to reduce moisture content
02/09/1999US5869212 Improved image resolution and depth of focus, and a minimization of image shortening effects
02/09/1999US5869211 Substrate having opaque film on central portion covered with coating film which has benn removed from peripheral portion by dissolving in processing solution
02/09/1999US5869210 Radical-polymerizable monomer, a cationic-polymerizable monomer, a radical polymerization initiator, and a cationic-polymerization initiator
02/09/1999US5869175 Two layers of photoresist: lower layer is thinner and dyed to have a lower transmittance; both layers are used as a masking pattern for the underlying conductive layer
02/09/1999US5868952 Fabrication method with energy beam
02/09/1999US5868560 Reticle, pattern transferred thereby, and correction method
02/09/1999US5868278 Eliminating microbubbles in developer solutions to reduce photoresist residues
02/04/1999WO1999005759A1 Wavelength shift correction technique for a laser
02/04/1999WO1999005710A1 Projection aligner, projection exposure method, optical cleaning method and method of fabricating semiconductor device
02/04/1999WO1999005709A1 Exposure method and aligner
02/04/1999WO1999005708A1 Projection exposure method, projection aligner, and methods of manufacturing and optically cleaning the aligner
02/04/1999WO1999005707A1 Focusing method, exposure method, and aligner
02/04/1999WO1999005591A2 Method and apparatus for providing a bioinformatics database
02/04/1999WO1999005574A1 Method and system for providing a probe array chip design database
02/04/1999WO1999005573A1 Supporting device with gas bearing
02/04/1999WO1999005572A2 Viscosity stabilization of radiation-curable compositions
02/04/1999WO1999005571A1 Sedimentation stabilized radiation-curable filled compositions
02/04/1999WO1999005324A1 System for providing a polymorphism database
02/04/1999WO1999005323A1 Gene expression and evaluation system
02/04/1999DE19830476A1 Semiconductor device for accelerometer
02/04/1999DE19732902A1 Deckschicht für lichtempfindliche Materialien umfassend ein (1-Vinylimidazol)-Polymer oder -Copolymer Overcoat for light-sensitive materials comprising a (1-vinylimidazole) polymer or copolymer
02/04/1999CA2296587A1 Viscosity stabilization of radiation-curable compositions
02/04/1999CA2292573A1 Sedimentation stabilized radiation-curable filled compositions
02/03/1999EP0895279A1 Manufacture of semiconductor device
02/03/1999EP0895127A2 Photoresist composition
02/03/1999EP0895113A2 Optical mount with UV curable adhesive and protective coating
02/03/1999EP0894808A1 Modified cellulose compound and photopolymerizable resin composition containing the same
02/03/1999EP0894622A2 Positive-working photosensitive composition for use with infrared laser
02/03/1999EP0894287A1 Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device
02/03/1999EP0894286A1 Nitrone compounds as photopolymer polymerization inhibitors and contrast enhancing additives
02/03/1999EP0894262A1 Optical inspection device and lithographic apparatus provided with such a device
02/03/1999EP0894154A1 RECOVERY OF Mo/Si MULTILAYER COATED OPTICAL SUBSTRATES
02/03/1999EP0894050A1 Laser addressable thermal transfer imaging element with an interlayer
02/03/1999CN1207109A Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoressit composition therefrom
02/03/1999CN1206933A Device and method for jet-coating photoresit
02/03/1999CN1206850A Fringe-free coating method for high-viscosity photolithographic coating-layer
02/02/1999US5867401 Phase shifter arranging method and computer readable medium storing program for carrying out the method
02/02/1999US5867319 Illumination optical system, an exposure apparatus having the illumination system, and a method for manufacturing a semiconductor device
02/02/1999US5867276 Method for broad wavelength scatterometry
02/02/1999US5867253 Method of correcting light proximity effect
02/02/1999US5866980 Sulfur/selenium lamp with improved characteristics
02/02/1999US5866935 Tunneling device
02/02/1999US5866920 Semiconductor device and manufacturing method of the same
02/02/1999US5866911 Method and apparatus for improving resolution in scanned optical system
02/02/1999US5866724 Positive resist composition and photosensitizers
02/02/1999US5866627 Photosensitive polyimide precursors
02/02/1999US5866437 Dynamic process window control using simulated wet data from current and previous layer data
02/02/1999US5866436 Process of manufacturing an intergrated circuit having an interferometrically profiled mounting film
02/02/1999US5866307 Using pressurized gas; deaeration
02/02/1999US5866306 Polyalkylphenylsilane
02/02/1999US5866305 Mixture of ethyl lactate, gamma butyrolactone and ethyl3-ethoxypropionate
02/02/1999US5866304 Using an acrylated acid terpolymer
02/02/1999US5866303 Resist developing method by magnetic field controlling, resist developing apparatus and method of fabricating semiconductor device
02/02/1999US5866302 Pattern formation method
02/02/1999US5866300 Method of and system for exposing pattern on object by charged particle beam
02/02/1999US5866299 Negative photoresist composition
02/02/1999US5866298 Radiation sensitive composition for color filters
02/02/1999US5866297 Photosensitive layer on carrier
02/02/1999US5866296 Photosensitive resin composition
02/02/1999US5866295 Photosensitive quinolone compounds and a process of preparation
02/02/1999US5866294 High durable printing
02/02/1999US5866283 Method of monitoring a photolithographic process through utilization of fractional radiant energy test pattern
02/02/1999US5866281 Multi-layer microstructure fabrication; accurate adjustment between x-ray mask and substrate
02/02/1999US5865893 Spin coating apparatus