Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/1998
11/10/1998US5834158 Method for the optimum utilization of base material in the manufacture of optoelectronic components with variable-period grating
11/10/1998US5834157 Photoinitiators; reduced diffusion and sublimation
11/10/1998US5834156 Method for processing photosensitive material and apparatus therefor
11/10/1998US5834129 Grained and anodized aluminum substrate for lithographic printing plates
11/10/1998US5834125 Non-reactive anti-reflection coating
11/10/1998US5832620 Staging apparatus
11/10/1998CA2048164C Photoimageable electrodepositable photoresist composition
11/10/1998CA2040482C Photosensitive resin composition and method of forming conductive pattern
11/05/1998WO1998049772A1 Method of making surface wave devices
11/05/1998WO1998049763A2 Magnetically-positioned x-y stage having six-degrees of freedom
11/05/1998WO1998049708A2 Use of sacrificial masking layer and backside exposure in forming a black matrix layer
11/05/1998WO1998049603A1 Antireflective coating compositions for photoresist compositions and use thereof
11/05/1998WO1998049602A1 Light absorbing polymers
11/05/1998WO1998049601A1 Positive resist composition for photomask preparation
11/05/1998WO1998049600A1 Photosensitive composition and method of pattern formation
11/05/1998WO1998049538A1 Monitoring of minimum features on a substrate
11/05/1998WO1998049214A1 Nitrogen-containing epoxy resins for photocurable coating applications
11/05/1998WO1998034092A3 Object inspection and/or modification system and method
11/05/1998DE19734695C1 Method of correcting measurement errors of coordinate measurement machine e.g. for semiconductor industry
11/05/1998DE19717152A1 Production of sharp-edged polyimide patterns on silicon chips
11/04/1998EP0875940A2 Optoelectronic array and method of making the same
11/04/1998EP0875790A2 Lamp instability detecting system
11/04/1998EP0875789A1 Resist composition and its use for forming pattern
11/04/1998EP0875788A1 Radiation sensitive composition for color filters
11/04/1998EP0875787A1 Method for reducing the substrate dependence of resist
11/04/1998EP0875778A1 Image-focusing optical system for ultraviolet laser
11/04/1998EP0875496A1 Acrylic or methacrylic acid derivatives and polymers obtained therefrom
11/04/1998EP0875022A1 Composition for the manufacture of flexographic printing plates
11/04/1998EP0586483B1 Method and apparatus for washing-out printing plates
11/04/1998EP0490966B1 Radiation-sensitive compositions containing fully substituted novolak polymers
11/04/1998EP0423150B1 A scanner system for successive irradiation of a working surface, particularly for ultra-violet exposure of a photo emulsion on a serigraphic printing frame
11/04/1998CN1198247A Provision of color elements on substrates by means of screen-printing or stencil-printing method
11/04/1998CN1198149A Low metal ion containing 4,4'-(1-(4-(1-(4-hydroxyphenyl)-1-methylethyl) phenyl) ethylidene) bisphenol and photoresist compositions therefrom
11/04/1998CN1197817A Ink jet print head containing radiation curable resin layer
11/03/1998US5832415 Method and apparatus for calibrating a control apparatus for deflecting a laser beam
11/03/1998US5831776 Projection optical system and projection exposure apparatus
11/03/1998US5831770 Projection optical system and exposure apparatus provided therewith
11/03/1998US5831716 Slit-scanning type light exposure apparatus
11/03/1998US5831715 Projection exposure apparatus with means to vary spherical aberration
11/03/1998US5831386 Electrodeless lamp with improved efficacy
11/03/1998US5831321 Semiconductor device in which an anti-reflective layer is formed by varying the composition thereof
11/03/1998US5831280 Device and method for programming a logic level within an integrated circuit using multiple mask layers
11/03/1998US5831272 Low energy electron beam lithography
11/03/1998US5831270 Magnetic deflectors and charged-particle-beam lithography systems incorporating same
11/03/1998US5831181 Automated tool for precision machining and imaging
11/03/1998US5831070 Applying print material on substrate for biosynthesis of oligonucleotides
11/03/1998US5830990 Ion exchanging; absorbent coating
11/03/1998US5830630 Controlling particle size
11/03/1998US5830624 Method for forming resist patterns comprising two photoresist layers and an intermediate layer
11/03/1998US5830623 Pattern lithography method
11/03/1998US5830621 Photosensitive elastomer composition and photosensitive rubber plate
11/03/1998US5830620 Water developable flexographic printing plate
11/03/1998US5830619 Blend of polymer and acid generating material
11/03/1998US5830611 Critical dimensions, ?open-loop? control process
11/03/1998US5830610 Method for measuring alignment accuracy in a step and repeat system utilizing different intervals
11/03/1998US5830608 Process for preparing filter
11/03/1998US5830606 Mask for manufacturing semiconductor device and method of manufacture thereof
11/03/1998US5830605 Accuracy; desired distribution of exposure light intensity
10/1998
10/30/1998CA2236068A1 Lamp stability diagnostic system
10/29/1998WO1998048494A1 VERY NARROW BAND KrF LASER
10/29/1998WO1998048452A1 Method and device for exposure control, method and device for exposure, and method of manufacture of device
10/29/1998WO1998048451A1 Aligner, exposure method using the aligner, and method of manufacture of circuit device
10/29/1998WO1998047719A1 Presensitised printing plates
10/29/1998DE19818444A1 Focusing lens system and projection illumination system
10/28/1998EP0874284A1 Developer for a positive electron beam resist composition
10/28/1998EP0874283A2 Optical exposure apparatus and photo-cleaning method
10/28/1998EP0874282A1 Negative working image recording material
10/28/1998EP0874281A1 Chemically amplified resist
10/28/1998EP0874280A2 Mask for producing three-dimensional laminated objects, mask-producing method ans mask-employing method
10/28/1998EP0873812A1 Laser beam machining device and laser
10/28/1998EP0873573A2 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas
10/28/1998EP0873542A1 Three-dimensional etching process
10/28/1998EP0873368A1 Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom
10/28/1998EP0838045A4 Making a photopolymer printing plate
10/28/1998EP0775330B1 Water-less lithographic plates
10/28/1998CN1197518A Method and appts. for development of resist
10/28/1998CN1197285A Material for antireflection film to be formed on workpiece disposed on semiconductor substrate and method of manufacturing semiconductor device using said material
10/28/1998CN1197283A Method of aligning semiconductor substrate with base stage and apparatus for doing the same
10/27/1998US5828923 Apparatus comprising washout unit, surfactant supply, hot water supply, holding tank, mixing cone for mixing effluent with coagulant to uniformly coagulate polymer grains for separation
10/27/1998US5828573 For exposing a circuit pattern defined by a mask onto a substrate
10/27/1998US5828505 Optical beam-shaper-uniformizer construction
10/27/1998US5828501 Apparatus and method for positioning a lens to expand an optical beam of an imaging system
10/27/1998US5828455 Apparatus, method of measurement, and method of data analysis for correction of optical system
10/27/1998US5828142 Platen for use with lithographic stages and method of making same
10/27/1998US5827775 Phase mask laser fabrication of fine pattern electronic interconnect structures
10/27/1998US5827634 Positive acid catalyzed resists
10/27/1998US5827624 Mask modification for focal plane on contact photolithography tool
10/27/1998US5827622 Reflective lithographic mask
10/27/1998US5827538 Controlled release of the water-insoluble core after imbibement of water vapor and wetting of a porous wall of semipermeable hydrophobic membrane impervious to liquid water; drug delivery
10/27/1998US5826513 Method and apparatus for punching and imaging a continuous web
10/27/1998CA2094436C Pressurized interface apparatus for transferring a semiconductor wafer between a pressurized sealable transportable container and a processing equipment
10/27/1998CA2041521C Method for engraving and/or etching with image-carrying mask and photo-sensitive laminate film for use in making the mask
10/22/1998WO1998047049A1 Apertured nonplanar electrodes and forming methods
10/22/1998WO1998047048A1 An illumination unit and a method for point illumination of a medium
10/22/1998WO1998047047A1 Ternary photoinitiator system for curing of epoxy/polyol resin compositions
10/22/1998WO1998047046A1 Ternary photoinitiator system for curing of epoxy resins
10/22/1998WO1998047042A1 An apparatus and a method for illuminating a light-sensitive medium
10/22/1998WO1998047029A1 Device for making grid structures in optical fibers
10/22/1998WO1998046647A1 Non-toxic initiators, resins with cross-linkable organofunctional groups containing same, and use for preparing stable and non-toxic polymers
10/22/1998WO1998046556A1 Photocurable halofluorinated acrylates
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