| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/21/1999 | EP0929844A1 Antireflective coating for photoresist compositions |
| 07/21/1999 | EP0929843A1 Light sensitive composition containing an arylhydrazo dye |
| 07/21/1999 | EP0929842A1 Bottom antireflective coatings containing an arylhydrazo dye |
| 07/21/1999 | EP0929841A1 Method for forming photoresist features having reentrant profiles using a basic agent |
| 07/21/1999 | EP0865631A4 Imaging a lithographic printing plate |
| 07/21/1999 | EP0851879B1 Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom |
| 07/21/1999 | EP0832095A4 A method of cross-linking amino acid-containing polymers using photoactivatable chemical cross-linkers |
| 07/21/1999 | EP0773271B1 Process for the production of photochromic product of curing |
| 07/21/1999 | CN1223727A Photopolymerizable thermosetting resin composition |
| 07/21/1999 | CN1223252A Copolymer resin preparation thereof, and photoresist using the same |
| 07/20/1999 | US5926740 Graded anti-reflective coating for IC lithography |
| 07/20/1999 | US5926257 Illumination optical system and exposure apparatus having the same |
| 07/20/1999 | US5925981 Tellurium lamp |
| 07/20/1999 | US5925956 Stage construction incorporating magnetically levitated movable stage |
| 07/20/1999 | US5925937 Semiconductor wafer, wafer alignment patterns |
| 07/20/1999 | US5925887 Projection exposure apparatus including an optical characteristic detector for detecting a change in optical characteristic of a projection optical system and device manufacturing method using the same |
| 07/20/1999 | US5925719 Photoresist developable in aqueous base made from acid-functional β-hydroxy thiol resin |
| 07/20/1999 | US5925718 Esterification of polyhydroxystyrene for photoresists |
| 07/20/1999 | US5925577 Method for forming via contact hole in a semiconductor device |
| 07/20/1999 | US5925525 Method of identifying nucleotide differences |
| 07/20/1999 | US5925502 Method of metallizing a quartz resonator |
| 07/20/1999 | US5925501 Dark CF4 flash |
| 07/20/1999 | US5925499 Epoxy-containing waterborne photoimageable composition |
| 07/20/1999 | US5925498 For lithographic printing plates |
| 07/20/1999 | US5925497 Coating made by reacting isocyanate groups from ethylenically unsaturated photocurable groups with a carboxy group of a polyalkenoic acid curable upon exposure to radiation; no processing required prior to being run on a press |
| 07/20/1999 | US5925496 Anodized zirconium metal lithographic printing member and methods of use |
| 07/20/1999 | US5925495 Photoresist laminate and method for patterning using the same |
| 07/20/1999 | US5925494 Vapor deposition of polymer films for photolithography |
| 07/20/1999 | US5925492 Storage stable resin for photoresists and integrated circuits |
| 07/20/1999 | US5925491 Amido substituted acetal polymer binders and their use in photosensitive compositions |
| 07/20/1999 | US5925490 Multilayer recording element suitable for producing flexographic printing plates by digital information transfer |
| 07/20/1999 | US5925484 Black photosensitive resin composition, color filter made by using the same, and a process for the production thereof |
| 07/20/1999 | US5925259 Applying material to stamp comprising deformable material, contacting stamp with substrate, filling depressions, bringing surface of stamp into contact with substrate such that surface of stamp forms seal around openings |
| 07/20/1999 | US5925205 Microstructuring, using lithography, electroforming, plastic molding parts of plates, joining by laser welding, diffusion soldering |
| 07/20/1999 | US5924912 Photosensitive resin composition for sandblast resist |
| 07/20/1999 | US5924634 Orifice plate, in particular for injection valves, and method for manufacturing an orifice plate |
| 07/15/1999 | WO1999035538A1 Developer solvent for photopolymer printing plates and method |
| 07/15/1999 | WO1999035537A1 Exposure method and scanning-type aligner |
| 07/15/1999 | WO1999035536A1 Inorganic-containing photosensitive resin composition and method for forming inorganic pattern |
| 07/15/1999 | WO1999034940A1 Improvement in aqueous stripping and cleaning compositions |
| 07/15/1999 | DE19815872C1 Photomask clear mask pattern drawer |
| 07/15/1999 | CA2318958A1 Developer solvent for photopolymer printing plates and method |
| 07/15/1999 | CA2317393A1 Improvement in aqueous stripping and cleaning compositions |
| 07/14/1999 | EP0929000A2 Image forming method and image forming apparatus |
| 07/14/1999 | EP0838084A4 Multilayer high vertical aspect ratio thin film structures |
| 07/14/1999 | CN1222981A Apertured nonplanar electrodes and forming methods |
| 07/14/1999 | CN1222756A Semiconductor device and its manufacturing method |
| 07/14/1999 | CN1222689A Photoimageable composition having improved flexibility, adhesion and stripping characteristics |
| 07/13/1999 | US5923990 Process for positioning a mask relative to a workpiece |
| 07/13/1999 | US5923915 Method and apparatus for processing resist |
| 07/13/1999 | US5923719 Exposure apparatus and device manufacturing method using the same |
| 07/13/1999 | US5923566 Phase shifted design verification routine |
| 07/13/1999 | US5923475 Laser printer using a fly's eye integrator |
| 07/13/1999 | US5923409 Scanning-type exposure apparatus including a vertically disposed holder surface and method thereof |
| 07/13/1999 | US5923408 Substrate holding system and exposure apparatus using the same |
| 07/13/1999 | US5923403 For replicating patterns present on first/second patterning masks |
| 07/13/1999 | US5923041 Overlay target and measurement procedure to enable self-correction for wafer-induced tool-induced shift by imaging sensor means |
| 07/13/1999 | US5922825 Catalytic amidation of diacids with amine, alcohols, mercaptans |
| 07/13/1999 | US5922528 Comprising a first low energy reducing agent which has high activity, a second reducing agent a silicon compound or a polysiloxane containing at least one silicon-hydrogen bond for reducing silver salt |
| 07/13/1999 | US5922522 Aqueous developing solutions for reduced developer residue |
| 07/13/1999 | US5922518 X-ray lithography resists |
| 07/13/1999 | US5922517 Catalytic seed material is either trapped between two layers of a photoimageable film, so that it is unavailable during plating or deposited on the surface of an aqueous photoimageable film which is removed prior to plating |
| 07/13/1999 | US5922516 Bi-layer silylation process |
| 07/13/1999 | US5922514 Thick film low value high frequency inductor, and method of making the same |
| 07/13/1999 | US5922513 Illumination method and apparatus for the formation of micro patterns |
| 07/13/1999 | US5922512 Heat sensitive polymer contains cyclic anhydride units that decarboxylate upon application of thermal energy, rendering the polymer more hydrophobic in exposed areas; neutral or acidic solution renders unexposed areas hydrophilic |
| 07/13/1999 | US5922511 On the press development of a diazo based printing plate |
| 07/13/1999 | US5922510 A blends comprising acrylic linear copolymer, an ethylenically-unsaturated compound and a photoinitiator for coating printed circuit boards, the ethylenically-unsaturated compound forming a polymer under photoinitiator and radiation |
| 07/13/1999 | US5922509 Photoimageable compositions having improved stripping properties in aqueous alkaline solutions |
| 07/13/1999 | US5922508 Consists of a support and a photopolymerizable layer containing a polymeric binder, a polymerization initiator combination comprising atleast one photoreducible dye and one photoinitiator, a free radical polymerizable acrylic compound |
| 07/13/1999 | US5922507 Imaging element comprising a two-phase layer having a disperse hydrophobic photopolymerisable phase |
| 07/13/1999 | US5922506 Imaging element comprising a hydrophobic photopolymerizable composition and method for producing lithographic plates therewith |
| 07/13/1999 | US5922505 Lithographic printing plate requiring no fountain solution |
| 07/13/1999 | US5922503 Plasma etchable material coated onto a substrate with a second layer of photoimagable material, reacting second layer with an organosilicon material and etching first layer in an oxygen environment |
| 07/13/1999 | US5922496 Apertures formed by differential etching are larger on the bottom of the mask contacting the substrate than constricted openings located near the top side of the mask, knife edges within upper sidewalls; compensation for thermal expansion |
| 07/13/1999 | US5922495 Used in lithography of semiconductor, provides a mask in which the line width of light blocking patterns at the overlapping region is widened to block the excessive light from passing through the mask due to repeated exposure |
| 07/13/1999 | US5922214 Nanometer scale fabrication method to produce thin film nanostructures |
| 07/13/1999 | US5922122 Triazine compounds; paints, printing inks, color display panels; photosensitivity; photopolymerizable monomer and acidic polymer |
| 07/13/1999 | US5920977 Impervious |
| 07/13/1999 | CA2093921C High power lamp |
| 07/13/1999 | CA2063508C Manufacture of a micromechanical element with two degrees of freedom |
| 07/08/1999 | WO1999034425A1 Etching process for organic anti-reflective coating |
| 07/08/1999 | WO1999034417A1 Exposure method and exposure apparatus |
| 07/08/1999 | WO1999034416A1 Projection exposure apparatus and exposure method |
| 07/08/1999 | WO1999034395A1 Discharge lamp sources apparatus and methods |
| 07/08/1999 | WO1999034258A1 Alignment device and lithographic apparatus comprising such a device |
| 07/08/1999 | WO1999034257A1 Positioning device having three coil systems mutually enclosing angles of 120°, and lithographic device comprising such a positioning device |
| 07/08/1999 | WO1999034256A1 Method for continuous and maskless patterning of structured substrates |
| 07/08/1999 | WO1999034255A1 Method and apparatus for manufacturing photomask and method of fabricating device |
| 07/08/1999 | WO1999034179A1 Pop-up temperature indicating device |
| 07/08/1999 | WO1999033725A1 Contactless wafer pick-up chuck |
| 07/08/1999 | WO1999033660A1 Engraving system and method comprising different engraving devices |
| 07/08/1999 | CA2315026A1 Method for continuous and maskless patterning of structured substrates |
| 07/07/1999 | EP0928012A2 Optical proximity correction method and apparatus |
| 07/07/1999 | EP0927911A2 Photoimageable compositions containing photopolymerizable urethane oligomers |
| 07/07/1999 | EP0927726A1 Photocatalytic composition |
| 07/07/1999 | EP0927381A1 Phase shifting circuit manufacture method and apparatus |
| 07/07/1999 | EP0927380A1 Supporting device with gas bearing |
| 07/07/1999 | EP0927209A1 Liquid curable resin composition |
| 07/07/1999 | CN1222163A Photoactive compounds for use with narrow wavelength band ultraviolet (UV) curing systems |