| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/08/1999 | US5910830 Liquid crystal display panels including alignment keys in the active regions thereof, and methods for manufacturing |
| 06/08/1999 | US5910658 Method and system for changed particle beam exposure |
| 06/08/1999 | US5910559 Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom |
| 06/08/1999 | US5910516 Photopolymerizing an unsaturated compound, an ultraviolet photoinitiator and a photochromic compound; using a filter which eliminates the uv light of wavelength shorter than 400 nm. |
| 06/08/1999 | US5910396 Providing damping layer on hard substrate, providing top coating on damping layer, masking top coating, exposing to stream of kinetic particles to pattern top coating |
| 06/08/1999 | US5910395 Negative-acting no-process printing plates |
| 06/08/1999 | US5910394 Radiation sensitive cured coating which exhibits substantial flexibility and reduces line growth |
| 06/08/1999 | US5910392 Acrylate copolymers |
| 06/08/1999 | US5910391 Subjecting plate to exposure, treating with developing solution, and washing with nitrogen-containing heterocycle compound having mercapto or thione group |
| 06/08/1999 | US5910390 Method for forming pattern |
| 06/08/1999 | US5910337 Controlling linewidth variations by reducing thin film interference effects |
| 06/08/1999 | US5909744 Photoresists |
| 06/08/1999 | CA2085698C Energy sensitive materials and methods for their use |
| 06/05/1999 | CA2255162A1 Positive working peel-developable color proofing system |
| 06/04/1999 | CA2246877A1 Reproduction equipment for printing newspapers |
| 06/03/1999 | WO1999027570A1 Projection exposure system |
| 06/03/1999 | WO1999027569A1 Aligner, exposure method and device manufacturing method |
| 06/03/1999 | WO1999027568A1 Projection aligner and projection exposure method |
| 06/03/1999 | WO1999027542A1 Collimator for x-ray proximity lithography |
| 06/03/1999 | WO1999027540A1 Stage positioning device |
| 06/03/1999 | WO1999027419A1 Method and apparatus for fabrication of high gradient insulators with parallel surface conductors spaced less than one millimeter apart |
| 06/03/1999 | WO1999027418A1 Photoresist composition containing a condensation polymer |
| 06/02/1999 | EP0920053A2 Device for exposing the peripheral area of a semiconductor wafer |
| 06/02/1999 | EP0919875A1 Mask blank and method of producing mask |
| 06/02/1999 | EP0919874A2 Photoresist composition effective for use as an ion etch barrier after patterning |
| 06/02/1999 | EP0919873A1 Photo curable resin composition and photosensitive element |
| 06/02/1999 | EP0919872A2 Negative-acting photoimageable compositions comprising unsaturated isocyanate trimers |
| 06/02/1999 | EP0919871A1 Photoimageable composition having improved flexibility, adhesion and stripping characteristics |
| 06/02/1999 | EP0919870A1 Photosensitive resin composition and photosensitive element using the resin composition |
| 06/02/1999 | EP0919869A1 Photopolymerizable compositions containing urethane oligomers and dibenzoate plasticizers |
| 06/02/1999 | EP0919868A1 Positive type image forming material |
| 06/02/1999 | EP0919867A2 Chemically amplified resist for electron beam lithography |
| 06/02/1999 | EP0919803A1 Method and compact system for inspecting a reticle with high accuracy |
| 06/02/1999 | EP0919015A1 Process and device for applying a photoresist lacquer on uneven base body surfaces |
| 06/02/1999 | EP0919014A1 Aqueous antireflective coatings for photoresist compositions |
| 06/02/1999 | EP0919013A1 Antireflective coatings for photoresist compositions |
| 06/02/1999 | EP0919012A1 Positive photoresist composition containing a 2,4-dinitro-1-naphthol |
| 06/02/1999 | EP0808481B1 Photolithographic structure generation process |
| 06/02/1999 | EP0633823B1 Removal of surface contaminants by irradiation |
| 06/02/1999 | DE19752713A1 UV-Optisches System mit reduzierter Alterung UV-optical system with reduced aging |
| 06/02/1999 | CN1218559A Thermal treatment of positive photoresist composition |
| 06/02/1999 | CN1218278A Method for pattering insulator film by electron beam irradiation |
| 06/02/1999 | CN1218277A Method of manufacturing semiconductor devices |
| 06/02/1999 | CN1218275A Semiconductor device manufacturing method |
| 06/01/1999 | US5909306 Solid-state spectrally-pure linearly-polarized pulsed fiber amplifier laser system useful for ultraviolet radiation generation |
| 06/01/1999 | US5909272 Stage and exposure apparatus using same |
| 06/01/1999 | US5909236 Laser exposure apparatus |
| 06/01/1999 | US5909030 Pattern transfer apparatus, an operation management system thereof, and an operation management system for a semiconductor manufacture apparatus |
| 06/01/1999 | US5908738 Undercoating composition for photolithography |
| 06/01/1999 | US5908735 Method of removing polymer of semiconductor device |
| 06/01/1999 | US5908734 Image formation method with a post exposure heating step |
| 06/01/1999 | US5908733 The present invention relates to electron beam exposure, and more particularly to that for drawing such a pattern as an ic (integrated circuit) directly on a semiconductor wafer. |
| 06/01/1999 | US5908732 Polymer compositions for high resolution resist applications |
| 06/01/1999 | US5908730 Chemical-sensitization photoresist composition |
| 06/01/1999 | US5908722 Dual-sided expose mechanism for web product |
| 06/01/1999 | US5908721 Using light-shading colored ink capable of changing from hydrophilic to hydrophobic |
| 06/01/1999 | US5908720 Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof |
| 06/01/1999 | US5908719 Radiation mask adapted to be aligned with a photoresist layer and method of making the same |
| 06/01/1999 | US5908706 Dummy plate for offset printing |
| 06/01/1999 | US5908668 One-sided or two-sided coating of printed circuit boards, for example with solder resist. |
| 06/01/1999 | US5908661 Apparatus and method for spin coating substrates |
| 06/01/1999 | US5908482 Heating ingot retaining the ingot in the heat, cooling to a lower temperature to anneal; used for optical systems; improved ultraviolet light resistance; no structural defects;uniform |
| 06/01/1999 | US5908319 Cleaning and stripping of photoresist from surfaces of semiconductor wafers |
| 06/01/1999 | US5908041 Method for cleaning a photoresist developer spray stream nozzle |
| 06/01/1999 | CA2254684A1 Photoimageable compositions containing photopolymerizable urethane oligomers and low tg binder polymers |
| 06/01/1999 | CA2252123A1 Photosensitive resin composition and photosensitive element using the resin composition |
| 06/01/1999 | CA2249697A1 Photoimageable compositions for improved adhesion and processing times |
| 06/01/1999 | CA2249527A1 Photoimageable composition having improved flexibility, adhesion and stripping characteristics |
| 05/27/1999 | WO1999026279A1 Exposure method and aligner |
| 05/27/1999 | WO1999026278A1 Exposure apparatus and method of manufacturing the same, and exposure method |
| 05/27/1999 | WO1999026277A1 Systems and methods for plasma enhanced processing of semiconductor wafers |
| 05/27/1999 | WO1999026113A1 Device and method for flat holding of a substrate in microlithography |
| 05/27/1999 | WO1999026112A1 Holographic medium and process |
| 05/27/1999 | WO1999026111A1 Imaging transfer system |
| 05/27/1999 | WO1999026097A1 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
| 05/27/1999 | WO1999014256A8 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| 05/27/1999 | DE19851247A1 Lithographic plate masters for writing by laser in heat mode |
| 05/27/1999 | DE19833481A1 Projection optical system for exposure system used in semiconductor device, liquid crystal display element manufacture |
| 05/26/1999 | EP0918255A2 Apparatus for exposure of printing plates using image modification |
| 05/26/1999 | EP0918254A2 Process for forming images in a layer of photosensitive resin, hologram for performing said process, and application of said process for fabricating microtip sources and screens |
| 05/26/1999 | EP0918048A1 A novel monomer and a polymer obtained therefrom |
| 05/26/1999 | EP0917544A1 Water soluble and oxygen-impermeable polymeric layers |
| 05/26/1999 | EP0917508A1 Lithographic plates |
| 05/26/1999 | EP0838134B1 Procedure and device for the chemical and electrolytic treatment of printed circuit boards and films |
| 05/26/1999 | EP0792195A4 Non-aminic photoresist adhesion promoters for microelectronic applications |
| 05/26/1999 | EP0607146B1 Thin films |
| 05/26/1999 | EP0605567B1 Water-soluble formulation for masking, and method utilizing the same |
| 05/26/1999 | CN1217725A Polymerisable composition |
| 05/26/1999 | CN1217567A Method for forming pattern on chemical-sensitive photoresist |
| 05/26/1999 | CN1217566A Preparation for structuralized protection layer and insulation layer |
| 05/25/1999 | US5907436 For producing specular reflection and diffraction orders |
| 05/25/1999 | US5907405 Alignment method and exposure system |
| 05/25/1999 | US5907392 Exposure apparatus |
| 05/25/1999 | US5907390 Positioning apparatus, exposure apparatus and method of manufacturing semiconductor device |
| 05/25/1999 | US5907333 Ink jet print head containing a radiation curable resin layer |
| 05/25/1999 | US5907230 Device for aligning and supporting an artwork during light exposure installation of a printed circuit board |
| 05/25/1999 | US5907046 Processes for preparing thioxanthone and derivatives thereof |
| 05/25/1999 | US5906912 Crosslinking a soluble electroconductive polymer to obtain film having a sheet resistance of 10.sup.10 .omega./.quadrature. or less; forming a pattern by coating with a silicon-containing resist, and effecting exposure and |
| 05/25/1999 | US5906911 Pattern exposing photoresits film to form first pattern, forming an etching and further pattern resistant film in the first pattern, exposing and developing photoresist to form second pattern, etching substrate twice |
| 05/25/1999 | US5906909 Multilayer printing plates |