| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/25/1999 | US5906903 Process tolerance calculating method relating exposure amount and focal point position to allowable dimension value |
| 05/25/1999 | US5906902 Manufacturing system error detection |
| 05/25/1999 | US5906901 Alignment method and exposure apparatus for use in such alignment method |
| 05/25/1999 | US5906862 Heat treatment a coating for drying on a substrate |
| 05/25/1999 | US5906860 The apparatus permitting efficiently rotating a spin chuck, which holds a wafer, and a cup so as to improve the through-put and product yield, and to provide a resist treating method. |
| 05/25/1999 | US5906429 Optical illumination device |
| 05/20/1999 | WO1999025011A1 Projection exposure apparatus |
| 05/20/1999 | WO1999025010A1 Exposure apparatus, apparatus for manufacturing devices, and method of manufacturing exposure apparatuses |
| 05/20/1999 | WO1999025009A1 Exposure apparatus |
| 05/20/1999 | WO1999025008A1 Projection exposure device, projection exposure method, and method of manufacturing projection exposure device |
| 05/20/1999 | WO1999024971A2 Magnetic recording/reproduction device |
| 05/20/1999 | WO1999024885A1 Positioning device with h-drive |
| 05/20/1999 | WO1999024869A1 Photomask, aberration correcting plate, exposure device and method of producing microdevice |
| 05/20/1999 | WO1999024868A1 Method of molecular-scale pattern imprinting at surfaces |
| 05/20/1999 | WO1999024861A1 Three-mirror system for lithographic projection, and projection apparatus comprising such a mirror system |
| 05/20/1999 | WO1999024851A1 Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography |
| 05/20/1999 | WO1999005591A3 Method and apparatus for providing a bioinformatics database |
| 05/20/1999 | WO1999001795A8 Pattern-forming methods and radiation sensitive materials |
| 05/20/1999 | DE19852299A1 Metal substrate, to be etched through a resist pattern, has a smooth surface with specified roughness values |
| 05/20/1999 | CA2309612A1 Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography |
| 05/19/1999 | EP0917004A2 Stage system and exposure apparatus with the same |
| 05/19/1999 | EP0917003A1 Method for fabricating screens and apparatus for carrying out the method |
| 05/19/1999 | EP0917002A1 Composition for antireflection or light absorption film and compounds for use in the same |
| 05/19/1999 | EP0917001A1 Negative photoresist compositions and use thereof |
| 05/19/1999 | EP0917000A2 Positive resist composition and method for forming a resist pattern |
| 05/19/1999 | EP0916683A1 Light-absorbing polymer, composition forming light-absorbing coatings, light-absorbing coatings, and antireflection coating made by using the same |
| 05/19/1999 | EP0916480A1 Manufacture of laminated film and printed wiring board |
| 05/19/1999 | EP0916175A1 Electrostatic precipitator for a gas discharge laser |
| 05/19/1999 | EP0808222B1 Process for the functionalisation of surfaces |
| 05/19/1999 | CN1043451C Composite screen plant made of metallic foil and silk net |
| 05/18/1999 | US5905569 Illuminance measuring method, an exposure apparatus using the method, and a device manufacturing method |
| 05/18/1999 | US5905267 Electron beam exposure apparatus and method of controlling same |
| 05/18/1999 | US5905063 Remover solution composition for resist and method for removing resist using the same |
| 05/18/1999 | US5905020 Method and apparatus for reducing the critical dimension difference of features printed on a substrate |
| 05/18/1999 | US5905019 Exposure and development of photoresists |
| 05/18/1999 | US5905018 Method of preparing a substrate surface for conformal plating |
| 05/18/1999 | US5905016 Resist pattern forming method and resist material |
| 05/18/1999 | US5905015 Method for making an offset printing plate according to the silver salt diffusion transfer process |
| 05/18/1999 | US5905007 Method for aligning and forming microelectromechanical systems (MEMS) contour surfaces |
| 05/18/1999 | US5904889 Apparatus and method for producing an object using stereolithography |
| 05/18/1999 | US5904863 Process for etching trace side walls |
| 05/18/1999 | US5904169 Apparatus for and method of treating substrate |
| 05/18/1999 | US5904156 Dry film resist removal in the presence of electroplated C4's |
| 05/18/1999 | US5904154 Method for removing fluorinated photoresist layers from semiconductor substrates |
| 05/14/1999 | WO1999023692A1 Aligner and exposure method |
| 05/14/1999 | WO1999023652A1 A method for manufacturing an optical memory device |
| 05/14/1999 | WO1999023532A1 Photosensitive resin composition and flexographic resin plate |
| 05/14/1999 | WO1999023175A1 Use of dimerdiolalcoxylate (meth)acrylic acid esters as constituents for radiation cured coatings |
| 05/14/1999 | WO1999008156A8 Laser-illuminated stepper or scanner with energy sensor feedback |
| 05/12/1999 | EP0915384A2 Dual exposure method and device manufacturing method using the same |
| 05/12/1999 | EP0915383A2 Photosensitive resin composition |
| 05/12/1999 | EP0915382A2 Novel polymers and photoresist compositions |
| 05/12/1999 | EP0915381A1 Process of forming a pattern on a substrate |
| 05/12/1999 | EP0914629A1 Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass |
| 05/12/1999 | EP0914628A1 Black-and-white photothermographic and thermographic elements containing substituted propenenitrile compounds as antifoggants |
| 05/12/1999 | EP0914626A1 Seamless, maskless lithography system using spatial light modulator |
| 05/12/1999 | EP0914623A1 Variable focus lens by small changes of the equatorial lens diameter |
| 05/12/1999 | EP0914260A1 Process for preparing high resolution emissive arrays and corresponding articles |
| 05/12/1999 | EP0914242A1 Process for the stereolithographic preparation of three-dimensional objects using a radiation-curable liquid formulation which contains fillers |
| 05/12/1999 | DE19851810A1 Curable resin material, e.g. for printed circuit boards |
| 05/12/1999 | DE19850139A1 Photoinitiator system for photopolymerizable compositions containing a new styryl-substituted o-alkylated quinolium dye compound as electron acceptor, preferably with a borate compound as electron donor |
| 05/12/1999 | CN1216618A Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| 05/12/1999 | CN1216396A Photomask and method of exposure using same |
| 05/12/1999 | CA2218830A1 Method for fabricating screens and apparatus carrying out the method |
| 05/11/1999 | US5903460 Method of manufacturing a thin film magnetic head |
| 05/11/1999 | US5903400 Projection-optical system for use in a projection-exposure apparatus |
| 05/11/1999 | US5903356 Position detecting apparatus |
| 05/11/1999 | US5902837 Photo-curing resin composition comprising a propenyl ether group-containing compound |
| 05/11/1999 | US5902836 Acrylic syrup curable to a crosslinked viscoelastomeric material |
| 05/11/1999 | US5902780 Comprising hydroxylamine, about 10-80% by weight of an alkanolamine which is miscible with said hydroxylamine, and water |
| 05/11/1999 | US5902723 Selectively removing a nucleotide by cleavage at terminal ends with catalytic antibodies; identifying excision site and repeating process; for concurrent parallel sequence analysis |
| 05/11/1999 | US5902719 Improved resolution for scanning type exposure using a plate having physical development nuclei layer between an aluminum support and a silver halide emulsion layer and processing in the presence of a monocyclic azole, free of a mercaptan |
| 05/11/1999 | US5902718 Methods and developer for developing a positive photoresist |
| 05/11/1999 | US5902717 Method of fabricating semiconductor device using half-tone phase shift mask |
| 05/11/1999 | US5902716 Exposure method and apparatus |
| 05/11/1999 | US5902714 Latex-based, aqueous developable photopolymers and use thereof in printing plates |
| 05/11/1999 | US5902713 Chemical-sensitization photoresist composition |
| 05/11/1999 | US5902712 Substrate having circuits disposed thereon, coated with ablatively photodecomposable polymer comprising acrylic polymer with bound photoabsorber |
| 05/11/1999 | US5902707 Mask containing alignment mark protection pattern |
| 05/11/1999 | US5902705 Making phase shifting mask for transferring circuit pattern onto semiconductor wafer by optical reduction projection exposure with ultraviolet light |
| 05/11/1999 | US5902704 Process for forming photoresist mask over integrated circuit structures with critical dimension control |
| 05/11/1999 | US5902703 Forming a calibration patterns of box configuration, using the narrow lines between boxes to maintain the production accuracy |
| 05/11/1999 | US5902648 Liquid application method and method of manufacturing electronic devices using the same liquid application method |
| 05/11/1999 | US5902493 Method for forming micro patterns of semiconductor devices |
| 05/11/1999 | US5902475 Method for manufacturing a stent |
| 05/11/1999 | US5902452 Forming oxide layer on silicon substrate, depositing and patterning photoresist layer, removing oxide layer and predetermined thickness of silicon in single dry etching stepusing gas mixture of carbon tetrafluoride and oxygen |
| 05/11/1999 | US5902399 Method and apparatus for improved coating of a semiconductor wafer |
| 05/11/1999 | CA2133149C Waterborne photoresists having polysiloxanes |
| 05/11/1999 | CA2133147C Waterborne photoresists having non-ionic fluorocarbon surfactants |
| 05/11/1999 | CA2131044C Waterborne photoresists having associate thickeners |
| 05/06/1999 | WO1999022273A1 Composite relief image printing plates |
| 05/06/1999 | WO1999022272A1 Lithographic pneumatic support device with controlled gas supply |
| 05/06/1999 | WO1999021725A1 Pattern formation |
| 05/06/1999 | WO1999021715A1 Manufacture of lithographic printing forms |
| 05/06/1999 | WO1999014706A3 Visual inspection and verification system |
| 05/06/1999 | WO1999013539A3 Laser with line narrowing output coupler |
| 05/06/1999 | WO1999008717A3 Latent reactive polymers with biologically active moieties |
| 05/06/1999 | EP0913855A2 Short arc lamp |
| 05/06/1999 | EP0913732A1 Processing of lithographic printing plate precursors |
| 05/06/1999 | EP0913731A1 Processing of lithographic printing plate precursors |