| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 07/07/1999 | CN1221987A Prodn. of organic electrical lighting device |
| 07/07/1999 | CN1221971A Semiconductor device and method for manufacturing the same |
| 07/07/1999 | CN1221969A Semiconductor device using polymer-containing photoresist, and process for manufacturing the same |
| 07/06/1999 | US5920786 In semiconductor substrates |
| 07/06/1999 | US5920487 Two dimensional lithographic proximity correction using DRC shape functions |
| 07/06/1999 | US5920398 Surface position detecting method and scanning exposure method using the same |
| 07/06/1999 | US5920396 Line width insensitive wafer target detection |
| 07/06/1999 | US5920380 Apparatus and method for generating partially coherent illumination for photolithography |
| 07/06/1999 | US5920379 Projection exposure method and apparatus |
| 07/06/1999 | US5920378 Projection exposure apparatus |
| 07/06/1999 | US5920377 Multi-hood system for correcting individual lens distortions |
| 07/06/1999 | US5920152 Mercury lamp of the short arc type and method for operation thereof |
| 07/06/1999 | US5920074 Thermostat |
| 07/06/1999 | US5920067 Monocrystalline test and reference structures, and use for calibrating instruments |
| 07/06/1999 | US5919868 Acrylate monomeric units and a photoabsorber bound to the monomeric units which is: 1-(dimethylamino)-pyrene, 4-(12-hydroxyethyl)ethylamino)-4-(trifluoromethylsulfonyl)tola ne, or 7-hydroxy-4-methyl-2h-1-benzopyrene-2-one. |
| 07/06/1999 | US5919714 Segmented box-in-box for improving back end overlay measurement |
| 07/06/1999 | US5919608 Exposing to electromagnetic radiation a composition comprising cationic electron acceptor, sensitizing dye, and supersensitizer |
| 07/06/1999 | US5919607 Photo-encoded selective etching for glass based microtechnology applications |
| 07/06/1999 | US5919605 Semiconductor substrate exposure method |
| 07/06/1999 | US5919604 Rubber-based aqueous developable photopolymers and photocurable elements comprising same |
| 07/06/1999 | US5919603 Acrylic polymer |
| 07/06/1999 | US5919602 Photocurable composition based on acid functional primary resinous mercaptans |
| 07/06/1999 | US5919601 Comprising thermal-activated acid generator, crosslinking resin, binder resin containing pendant groups capable of undergoing acid-catalyzed condensation with crosslinking resin, infrared absorber |
| 07/06/1999 | US5919600 Composite layer on a substrate comprising: a layer of photothermal conversion material and a thermoplastic polyurethane containing allyl groups and a layer comprising a crosslinked silicone polymer; image by infrared laser curing |
| 07/06/1999 | US5919599 Thermosetting anti-reflective coatings at deep ultraviolet |
| 07/06/1999 | US5919598 Method for making multilayer resist structures with thermosetting anti-reflective coatings |
| 07/06/1999 | US5919597 Methods for preparing photoresist compositions |
| 07/06/1999 | US5919596 Making a curable admixture by dissolving a halogen containing thermoplastic modifier in a thermosetting cyanate resin, cyanate prepolymer or blend, and photosensitive agent; curing for a crack resistant, heat resistant electronic packaging |
| 07/06/1999 | US5919569 Containing a photopolymerizable acrylated polyurethane |
| 07/06/1999 | US5919520 Spin chuck for holding semiconductor in horizontal positionusing vacuum |
| 07/06/1999 | US5919402 Electronically conducting polymers with silver grains |
| 07/06/1999 | US5919378 Process for automatically making printing sleeves |
| 07/06/1999 | US5919364 Microfabricated filter and shell constructed with a permeable membrane |
| 07/01/1999 | WO1999033096A1 Method and composition for dry photoresist stripping in semiconductor fabrication |
| 07/01/1999 | WO1999033095A1 Improved techniques for etching with a photoresist mask |
| 07/01/1999 | WO1999032940A1 Repetitively projecting a mask pattern using a time-saving height measurement |
| 07/01/1999 | WO1999032939A1 Method of developing photosensitive resin plate and developing device |
| 07/01/1999 | WO1999032938A2 Illumination system for projector |
| 07/01/1999 | WO1999032937A1 The method of printing plate production |
| 07/01/1999 | WO1999032936A1 Photoimageable compositions and films for printed wiring board manufacture |
| 07/01/1999 | WO1999032935A1 Photosensitive resin composition and process for producing the same |
| 07/01/1999 | WO1999032438A1 A process of controlling particle size of naphthoquinone diazide esters |
| 07/01/1999 | WO1999032293A2 Direct electrostatic printing method and apparatus |
| 07/01/1999 | DE19755712A1 Electroformed stamping punch for IC microstructure stamping, produced using photolithography |
| 07/01/1999 | DE19752517A1 Liquid applicator for surfaces of semiconductor, glass, ceramic disc, etc. |
| 06/30/1999 | EP0926701A1 Mercury lamp of the short arc type |
| 06/30/1999 | EP0926556A2 Projection exposure system and exposure method |
| 06/30/1999 | EP0926555A1 Photoactive materials applicable to imaging systems. |
| 06/30/1999 | EP0926146A1 Chromene compounds |
| 06/30/1999 | EP0925529A1 Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity |
| 06/30/1999 | EP0836540B1 Process for manufacturing mould inserts |
| 06/30/1999 | CN1221497A Metal ion reduction of aminochromatic chromophores and their use in synthesis of low metal bottom anti-reflective coatings for photoresists |
| 06/30/1999 | CN1221208A Method for forming fine inter-pattern space in semiconductor device |
| 06/30/1999 | CN1221130A Photoimageable composition containing photopolymerizable urethane oligomers and dibenzoate plasticizers |
| 06/30/1999 | CN1221129A Photosensitive resin composition and photosensitive element using resin composition |
| 06/30/1999 | CN1221128A Development system for manufacturing semiconductor device and controlling method thereof |
| 06/29/1999 | US5918147 Process for forming a semiconductor device with an antireflective layer |
| 06/29/1999 | US5917932 System and method for evaluating image placement on pre-distorted masks |
| 06/29/1999 | US5917879 Reflective reduction imaging optical system for X-ray lithography |
| 06/29/1999 | US5917655 Method and apparatus for generating a stereoscopic image |
| 06/29/1999 | US5917590 Optical inspection device and lithographic apparatus provided with such a device |
| 06/29/1999 | US5917581 Projection exposure method and apparatus therefor |
| 06/29/1999 | US5917580 Scan exposure method and apparatus |
| 06/29/1999 | US5917579 Block exposure of semiconductor wafer |
| 06/29/1999 | US5917294 Synchronization control apparatus and method |
| 06/29/1999 | US5917205 Photolithographic alignment marks based on circuit pattern feature |
| 06/29/1999 | US5917024 Acid labile photoactive composition |
| 06/29/1999 | US5916995 Superior transmissivity to deep ultraviolet light and excimer laser, improved thermal resistance and storage stability after exposure |
| 06/29/1999 | US5916984 Process for preparing thioxanthone and derivatives thereof |
| 06/29/1999 | US5916821 Method for producing sublithographic etching masks |
| 06/29/1999 | US5916738 Photosensitive resin composition for sandblast resist |
| 06/29/1999 | US5916737 Forming a indium tin oxide layer on the substrate, forming a silicon nitride protective layer over the first layer, forming photoresist layer and patterning photoresist layer using mask, removing patterned photoresist layer |
| 06/29/1999 | US5916736 Process of manufacturing a printed circuit board with plated landless through-holes by the use of a filling material |
| 06/29/1999 | US5916735 Method for manufacturing fine pattern |
| 06/29/1999 | US5916734 Method for making lithographic printing plate |
| 06/29/1999 | US5916733 Method of fabricating a semiconductor device |
| 06/29/1999 | US5916732 Photosensitive resin compositions for printing plates and photosensitive resin plate materials |
| 06/29/1999 | US5916731 Photosensitive resin composition |
| 06/29/1999 | US5916729 Chemically amplified resist composition |
| 06/29/1999 | US5916728 Resin which is converted to alkali-soluble from alkali-insoluble or alkali-slightly soluble by the action of an acid, acid generator and tertiary amine compound having an aliphatic hydroxyl group. |
| 06/29/1999 | US5916727 Suitable for exposure using a liquid crystal array or light emitting diodes driven by a computer generated signals or video signal for reproduction of images from video cassett recorder and a camcorder; contains disulfide photoinitiator |
| 06/29/1999 | US5916717 Process utilizing relationship between reflectivity and resist thickness for inhibition of side effect caused by halftone phase shift masks |
| 06/29/1999 | US5916716 Emulation methodology for critical dimension control in E-Beam lithography |
| 06/29/1999 | US5916715 Process of using electrical signals for determining lithographic misalignment of vias relative to electrically active elements |
| 06/29/1999 | US5916714 Preparation of a pixel sheet provided with black matrix |
| 06/29/1999 | US5916713 Polymerizable composition for a color filter |
| 06/29/1999 | US5916641 Method of forming a monolayer of particles |
| 06/29/1999 | US5916631 Method and apparatus for spin-coating chemicals |
| 06/29/1999 | US5916626 HMDS supplying apparatus |
| 06/29/1999 | US5916403 Calendering molten stream of photopolymerizable material on mandrel-supported sleeve, rotating, heating, forming seamless cylinder sleeve for printer |
| 06/29/1999 | US5916374 Supporting vertically, simultaneously spraying front and back with aqueous alkaline cleaning solution |
| 06/29/1999 | US5916368 Method and apparatus for temperature controlled spin-coating systems |
| 06/29/1999 | US5916366 Substrate spin treating apparatus |
| 06/29/1999 | US5915299 Stamp making unit and package therefor |
| 06/29/1999 | CA2165266C Process for dispersive network forming in an optical fiber |
| 06/24/1999 | WO1999031773A1 High pulse rate pulse power system |
| 06/24/1999 | WO1999031717A1 Projection exposure method and projection aligner |
| 06/24/1999 | WO1999031716A1 Aligner, exposure method and method of manufacturing device |
| 06/24/1999 | WO1999031713A2 Integrated material management module |
| 06/24/1999 | WO1999031462A1 Stage device and exposure apparatus |