Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/1998
12/22/1998US5851733 Photolithographic pattern generation
12/22/1998US5851731 Composition for the manufacture of flexographic printing plates
12/22/1998US5851730 Substrates coated with an antihalation layer that contains a resin binder comprising anthracene units
12/22/1998US5851728 Three-component chemical amplified photoresist composition
12/22/1998US5851727 Photosensitive polymers and photoresist compositions containing the same
12/22/1998US5851726 Method for producing a chemically adsorbed film
12/22/1998US5851725 Exposure of lithographic resists by metastable rare gas atoms
12/22/1998US5851724 Method for producing lithographic plates with imaging elements comprising a photosensitive acid precursor
12/22/1998US5851723 Process for making lithographic printing plate
12/22/1998US5851722 Imaging element for making an improved printing plate according to the silver salt diffusion transfer process
12/22/1998US5851707 Microlithography projection-exposure masks, and methods and apparatus employing same
12/22/1998US5851705 Method for manufacturing a self-aligned type out-rigger phase shift mask
12/22/1998US5851703 Photomask and pattern forming method employing the same
12/22/1998US5851701 Atom lithographic mask having diffraction grating and attenuated phase shifters
12/22/1998US5851503 Fullerene compound, manufacturing method, and use
12/22/1998US5851302 Method for dry etching sidewall polymer
12/19/1998CA2241125A1 Vacuum assisted debris removal system
12/17/1998WO1998057358A1 Method and apparatus for automatically generating schedules for wafer processing within a multichamber semiconductor wafer processing tool
12/17/1998WO1998057213A1 Optical device, method of cleaning the same, projection aligner, and method of producing the same
12/17/1998WO1998056513A1 Photosensitive organosilicon films
12/17/1998DE19817132A1 Transport system e.g. for scanning apparatus
12/17/1998CA2238625A1 Delocalisation of stitch errors in the writing of gratings
12/16/1998EP0884724A2 Optical discs
12/16/1998EP0884651A2 Light intensity measuring system
12/16/1998EP0884650A1 Photosensitive recording material using microcapsules
12/16/1998EP0884649A2 Photosensitive resin composition
12/16/1998EP0884648A1 Radiation-sensitive resin composition
12/16/1998EP0884647A1 Image forming material and image forming method
12/16/1998EP0884646A2 Printer, printing system, and printing method using print paper with photosensitive microcapsules applied thereto
12/16/1998EP0884645A1 Method for verifying silver-based lithographic printing plates
12/16/1998EP0884643A1 Pressure-developing device and recording device
12/16/1998EP0883892A1 Vacuum compatible linear motion device
12/16/1998EP0883835A1 Protective overcoat useful for enhancing the resistance of a printing plate precursor to ambient humidity
12/16/1998EP0883825A1 Process for the production of optical components with coupled optical waveguides and optical components produced by said method
12/16/1998EP0766908B1 Method and device for coating printed-circuit boards, in particular for the manufacture of multi-chip-modules
12/16/1998CN2300936Y Multi-function copying machine
12/16/1998CN1041243C Top anti-reflective coating film and method for making patterns on substrate
12/16/1998CA2240564A1 Positive photoresist composition
12/15/1998US5850300 Diffractive beam homogenizer having free-form fringes
12/15/1998US5850291 Projection exposure apparatus and method for controlling a stage on the basis of a value corrected by ABBE error
12/15/1998US5850288 Method for manufacturing a semiconductor device
12/15/1998US5850280 Stage unit, drive table, and scanning exposure and apparatus using same
12/15/1998US5850279 Alignment method, projection exposure method, and projection exposure apparatus
12/15/1998US5849857 Production method for photo-sensitive resin and liquid photo-sensitive resin composition
12/15/1998US5849842 Sulfonamido substituted acetal polymers
12/15/1998US5849809 Hydroxyalkylated high performance curable polymers
12/15/1998US5849808 Organic solvent soluble photoresists which are developable in aqueous alkaline solutions
12/15/1998US5849639 Method for removing etching residues and contaminants
12/15/1998US5849602 Resist processing process
12/15/1998US5849582 Baking of photoresist on wafers
12/15/1998US5849467 Method for the pre-treatment of a photoresist layer on a substrate surface
12/15/1998US5849465 Photosensitive titanium carboxydiketonate and titanium carboxyketoester precursor solutions and method of patterning integrated circuits using the same
12/15/1998US5849464 Method of making a waterless lithographic printing plate
12/15/1998US5849463 Photosensitive composition
12/15/1998US5849462 Negative-acting no-process printing plates
12/15/1998US5849461 Chemically amplified positive resist composition
12/15/1998US5849460 Photosensitive resin composition and method for using the same in manufacture of circuit boards
12/15/1998US5849459 Resin composition for stereolithography
12/15/1998US5849457 Positive-working quinonediazide sulfonic acid ester resist composition utilizing solvent system including 2-heptanone, ethyl lactate, and γ-
12/15/1998US5849454 Apparatus and method for coating, apparatus and method for coating an electrophotographic photosensitive member
12/15/1998US5849440 Process for producing and inspecting a lithographic reticle and fabricating semiconductor devices using same
12/15/1998US5849437 Electron beam exposure mask and method of manufacturing the same and electron beam exposure method
12/15/1998US5849436 Block mask and charged particle beam exposure method and apparatus using the same
12/15/1998US5849435 Method for forming a thin uniform layer of resist for lithography
12/15/1998US5849411 Polymer film, nonwoven web and fibers containing a photoreactor composition
12/15/1998US5849084 Spin coating dispense arm assembly
12/15/1998CA2100413C Method and apparatus for laser-discharge imaging
12/10/1998WO1998056165A1 Method and device for removing light
12/10/1998WO1998056092A1 Very narrow band laser
12/10/1998WO1998055899A1 Liquid photosensitive composition
12/10/1998WO1998055521A1 Light-absorbing polymer, composition forming light-absorbing coatings, light-absorbing coatings, and antireflection coating made by using the same
12/10/1998WO1998055332A1 Method of making lithographic printing plates
12/10/1998WO1998055331A1 Method of preparing a printing plate
12/10/1998WO1998055330A1 A heat sensitive printing plate precursor
12/10/1998WO1998055311A1 Heat sensitive printing plate precursors
12/10/1998WO1998055310A1 Heat sensitive plate precursor
12/10/1998WO1998055309A1 Method of preparing a lithographic printing plate
12/10/1998WO1998055308A1 Heat sensitive plate precursors
12/10/1998DE19723310A1 Cleaner for printing cylinders prepared by inscribing and engraving
12/10/1998DE19723170A1 Verfahren und Vorrichtung zur Beseitigung von Licht Method and apparatus for the removal of light
12/10/1998CA2276104A1 Liquid photosensitive composition
12/09/1998EP0883281A1 Method and apparatus for selectively drawing air from a plurality of vacuum channels
12/09/1998EP0883163A2 Method of forming micropatterns
12/09/1998EP0883030A2 Lithography information control system
12/09/1998EP0883029A1 Exposure apparatus
12/09/1998EP0883028A1 Photosensitive lithographic plate and process for producing same
12/09/1998EP0883027A1 A method for making an offset printing plate according to the silver salt diffusion transfer process
12/09/1998EP0883026A1 Method of forming an image
12/09/1998EP0883025A1 Method of forming an image
12/09/1998EP0882582A1 A lithographic printing plate and method for manufacturing the same technical field
12/09/1998EP0882086A1 Composition exhibiting improved fluorescent response
12/09/1998EP0882072A1 Anionic photocatalyst
12/09/1998EP0821708B1 Process for producing a polyamide based on a dicarboxylic acid and a diamine
12/09/1998EP0667024B1 Cd mastering process
12/09/1998EP0650608B1 Positive-acting radiation-sensitive mixture and recording material produced therewith
12/09/1998EP0628599B1 Photosensitive resin composition for color filter
12/09/1998EP0606355B1 Method and compositions for diffusion patterning
12/09/1998CN1201165A Electronic beam exposure method using moving platform
12/09/1998CN1201164A Light-sensitive resin composition and application of its light-sensitivity
12/09/1998CN1201061A Chemical-ray sensitive polymer composition
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