Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1998
10/22/1998WO1998046325A1 Microfabricated filter and capsule formed by substrates
10/22/1998WO1998021629A3 In-line holographic mask for micromachining
10/22/1998DE19815398A1 Lithographic printing plate development by coating method avoiding acidification by absorption of carbon di:oxide
10/22/1998DE19814877A1 Lithographic rotary printing cylinder or sleeve
10/22/1998DE19814245A1 Electron beam exposure method
10/22/1998CA2288295A1 Photocurable halofluorinated acrylates
10/21/1998EP0872769A1 Lithographic printing plate and treating liquids for such plate comprising a hydrophilic amphoteric block copolymer
10/21/1998EP0872768A1 Packing method and package for dry image-forming material
10/21/1998EP0871607A1 Photosensitive intramolecular electron transfer compounds
10/21/1998EP0871573A2 Transfer printing medium
10/21/1998EP0708934B1 Radiation-sensitive paint composition
10/21/1998EP0698233B1 Process and device for coating printed circuit boards
10/21/1998CN2295233Y Ammonium-less automatic diazonium separating duplicator
10/21/1998CN1196806A Process for producing surfactant having low metal ion level and developer produced therefrom
10/21/1998CN1196805A Water-less lithographic plates
10/21/1998CN1196804A Black-and-white photothermographic and thermographic elements comprising acrylonitrile compounds as co-developers
10/21/1998CN1196736A Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
10/21/1998CN1196735A Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
10/21/1998CN1196701A Heat-sensitive composition and method of making lithographic printing from it
10/21/1998CN1196503A Pattern exposure method using electron beam
10/21/1998CN1196281A Process for production of coating of molecular thickness on substrate
10/20/1998US5826130 Apparatus and method for developing resist coated on substrate
10/20/1998US5825847 Compton backscattered collimated x-ray source
10/20/1998US5825844 Optical arrangement and illumination method
10/20/1998US5825647 Correction method and correction apparatus of mask pattern
10/20/1998US5825483 Multiple field of view calibration plate having a reqular array of features for use in semiconductor manufacturing
10/20/1998US5825470 To transfer a pattern formed on a mask onto photosensitive substrates
10/20/1998US5825469 Auto focus system using twice reflection
10/20/1998US5825468 For a semiconductor device
10/20/1998US5825463 Mask and mask supporting mechanism
10/20/1998US5825043 Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
10/20/1998US5825034 Method of compensation for electron beam dose
10/20/1998US5824824 Sulfonium salts and chemically amplified positive resist compositions
10/20/1998US5824717 Peroxide and radiation curable compositions containing isobutylenene copolymers having acrylate functionality
10/20/1998US5824604 Hydrocarbon-enhanced dry stripping of photoresist
10/20/1998US5824457 Sealing the edge of wafers by exposing ultra violet light on a rotatable chuck
10/20/1998US5824456 Composition for forming metal oxide thin film pattern and method for forming metal oxide thin film pattern
10/20/1998US5824455 Processing method and apparatus
10/20/1998US5824454 Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material
10/20/1998US5824452 Excimer laser lithography; crosslinkable copolymer consisting of vinyl monomer, (meth)acrylic ester, (meth)acrylamide, (meth)acrylic acid, adamantyl (meth)acrylate
10/20/1998US5824451 Positive photosensitive composition
10/20/1998US5824448 Simplified color proofing system, adhesive is mixture of acrylic polymers
10/20/1998US5824441 Integrated circuits
10/20/1998US5824377 Photosensitive material for orientation of liquid crystal device and liquid crystal device thereof
10/20/1998US5824374 Thin film layers, laser ablation to remove coatings, color filters and deposits on substrates
10/20/1998US5824361 Magnetic head fabrication process
10/20/1998US5824180 Method of bonding or decorating artificial nail
10/20/1998US5823307 For isolating a payload mass from a source of vibration
10/15/1998WO1998045869A1 Apodizing filter system useful for reducing spot size in optical measurements and for other applications
10/15/1998WO1998045759A1 Method of producing an optical element and optical element therefrom
10/15/1998WO1998045757A1 Black-pigmented structured high molecular weight material
10/15/1998WO1998045756A1 Highly transparent, colour-pigmented high molecular weight material
10/15/1998WO1998045755A1 Waterborne photoresists made from urethane acrylates
10/15/1998WO1998045693A1 Methods for fabricating enclosed microchannel structures
10/15/1998WO1998045506A1 Method for manufacturing a stent
10/15/1998WO1998045399A1 Ethylenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal composition and process
10/15/1998WO1998022995A3 Picosecond laser
10/15/1998DE19814142A1 Material for forming fine pattern in semiconductor manufacture
10/15/1998DE19735059A1 Polymers for production of chemically enhanced resists
10/15/1998CA2286275A1 Method of producing an optical element and optical element therefrom
10/15/1998CA2234748A1 Packing method for dry image-forming material
10/14/1998EP0871072A2 Multiple detector alignment system for photolithography
10/14/1998EP0871071A2 Method and apparatus for charged particle beam exposure
10/14/1998EP0871070A2 Positive working photosensitive lithographic printing plate
10/14/1998EP0871069A1 Light-sensitive mixture and recording material prepared therefrom
10/14/1998EP0870809A2 Pigment composition and colored photosensitive composition
10/14/1998EP0870789A1 Polyurethanes containing amino groups
10/14/1998EP0870188A1 Variable spot-size scanning apparatus
10/14/1998EP0858615A4 Thermosetting anti-reflective coatings and method for making same
10/14/1998EP0698232B1 Process and device for coating printed circuit boards
10/13/1998US5822641 Heating apparatus and thermal developing system
10/13/1998US5822479 Writing diffraction gratings with interference fringe patterns
10/13/1998US5822389 Alignment apparatus and SOR X-ray exposure apparatus having same
10/13/1998US5822133 Optical structure and device manufacturing method using the same
10/13/1998US5822043 Exposure method and projection exposure apparatus using the same
10/13/1998US5822042 Three dimensional imaging system
10/13/1998US5821980 Device and method for producing a screen printing stencil having improved image sharpness
10/13/1998US5821624 Semiconductor device assembly techniques using preformed planar structures
10/13/1998US5821550 For writing a circuit pattern of a workpiece
10/13/1998US5821345 Thermodynamically stable photoactive compound
10/13/1998US5821279 Catalyst, rosin, extender and hydrothalic acid monoester
10/13/1998US5821277 Thermosetting and procuring compositions for color filters and method for making the same
10/13/1998US5821175 Removal of surface contaminants by irradiation using various methods to achieve desired inert gas flow over treated surface
10/13/1998US5821169 Hard mask method for transferring a multi-level photoresist pattern
10/13/1998US5821131 Method for inspecting process defects occurring in semiconductor devices
10/13/1998US5821036 Method of developing positive photoresist and compositions therefor
10/13/1998US5821035 Resist developing apparatus and resist developing method
10/13/1998US5821034 Method for forming micro patterns of semiconductor devices
10/13/1998US5821032 Photosensitive polymer composition and negative working photosensitive element containing three photocrosslinkable polymers
10/13/1998US5821031 An ultraviolet curable resin containing an ethylenically unsaturated monomer having an epoxy group, (meth)acrylic acid, a saturated or unsaturated polybasic anhydride and an epoxy compound
10/13/1998US5821030 Lithographic printing plates having a photopolymerizable imaging layer overcoated with an oxygen barrier layer
10/13/1998US5821017 Method of deposition
10/13/1998US5821016 Photopolymerization of unsaturated bond in copolymers with carboxyl groups, pigments and optical sensitizers
10/13/1998US5821015 Photolithography
10/13/1998US5821014 Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars on a mask
10/13/1998US5821013 Variable step height control of lithographic patterning through transmitted light intensity variation
10/13/1998US5820944 Ultraviolet-curable composition and method for forming cured-product patterns therefrom
10/13/1998US5820926 Forming barrier layer on reflective layer provided on substrate, forming antireflection layer on barrier layer
10/13/1998US5820677 Coater
10/13/1998US5820038 Coater track dispense arm
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