Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/1999
04/01/1999DE19825039A1 Control of photoacid diffusion by applying an electric field in structurization of chemically enhanced photoresist to increase contrast and resolution
04/01/1999CA2304795A1 Techniques for fabricating and packaging multi-wavelength semiconductor laser array devices (chips) and their applications in system architectures
03/1999
03/31/1999EP0905869A2 Linear motor mechanism for exposure apparatus, and device manufacturing method using the same
03/31/1999EP0905720A1 Thick film low value high frequency inductor, and method of making the same
03/31/1999EP0905566A2 Exposure method and method of producing a photolithographic mask
03/31/1999EP0905565A1 Improved deep ultraviolet photolithography
03/31/1999EP0905564A2 Dry film photoresist construction suitable for rolling up on itself
03/31/1999EP0905170A2 Polybenzoxazoles and polybenzothiazoles precursors
03/31/1999EP0905169A2 Precursors of polybenzoxazoles and polybenzothiazoles
03/31/1999EP0905168A1 Photosensitive polyimide
03/31/1999EP0904954A2 Positive working photosensitive lithographic printing plate
03/31/1999EP0904952A1 Ablation image forming method
03/31/1999EP0904853A2 Process for curing layers of radiation curable adhesives
03/31/1999EP0904599A1 METHOD FOR ENGRAVING THE GATE IN MOS TECHNOLOGY USING A SiON BASED HARD MASK
03/31/1999EP0904569A1 Method of producing printing or embossing cylinders having a patterned surface
03/31/1999EP0904568A1 Metal ion reduction of aminochromatic chromophores and their use in the synthesis of low metal bottom anti-reflective coatings for photoresists
03/31/1999EP0904559A1 Short wavelength pulsed laser scanner
03/31/1999CN1212768A Three-dimensional etching process
03/31/1999CN1212767A Light-absorbing antireflective layers with improved performance due to refractive index optimization
03/31/1999CN1212640A Resist coating apparatus and coating method
03/31/1999CN1212382A Process for manufacturing microstructured bodies
03/31/1999CN1212204A Lithographic sheet material having thermoplastic adhesive layer
03/31/1999CN1042776C Method for forming resist patterns
03/30/1999US5889758 Reflection type mask structure and exposure apparatus using the same
03/30/1999US5889686 Profile simulation method
03/30/1999US5889678 Topography simulation method
03/30/1999US5889580 Scanning-slit exposure device
03/30/1999US5889165 Photolabile nucleoside protecting groups
03/30/1999US5889141 Dissolving with photosensitizer in solvent; coating on substrate; exposure film to light through mask
03/30/1999US5889116 Blend of an elastomer, hydrophilic copolymer and photoinitiators
03/30/1999US5889077 Process for direct substitution of high performance polymers with unsaturated ester groups
03/30/1999US5888703 Method of forming resist pattern utilizing antireflective layer containing rosin or hydrogenated rosin
03/30/1999US5888701 Method for making a flexographic printing plate from a flexographic printing element having a powder layer
03/30/1999US5888700 Lithographic printing plates having a photopolymerizable imaging layer overcoated with an oxygen barrier layer
03/30/1999US5888699 Reducing dose of charged particle beam applied per unit area of beam limiting portion of mask pattern area to suppress generation of heat from mask
03/30/1999US5888698 Photoresist film for deep ultra violet and method for forming photoresist film pattern using the same
03/30/1999US5888697 Flexographic printing element having a powder layer
03/30/1999US5888696 Planographic original plate requiring no fountain solution
03/30/1999US5888695 Photosensitive layer is coated over particles, providing roughness without graining or anodizing; low cost, pollution control
03/30/1999US5888682 Method of using a compensation mask to correct particle beam proximity-effect
03/30/1999US5888679 Forming resin layer on substrate, precuring, exposing, developing to form black matrices with spaces between, heating under reduced pressure, separately applying inks to spaces to produce color filter
03/30/1999US5888677 Exposure mask, method of fabricating same, and method of manufacturing semiconductor device
03/30/1999US5888676 Miniatuization using multiple reticle-subfield exposures per die
03/30/1999US5888675 Obtaining the lens error in terms of image displacement data, and structurally modifying a reticle using the image displacement data so that the reticle compensates for the lense error
03/30/1999US5888584 Printing paste on substrate in pattern through multilayer stencil having capillaries to control paste flow and reservoirs to control dosing
03/30/1999US5888337 Endpoint detector for plasma etching
03/30/1999US5888309 Lateral etch inhibited multiple for forming a via through a microelectronics layer susceptible to etching within a fluorine containing plasma followed by an oxygen containing plasma
03/30/1999US5887525 Machine for simultaneously making two printing plates for newspaper printing
03/30/1999CA2132332C Removal of surface contaminants by irradiation
03/30/1999CA2106750C Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins
03/25/1999WO1999014706A2 Visual inspection and verification system
03/25/1999WO1999014637A1 Data hierarchy layout correction and verification method and apparatus
03/25/1999WO1999014636A1 Method and apparatus for data hierarchy maintenance in a system for mask description
03/25/1999WO1999014635A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
03/25/1999WO1999014634A1 Smart photolithography
03/25/1999WO1999014256A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
03/25/1999WO1999014048A1 Planographic printing
03/25/1999WO1999013994A1 Deposition of substances on a surface
03/25/1999WO1999001796A3 Pattern-forming methods
03/25/1999WO1999001586A3 Device for transferring structures
03/25/1999DE19742146A1 Process for making lithographic sheet material for offset printing
03/25/1999CA2303857A1 Smart photolithography
03/25/1999CA2302252A1 Deposition of substances on a surface
03/24/1999EP0903876A1 Optical fiber communication system with a distributed raman amplifier and a remotely pumped er-doped fiber amplifier
03/24/1999EP0903777A1 Pattern forming method
03/24/1999EP0903639A2 Process of making patterned protective and insulating layers
03/24/1999EP0903638A1 Process for manufacturing microstructured bodies
03/24/1999EP0903637A2 Electron beam resist
03/24/1999EP0903636A2 Thermal assisted photosensitive composition and process for formation of fine conductor lines utilizing such composition
03/24/1999EP0903605A2 Four mirror EUV projection optics
03/24/1999EP0903597A2 Writing bragg reflection gratings in optical waveguides
03/24/1999EP0903226A2 Heat sensitive planographic printing plate, its manufacturing method and image forming method employing the same
03/24/1999EP0903225A2 Light sensitive composition and image forming material
03/24/1999EP0902915A1 Photolithography mask using serifs and method thereof
03/24/1999EP0902914A1 Continuous production of cross-linked resin relief images for printing plates
03/24/1999EP0902729A1 Process and device for coating disc-shaped data storage media
03/24/1999EP0680625B1 Negative working, peel developable, single sheet color proofin system having a crosslinked layer containing a polymer with phenolic moieties
03/24/1999CN1211949A Laser imageable tuned optical cavity thin film and printing plate incorporating same
03/24/1999CN1211818A Aperture apparatus used for photolithography and manufacturing method thereof
03/24/1999CN1211750A Thermal assisted photosensitive composition and method thereof
03/24/1999CA2216333A1 Lithographic sheet material having a thermoplastic adhesive layer
03/23/1999US5887014 Process for selecting operating range for narrow band excimer laser
03/23/1999US5886432 Magnetically-positioned X-Y stage having six-degrees of freedom
03/23/1999US5886391 Antireflective structure
03/23/1999US5886357 Electron-beam writing system comprising a second aperture member including at least one rectangular beam-size adjustment aperture
03/23/1999US5886136 Coating a substrate with a photosensitive resin composition comprising a polyamic compound having at each terminal thereof at least one actinic ray-sensitive functional group, a photosensitive polymerizable auxiliary, exposing, developing
03/23/1999US5886119 Terpolymers containing organosilicon side chains
03/23/1999US5886102 Crosslinker and novel acrylic resin binders that effectively absorb reflected deep uv exposure radiation
03/23/1999US5886101 Solvent dispersible interpenetrating polymer networks
03/23/1999US5885756 Methods of patterning a semiconductor wafer having an active region and a peripheral region, and patterned wafers formed thereby
03/23/1999US5885755 Forming liquid film on surface of photoresist applied onto semiconductor substrate and pattern-exposed to light, replacing the liquid film with a developer to develop the photoresist
03/23/1999US5885754 Method of forming a pattern
03/23/1999US5885753 In situ acetylenic polymerized layer as photoresist layer
03/23/1999US5885751 Method and apparatus for depositing deep UV photoresist films
03/23/1999US5885750 Tantalum adhesion layer and reactive-ion-etch process for providing a thin film metallization area
03/23/1999US5885749 Method of customizing integrated circuits by selective secondary deposition of layer interconnect material
03/23/1999US5885748 Method of exposing, with correction of pattern data used to draw photomask to overcome proximity effects
03/23/1999US5885747 Providing charged beam pattern drawing method which can draw auxiliary pattern for compensating for optical proximity effect by use of charged beam pattern drawing apparatus provided with acceleration voltage and beam resolution
03/23/1999US5885746 Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate
03/23/1999US5885745 Photolithographic dielectric film
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