Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/1999
09/01/1999EP0938413A1 Radiation-sensitive compositions and printing plates
09/01/1999EP0938409A1 Laser imageable tuned optical cavity thin film and printing plate incorporating the same
09/01/1999CN1227638A Antireflective coatings for photoresist resin compositions
09/01/1999CN1227637A Positive photoresist composition containing a 2,4-dinitro-1-naphthol
09/01/1999CN1227355A Photoresist material and method for producing semiconductor constituted of corrosion resist picture thereof
09/01/1999CN1227354A Liquid photoresist
08/1999
08/31/1999US5946559 Method of forming a field effect transistor
08/31/1999US5946183 Electrostatic chuck
08/31/1999US5946138 Illumination optical system, exposure device and device manufacturing method
08/31/1999US5946079 Photolithography method using coherence distance control
08/31/1999US5946024 Illuminating apparatus and device manufacturing method
08/31/1999US5945725 Spherical shaped integrated circuit utilizing an inductor
08/31/1999US5945517 Capable of giving a patterned resist layer with high contrast, high film thickness retention, high pattern resolution and latent image stability
08/31/1999US5945516 Prior to esterification of the polyhydroxy phenol with the naphthoquinone diazide sulfonyl halide, the reactants are initially dissolved in an aprotic solvent together with strong base; nonprecipitating, for formation of photoresists
08/31/1999US5945351 Protective chambers with covers for semiconductors and etching
08/31/1999US5945262 Correcting liquid for a silver imaged lithographic printing plate
08/31/1999US5945260 Method for manufacturing liquid jet recording head
08/31/1999US5945256 Reducing detectable variations in brightness or electrical properties near the boundaries of exposure regions in liquid crystal displays or microelectronic devices
08/31/1999US5945255 Birefringent interlayer for attenuating standing wave photoexposure of a photoresist layer formed over a reflective layer
08/31/1999US5945254 Crosslinking dielectric layer by using ultraviolet, ion beam or electron beam radiation while keeping termperature below recrystallization temperature of the thin film metal, for preventing warping, metal interdiffusion and corrosion
08/31/1999US5945253 A polyether containing atleast some monomer repeat units with photosensitivity imparting epoxy substituents which enable crosslinking or chain extensiion of the polymer upon exposure to actinic radiation
08/31/1999US5945251 Acid catalyst in reaction/photoresist solvent; amine; hydrophilic solvent; hydrophobic solvent
08/31/1999US5945250 Positive photosensitive composition
08/31/1999US5945249 Laser absorbable photobleachable compositions
08/31/1999US5945248 Chemical-sensitization positive-working photoresist composition
08/31/1999US5945239 Adjustment method for an optical projection system to change image distortion
08/31/1999US5945238 Method of making a reusable photolithography mask
08/31/1999US5945202 Ink impregnated foam
08/31/1999US5944974 Process for manufacturing mold inserts
08/31/1999US5944896 Adjustable support for print screens
08/31/1999CA2130159C Aqueous developable flexographic printing plate
08/26/1999WO1999042905A1 Reflective optical imaging system
08/26/1999WO1999042904A1 Filter for extreme ultraviolet lithography
08/26/1999WO1999042903A1 RADIATION SENSITIVE TERPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND 193 nm BILAYER SYSTEMS
08/26/1999WO1999042902A2 Reflective optical imaging systems with balanced distortion
08/26/1999WO1999042901A1 Method to adjust multilayer film stress induced deformation of optics
08/26/1999WO1999042813A1 Method and apparatus for synthesis of arrays of dna probes
08/26/1999WO1999042510A1 Modified polycyclic polymers
08/26/1999WO1999042507A1 Selected high thermal novolaks and positive-working radiation-sensitive compositions
08/26/1999WO1999042502A1 Polycyclic resist compositions with increased etch resistance
08/26/1999WO1999042414A1 Mo-si multilayer coating
08/25/1999EP0938031A1 A process for device fabrication using a variable transmission aperture
08/25/1999EP0938030A1 Projection exposure apparatus
08/25/1999EP0938029A2 Methods using photoresist compositions and articles produced therewith
08/25/1999EP0938028A1 A precursor of waterless planographic printing plates
08/25/1999EP0938027A1 Photorecording medium and process for forming medium
08/25/1999EP0938026A1 Photocurable liquid resin composition
08/25/1999EP0938009A1 Optical device and a microlithography projection exposure system with passive thermal compensation
08/25/1999EP0937999A1 Optical system with polarisation compensator
08/25/1999EP0937321A2 Picosecond laser
08/25/1999EP0937308A1 Micromachining using high energy light ions
08/25/1999EP0937280A1 Multifunctional microstructures and preparation thereof
08/25/1999EP0819265B1 Exposure and pressure applicator device for printing an image
08/25/1999EP0724768A4 Tellurium lamp
08/25/1999CN1226978A Composition for antireflection or light absorption film and compounds for use in the same
08/25/1999CN1226565A Copolymer resin, preparation thereof, and photoresist using the same
08/24/1999US5943550 Method of processing a semiconductor wafer for controlling drive current
08/24/1999US5943534 Image forming method and apparatus including a liquid developer capable of changing in surface tension
08/24/1999US5943172 Projection optical system and projection exposure apparatus
08/24/1999US5942871 Double flexure support for stage drive coil
08/24/1999US5942760 Method of forming a semiconductor device utilizing scalpel mask, and mask therefor
08/24/1999US5942555 Photoactivatable chain transfer agents and semi-telechelic photoactivatable polymers prepared therefrom
08/24/1999US5942376 Shelf-stable liquid metal arylketone alcoholate solutions and use thereof in photoinitiated patterning of thin films
08/24/1999US5942374 Transistors made with undoped and doped radiation sensitive polymer layers to form source/drain regions, channels and gates of common material so temperature cycle reliablility is eliminated; cost efficiency, simplification
08/24/1999US5942373 Pattern or via structure formed through supplemental electron beam exposure and development to remove image residue
08/24/1999US5942372 Sensitized photopolymerizable compositions and use thereof in lithographic printing plates
08/24/1999US5942371 Containing an acrylic polymer
08/24/1999US5942370 Production of three-dimensional objects
08/24/1999US5942369 Positive photoresist composition
08/24/1999US5942368 Pigment dispersion composition
08/24/1999US5942367 High sensitivity, resolution
08/24/1999US5942358 Method of forming a fluorescent screen on a front panel of a cathode ray tube
08/24/1999US5942357 Aligning a substrate pattern on a photosensitive surface of a substrate with an image of a mask pattern to be formed by exposing radiation through a projection optical system using an alignment sensor detecting a positional relationship
08/24/1999US5942290 Molecular complex of a mono-, bis- or triacylphosphine oxide associated with an alpha-hydroxy ketone in crystalline form by way of hydrogen bonding; photographic production of relief images
08/24/1999US5942035 Solvent and resist spin coating apparatus
08/24/1999US5942013 Substrate processing system
08/24/1999CA2075253C Method and apparatus for measuring deviation
08/19/1999WO1999041775A1 Developer injection nozzle of resist developer
08/19/1999WO1999041767A1 Large area silent discharge excitation radiator
08/19/1999WO1999041642A1 Positive acting photodielectric composition
08/19/1999WO1999041007A2 Method and apparatus for chemical and biochemical reactions using photo-generated reagents
08/19/1999WO1999041006A1 An improved method of fabricating coded particles
08/19/1999WO1999029439A8 Photoresist coating process control with solvent vapor sensor
08/19/1999WO1999028787A3 High optical density ultra thin organic black matrix system
08/19/1999DE19846938A1 Method for separating required chips from semiconductor wafer
08/19/1999DE19807614A1 Enhanced positive photoresist based on hydrophobized polymer for photolithography
08/19/1999CA2320852A1 Positive acting photodielectric composition
08/18/1999EP0936658A2 Charged particle beam exposure method and apparatus
08/18/1999EP0936506A2 Dry process for the development and stripping of photoresists
08/18/1999EP0936505A1 Method of producing phase mask for fabricating optical fiber and optical fiber with bragg's diffraction grating produced by using the phase mask
08/18/1999EP0936504A1 A radiation-sensitive material and a method for forming a pattern therewith
08/18/1999EP0936281A1 Method and apparatus for three-dimensional processing of filamentary substrates
08/18/1999EP0936081A1 Improvements in the performance of printing plates.
08/18/1999EP0936064A1 Screen printing stencil production
08/18/1999EP0935778A1 Direct positive lithographic plate
08/18/1999EP0935531A1 Planographic printing
08/18/1999EP0824399B1 Laser exposure apparatus
08/18/1999EP0770053B1 Positive photoactive compounds based on 2,6-dinitrobenzyl groups
08/18/1999EP0723699A4 Electrodeless map with improved efficacy
08/18/1999EP0670784B1 Improved laser pattern generation apparatus
1 ... 1001 1002 1003 1004 1005 1006 1007 1008 1009 1010 1011 1012 1013 1014 1015 1016 1017 1018 1019 1020 1021 ... 1272