| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/14/1999 | USRE36305 Method for fabrication of close-tolerance lines and sharp emission tips on a semiconductor wafer |
| 09/14/1999 | US5953595 Method of manufacturing thin film transistor |
| 09/14/1999 | US5953591 Purging with an inert gas |
| 09/14/1999 | US5953128 Optically measurable serpentine edge tone reversed targets |
| 09/14/1999 | US5953106 Projection optical system, exposure apparatus and semiconductor-device manufacturing method using the system |
| 09/14/1999 | US5953105 Positioning device with a reference frame for a measuring system, and a lithographic device provided with such a positioning device |
| 09/14/1999 | US5952668 Resolution in microscopy and microlithography |
| 09/14/1999 | US5952429 Carbon black graft polymer, method for production thereof, and use thereof |
| 09/14/1999 | US5952160 Method and system for controlling the relative size of images formed in light-sensitive media |
| 09/14/1999 | US5952157 Method for removal of resist film and method for production of semiconductor device |
| 09/14/1999 | US5952156 Enhanced reflectivity coating (ERC) for narrow aperture width contact and interconnection lithography |
| 09/14/1999 | US5952154 Photoimageable composition having improved flexibility |
| 09/14/1999 | US5952153 Photoimageable composition having improved flexibility, adhesion and stripping characteristics |
| 09/14/1999 | US5952152 Borate coinitiators for photopolymerization |
| 09/14/1999 | US5952151 Photopolymerizable mixture exhibiting low oxygen sensitivity for the production of color proofs |
| 09/14/1999 | US5952150 Comprising a disulfonylmethane derivative, a resin protected by an acid decomposable group or an alkali-soluble resin and an alkali solubility control agent; photoresists |
| 09/14/1999 | US5952149 High accuracy pattern transfer while suppressing oxidation of resist |
| 09/14/1999 | US5952134 Method for measuring overlay accuracy |
| 09/14/1999 | US5952133 Methods for evaluating image-forming characteristics of a projection-optical system used in a charged-particle-beam microlithography apparatus |
| 09/14/1999 | US5952132 Method for forming a stepper focus pattern through determination of overlay error |
| 09/14/1999 | US5951881 Fabrication of small-scale cylindrical articles |
| 09/10/1999 | WO1999045613A1 RELIABLE, MODULAR, PRODUCTION QUALITY NARROW-BAND KrF EXCIMER LASER |
| 09/10/1999 | WO1999045581A1 Method and apparatus for exposure, method of manufacture of exposure tool, device, and method of manufacture of device |
| 09/10/1999 | WO1999045580A1 Exposure device and method of manufacturing semiconductor device |
| 09/10/1999 | WO1999045566A1 Device and method for forming lithographic patterns using an interferometer |
| 09/10/1999 | WO1999045558A1 Blue and ultraviolet photolithography with organic light emitting devices |
| 09/10/1999 | WO1999045443A1 Composition and method for removing resist and etching residues using hydroxylammonium carboxylates |
| 09/10/1999 | WO1999045442A1 Alkaline aqueous solution and method for forming pattern of photosensitive resin composition using the same |
| 09/10/1999 | WO1999045441A1 Improved modulator design for pattern generator |
| 09/10/1999 | WO1999045440A1 Pattern generator with improved address resolution |
| 09/10/1999 | WO1999045439A1 Improved pattern generator |
| 09/10/1999 | WO1999045438A1 Method for pattern generation with improved image quality |
| 09/10/1999 | WO1999045437A1 Pattern generator using euv |
| 09/10/1999 | WO1999045436A1 Improved pattern generator for avoiding stitching errors |
| 09/10/1999 | WO1999045435A1 Pattern generator with improved precision |
| 09/10/1999 | WO1999045434A1 Dry image forming material and dry image forming method |
| 09/10/1999 | WO1999045340A1 Measuring a diffracting structure, broadband, polarized, ellipsometric, and an underlying structure |
| 09/10/1999 | WO1999045045A1 Polymeric films having controlled viscosity response to temperature and shear |
| 09/10/1999 | WO1999032293A3 Direct electrostatic printing method and apparatus |
| 09/10/1999 | CA2287937A1 Dry image forming material and dry image forming method |
| 09/08/1999 | EP0940846A1 Method for stripping ion implanted photoresist layer |
| 09/08/1999 | EP0940724A2 Developer for photosensitive polyimide precursor, and method of using it for patterning |
| 09/08/1999 | EP0940723A2 Sample table for pattern exposure machine |
| 09/08/1999 | EP0940722A2 Illumination system and REMA (reticle masking) objective with lens shift and method of use therefor |
| 09/08/1999 | EP0940721A2 Reticle library apparatus and method |
| 09/08/1999 | EP0940720A1 Photodefinable multilayer element with removable cover sheet |
| 09/08/1999 | EP0940719A2 Photoresist film and method for forming a pattern thereof |
| 09/08/1999 | EP0940718A2 Reticle with crystalline substrate and pellicle |
| 09/08/1999 | EP0940710A2 Display device and fabrication method thereof |
| 09/08/1999 | EP0940695A1 Phase mask for machining optical fibers and method of manufacturing the same |
| 09/08/1999 | EP0939920A1 Planographic printing |
| 09/08/1999 | EP0815565A4 Method and apparatus for micromachining using hard x-rays |
| 09/08/1999 | CN1228172A Liquid antireflective coating for photoresist compositions |
| 09/08/1999 | CN1228098A Light-absorbing polymer, composition forming light-absorbing coating, light-absorbing coatings, and antireflection coating made by using same |
| 09/07/1999 | US5950106 Method of patterning a metal substrate using spin-on glass as a hard mask |
| 09/07/1999 | US5949844 Exposure apparatus |
| 09/07/1999 | US5949557 Total internal reflection holography method and apparatus for lithography on 3-D spherical shaped integrated circuit |
| 09/07/1999 | US5949547 System for in-line monitoring of photo processing in VLSI fabrication |
| 09/07/1999 | US5949528 Image forming apparatus |
| 09/07/1999 | US5949468 Light quantity measuring system and exposure apparatus using the same |
| 09/07/1999 | US5949145 Semiconductor device including alignment marks |
| 09/07/1999 | US5949079 Method of and an apparatus for electron beam exposure |
| 09/07/1999 | US5948847 Acrylated ester crosslinked with nitrogen containing organic compound |
| 09/07/1999 | US5948599 Imagewise exposure of photosensitive plate; development; heating |
| 09/07/1999 | US5948598 Anti-reflective silicon nitride film using in-situ deposition |
| 09/07/1999 | US5948597 Dyes for color filters and photosensitive resist resin composition containing the same |
| 09/07/1999 | US5948595 Spraying with a resin; drying |
| 09/07/1999 | US5948594 Thermoplastic, elastomeric, block copolymer comprising two or more polymer blocks comprising aromatic vinyl units, and one or more polymer blocks comprising isoprene and/or isoprene/butadiene units. |
| 09/07/1999 | US5948592 Mixture of casein and calcium compound |
| 09/07/1999 | US5948590 Negative type image recording material |
| 09/07/1999 | US5948589 Positive-working photoresist composition |
| 09/07/1999 | US5948587 Positive working photoresist composition |
| 09/07/1999 | US5948586 Hand application to fabric of heat transfers imaged with color copiers/printers |
| 09/07/1999 | US5948578 The present invention relates to a photoresist for forming a fine pattern used in manufacturing a large scale integrated circuit (lsi) and so on. |
| 09/07/1999 | US5948577 Color filter substrate, liquid crystal display device using the same and method of manufacturing color filter substrate |
| 09/07/1999 | US5948574 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 09/07/1999 | US5948572 Alignment marks |
| 09/07/1999 | US5948571 An exposure mask for use in a photoresist imaging system. |
| 09/07/1999 | US5948514 Photocurable thermosettting resin composition developable with aqueous alkali solution |
| 09/07/1999 | US5948470 A selected block copolymer is coated onto the selected substrate and a component of the block copolymer is modified with ozone and physically removed so that the dense periodic pattern of the block copolymer can be transferred onto the |
| 09/07/1999 | US5948255 Microfabricated particle thin film filter and method of making it |
| 09/07/1999 | US5948232 Method of manufacturing passive elements using conductive polypyrrole formulations |
| 09/07/1999 | US5948219 Apparatus for selectively exposing a semiconductor topography to an electric field |
| 09/07/1999 | US5947027 Printing apparatus with inflatable means for advancing a substrate towards the stamping surface |
| 09/02/1999 | WO1999044232A1 Method of increasing alignment tolerances for interconnect structures |
| 09/02/1999 | WO1999044101A1 Resist stripping process |
| 09/02/1999 | WO1999044100A1 Curable compositions |
| 09/02/1999 | WO1999044099A1 Imaging system employing encapsulated radiation sensitive composition |
| 09/02/1999 | DE19907957A1 Pigmented photopolymerizable compositions based on ethylenically unsaturated compounds |
| 09/02/1999 | CA2319603A1 Imaging system employing encapsulated radiation sensitive composition |
| 09/01/1999 | EP0939344A1 Photoresist stripping liquid composition |
| 09/01/1999 | EP0939343A1 Exposure method and exposure apparatus |
| 09/01/1999 | EP0939342A1 Process for forming photoresist patterns |
| 09/01/1999 | EP0939341A2 Illumination system and exposure apparatus and method |
| 09/01/1999 | EP0939340A1 Radiation sensitive resists |
| 09/01/1999 | EP0939339A1 Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups |
| 09/01/1999 | EP0939147A2 A manufacturing method for calcium fluoride and calcium fluoride for photolithography |
| 09/01/1999 | EP0938972A1 Photosensitive lithographic form plate using an image-forming material |
| 09/01/1999 | EP0938606A1 Imaging transfer system and process for transferring image and non-image areas thereof to receptor element |
| 09/01/1999 | EP0938526A1 Thermosettable pressure sensitive adhesive |