Patents
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
05/1987
05/06/1987EP0220471A1 Process for examining defects in masks
05/06/1987EP0220233A1 Target keys for wafer probe alignment.
05/05/1987US4662747 Method and apparatus for production and use of nanometer scale light beams
04/1987
04/30/1987DE3537829A1 Method for producing artwork, particularly for fabricating printed circuits
04/28/1987US4661426 Process for manufacturing metal silicide photomask
04/22/1987EP0218613A1 Device for the alignment, testing and/or measurement of two-dimensional objects.
04/21/1987US4659650 Temperature resistance
04/21/1987US4659429 High resolution optical microscopy and lithography
04/16/1987DE3624566A1 Mask for X-ray lithography
04/14/1987US4658301 Phototelegraphic apparatus for transmitting images of film and data
04/14/1987US4657805 Dust cover superior in transparency for photomask reticle use and process for producing the same
04/14/1987US4657648 Method of manufacturing a mask blank including a modified chromium compound
04/14/1987US4657379 Photomask and exposure apparatus using the same
04/09/1987DE3535630A1 Method for photographic montage by copying-in and device for carrying out the method
04/07/1987US4656504 Allocation of recording area onto photosensitive film
04/01/1987EP0216750A1 Ion beam apparatus and process for realizing modifications, especially corrections, on substrates, using an ion beam apparatus
04/01/1987EP0216619A1 Recording medium
04/01/1987EP0216305A2 Film checking apparatus
04/01/1987EP0215939A1 Mounting table
03/1987
03/31/1987US4654526 System for prevention of contact between analyzing head and transparent drum of color scanner
03/31/1987US4653882 Device for exposing discrete portions of a photosensitive surface by means of a light beam
03/26/1987WO1987001865A1 Ion beam apparatus and method of modifying substrates
03/25/1987EP0215532A2 An electron emissive mask for an electron beam image projector, its manufacture, and the manufacture of a solid state device using such a mask
03/25/1987EP0215358A2 Method and device employing input and output staging chamber devices for reduced pressure lamination
03/24/1987US4652762 Electron lithography mask manufacture
03/24/1987US4652118 Device for mounting film in-register for producing printing plates for small offset printing presses
03/18/1987EP0214514A2 Mask removal tool
03/18/1987EP0214236A1 Method of forming a pressure sensitive image transfer sheet and the product thereof.
03/11/1987EP0213693A2 Photomask material
03/10/1987US4648937 Semiconductors
03/05/1987DE3530029A1 Method for producing printing copies for multi-colour printing and colour variation sheet for carrying out the method
03/04/1987EP0212713A2 Process for manufacturing a mask for use in X-ray photolithography using a monolithic support and resulting structure
03/04/1987EP0212054A2 Process for the production of X-ray masks
03/03/1987US4647517 Very large scale integration semiconductor components
03/03/1987CA1218763A1 Focal plane adjusted photomask and methods of projecting images onto photosensitized workpiece surfaces
03/02/1987EP0198908A4 Focused substrate alteration.
02/1987
02/26/1987DE3529871A1 Method for making printing masks
02/24/1987US4645731 Distortion resistant polyester support for use as a phototool
02/24/1987US4645336 Method and apparatus for determining the trimmed images of originals for reproduction on printing technology
02/17/1987US4643796 Moly mask removal tool
02/12/1987DE3528814A1 Hard mask for printed-circuit board exposure, method for producing said mask, and appliance for implementing the method
02/10/1987US4642699 Method of scanning and recording images
02/10/1987CA1217669A Metal film imaging structure
02/03/1987US4641353 Inspection method and apparatus for a mask pattern used in semiconductor device fabrication
02/03/1987US4640900 Low expansion glass
02/03/1987US4640878 Method of forming a pressure sensitive image transfer sheet and the product thereof
01/1987
01/28/1987EP0209950A2 Process for making a mask used in x-ray photolithography
01/22/1987DE3525067A1 Method for preparing a patterned absorber for an X-ray lithography mask
01/20/1987US4637714 Inspection system for pellicalized reticles
01/20/1987US4637713 Pellicle mounting apparatus
01/13/1987US4636870 Method and system for recording transformed images
01/13/1987US4636438 Masking films
01/13/1987US4636403 Method of repairing a defective photomask
01/13/1987US4636073 Semiconductors, hemispherical pads to simulate light scattering
01/08/1987DE3620970A1 Mask holding device
01/07/1987EP0207528A2 Process of producing a photomask
01/06/1987US4634643 X-ray mask and method of manufacturing the same
01/06/1987US4634270 Protective cover
01/02/1987DE3522817A1 Process for the production of protective coatings which prevent vegetative or animal colonisation and rodent or insect damage
12/1986
12/30/1986US4633504 Automatic photomask inspection system having image enhancement means
12/30/1986US4633090 Method and apparatus for particle irradiation of a target
12/30/1986US4632871 Anodic bonding method and apparatus for X-ray masks
12/30/1986US4632541 Method of using photographic montage to make portrait photos in particular
12/30/1986EP0206681A2 Optical method for forming a hologram
12/30/1986EP0206633A2 Method of inspecting masks and apparatus thereof
12/30/1986EP0205571A1 Establishing and/or evaluating alignment by means of alignment marks.
12/18/1986WO1986007301A1 Laminator
12/16/1986US4630094 Use of metallic glasses for fabrication of structures with submicron dimensions
12/16/1986CA1215481A1 Electron lithography mask manufacture
12/10/1986EP0204169A1 Support material for electron beam devices
12/09/1986US4628350 Scanning apparatus for generating signals representing color components
12/03/1986EP0203563A2 Photomask blank and photomask
12/03/1986EP0203215A1 Process for the correction of transmission masks
12/02/1986US4627005 Equal density distribution process
12/02/1986US4626493 Laser-imageable assembly with heterogeneous resin layer and process for production thereof
12/02/1986US4626097 Process for preparing printing plates
11/1986
11/26/1986EP0203014A2 Photomechanical contact device for the correction of the image deformation in a metal box extrusion process
11/26/1986EP0202540A1 Electron beam mask
11/25/1986CA1214349A1 Method and apparatus for setting and monitoring an exposure spot for printing
11/20/1986WO1986006852A1 Method and device for aligning, controlling and/or measuring bidimensional objects
11/18/1986US4623676 Photocurable
11/18/1986US4623607 Coating defects, selective masking and irradiation
11/18/1986US4623257 Alignment marks for fine-line device fabrication
11/18/1986US4623256 Apparatus for inspecting mask used for manufacturing integrated circuits
11/11/1986US4622591 Apparatus and method for precisely orienting originals on an image scanner drum
11/11/1986US4622262 Recording materials of improved lubricity for use in electroerosion printing
10/1986
10/29/1986EP0198908A1 Focused substrate alteration
10/29/1986EP0198907A1 Focused substrate alteration
10/28/1986US4620288 Data handling system for a pattern generator
10/23/1986WO1986006176A1 Target keys for wafer probe alignment
10/23/1986WO1986006024A1 Stretched, composite polyester films useable particularly for graphic arts
10/22/1986EP0198571A2 Method and system for patching original and extracting original-trimming data in scanner
10/22/1986EP0198280A2 Dry development process for metal lift-off profile
10/21/1986US4618550 Resin printing plate and preparation thereof
10/09/1986WO1986005895A1 Device for the alignment, testing and/or measurement of two-dimensional objects
10/09/1986WO1986005744A1 Mounting table
09/1986
09/30/1986US4614433 Mask-to-wafer alignment utilizing zone plates
09/30/1986US4614427 Automatic contaminants detection apparatus
09/30/1986CA1212182A1 Photomask
09/25/1986WO1986005600A1 Method of forming a pressure sensitive image transfer sheet and the product thereof