Patents
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
05/1989
05/24/1989EP0260258B1 Stretched, composite polyester films useable particularly for graphic arts
05/23/1989US4833051 Protective pellicles, spacings
05/17/1989EP0316111A2 Mask repair
05/17/1989EP0315774A2 System for the production of dot-etched lithographic films
05/16/1989US4831274 Surface inspecting device for detecting the position of foreign matter on a substrate
05/10/1989EP0315450A2 Pellicle
05/09/1989US4828949 Cathode ray tubes, ammonium dichromate, pigments, polyvinyl alcohol, glycol, leveling, development
05/09/1989US4828640 Method of producing films using a peeling jig
05/05/1989WO1989004052A1 Exposing substrates to ion beams
05/03/1989EP0314418A2 Dust-proof film
05/03/1989EP0313886A2 Production of a direct negative from resistive ribbon
05/02/1989US4827138 Filled grid mask
05/02/1989US4825555 Apparatus for automatic forming on a film material of both a mask film pattern and a positioning hole
04/1989
04/27/1989DE3733874A1 Druckformherstellung mittels auswaschbarem bildtraeger Platemaking using washable bildtraeger
04/20/1989WO1989003545A1 Production of formes using washable image carriers
04/20/1989WO1989003544A1 Monolithic channeling mask having amorphous/single crystal construction
04/19/1989EP0312341A2 High resolution imagery systems
04/18/1989US4823289 Positioning originals on an original scanning drum of an image reproducing system
04/18/1989US4822718 Light absorbing coating
04/11/1989US4820898 Ion beam apparatus for finishing patterns
04/11/1989US4820546 Method for production of X-ray-transparent membrane
04/06/1989WO1989003051A1 Method and apparatus for registering color separation film
04/05/1989EP0310412A2 Improvements in photo-masks
04/05/1989EP0310183A2 Fabrication process of a SiC mask support for X-ray lithography
04/05/1989EP0310124A2 Process for producing an X-ray mask
04/04/1989US4818661 Method for fabricating thin film metallic meshes for use as Fabry-Perot interferometer elements, filters and other devices
03/1989
03/30/1989DE3730642A1 Hole mask for use in ion- or electron-optical processes, and method for fabricating such a hole mask
03/28/1989US4816903 Film checking apparatus
03/28/1989US4816382 Method of producing plate making masks and film for forming masks
03/22/1989EP0307966A2 System for making covering masks for use in photoengraving
03/22/1989EP0307948A2 Silhouette cutting apparatus
03/22/1989EP0307726A2 Semiconductor manufacturing process which compensates for the distortion between a pattern on a semiconductor body and the mask from which the pattern is derived
03/22/1989CN1031900A Method of manufacturing a mask for radiation lithography
03/22/1989CN1031899A Method for obtaining ultrathin protected phototools
03/21/1989US4814799 Method and apparatus for creating a photomask for projecting an image
03/21/1989US4814615 Method and apparatus for detecting defect in circuit pattern of a mask for X-ray exposure
03/21/1989US4814246 Light-sensitive photoconductive recording material with light sensitive covering layer for use in manufacturing printing form or printed circuit
03/21/1989US4814244 Irradiating with ion beam
03/21/1989US4813764 Device for editing a reproduction
03/14/1989US4812279 Process for preparation of cellulose ester films
03/08/1989EP0306091A2 Process for the production of a mask for radiation lithography
03/01/1989EP0304969A2 Process for forming a pattern film
02/1989
02/28/1989US4809341 Test method and apparatus for a reticle or mask pattern used in semiconductor device fabrication
02/28/1989US4808510 Photographic element and patternable mordant composition
02/28/1989US4808435 Screen printing method for producing lines of uniform width and height
02/23/1989WO1989001650A1 Durable patterning member
02/23/1989DE3727030A1 Method for indirectly determining the pattern line (pattern feature) widths and deviations in the pattern line widths of lithography masks
02/22/1989EP0304383A2 A photographic element and patternable mordant composition
02/22/1989EP0304211A2 Dust-proof film
02/21/1989US4807020 Image reproducing system having multiple processing levels
02/21/1989US4806921 From data representing geometric objects
02/21/1989US4806457 Forming check pattern with resist stripes in intervals
02/15/1989EP0303572A1 Use of a thermal transfer printer in the production of a photomask
02/14/1989US4805123 Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-systems
02/14/1989US4804600 Lithographic mask structure and process for preparing the same
02/08/1989EP0189435B1 Mask-to-wafer alignment utilizing zone plates
02/07/1989US4803145 Coloring film of uniform thickness
01/1989
01/25/1989EP0300661A2 Reflection-preventive pellicle film and process for preparation thereof
01/25/1989EP0300475A2 Method for obtaining ultrathin protected phototools
01/18/1989EP0299951A2 Process and apparatus for mask inspection
01/11/1989EP0298495A2 Method and apparatus for correcting defects of x-ray mask
01/10/1989US4797334 Patterning optical and X-ray masks for integrated circuit fabrication
01/10/1989US4797177 Method of cutting an organic membrane
01/10/1989US4796973 Pellicle structure for transmission of mid ultraviolet light
01/04/1989EP0297506A2 Removal of particles from solid-state surfaces by laser bombardement
01/04/1989CN1030147A Method of plate making and printing for synthesizing colored stereapicture
01/03/1989US4796061 Device for detachably attaching a film onto a drum in a drum type picture scanning recording apparatus
12/1988
12/29/1988DE3808573A1 Photomask glass of low expansion having improved adhesion properties
12/27/1988US4794462 Method and system for patching an original at a desired angular orientation on a scanner input drum or an original patching sheet and extracting original trimming data
12/20/1988US4792693 Step-and-repeat exposure method
12/20/1988US4792461 Method of forming a photomask material
12/13/1988US4790895 Laminater
12/07/1988EP0293643A2 Lithographic process having improved image quality
12/06/1988US4789611 Method for amending a photomask
11/1988
11/30/1988EP0293239A2 Method of producing films and jig for producing the same
11/29/1988US4788117 Semiconductor device fabrication including a non-destructive method for examining lithographically defined features
11/23/1988EP0292090A2 Rinser dryer system
11/17/1988WO1988009049A1 Mask repair using an optimized focused ion beam system
11/17/1988DE3715865A1 X-ray mask made from silicon combined with silicon nitride layers, and process for the production thereof
11/15/1988US4785347 Method for emphasizing sharpness of a picture image by forming and processing sharp and unsharp signals from a picture image signal
11/08/1988US4783390 Multicolor diazo image-forming material
11/08/1988US4783385 Dry dot etching; exposure behind halftone positive and negative of color separation set and diffusion sheets
11/08/1988US4783371 Photomask material
11/08/1988CA1244521A1 Apparatus for photomask repair
11/02/1988EP0289249A2 Device fabrication by X-ray lithography utilizing stable boron nitride mask
11/02/1988EP0289174A2 Antireflection coatings for use in photolithography
11/02/1988EP0220233A4 Target keys for wafer probe alignment.
10/1988
10/25/1988US4780382 Process for making a transmission mask
10/18/1988US4778745 Defect detection method of semiconductor wafer patterns
10/18/1988US4778693 Photolithographic mask repair system
10/18/1988CA1243427A1 Laser pattern generation apparatus
10/12/1988EP0286018A2 Exposure mask for materials coated with a photosensitive layer
10/12/1988EP0285850A2 Improved screen printing method for producing lines of uniform width and height
10/11/1988US4777372 Right angle driving
10/11/1988US4777371 Glass ceramic with high quartz structure
10/04/1988US4775886 Apparatus for performing a plurality of editing processes according to a predetermined order of priority while recording a composite image
10/04/1988US4775797 Method of stabilizing a mask
10/04/1988US4775205 Light-beam scanning apparatus having two beam waists
10/04/1988CA1242815A1 Defect detection method of semiconductor wafer patterns
09/1988
09/28/1988EP0284003A1 Reticle frame assembly