Patents
Patents for G01Q 30 - Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices (4,691)
05/2003
05/29/2003US20030098416 System and method for directing a miller
05/29/2003US20030098415 Aberration corrector for instrument utilizing charged-particle beam
05/28/2003EP1314178A1 Environmental scanning electron microscope
05/27/2003US6570170 Total release method for sample extraction from a charged-particle instrument
05/27/2003US6570164 Resolution enhancement device for an optically-coupled image sensor using high extra-mural absorbent fiber
05/22/2003US20030094583 Wafer holding apparatus for ion implanting system
05/22/2003US20030094572 Inspection system and inspection process for wafer with circuit using charged-particle beam
05/20/2003US6567770 Remote semiconductor microscopy
05/20/2003US6567168 Inspection method, apparatus and system for circuit pattern
05/20/2003US6566897 Voltage contrast method and apparatus for semiconductor inspection using low voltage particle beam
05/20/2003US6566885 Multiple directional scans of test structures on semiconductor integrated circuits
05/20/2003US6566658 Charged particle beam control element, method of fabricating charged particle beam control element, and charged beam apparatus
05/20/2003US6566655 Multi-beam SEM for sidewall imaging
05/20/2003US6566654 Detecting secondary electrons emitted as a result of irradiation of the circuit pattern with the electron beam, forming images of the irradiated first and second regions, extracting a difference between the formed images
05/20/2003US6566653 Investigation device and method
05/15/2003WO2003041109A2 Spot grid array electron imagine system
05/15/2003US20030090684 An electron beam emitter, a data storage unit for storing widths of a plurality of test patterns formed on a wafer, calculator for calculating an change in width before and after being irradiated; making semiconductor memory
05/15/2003US20030089860 Electrostatic manipulating apparatus
05/15/2003US20030089852 Apparatus and method for observing sample using electron beam
05/13/2003US6563112 Method for enhancing the contrast for a transmission electron microscope
05/08/2003WO2003038147A2 High resolution patterning method
05/08/2003WO2002025271A3 A method for quantifying the texture homogeneity of a polycrystalline material
05/08/2003US20030085355 Electron beam apparatus, and inspection instrument and inspection process thereof
05/08/2003US20030085354 Method of preventing charging, and apparatus for charged particle beam using the same
05/08/2003US20030085353 Spot grid array electron imaging system
05/06/2003US6559663 Method and apparatus for inspecting integrated circuit pattern
05/06/2003US6559662 Semiconductor device tester and semiconductor device test method
05/06/2003US6559459 Convergent charged particle beam apparatus and inspection method using same
05/06/2003US6559458 Measuring instrument and method for measuring features on a substrate
05/06/2003US6559457 System and method for facilitating detection of defects on a wafer
05/06/2003US6559456 Charged particle beam exposure method and apparatus
05/02/2003EP1305816A2 Collection of secondary electrons through the objective lens of a scanning electron microscope
04/2003
04/30/2003CN1107219C Method of measuring exchange force and method of evaluating magnetism using exchange force
04/29/2003US6555830 Suppression of emission noise for microcolumn applications in electron beam inspection
04/29/2003US6555819 Scanning electron microscope
04/29/2003US6555816 Scanning electron microscope and sample observation method using the same
04/29/2003US6555815 Apparatus and method for examining specimen with a charged particle beam
04/29/2003US6555362 Dna bound to carbon nanotubes
04/29/2003US6553788 Glass substrate for magnetic disk and method for manufacturing
04/24/2003US20030075691 Charged particle beam apparatus, pattern measuring method and pattern writing method
04/23/2003EP1303778A2 Differential interferometric scanning near-field confocal microscopy
04/22/2003US6553546 Failure analyzing apparatus and failure analyzing method for semiconductor integrated circuit
04/22/2003US6552340 Autoadjusting charged-particle probe-forming apparatus
04/22/2003US6552336 Non-invasive, opto-acoustic water current measurement system and method
04/22/2003US6552331 Device and method for combining scanning and imaging methods in checking photomasks
04/16/2003EP1301939A2 Time-of-flight mass spectrometer array instrument
04/16/2003CN1411025A Charged beam apparatus, pattern testing method and pattern display method
04/15/2003US6548810 Scanning confocal electron microscope
04/15/2003US6546788 Nanotomography
04/10/2003US20030066963 Multi-beam multi-column electron beam inspection system
04/08/2003US6545491 Apparatus for detecting defects in semiconductor devices and methods of using the same
04/08/2003US6545470 Scanning probe microscope
04/08/2003US6545276 Near field optical microscope
04/08/2003US6545275 Beam evaluation
04/08/2003US6544889 Method for tungsten chemical vapor deposition on a semiconductor substrate
04/03/2003WO2003028065A2 Electrostatic manipulating apparatus
04/03/2003WO2003028036A1 Device for fixing a measuring probe for a raster scanning probe microscope
04/03/2003US20030065475 Method for estimating repair accuracy of a mask shop
04/03/2003US20030062463 Near-field spectrometer
04/01/2003US6541779 Charged-particle-beam microlithography apparatus including selectable systems for determining alignment-mark position, and device-fabrication methods utilizing same
03/2003
03/27/2003WO2002048678A9 High capacity and scanning speed system for sample handling and analysis
03/27/2003US20030058444 Inspection method, apparatus and system for circuit pattern
03/27/2003US20030057988 Semiconductor device inspecting method using conducting AFM
03/27/2003US20030057377 Electron detection device
03/25/2003US6538249 Image-formation apparatus using charged particle beams under various focus conditions
03/20/2003US20030052270 Electron beam length-measurement apparatus and measurement method
03/18/2003US6535474 Near field optical recording/reproducing device
03/18/2003US6532806 Scanning evanescent electro-magnetic microscope
03/18/2003US6532805 For superfine materials and ultra thin film materials used for semiconductor devices; atomic force microscope
03/13/2003US20030047689 Holder support device
03/12/2003EP1290714A1 Scanning electron microscope
03/12/2003EP1290430A1 Apparatus for inspection of semiconductor wafers and masks using a low energy electron microscope with two illuminating beams
03/12/2003CN1402830A Precision stage
03/11/2003US6530268 Apparatus and method for isolating and measuring movement in a metrology apparatus
03/11/2003US6530267 Scanning system having a deflectable probe tip
03/07/2003WO2002021113A1 Thermal lens microscope device
03/06/2003WO2003019238A2 Multiple plate tip or sample scanning reconfigurable scanned probe microscope with transparent interfacing of far-field optical microscopes
03/06/2003WO2003019108A1 Method and apparatus for the ultrasonic actuation of the cantilever of a probe-based instrument
03/06/2003WO2003019107A1 Method and apparatus for the ultrasonic actuation of the cantilever of a probe-based instrument
03/06/2003WO2003018465A1 Substituted donor atoms in silicon crystal for quantum computer
03/06/2003WO2002075772A3 Simultaneous flooding and inspection for charge control in an electron beam inspection machine
03/06/2003WO2002058102A3 Adjustable conductance limiting aperture for ion implanters
03/06/2003US20030041669 Method and apparatus for the ultrasonic actuation of the cantilever of a probe-based instrument
03/06/2003US20030041657 Method and apparatus for the ultrasonic actuation of the cantilever of a probe-based instrument
03/04/2003US6529793 Method of sorting a group of integrated circuit devices for those devices requiring special testing
03/04/2003US6528807 Method for applying or removing material
03/04/2003US6528786 Analysis of semiconductor surfaces by secondary ion mass spectrometry and methods
02/2003
02/27/2003WO2003016781A2 Surface plasmon enhanced illumination system
02/27/2003US20030038244 Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital e-beam direct write lithography and scanning electron microscopy
02/20/2003US20030036204 Surface plasmon enhanced illumination system
02/20/2003US20030034457 Electron-optical corrector for eliminating third-order aberations
02/20/2003US20030034453 Coaxial probe and scanning micro-wave microscope including the same
02/18/2003US6522776 Method for automated determination of reticle tilt in a lithographic system
02/18/2003US6521889 Dust particle inspection apparatus, and device manufacturing method using the same
02/18/2003US6521466 Apparatus and method for semiconductor wafer test yield enhancement
02/13/2003US20030029999 Spherical aberration corrector for electron microscope
02/11/2003US6518582 Electron beam apparatus, and inspection instrument and inspection process thereof
02/11/2003US6518571 Through-the-substrate investigation of flip-chip IC's
02/11/2003US6518570 Sensing mode atomic force microscope
02/06/2003WO2002086476A3 High spatial resolution x-ray microanalysis
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