Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23F - Non-mechanical removal of metallic material from surfaces; Inhibiting corrosion of metallic material; Inhibiting incrustation in general; Multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass  or or class › C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or
Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769)
08/1995
08/08/1995CA1336550C Corrosion resistance alloys
08/03/1995WO1995020823A1 Methods for improving semiconductor processing
08/03/1995DE19501387A1 Atomic sharp emission tips uniform array forming
08/02/1995EP0665575A1 Plasma processing systems
08/02/1995EP0665306A1 Apparatus and method for igniting plasma in a process module
07/1995
07/26/1995EP0664343A2 Method for improving substrate adhesion in fluoropolymer deposition processes
07/25/1995US5435886 Electron cyclotron resonance plasma etching
07/25/1995US5435881 Apparatus for producing planar plasma using varying magnetic poles
07/25/1995US5435880 Plasma processing apparatus
07/18/1995US5433813 Semiconductor device manufacturing apparatus
07/18/1995US5433812 Apparatus for enhanced inductive coupling to plasmas with reduced sputter contamination
07/18/1995US5433258 Gettering of particles during plasma processing
07/12/1995EP0640244A4 Plasma treatment apparatus and method in which a uniform electric field is induced by a dielectric window.
07/12/1995EP0607415A4 Hollow-anode glow discharge apparatus.
07/11/1995US5431774 Copper etching
07/11/1995US5431769 Method and system for plasma treatment
07/11/1995CA1336273C Desmear and etchback of printed circuit boards using an nf_/o_ plasma gas mixture
07/05/1995EP0661569A1 Method of making fiber probe devices using patterned reactive ion etching
07/04/1995US5430355 RF induction plasma source for plasma processing
07/04/1995US5429710 Dry etching method
07/04/1995US5429705 Apparatus for coating and/or etching substrates in a vacuum chamber
06/1995
06/29/1995WO1995017766A1 A method for fabricating integrated circuits
06/28/1995EP0660030A2 Purgeable connection for gas supply cabinet
06/27/1995US5427670 Device for the treatment of substrates at low temperature
06/22/1995WO1995016800A1 Apparatus for heating or cooling wafers
06/21/1995EP0658917A2 Fine-processing apparatus using low-energy neutral particle beam
06/21/1995EP0658637A1 Process and apparatus for the dry treatment of metallic surfaces
06/20/1995US5425844 Method of making layer containing magnetic material
06/14/1995EP0658073A1 Plasma generating apparatus and method
06/14/1995EP0657753A2 Methods for making microstructures
06/14/1995CA2117828A1 Methods for making microstructures
06/13/1995US5423945 Using a fluorocarbon gas as etchant, and scavenger
06/13/1995US5423940 Supersonic molecular beam etching of surfaces
06/06/1995CA2021315C Plasma removal of unwanted material
05/1995
05/31/1995EP0655775A1 Dry etching process for SIOX compounds
05/31/1995EP0390871B1 Plasma pinch system and method of using same
05/26/1995WO1995013927A1 Topology induced plasma enhancement for etched uniformity improvement
05/23/1995US5417799 Reactive ion etching of gratings and cross gratings structures
05/23/1995US5417798 Etching method
05/18/1995WO1995013525A1 Method of producing at least one recess in a surface of a substrate, device for carrying out the said method and use of the product thus obtained
05/17/1995EP0653775A1 Microwave plasma processing apparatus and method
05/16/1995US5415728 Method of performing plain etching treatment and apparatus therefor
05/16/1995US5415719 Two parallel plate electrode type dry etching apparatus
05/16/1995US5415718 Reactive ion etching device
05/16/1995US5415674 Cemented carbide substrate having a diamond layer of high adhesive strength
05/10/1995EP0652588A2 Process for etching conductor layers in integrated circuits
05/09/1995US5414504 Interference removal
05/09/1995US5413669 Metal CVD process with post-deposition removal of alloy produced by CVD process
05/03/1995EP0651426A1 Methods for reducing contaminants in plasma etch chambers
05/03/1995EP0651245A1 Fluid delivery apparatus and method having an infrared feedline sensor
05/02/1995US5411631 Dry etching method
04/1995
04/26/1995EP0650183A1 Methods and apparatus for treating workpieces with plasmas
04/26/1995EP0650182A1 Plasma etch reactors and methods of operating thereof
04/25/1995US5409562 Dry-etching method and apparatus
04/19/1995EP0648858A1 Methods of coating plasma etch chambers and apparatus for plasma etching workpieces
04/18/1995US5407531 Method of fabricating a compound semiconductor device
04/18/1995US5407530 Forming insulating layer on substrate, forming pattern resist, etching, depositing conductor, lifting off portions on pattern resist
04/12/1995EP0648069A1 RF induction plasma source for plasma processing
04/12/1995EP0647163A1 A plasma cleaning method for removing residues in a plasma treatment chamber
04/11/1995US5405481 Gas expansion chamber equipped with gas supply for producing patterns, microcapillaries for gas discharge, optical fiber coupled to light source, means for detecting and processing light signal reflected from sample
04/11/1995US5405480 Induction plasma source
03/1995
03/29/1995EP0645478A1 Method of shaping a diamond body
03/28/1995US5401356 Method and equipment for plasma processing
03/28/1995US5401351 Radio frequency electron cyclotron resonance plasma etching apparatus
03/28/1995US5401318 Plasma reactor for performing an etching or deposition method
03/23/1995DE4433523A1 Shape-simulation method, which allows simulation of a prepared shape during steps for producing a semiconductor device in a short time period
03/22/1995EP0644462A1 Reactive ion etching of gratings and cross gratings structures
03/21/1995US5399830 Plasma treatment apparatus
03/21/1995US5399236 Method for manufacturing a semiconductor device
03/21/1995US5399230 Method and apparatus for etching compound semiconductor
03/14/1995US5397962 Source and method for generating high-density plasma with inductive power coupling
03/14/1995US5397433 Method and apparatus for patterning a metal layer
03/08/1995EP0530236B1 Process and device for monitoring and controlling etching operations
03/08/1995CN1099812A Improvements in the treating of metal surfaces
03/07/1995US5395741 Method of making fiber probe devices using patterned reactive ion etching
03/03/1995CA2105423A1 Method and apparatus for carrying out surface processes
03/01/1995EP0641150A1 Process apparatus
03/01/1995EP0641014A1 Plasma reactor for deposition or etching process
03/01/1995EP0641013A2 High density plasma CVD and etching reactor
03/01/1995EP0640244A1 Plasma treatment apparatus and method in which a uniform electric field is induced by a dielectric window.
02/1995
02/28/1995US5394061 High frequency plasma power source and impedance matching device for supplying power to a semiconductor processing apparatus
02/28/1995US5393575 Method for carrying out surface processes
02/21/1995US5391281 Plasma shaping plug for control of sputter etching
02/21/1995US5391275 Method for preparing a shield to reduce particles in a physical vapor deposition chamber
02/21/1995US5391259 Plasma etching continuing after full undercut while mask remains balanced on pointed tips
02/21/1995US5391252 Plasma pressure control assembly
02/21/1995US5391244 Using sulfur halide gases
02/14/1995US5389197 Method of and apparatus for plasma processing of wafer
02/09/1995WO1995004373A1 Shadow clamp
02/09/1995DE4326061A1 Method for structuring a metallic thin-film measurement resistor
02/07/1995US5387777 Methods and apparatus for contamination control in plasma processing
02/07/1995US5387556 Etching aluminum and its alloys using HC1, C1-containing etchant and N.sub.2
02/02/1995WO1995003435A2 Method of ion bombarding a zinc or zinc alloy coated steel sheet before painting thereof
02/01/1995EP0637067A2 Plasma etching using xenon
02/01/1995EP0636285A1 Stabilizer for switch-mode powered rf plasma processing.
01/1995
01/26/1995WO1995002472A1 Post treatment of a coated substrate with a gas containing excited halogen to remove residues
01/24/1995US5384018 Process and apparatus for generating and igniting a low-voltage
01/24/1995US5384009 Plasma etching using xenon
01/18/1995EP0634777A1 Electrode assembly useful in confined plasma assisted chemical etching
01/17/1995US5382314 Laminating with retarder before etching with molten material
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