| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 03/21/2000 | US6039835 Etching apparatus and method of etching a substrate |
| 03/14/2000 | US6037267 Method of etching metallic film for semiconductor devices |
| 03/14/2000 | US6037264 Method for removing redeposited veils from etched platinum |
| 03/14/2000 | US6036816 Apparatus for processing a sample having a metal laminate |
| 03/14/2000 | US6035804 Process chamber apparatus |
| 03/09/2000 | WO2000013219A1 Apparatus for plasma processing |
| 03/07/2000 | US6033586 Apparatus and method for surface treatment |
| 03/07/2000 | US6033582 Irregularly etched medical implant device is provided having random non-uniform relief patterns on the surface; roughened surface amenable to bioadhesion |
| 02/29/2000 | US6031198 Plasma processing method and apparatus |
| 02/29/2000 | US6030515 Producing an insulating layer only on each of the side walls of a plurality of trenches in a polymer layer; filling using an electroplating process and then removing the polymer layer without removing the insulating layer; short circuiting |
| 02/29/2000 | US6030486 Magnetically confined plasma reactor for processing a semiconductor wafer |
| 02/22/2000 | US6028009 Process for fabricating a device with a cavity formed at one end thereof |
| 02/22/2000 | US6027606 Center gas feed apparatus for a high density plasma reactor |
| 02/22/2000 | US6027604 Dry etching apparatus having upper and lower electrodes with grooved insulating rings or grooved chamber sidewalls |
| 02/17/2000 | DE19518185C2 Verfahren zur Agglomeratstrahl-Mikrostrukturierung Process for microstructuring Agglomeratstrahl |
| 02/15/2000 | US6024885 Process for patterning magnetic films |
| 02/15/2000 | US6024045 Apparatus for fabricating semiconductor device and method for fabricating semiconductor device |
| 02/08/2000 | US6022805 Method of fabricating semiconductor device with a multi-layered interconnection structure having a low contact resistance |
| 02/08/2000 | US6022446 Shallow magnetic fields for generating circulating electrons to enhance plasma processing |
| 02/02/2000 | EP0977243A2 Plasma etching apparatus using halogen type gas plasma |
| 02/01/2000 | US6020570 Plasma processing apparatus |
| 01/27/2000 | WO2000004576A1 Method and apparatus for plasma processing |
| 01/19/2000 | CN2359295Y Small-angle two-sided ion reduction instrument sample stage |
| 01/19/2000 | CN1241806A Process for patterning conductive line without after-corrosion and apparatus use in process |
| 01/12/2000 | EP0700524B1 Process for producing surface micromechanical structures |
| 01/11/2000 | US6013575 Method of selectively depositing a metal film |
| 01/11/2000 | CA2113111C Antipilferage markers |
| 01/06/2000 | WO2000001007A1 Plasma processing method |
| 01/06/2000 | WO2000001003A1 Device and method for plasma processing |
| 01/05/2000 | EP0968525A1 Uv/halogen metals removal process |
| 01/04/2000 | US6010919 Method for manufacturing semiconductor devices by use of dry etching |
| 01/04/2000 | US6010603 Using ions |
| 01/04/2000 | CA2016893C Apparatus for the continuous etching and aluminum plating of stainless steel strips |
| 12/29/1999 | WO1999067443A1 Methods for etching an aluminum-containing layer |
| 12/28/1999 | US6008140 Copper etch using HCI and HBr chemistry |
| 12/28/1999 | US6008139 Method of etching polycide structures |
| 12/28/1999 | US6008132 Dry etching suppressing formation of notch |
| 12/28/1999 | US6007672 Dustless process using an electrode having a specific flatess and a camber of the front surface side of the being recessed and the back is projecting; fine patterns for semiconductor wafers for integrated circuits and optical apparatus |
| 12/28/1999 | US6007671 Having a vacuum chamber where part of an inside wall is silicon oxide; controlling the temperature of the silicon dioxide to prevent hydrogen atoms from deposit and recombining on the internal wall |
| 12/23/1999 | WO1999066769A1 Plasma processor |
| 12/23/1999 | WO1999066531A1 Plasma processing apparatus |
| 12/21/1999 | US6005217 Microwave plasma processing method for preventing the production of etch residue |
| 12/21/1999 | US6004882 Method for etching Pt film of semiconductor device |
| 12/15/1999 | EP0964425A2 Apparatus for processing a work piece with a uniformly neutralised ion beam |
| 12/15/1999 | EP0792571B1 Method and device for measuring ion flow in a plasma |
| 12/14/1999 | CA2048470C Plasma processing apparatus having an electrode enclosing the space between cathode and anode |
| 12/07/1999 | US5998297 Method of etching copper or copper-doped aluminum |
| 12/07/1999 | US5997757 Method of forming connection hole |
| 12/07/1999 | US5997687 Plasma processing apparatus |
| 12/02/1999 | WO1999054908A8 Crystalline gas distributor for semiconductor plasma etch chamber |
| 12/01/1999 | EP0961308A2 Quartz glass member for use in dry etching and dry etching system equipped with the same |
| 11/30/1999 | US5994750 Microstructure and method of forming the same |
| 11/30/1999 | US5994235 Methods for etching an aluminum-containing layer |
| 11/30/1999 | US5994234 Multilayer film of polysilicon on semiconductor substrate |
| 11/30/1999 | US5993678 Device and method for processing a plasma to alter the surface of a substrate |
| 11/30/1999 | US5993597 Single-crystal or polycrystalline silicon, which has an electric resistance of 0.0001-40 omega cm, whose crystal faces are (100), which is doped with boron or phosphorus, whose surface has been acid etched & vacuum heat treated |
| 11/25/1999 | DE19919384A1 Verfahren zum Trockenätzen und Vakuumbehandlungsreaktor A method for dry etching and vacuum treatment reactor |
| 11/23/1999 | US5989928 Method and device for detecting end point of plasma treatment, method and device for manufacturing semiconductor device, and semiconductor device |
| 11/23/1999 | US5989625 Injecting reactive gas with trifluorocarbon groups which bond chemically with the atoms in the surface of substrate |
| 11/23/1999 | US5988104 Plasma treatment system |
| 11/18/1999 | WO1999059198A1 Plasma etching method |
| 11/17/1999 | CN2349218Y Attached type mask assembly for quasi-molecule laser etching |
| 11/16/1999 | US5985750 Selectively etching aluminum wires, reforming surface of oxide film beneath wires, forming an organic ingterlayer film |
| 11/16/1999 | US5983829 Microwave plasma etching apparatus |
| 11/11/1999 | WO1999057334A1 Method and apparatus for treating metal surfaces by dry process |
| 11/11/1999 | WO1999057332A1 A method of etching an opening |
| 11/11/1999 | CA2330998A1 A method of etching an opening |
| 11/11/1999 | CA2293610A1 Method and apparatus for treating metal surfaces by dry process |
| 11/09/1999 | US5981904 Tandem cathodic cleaning device for wire |
| 11/09/1999 | US5980769 Plasma etching method |
| 11/09/1999 | US5980766 Process optimization in gas phase dry etching |
| 11/04/1999 | WO1999056309A1 Protective member for inner surface of chamber and plasma processing apparatus |
| 11/02/1999 | US5976986 Low pressure and low power C12 /HC1 process for sub-micron metal etching |
| 11/02/1999 | US5976394 Method for dry-etching a platinum thin film |
| 11/02/1999 | US5976308 High density plasma CVD and etching reactor |
| 10/28/1999 | WO1999054908A1 Crystalline gas distributor for semiconductor plasma etch chamber |
| 10/27/1999 | EP0951963A2 Wafer flattening process, wafer flattening system, and wafer |
| 10/27/1999 | EP0951578A1 Precision etching and coating system |
| 10/26/1999 | US5972161 Dry etcher apparatus for preventing residual reaction gas from condensing on wafers after etching |
| 10/21/1999 | WO1999053533A1 Apparatus for gas processing |
| 10/19/1999 | US5968847 Process for copper etch back |
| 10/12/1999 | US5965042 Method and apparatus for laser marking with laser cleaning |
| 10/07/1999 | DE19814760A1 Ion beam machining process for surface leveling, shaping or shape correction of mechanical, micromechanical, electronic and high quality optical components |
| 10/05/1999 | US5961851 Microwave plasma discharge device |
| 10/05/1999 | US5961773 Plasma processing apparatus and plasma processing method using the same |
| 10/05/1999 | US5961361 Method for manufacturing electrode plate for plasma processing device |
| 10/05/1999 | CA2182342C Method for radiofrequency wave etching |
| 09/30/1999 | WO1999029922A8 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 09/28/1999 | US5959409 Ceramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method protecting such heated metal surfaces |
| 09/28/1999 | US5958799 Ion beam machining in presence of water vapor to quickly sputter away portions photoresist and expose photoresist cross-section without damage to underlying integrated circuit substrate material, then analyzing cross section |
| 09/28/1999 | US5958644 Process to form light-receiving member with outer layer made by alternately forming and etching |
| 09/28/1999 | US5958265 Substrate holder for a plasma processing system |
| 09/28/1999 | US5958141 Dry etching device |
| 09/28/1999 | US5958134 Process equipment with simultaneous or sequential deposition and etching capabilities |
| 09/22/1999 | EP0721514B1 Magnetically enhanced multiple capacitive plasma generation apparatus and related method |
| 09/21/1999 | US5955673 Cathode sputtering targets selected by ultrasonic inspection for their low level of particle emission |
| 09/21/1999 | US5954884 Demetallization substrates with chlorine, radiation |
| 09/16/1999 | WO1999046812A1 Process for copper etch back |
| 09/14/1999 | US5952245 Method for processing samples |
| 09/14/1999 | US5951879 Forming a polysilicon layer on a silicon dioxide layer formed on a silicon substrate, masking, etching, wherein said etching step comprises using a mixed gas of an etching gas and an oxygen gas |