| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 06/11/1991 | US5022956 Making hole(s) in glass fiber reinforced epoxy resin sheet, plasma etching with tetrafluoromethane and oxygen to remove resin only |
| 06/05/1991 | EP0430856A1 Liquid jet removal of plasma sprayed and sintered coatings |
| 06/05/1991 | EP0430079A2 Chemical vapor deposition apparatus of in-line type |
| 06/04/1991 | US5021121 Reactive ion etching by flowing an inert gas and trifluoromethane into an enclosure while controlling the power level of the plasma |
| 05/30/1991 | WO1991007700A1 Process for the production of metal microstructure bodies |
| 05/29/1991 | EP0429270A2 Continuous etching method and apparatus therefor |
| 05/07/1991 | US5013400 Dry etch process for forming champagne profiles, and dry etch apparatus |
| 05/07/1991 | CA1283885C Etching process for the surface of an indium phosphorus workpiece |
| 05/02/1991 | EP0425419A2 Methods and apparatus for contamination control in plasma processing |
| 05/02/1991 | EP0425166A1 Polysilicon etch using bromine |
| 05/02/1991 | DE3933501A1 Light-induced gas etching process - with etch prod. removal solely by photo-desorption |
| 04/24/1991 | EP0424256A1 Device for chemical treatment assisted by a diffusion plasma |
| 04/24/1991 | EP0424211A1 Method of plasma surface treatment of metallurgical products |
| 04/24/1991 | CA2024637A1 Methods and apparatus for contamination control in plasma processing |
| 04/23/1991 | CA1283381C Hollow cathode enhanced plasma for high rate reactive ion etching and deposition |
| 04/20/1991 | CA2027883A1 Diffusion-plasma-assisted chemical treatment apparatus |
| 04/18/1991 | CA2027703A1 Process for the surface treatment of steel products by the action of a plasma |
| 04/17/1991 | EP0422381A2 Method for removing material from surfaces using a plasma |
| 04/16/1991 | US5007981 Method of removing residual corrosive compounds by plasma etching followed by washing |
| 04/10/1991 | EP0421745A2 Apparatus for cleaning an optical element for use with a radiation beam. |
| 04/10/1991 | EP0421430A2 A plasma process, method and apparatus |
| 04/09/1991 | US5006220 Electrode for use in the treatment of an object in a plasma |
| 04/03/1991 | EP0419930A2 Particulate contamination prevention scheme |
| 03/27/1991 | EP0418592A1 Cleaning process for removal of deposits from the susceptor of a chemical vapor deposition apparatus |
| 03/27/1991 | EP0418438A1 Method and apparatus for the plasma etching, substrate cleaning or deposition of materials by D.C. glow discharge |
| 03/20/1991 | EP0417067A1 Energy intensive surface reactions using a cluster beam. |
| 03/19/1991 | US5000113 Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process |
| 03/13/1991 | EP0416774A1 A method of treating a sample of aluminium-containing material |
| 03/05/1991 | US4997520 Method for etching tungsten |
| 02/27/1991 | EP0414038A2 Process and apparatus for removing deposits from backside and end edge of semiconductor wafer while preventing removal of materials from front surface of wafer |
| 02/20/1991 | EP0413282A2 Method and apparatus for producing magnetically-coupled planar plasma |
| 02/20/1991 | EP0413239A2 Gas distribution system and method of using said system |
| 02/12/1991 | US4992137 Evacuation by injection of an inert pruge gas to expel reactive gas from reactor while controlling voltage |
| 02/06/1991 | EP0411061A1 Fe-Mn-Al-C ALLOYS AND THEIR TREATMENT. |
| 02/05/1991 | US4990859 Process and apparatus for determining the impedance of the discharge in a plasma reactor system comprising a tuning box and application to the regulation of the impedance or the ionic current in such reactor |
| 02/05/1991 | US4990229 High density plasma deposition and etching apparatus |
| 01/30/1991 | EP0410165A2 Method and apparatus for treating an object provided with perforations by products present in a high frequency plasma |
| 01/29/1991 | US4988644 Method for etching semiconductor materials using a remote plasma generator |
| 01/22/1991 | US4987346 Particle source for a reactive ion beam etching or plasma deposition installation |
| 01/15/1991 | US4985109 Apparatus for plasma processing |
| 01/15/1991 | CA1279104C Lithographic technique using laser for fabrication of electronic components and the like |
| 01/08/1991 | CA1278768C Device fabrication through etching a substrate with plasma confined to substrate area |
| 01/02/1991 | EP0405848A2 Method and apparatus for tapered etching |
| 01/01/1991 | US4981722 Apparatus for the gas-phase processing of disk-shaped workpieces |
| 12/25/1990 | US4980197 Method of producing metallic structures on inorganic non-conductors |
| 12/25/1990 | US4980018 Using three different mixtures of sulfur fluoride, oxygen, helium and chlorine |
| 12/19/1990 | EP0403418A2 High density plasma deposition and etching apparatus |
| 12/04/1990 | US4975335 Fe-Mn-Al-C based alloy articles and parts and their treatments |
| 12/04/1990 | US4975146 Cleaning surface, then exposing to a halogen species in a plasma reactor |
| 11/28/1990 | EP0399470A2 Method for growing thin film by beam deposition |
| 11/22/1990 | EP0397988A2 Plasma processing with metal mask integration |
| 11/22/1990 | EP0397952A1 A method and apparatus for the continuous etching and aluminum plating of stainless steel strips |
| 11/15/1990 | WO1990013909A1 Reactive ion etching apparatus |
| 11/14/1990 | EP0396919A2 Plasma Reactor and method for semiconductor processing |
| 11/07/1990 | EP0396398A1 Plasma etching apparatus with surface magnetic fields |
| 11/07/1990 | EP0396010A2 Method and apparatus for monitoring growth and etch rates of materials |
| 11/06/1990 | US4968585 Microfabricated cantilever stylus with integrated conical tip |
| 11/06/1990 | US4968374 Plasma etching apparatus with dielectrically isolated electrodes |
| 11/06/1990 | CA1275762C Aluminum and aluminum alloy parts having at least one region of wear resistant zones |
| 11/05/1990 | CA2015976A1 Plasma etching apparatus with surface magnetic fields |
| 11/01/1990 | WO1990012641A1 Process gas supply apparatus |
| 10/24/1990 | EP0393637A1 Plasma processing method |
| 10/24/1990 | EP0221164B1 Method and apparatus for producing large volume magnetoplasmas |
| 10/23/1990 | US4964940 Laser microbeam machine for acting on thin film objects, in particular for chemically etching or depositing substance in the presence of a reactive gas |
| 10/10/1990 | EP0390871A1 Plasma pinch system and method of using same. |
| 10/02/1990 | US4960073 Microwave plasma treatment apparatus |
| 09/26/1990 | EP0388749A1 Titanium nitride removal method |
| 09/05/1990 | EP0385590A1 Sample processing method and apparatus |
| 08/22/1990 | EP0383567A2 Microwave plasma processing method and apparatus |
| 08/22/1990 | EP0383550A2 Plasma forming electrode and method of using the same |
| 08/21/1990 | US4950956 Plasma processing apparatus |
| 08/21/1990 | US4950377 High ion density, narrow spectrum of energies |
| 08/21/1990 | US4950376 Method of gas reaction process control |
| 08/21/1990 | US4949783 Substrate transport and cooling apparatus and method for same |
| 08/16/1990 | EP0382065A2 Apparatus for plasma processing |
| 08/14/1990 | US4948462 Tungsten etch process with high selectivity to photoresist |
| 08/14/1990 | US4948458 Radiofrequency resonant current induced in a planar coil; uniform flux; semiconductor wafer processing |
| 08/07/1990 | US4946804 Aperture forming method |
| 08/01/1990 | EP0379828A2 Radio frequency induction/multipole plasma processing tool |
| 07/24/1990 | US4943344 Crystals/single/, masking, plasma/gases/, silicon substrate, low temperature, halogen compound |
| 07/12/1990 | WO1990007587A1 Feeder for process gas |
| 07/11/1990 | CN1043846A Plasma pinch system and method of using same |
| 07/11/1990 | CN1043827A Method of etching thin indium tin oxide films |
| 07/04/1990 | EP0376045A2 Method and apparatus for processing a fine pattern |
| 07/03/1990 | US4939364 Specimen or substrate cutting method using focused charged particle beam and secondary ion spectroscopic analysis method utilizing the cutting method |
| 06/27/1990 | EP0375066A1 A method of etching thin indium tin oxide films |
| 06/20/1990 | EP0373793A2 Lift-off process for patterning shields in thin magnetic recording heads |
| 06/19/1990 | US4935661 Pulsed plasma apparatus and process |
| 06/14/1990 | WO1990006206A1 Microlaser beam machine for the treatment of thin film objects, in particular, for engraving or depositing material by chemical means in the presence of a reactive gas |
| 06/13/1990 | EP0372179A1 Method of procuring high-frequency energy, and its use |
| 06/12/1990 | US4933318 Plasma etch of masked superconductor film |
| 06/06/1990 | EP0371252A1 Process and apparatus for etching substrates with a low-pressure discharge assisted by a magnetic field |
| 05/30/1990 | EP0370925A1 Process and apparatus for the plasma surface treatment of a substrate borne by an electrode |
| 05/30/1990 | EP0370912A1 Laser micro-beam intervention machine for thin layer objects, in particular for etching or chemically depositing matter in the presence of a reactive gas |
| 05/29/1990 | CA1269719A1 Microwave apparatus for generating plasma afterglows for stripping semiconductor |
| 05/25/1990 | CA2003847A1 Mind-array laser device for thin surface objects, especially for engraving or chemical deposit using a reaction gas |
| 05/23/1990 | EP0192656B1 Interferometric methods for device fabrication |
| 05/22/1990 | US4926791 Microwave plasma apparatus employing helmholtz coils and ioffe bars |
| 05/04/1990 | CA2002322A1 Method and apparatus for etching substrates with a magnetic-field supported low-pressure discharge |
| 04/25/1990 | EP0364619A1 Device for plasma or reactive ion etching, and process for etching thermally poorly conducting substrates |