| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 05/04/1994 | EP0595053A2 Anisotropic liquid phase photochemical etch method |
| 05/04/1994 | EP0594714A1 Antipilferage markers |
| 05/03/1994 | US5308950 Method of removing material from a surface in a vacuum chamber |
| 05/03/1994 | US5308791 Cleaning, oxide decomposition |
| 04/27/1994 | EP0593579A1 Rapid-switching rotating disk reactor |
| 04/26/1994 | US5306379 Dry etching apparatus for rectangular substrate comprising plasma bar generation means |
| 04/19/1994 | US5304278 Apparatus for plasma or reactive ion etching and method of etching substrates having a low thermal conductivity |
| 04/19/1994 | US5304277 Plasma processing apparatus using plasma produced by microwaves |
| 04/13/1994 | EP0592129A1 ECR plasma process |
| 04/13/1994 | EP0591975A1 Two parallel plate electrode type dry etching apparatus |
| 04/13/1994 | EP0591559A1 Method and apparatus for engraving cylindrical printing screens |
| 04/13/1994 | CN1085157A Process and device for the etching of round templates |
| 04/12/1994 | US5302434 Aluminum alloy, nickel phosphide layer overcoated with formed nickel oxide |
| 04/05/1994 | US5300189 Depositing carbon form hydrocarbon gas; having grounded and hollow counterelectrodes |
| 03/30/1994 | EP0588992A1 Device for processing substrates within a plasma. |
| 03/29/1994 | US5298720 Method and apparatus for contamination control in processing apparatus containing voltage driven electrode |
| 03/29/1994 | US5298103 Electrode assembly useful in confined plasma assisted chemical etching |
| 03/22/1994 | US5296091 Plastics |
| 03/17/1994 | DE4300808C1 Film capacitor prodn. from 2 types of conductive films and dielectric - using selective under-etching of one type of conductive film in each contact hole to increase capacity e.g. for passive device or IC |
| 03/16/1994 | EP0587500A1 Fabrication method of striped electro-optical devices, especially lagers and devices made like-wise |
| 03/16/1994 | EP0586579A1 Window for microwave plasma processing device |
| 03/15/1994 | US5294289 Illuminating the surface with coherent radiation filtered to block a second frequency being twice the first frequency |
| 03/08/1994 | US5292625 Projecting light through prismatic element |
| 03/08/1994 | US5292400 Method and apparatus for producing variable spatial frequency control in plasma assisted chemical etching |
| 03/08/1994 | US5292396 Plasma processing chamber |
| 03/03/1994 | WO1994005035A1 Hollow-anode glow discharge apparatus |
| 03/02/1994 | EP0584483A1 Method for preparing a shield to reduce particles in a physical vapor deposition chamber |
| 03/01/1994 | US5291415 Method to determine tool paths for thinning and correcting errors in thickness profiles of films |
| 03/01/1994 | US5290993 Microwave plasma processing device |
| 03/01/1994 | US5290382 Methods and apparatus for generating a plasma for "downstream" rapid shaping of surfaces of substrates and films |
| 02/24/1994 | DE4227237A1 Microstructuring substrate surface - by casting shadow of beam of atom agglomerates onto surface |
| 02/23/1994 | EP0583997A1 Topographical selective patterns |
| 02/23/1994 | EP0583678A2 Process to create surface pattern and applications thereof |
| 02/23/1994 | CN1082750A A magnetic recording disk for contact recording |
| 02/22/1994 | US5288329 Chemical vapor deposition apparatus of in-line type |
| 02/17/1994 | DE4308203A1 Plasma etching appts. e.g. for semiconductor wafers - provides high etching selectivity and anisotropy even at wafer edges. |
| 02/17/1994 | DE4226914A1 Magnetic recording support with improved recording properties - comprises ferromagnetic layer formed on polymer support treated by ion beam and sputter etching |
| 02/17/1994 | DE4226911A1 Magnetic recording layer for use at high frequencies - comprises ion etched polymer support and ferromagnetic cobalt-contg. thin layer |
| 02/15/1994 | US5286337 Reactive ion etching or indium tin oxide |
| 02/15/1994 | US5286331 High energy eetchant gas clostered through a nozzle |
| 02/08/1994 | US5284805 Rapid-switching rotating disk reactor |
| 02/01/1994 | US5282925 Controlling surface residence time, thickness and composition of reactant containing film |
| 02/01/1994 | US5282924 Containing cantilever beam |
| 01/27/1994 | DE4324325A1 Optical component mfr. by reactive etching - of metal oxide dielectric, esp. tantalum or hafnium oxide |
| 01/26/1994 | EP0580368A2 Studless thin film magnetic head and process for making the same |
| 01/25/1994 | US5281304 Modifying surface of copper film to copper sulfide, etching to patternize wiring, reducing copper sulfide to copper, forming insulation |
| 01/25/1994 | US5281302 Fluoridated carbon compounds and ozone and oxygen |
| 01/25/1994 | US5281300 Thin film head for a magnetic storage device |
| 01/18/1994 | US5280154 Radio frequency induction plasma processing system utilizing a uniform field coil |
| 01/18/1994 | US5279702 Anisotropic liquid phase photochemical copper etch |
| 01/17/1994 | CA2097388A1 Topographical selective patterns |
| 01/12/1994 | EP0578010A1 Multi-zone plasma processing method |
| 01/11/1994 | US5277770 Regenerating a plasma initiator using oxygen-containing gas in the presence of microwave radiation |
| 01/11/1994 | US5277750 Using hydrogen iodide gas mixture |
| 01/06/1994 | WO1994000251A1 A plasma cleaning method for removing residues in a plasma treatment chamber |
| 01/04/1994 | US5275692 Method for fabricating integrated circuits |
| 12/28/1993 | US5273634 Method and apparatus for hot-dipping steel strip |
| 12/22/1993 | EP0575126A1 Plasma reactor head and electrode assembly |
| 12/21/1993 | US5272417 Device for plasma process |
| 12/21/1993 | US5271264 Method of in-situ particle monitoring in vacuum systems |
| 12/14/1993 | US5269878 Metal patterning with dechlorinization in integrated circuit manufacture |
| 12/08/1993 | EP0572810A1 Enhanced membrane-electrode interface |
| 12/01/1993 | EP0571950A2 Removal of metal contamination |
| 11/30/1993 | US5266421 Thermoelectrical systems |
| 11/25/1993 | WO1993023978A1 Process apparatus |
| 11/25/1993 | WO1993023874A1 Plasma treatment apparatus and method in which a uniform electric field is induced by a dielectric window |
| 11/16/1993 | US5262001 Dry etching method for perovskite oxide film |
| 11/16/1993 | US5261998 Method for detecting an end point of etching in semiconductor manufacture using the emission spectrum of helium |
| 11/13/1993 | CA2094413A1 Enhanced membrane-electrode interface |
| 11/10/1993 | EP0569296A1 Device for chemical treatment by plasma and method using the same |
| 11/10/1993 | EP0568696A1 PRODUCTION OF CLEAN, WELL-ORDERED CdTe SURFACES USING LASER ABLATION. |
| 10/28/1993 | WO1993021685A1 Stabilizer for switch-mode powered rf plasma processing |
| 10/20/1993 | EP0566220A2 Magnetic field enhanced plasma etch reactor |
| 10/13/1993 | EP0565341A2 Method for treating small holes in substrate material |
| 10/13/1993 | EP0565259A1 Method and apparatus for producing variable spatial frequency control in plasma assisted chemical etching |
| 10/13/1993 | EP0564789A1 Process for treatment of workpieces in a vacuum processing apparatus |
| 10/12/1993 | US5252181 Method for cleaning the surface of a substrate with plasma |
| 10/12/1993 | US5252178 Multi-zone plasma processing method and apparatus |
| 10/12/1993 | CA2002861C Nitride removal method |
| 10/06/1993 | EP0564364A2 Method for selectively exposing an uneven substrate surface |
| 10/06/1993 | EP0563616A2 Electrochemical fine processing apparatus |
| 10/06/1993 | EP0563605A1 Method for the production of microstructures |
| 10/05/1993 | US5250137 Plasma treating apparatus |
| 09/30/1993 | WO1993019571A1 System for characterizing ac properties of a processing plasma |
| 09/28/1993 | US5248371 Hollow-anode glow discharge apparatus |
| 09/21/1993 | US5247181 Ion beam processing apparatus and specimen replacing method for the same |
| 09/15/1993 | EP0560526A1 Method and apparatus for carrying out surface treatment |
| 09/14/1993 | US5245157 Microwave plasma processing or semiconductor devices |
| 09/07/1993 | US5242561 Semiconductors |
| 09/07/1993 | US5241987 Process gas supplying apparatus |
| 09/01/1993 | EP0558327A1 Method and apparatus for non-contact plasma polishing and smoothing of uniformly thinned substrates |
| 08/31/1993 | US5241245 Optimized helical resonator for plasma processing |
| 08/19/1993 | WO1993016213A1 Process and device for surface-modification by physico-chemical reactions of gases or vapours on surfaces, using highly-charged ions |
| 08/18/1993 | EP0556043A1 Apparatus for programmed plasma etching tool motion to modify solid layer thickness profiles |
| 08/18/1993 | EP0555891A2 Vacuum processing system |
| 08/18/1993 | EP0555890A2 Vacuum processing system |
| 08/18/1993 | EP0555858A2 Method of dry etching a polycide without using a CFC gas |
| 08/17/1993 | US5237152 Apparatus for thin-coating processes for treating substrates of great surface area |
| 08/17/1993 | US5236556 Plasma apparatus |
| 08/17/1993 | US5236550 Method for plasma etch of ruthenium |