| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 04/30/1996 | US5512130 Variations in frequency |
| 04/24/1996 | EP0708478A1 Plasma guard for use in a vacuum process chamber |
| 04/24/1996 | CN1121303A Spiral wave plasma processing method and device |
| 04/23/1996 | US5511088 Process for fabricating strip optoelectronic devices, particularly lasers, and devices obtained |
| 04/23/1996 | US5510216 Using ligatrig material, electroless metallization catalysts and electroless plating solution |
| 04/17/1996 | EP0707337A1 Solid annular gas discharge electrode |
| 04/16/1996 | US5508368 Ion beam process for deposition of highly abrasion-resistant coatings |
| 04/09/1996 | US5505322 Nitrating exposed copper on substrate with nitrogen gas, followed by sublimation |
| 04/03/1996 | EP0704886A1 Process for etching cobalt silicide layers |
| 03/28/1996 | WO1996009128A1 Selective removal of material by irradiation |
| 03/28/1996 | CA2200199A1 Selective removal of material by irridiation |
| 03/27/1996 | EP0703606A2 Process to avoid the redeposition of etching products in the surface of wafers during the back-etching of tungsten in the fabrication of high-density integrated circuits |
| 03/26/1996 | US5501740 Microwave plasma reactor |
| 03/21/1996 | DE4443608C1 Plasma reactor for integrated circuit fabrication |
| 03/20/1996 | EP0702400A2 Removal of metal contamination |
| 03/20/1996 | EP0702392A2 Plasma reactor |
| 03/19/1996 | US5500279 Laminated metal structure and metod of making same |
| 03/13/1996 | EP0700524A1 Process for producing surface micromechanical structures |
| 03/12/1996 | US5498312 Method for anisotropic plasma etching of substrates |
| 03/12/1996 | US5498291 Arrangement for coating or etching substrates |
| 03/05/1996 | US5496459 Apparatus for the treating of metal surfaces |
| 02/28/1996 | EP0698485A1 Laminated metal structure and method of making same |
| 02/28/1996 | CN1031123C Process and device for the etching of round templates |
| 02/27/1996 | US5494713 Anodic oxidation, sealing pores, silicon-containing coating film by chemical vapor deposition |
| 02/21/1996 | EP0697715A1 UV-enhanced dry stripping of silicon nitride films |
| 02/21/1996 | CN1031072C Large area murowave plasma apparatus |
| 02/20/1996 | US5492718 Fluid delivery apparatus and method having an infrared feedline sensor |
| 02/13/1996 | CA1338053C Method and apparatus for forming or modifying cutting edges |
| 02/07/1996 | EP0677595A4 Device for the vacuum-plasma treatment of articles. |
| 02/07/1996 | EP0647163A4 A plasma cleaning method for removing residues in a plasma treatment chamber. |
| 02/01/1996 | WO1996002934A1 Method of and apparatus for microwave-plasma production |
| 01/31/1996 | EP0694949A2 Inductively coupled plasma reactors |
| 01/31/1996 | EP0694208A1 Plasma shaping plug for control of sputter etching |
| 01/24/1996 | EP0693769A2 Plasma reactor with enhanced plasma uniformity by gas addition, reduced chamber diameter and reduced RF wafer pedestal diameter |
| 01/17/1996 | EP0692140A1 Stripping, passivation and corrosion inhibition of semiconductor substrates |
| 01/16/1996 | US5484486 Quick release process kit |
| 01/11/1996 | WO1995033082A3 Plasma treatment and apparatus in electronic device manufacture |
| 01/10/1996 | EP0691420A1 Plasma-inert cover and plasma cleaning process and apparatus employing same |
| 01/04/1996 | DE4422913A1 Prodn. of microstructures used in the construction of microsystems |
| 01/03/1996 | EP0690666A1 Structure and method for semiconductor processing |
| 01/02/1996 | US5480052 Domed extension for process chamber electrode |
| 01/02/1996 | US5480051 Method for the anisotropic etching of an aluminiferous layer |
| 12/27/1995 | EP0689227A2 Microwave plasma processing method |
| 12/27/1995 | EP0527133B1 Plasma reaction chamber having conductive diamond-coated surfaces |
| 12/26/1995 | US5477975 Plasma etch apparatus with heated scavenging surfaces |
| 12/20/1995 | EP0687897A1 Method for making specimen and apparatus thereof |
| 12/07/1995 | WO1995033082A2 Plasma treatment and apparatus in electronic device manufacture |
| 12/06/1995 | EP0685873A1 Inductively coupled plasma reactor with an electrode for enhancing plasma ignition |
| 12/05/1995 | US5472565 Topology induced plasma enhancement for etched uniformity improvement |
| 11/30/1995 | WO1995032315A1 Magnetically enhanced multiple capacitive plasma generation apparatus and related method |
| 11/29/1995 | EP0683921A1 Microstructures and single mask, single-crystal process for fabrication thereof |
| 11/28/1995 | US5470426 Plasma processing apparatus |
| 11/22/1995 | EP0683510A1 Method of plasma etching |
| 11/21/1995 | US5468597 Selective metallization process |
| 11/21/1995 | US5468362 Apparatus for treating substrates in a vacuum chamber |
| 11/21/1995 | US5468340 Highly selective high aspect ratio oxide etch method and products made by the process |
| 11/21/1995 | US5468339 Plasma etch process |
| 11/15/1995 | EP0682361A1 Method and apparatus for planarization of metal films |
| 11/15/1995 | EP0682126A1 Low energy plasma cleaning method for cryofilms |
| 11/08/1995 | EP0681313A1 A cover assembly for reactive gas processing apparatus |
| 11/07/1995 | US5465154 Optical monitoring of growth and etch rate of materials |
| 11/02/1995 | EP0680072A2 A method of operating a high density plasma CVD reactor with combined inductive and capacitive coupling |
| 10/25/1995 | CN1110832A Vacuum plasma processing apparatus |
| 10/24/1995 | US5460707 Etching or coating method and a plant therefor |
| 10/24/1995 | US5460689 Precleaning semiconductor wafer at varying pressure |
| 10/24/1995 | US5460687 Anisotropic liquid phase photochemical etch |
| 10/18/1995 | EP0677595A1 Device for the vacuum-plasma treatment of articles |
| 10/17/1995 | US5459326 Method for surface treatment with extra-low-speed ion beam |
| 10/17/1995 | US5458687 Method of and apparatus for securing and cooling/heating a wafer |
| 10/11/1995 | EP0676790A1 Focus ring for semiconductor wafer processing in a plasma reactor |
| 10/11/1995 | CN1029992C Microwave plasma treating apparatus |
| 10/03/1995 | US5455419 Micromechanical sensor and sensor fabrication process |
| 10/03/1995 | US5454902 Production of clean, well-ordered CdTe surfaces using laser ablation |
| 09/27/1995 | EP0674337A1 Magnetron sputtering methods and apparatus |
| 09/27/1995 | EP0674334A1 Plasma processing method and apparatus |
| 09/24/1995 | CA2143777A1 Use of multiple anodes in a magnetron for improving the uniformity of its plasma |
| 09/20/1995 | EP0673063A2 Method for forming a silane based boron phosphorous silicate planarization structure |
| 09/20/1995 | EP0673056A1 Plasma processing chamber and method of treating substrates in a plasma processing chamber |
| 09/20/1995 | EP0672297A1 Wafer processing machine vacuum front end method and apparatus |
| 09/19/1995 | US5451290 Gas distribution system |
| 09/14/1995 | DE19506745A1 Plasma current etching apparatus |
| 09/12/1995 | US5449924 Photodiode having a Schottky barrier formed on the lower metallic electrode |
| 09/12/1995 | US5449432 Method of treating a workpiece with a plasma and processing reactor having plasma igniter and inductive coupler for semiconductor fabrication |
| 09/08/1995 | WO1995023652A1 Ion beam process for deposition of highly abrasion-resistant coatings |
| 09/08/1995 | WO1995022171A3 Stripping, passivation and corrosion inhibition of semiconductor substrates |
| 09/06/1995 | EP0670666A1 Plasma generating apparatus and plasma processing apparatus |
| 09/06/1995 | EP0670590A2 High pressure plasma treatment method and apparatus |
| 09/05/1995 | US5447595 Electrodes for plasma etching apparatus and plasma etching apparatus using the same |
| 08/30/1995 | EP0669637A1 Plasma process apparatus |
| 08/29/1995 | US5445709 Anisotropic etching method and apparatus |
| 08/23/1995 | EP0668609A2 Process for plasma etching the backside of a semiconductor wafer, the front surface not being coated with a protective resin |
| 08/22/1995 | US5444259 Plasma processing apparatus |
| 08/22/1995 | US5443676 Method and apparatus for etching round templates |
| 08/17/1995 | WO1995022171A2 Stripping, passivation and corrosion inhibition of semiconductor substrates |
| 08/16/1995 | EP0667638A2 Method of etching a compound semiconductor |
| 08/15/1995 | US5441595 Dry etching apparatus and method of forming a via hole in an interlayer insulator using same |
| 08/10/1995 | WO1995021458A1 Stripping, passivation and corrosion inhibition of semiconductor substrates |
| 08/09/1995 | EP0666588A2 Metal CVD process with post-deposition removal of alloy produced by CVD process |
| 08/08/1995 | US5439847 Etching partially through a layer overlying a conductive layer on a substrate using a photoresist; using the raised feature as a mask |
| 08/08/1995 | US5439782 Methods for making microstructures |