Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23F - Non-mechanical removal of metallic material from surfaces; Inhibiting corrosion of metallic material; Inhibiting incrustation in general; Multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass  or or class › C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or
Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769)
01/1985
01/15/1985US4493745 Monitoring change in emission intensity
01/01/1985US4491499 Monitoring, etching
12/1984
12/27/1984EP0033345B1 High capacity etching apparatus
12/25/1984US4490211 Laser induced chemical etching of metals with excimer lasers
12/25/1984US4490210 Laser induced dry chemical etching of metals
12/25/1984US4489482 Impregnation of aluminum interconnects with copper
12/18/1984US4489101 Pattern forming method
12/12/1984EP0128102A2 Impregnation of aluminum interconnects with copper
12/05/1984EP0127268A2 Method of reactive ion etching molybdenum and molybdenum silicide
11/1984
11/13/1984CA1177782A1 Multi-planar electrode plasma etching
11/13/1984CA1177638A1 Apparatus for physical vapor deposition
10/1984
10/30/1984US4479848 Optical image reflected from pattern onto substrate
10/23/1984US4478678 Method of reactive ion etching molybdenum and molybdenum silicide
10/02/1984US4474642 Semiconductors
10/02/1984CA1175279A1 Solid state devices produced by plasma developing of resists
09/1984
09/26/1984EP0119455A2 Etching method and apparatus
08/1984
08/28/1984US4468284 Process for etching an aluminum-copper alloy
08/21/1984CA1172993A1 Microwave plasma etching
08/14/1984US4465553 Method for dry etching of a substrate surface
08/14/1984US4465551 Graded microstructured layers formed by vacuum etching
08/07/1984US4464223 Plasma reactor apparatus and method
07/1984
07/31/1984US4462882 Selective etching of aluminum
07/31/1984US4462863 Microwave plasma etching
07/25/1984EP0027142B1 Treating multilayer printed wiring boards
07/24/1984US4461954 Ion-processing method and apparatus
07/24/1984US4461237 Plasma reactor for etching and coating substrates
07/24/1984CA1171381A1 Method for maskless chemical and electrochemical machining
07/11/1984EP0112989A1 Copper texturing process
07/03/1984US4457820 Two step plasma etching
07/03/1984CA1170315A1 Vacuum-arc plasma apparatus for producing coatings
06/1984
06/20/1984EP0111129A2 Ion beam source
06/20/1984EP0111086A2 Process for making sub-micrometric structures and use of this process in making deep dielectric isolation regions with a sub-micrometric width in a semiconductor body
06/13/1984EP0049272A4 Fabrication of microminiature devices using plasma etching of silicon with fluorine-containing gaseous compounds.
06/05/1984US4452642 Cleaning of metallic surfaces with hydrogen under vacuum
05/1984
05/22/1984US4450042 Using a mixture of bromine and a chlorine-containing compound to eliminate undercutting
05/16/1984EP0108206A2 Vacuum Chamber
05/15/1984US4448149 Apparatus for removably mounting and supplying mechanical and electrical energy to a vacuum chamber substrate holder
05/02/1984EP0106977A2 Method and apparatus for electrochemically treating a substrate
05/01/1984US4446403 Compact plug connectable ion source
05/01/1984US4446197 Ion beam deposition or etching re rubber-metal adhesion
04/1984
04/24/1984US4444618 Processes and gas mixtures for the reactive ion etching of aluminum and aluminum alloys
04/17/1984CA1165723A1 Selectively etched bodies
04/10/1984US4442338 Plasma etching apparatus
04/04/1984EP0104331A2 Controllable dry etching technique, and apparatus
03/1984
03/27/1984US4439294 Reactive ion etching of soft-magnetic substrates
03/20/1984US4438368 Plasma treating apparatus
03/20/1984US4438315 High selectivity plasma etching apparatus
03/13/1984US4436581 Uniform etching of silicon (doped and undoped) utilizing ions
03/07/1984EP0102310A2 Ion beam deposition or etching for rubber-metal bonding
03/07/1984EP0101828A1 Plasma etch chemistry for anisotropic etching of silicon
02/1984
02/21/1984US4432855 Automated system for laser mask definition for laser enhanced and conventional plating and etching
02/14/1984US4431898 Of semiconductor devices
02/14/1984US4431499 Texturing a target with a seed to lower reflectance; process control
02/14/1984US4431473 RIE Apparatus utilizing a shielded magnetron to enhance etching
02/07/1984US4430547 Cleaning device for a plasma etching system
02/07/1984US4430138 Microwave plasma etching apparatus having fan-shaped discharge
02/07/1984CA1161787A1 Dry etching of copper patterns
02/01/1984EP0099558A2 Fast plasma etch for aluminum
01/1984
01/24/1984US4427483 Microelectrode fabricting apparatus
01/17/1984US4426274 Reactive ion etching apparatus with interlaced perforated anode
01/17/1984CA1160761A1 Fabrication of microminiature devices using plasma etching of silicon and resultant products
01/03/1984US4424102 Reactor for reactive ion etching and etching method
12/1983
12/27/1983US4422896 Encapsulation support electrode in hermetic sealed chamber with magnetic field, applying voltage to produce glow discharge
12/07/1983EP0095879A2 Apparatus and method for working surfaces with a low energy high intensity ion beam
11/1983
11/30/1983EP0095366A2 Compact plug connectable ion source
11/30/1983EP0095212A2 Method of forming a resist mask resistant to plasma etching
11/30/1983EP0095209A2 Method of forming a resist mask resistant to plasma etching
11/22/1983US4416725 Copper texturing process
11/15/1983US4415402 End-point detection in plasma etching or phosphosilicate glass
11/09/1983EP0093316A2 Reactive ion etching apparatus
11/08/1983CA1156603A1 Low energy ion beam oxidation process
11/01/1983US4412885 Materials and methods for plasma etching of aluminum and aluminum alloys
10/1983
10/25/1983US4412119 Method for dry-etching
10/05/1983EP0090067A1 Reactor for reactive ion etching, and etching process
09/1983
09/28/1983EP0089382A1 Plasma-reactor and its use in etching and coating substrates
09/21/1983EP0088869A2 Thin film techniques for fabricating narrow track ferrite heads
09/20/1983US4405989 Spectral monitoring device for both plasma etching and sputtering
08/1983
08/09/1983US4397724 Apparatus and method for plasma-assisted etching of wafers
08/03/1983EP0084970A2 Magnetically enhanced plasma process and apparatus
08/02/1983US4396704 Solid state devices produced by organometallic plasma developed resists
08/02/1983US4396479 Ion etching process with minimized redeposition
08/02/1983CA1151106A1 Plasma passivation technique for the prevention of post etch corrosion of plasma-etched aluminum films
07/1983
07/19/1983US4394237 Induction of fluorescence
07/12/1983US4393311 Method and apparatus for surface characterization and process control utilizing radiation from desorbed particles
07/12/1983US4392938 Radio frequency etch table with biased extension member
07/12/1983US4392932 Semiconductors etched with plasma
07/06/1983EP0082993A2 Method of selectively etching openings in a material of variable thickness
06/1983
06/07/1983US4387013 Plasma discharge, cryogenic pump
05/1983
05/24/1983US4384938 Reactive ion etching chamber
05/11/1983EP0078579A2 Method of using an electron beam
05/04/1983EP0078224A1 Inhibiting corrosion of aluminium metallization
05/04/1983EP0078161A2 Materials and methods for plasma etching of oxides and nitrides of silicon
05/03/1983US4381965 Multi-planar electrode plasma etching
04/1983
04/20/1983EP0076860A1 Process for dry-etching an aluminum alloy
04/20/1983EP0020776B1 Method of forming patterns
04/19/1983US4380488 Process and gas mixture for etching aluminum
03/1983
03/16/1983EP0073963A2 Inductively coupled discharge for plasma etching and resist stripping
03/15/1983US4376692 Dry etching device comprising a member for bringing a specimen into electrical contact with a grounded electrode
03/15/1983US4376672 With a fluorocarbon gas doped with carbon dioxide
03/01/1983US4375390 Thin film techniques for fabricating narrow track ferrite heads
1 ... 36 37 38 39 40 41 42 43 44 45 46 47 48