Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23F - Non-mechanical removal of metallic material from surfaces; Inhibiting corrosion of metallic material; Inhibiting incrustation in general; Multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass  or or class › C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or
Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769)
03/1983
03/01/1983US4375385 Plasma etching of aluminum
02/1983
02/23/1983EP0072618A2 A dry etching apparatus
02/15/1983US4373990 Dry etching aluminum
02/08/1983US4372807 Reduction of undercutting by inclusion of polymerizable gaseous hydrocarbon
02/08/1983US4372806 Plasma etching technique
01/1983
01/26/1983EP0070523A2 Device fabrication using gas-solid processes
01/25/1983US4370196 Anisotropic etching of aluminum
01/25/1983US4370195 Aluminum and alloys, nitrogen glow discharge
01/25/1983CA1140078A1 Method and apparatus for pretreating and depositing thin films on substrates
01/11/1983US4368220 Reactive ion etching
01/05/1983EP0068277A1 Method for passivating aluminum-based metallizations
01/05/1983EP0068155A2 Etch end point detector in reactive ion etching systems
01/04/1983US4367114 High speed plasma etching system
12/1982
12/08/1982EP0066088A2 Perforated anode for use in reactive ion etching apparatus
12/08/1982EP0066042A2 Methods of processing a silicon substrate for the formation of an integrated circuit therein
12/07/1982US4362596 Etch end point detector using gas flow changes
11/1982
11/30/1982CA1136525A1 Dry etching of metal film
11/24/1982EP0065085A2 A cathode for reactive ion etching
11/10/1982EP0064163A2 High speed plasma etching system
11/09/1982US4358686 Plasma reaction device
11/09/1982US4358338 End point detection method for physical etching process
11/02/1982US4357369 Method of plasma etching a substrate
10/1982
10/28/1982WO1982003636A1 Process for dry-etching aluminum or its alloy
10/27/1982EP0063493A2 Ion-processing method and apparatus and a product made thereby
10/26/1982US4356055 Process and device for monitoring the plasma etching of thin layer utilizing pressure changes in the plasma
10/13/1982EP0062302A2 End-point detection in plasma etching of phosphosilicate glass
10/05/1982US4352725 Dry etching device comprising an electrode for controlling etch rate
10/05/1982US4352716 Dry etching of copper patterns
09/1982
09/28/1982US4351714 Sputter-etching device
09/28/1982US4351712 Low energy ion beam oxidation process
09/28/1982US4351696 Passivation
09/21/1982US4350729 Patterned layer article and manufacturing method therefor
09/21/1982US4350578 Cathode for etching
09/21/1982US4350563 Dry etching of metal film
09/07/1982US4348577 High selectivity plasma etching method
08/1982
08/25/1982EP0058214A1 Method for increasing the resistance of a solid material surface against etching
08/17/1982US4344816 Forming a mask which does not west surface
08/11/1982EP0027142A4 Treating multilayer printed wiring boards.
08/10/1982US4343677 Semiconductor containing very large scale integrated circuits
08/03/1982CA1128896A1 Treating multilayer printed wiring boards
07/1982
07/27/1982US4341616 Portion of passageway of etchant has protective coating
07/27/1982US4341593 Plasma etching method for aluminum-based films
06/1982
06/30/1982EP0054663A1 Method for forming a copper based metal pattern
06/29/1982US4337132 Getter mask, resist mask
06/16/1982EP0053912A1 Process for oxidising a metal sample
06/01/1982CA1124622A1 Etching method employing radiation
05/1982
05/25/1982CA1124208A1 Device fabrication by plasma etching
05/25/1982CA1124207A1 Device fabrication by plasma etching with lessened loading effect
05/04/1982US4328068 Method for end point detection in a plasma etching process
04/1982
04/20/1982US4325984 Plasma passivation technique for the prevention of post-etch corrosion of plasma-etched aluminum films
04/14/1982EP0049272A1 Fabrication of microminiature devices using plasma etching of silicon with fluorine-containing gaseous compounds.
04/06/1982CA1121306A1 Device fabrication by plasma etching of aluminum rich surfaces
04/06/1982CA1121305A1 Device fabrication by plasma etching
03/1982
03/30/1982CA1120888A1 Glow discharge etching process for chromium
03/17/1982EP0047663A2 Microwave plasma etching
03/16/1982US4320191 Pattern-forming process
03/10/1982EP0047002A2 Plasma etching apparatus
02/1982
02/10/1982EP0045674A1 Process and apparatus for plasma-etching a thin layer
02/09/1982US4314874 Oxygen ion beam, dopes, plasma etching
02/02/1982US4313648 Optical filter for a photoelectric pickup tube in a television camera
02/02/1982CA1117400A1 Process and gas for removal of materials in plasma environment
01/1982
01/26/1982CA1116986A1 Method for dry-etching aluminum and aluminum alloys
01/12/1982US4310614 Method and apparatus for pretreating and depositing thin films on substrates
01/12/1982US4310380 Plasma etching of silicon
01/07/1982WO1982000075A1 Vacuum arc plasma device
12/1981
12/29/1981US4308089 Sputtering in an ammonia atmosphere followed by washing with a liquid
12/22/1981US4307283 Plasma etching apparatus II-conical-shaped projection
12/22/1981US4307176 On electron resists
12/01/1981US4303467 Process and gas for treatment of semiconductor devices
11/1981
11/03/1981US4298419 Dry etching apparatus
10/1981
10/27/1981US4297162 Convex shape
10/15/1981WO1981002947A1 Fabrication of microminiature devices using plasma etching of silicon and resultant products
10/13/1981EP0033345A4 High capacity etching apparatus.
09/1981
09/15/1981US4289188 Method and apparatus for monitoring etching
09/08/1981CA1108513A1 Etching method using noble gas halides
09/02/1981EP0034706A2 Process and apparatus for ion etching or for plasma C.V.D.
08/1981
08/12/1981EP0033345A1 High capacity etching apparatus.
08/11/1981US4283259 Method for maskless chemical and electrochemical machining
07/1981
07/07/1981US4277321 Plasma etching to remove adhesive smears from holes
06/1981
06/23/1981US4275286 Process and mask for ion beam etching of fine patterns
06/02/1981US4270999 Method and apparatus for gas feed control in a dry etching process
05/1981
05/12/1981US4267013 Method for dry-etching aluminum and aluminum alloys
05/05/1981US4265730 Surface treating apparatus utilizing plasma generated by microwave discharge
04/1981
04/29/1981EP0027578A1 Apparatus for radio frequency plasma etching provided with an improved electrode and method of etching using such an apparatus
04/22/1981EP0027142A1 Treating multilayer printed wiring boards.
04/21/1981US4263088 Method for process control of a plasma reaction
04/14/1981US4261808 Vacuum coating apparatus with continuous or intermittent transport means
04/08/1981EP0026337A2 Method of etching workpieces in a vacuum chamber
04/07/1981US4260649 Laser induced dissociative chemical gas phase processing of workpieces
03/1981
03/17/1981US4256534 Of aluminum using reactive boron trichloride-chlorine mixture
03/11/1981EP0024571A2 Selective metal removal in the presence of a metal silicide
03/03/1981US4253907 Anisotropic plasma etching
02/1981
02/19/1981WO1981000420A1 High capacity etching apparatus
02/10/1981US4250009 Energetic particle beam deposition system
02/04/1981EP0023429A2 Dry etching of metal film
02/03/1981USRE30505 Process and material for manufacturing semiconductor devices
02/03/1981US4248688 Ion milling of thin metal films
01/1981
01/27/1981US4247600 Metallized plastic camera housing and method
01/21/1981EP0022530A1 A patterned layer article and manufacturing method therefor
01/07/1981EP0020935A1 A dry method of etching and an apparatus using solid masking materials for etch rate modification
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