| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 11/19/1997 | EP0807968A2 Etching a metal silicide with HC1 and chlorine |
| 11/19/1997 | EP0807953A1 Inductively coupled RF plasma reactor having an overhead solenoidal antenna |
| 11/19/1997 | EP0807951A2 Magnetic neutral line discharged plasma type surface cleaning apparatus |
| 11/18/1997 | US5689263 Method of making a self-adhesive tag |
| 11/18/1997 | US5688382 Vacuum deposition with microwaves for targets, magnets on targets, ionizing material and sputtering |
| 11/12/1997 | EP0806128A1 Method of selectively removing a metallic layer from a non-metallic substrate |
| 11/12/1997 | CN1164761A Method for plasma etching in process for fabrication of semiconductor device |
| 11/11/1997 | US5686001 Variable polarity arc technology for the repair of coated articles |
| 11/11/1997 | US5685949 Plasma treatment apparatus and method |
| 11/11/1997 | US5685941 Inductively coupled plasma reactor with top electrode for enhancing plasma ignition |
| 11/11/1997 | US5685914 Focus ring for semiconductor wafer processing in a plasma reactor |
| 11/11/1997 | US5685913 Plasma processing apparatus and method |
| 11/06/1997 | DE19706763A1 Dry etching method for metal film |
| 11/04/1997 | US5683596 Method for etching compound solid state material |
| 11/04/1997 | US5683591 Process for producing surface micromechanical structures |
| 11/04/1997 | US5683548 Inductively coupled plasma reactor and process |
| 11/04/1997 | US5683539 Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling |
| 10/30/1997 | DE19715194A1 Semiconductor device production for producing angular velocity sensors |
| 10/29/1997 | EP0803897A2 Electrode for plasma etching |
| 10/29/1997 | EP0803896A2 Plasma processing system and protective member used for the same |
| 10/29/1997 | EP0803895A2 Electrode for plasma etching |
| 10/29/1997 | EP0802988A1 Method of forming diamond-like carbon film (dlc), dlc film formed thereby, use of the same, field emitter array and field emitter cathodes |
| 10/28/1997 | US5681418 Plasma processing with inductive coupling |
| 10/28/1997 | US5681393 Plasma processing apparatus |
| 10/22/1997 | EP0802560A1 Process and electromagnetically coupled plasma apparatus for etching oxides |
| 10/22/1997 | EP0801606A1 Cleaning method |
| 10/21/1997 | US5680013 Ceramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method of protecting such heated metal surfaces |
| 10/21/1997 | US5679204 Chemical reactor and gas supply pipes having aluminum alloy with magnesium, free of surface coatings; corrosion resistance, chemical resistance |
| 10/15/1997 | EP0801413A1 Inductively coupled plasma reactor with faraday-sputter shield |
| 10/15/1997 | EP0800438A1 Process equipment for razor blades with simultaneous or sequential deposition and etching capabilities |
| 10/14/1997 | US5677824 Electrostatic chuck with mechanism for lifting up the peripheral of a substrate |
| 10/14/1997 | US5677011 Premasking |
| 10/09/1997 | WO1997037059A1 Showerhead for uniform distribution of process gas |
| 10/09/1997 | WO1997037055A1 Plasma device and method utilizing azimuthally and axially uniform electric field |
| 10/08/1997 | EP0800200A2 Plasma applicators |
| 10/08/1997 | EP0799557A1 High frequency induction plasma method and apparatus |
| 10/08/1997 | CN1161476A Process for producing light-receiving member, electrophotographic apparatus having light-receiving member, and electrophotographic method using light-receiving member |
| 09/24/1997 | EP0796505A1 Plasma reactor and method of operating the same |
| 09/23/1997 | USRE35611 Liquid jet removal of plasma sprayed and sintered coatings |
| 09/23/1997 | US5670018 Isotropic silicon etch process that is highly selective to tungsten |
| 09/18/1997 | WO1997034315A1 Method and apparatus for the coating of workpieces |
| 09/17/1997 | EP0795896A2 Dry etching method |
| 09/17/1997 | EP0795890A2 Substrate coating assembly using a sputtering device |
| 09/17/1997 | EP0795889A2 Plasma-etching electrode plate |
| 09/17/1997 | EP0694208B1 Plasma shaping plug for control of sputter etching |
| 09/16/1997 | US5667700 Process for the fabrication of a structural and optical element |
| 09/15/1997 | CA2199878A1 Dry etching method |
| 09/10/1997 | EP0794553A2 High density plasma CVD and etching reactor |
| 09/09/1997 | US5666023 Device for producing a plasma, enabling microwave propagation and absorption zones to be dissociated having at least two parallel applicators defining a propogation zone and an exciter placed relative to the applicator |
| 09/03/1997 | EP0792947A2 Process using an inductively coupled plasma reactor |
| 09/03/1997 | EP0792571A1 Method and device for measuring ion flow in a plasma |
| 09/02/1997 | US5662819 Plasma processing method with controlled ion/radical ratio |
| 08/28/1997 | WO1997031132A1 RECOVERY OF Mo/Si MULTILAYER COATED OPTICAL SUBSTRATES |
| 08/28/1997 | WO1997026026A3 Surface modification of medical implants |
| 08/27/1997 | CN1158003A Plasma processing apparatus for dry etching of semiconductor wafers |
| 08/26/1997 | US5660673 Apparatus for dry etching |
| 08/21/1997 | WO1997030348A1 Ultrasonic sputtering target testing method |
| 08/20/1997 | EP0790643A2 Method of dry etching for patterning refractory metal layer improved in etching rate, anisotropy and selectivity to silicon oxide |
| 08/20/1997 | EP0790533A2 Process and apparatus for surface cleaning |
| 08/20/1997 | EP0640244B1 Plasma treatment apparatus and method in which a uniform electric field is induced by a dielectric window |
| 08/20/1997 | CN1157482A Electrostatic chuck |
| 08/19/1997 | US5659451 Studless thin film magnetic head and process for making the same |
| 08/19/1997 | US5658472 Method for producing deep vertical structures in silicon substrates |
| 08/19/1997 | US5658470 Diamond-like carbon for ion milling magnetic material |
| 08/19/1997 | US5658418 Apparatus for monitoring the dry etching of a dielectric film to a given thickness in an integrated circuit |
| 08/13/1997 | CN1156827A Aliasing sampler for plasma probe detection |
| 08/12/1997 | US5657192 Thin film magnetic head including crater for recessed structure and process for making the same |
| 08/12/1997 | US5656820 Ion generation device, ion irradiation device, and method of manufacturing a semiconductor device |
| 08/12/1997 | US5656811 Method for making specimen and apparatus thereof |
| 08/12/1997 | US5656123 Dual-frequency capacitively-coupled plasma reactor for materials processing |
| 08/12/1997 | US5656122 Shadow clamp |
| 08/12/1997 | US5655277 Vacuum apparatus for the surface treatment of workpieces |
| 08/06/1997 | EP0788160A2 Semiconductor device having a multi-layered wire structure |
| 08/06/1997 | EP0788147A2 Plasma process for etching multicomponent alloys |
| 08/06/1997 | EP0788138A2 Plasma reactors for processing substrates |
| 07/30/1997 | EP0786804A2 Apparatus and method for processing substrates |
| 07/30/1997 | EP0786794A2 Plasma reactors for processing semiconductor wafers |
| 07/30/1997 | EP0786304A1 Variable polarity arc technology for the repair of coated articles |
| 07/29/1997 | US5651825 Plasma generating apparatus and plasma processing apparatus |
| 07/24/1997 | WO1997026026A2 Surface modification of medical implants |
| 07/22/1997 | US5650032 Apparatus for producing an inductive plasma for plasma processes |
| 07/15/1997 | US5647912 Plasma processing apparatus |
| 07/09/1997 | EP0782483A1 Selective removal of material by irradiation |
| 07/08/1997 | US5645897 Process and device for surface-modification by physico-chemical reactions of gases or vapors on surfaces, using highly-charged ions |
| 07/08/1997 | US5645645 Method and apparatus for plasma treatment of a surface |
| 07/02/1997 | EP0781618A1 Highly efficient processing method based on high density radical reaction and using rotary electrode, apparatus therefor and rotating electrode used therefor |
| 07/01/1997 | US5643639 Plasma treatment method for treatment of a large-area work surface apparatus and methods |
| 07/01/1997 | US5643483 Ceramic heater made of fused silica glass having roughened surface |
| 07/01/1997 | US5643472 Selective removal of material by irradiation |
| 07/01/1997 | US5643394 Plasma reactor having gas distribution apparatus including disk surrounded by annular member with gap therebetween comprising elongate thin slit nozzle, spacers between disk and annular so gap is of equal width over circumference |
| 06/18/1997 | EP0779645A2 Plasma reactors for processing work pieces |
| 06/17/1997 | US5640020 Ion generation device, ion irradiation device, and method of manufacturing a semiconductor device |
| 06/17/1997 | US5639387 Method for etching crystalline bodies |
| 06/17/1997 | US5639357 Synchronous modulation bias sputter method and apparatus for complete planarization of metal films |
| 06/17/1997 | US5639341 Dry etching with less particles |
| 06/17/1997 | US5639309 Plasma processing apparatus adjusted for a batch-processing of a plurality of wafers with plasma gases |
| 06/17/1997 | US5639308 Plasma apparatus |
| 06/11/1997 | EP0710298B1 Method of ion bombarding a zinc or zinc alloy coated steel sheet before painting thereof |
| 06/10/1997 | US5637961 Concentric rings with different RF energies applied thereto |
| 06/10/1997 | US5637237 Method for hot wall reactive ion etching using a dielectric or metallic liner with temperature control to achieve process stability |