Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23F - Non-mechanical removal of metallic material from surfaces; Inhibiting corrosion of metallic material; Inhibiting incrustation in general; Multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass  or or class › C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or
Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769)
11/1996
11/27/1996EP0744767A2 Process of etching silicon nitride layer by using etching gas containing sulfur hexafluoride, hydrogen bromide and oxygen
11/27/1996EP0744659A1 A process for dry lithographic etching
11/27/1996EP0500620B1 Process for the production of metal microstructure bodies
11/26/1996US5578133 Dry cleaning process for cleaning a surface
11/20/1996EP0743377A1 Apparatus for chemical surface treatment of flat substrate using active gas
11/20/1996EP0743376A2 Light-receiving member, process for its production and its use in electrophotographic apparatus and method
11/20/1996EP0742848A1 Plasma treatment and apparatus in electronic device manufacture
11/19/1996US5575888 Sidewall passivation by oxidation during refractory-metal plasma etching
11/19/1996US5575887 Semiconductors
11/13/1996EP0742579A2 A method and apparatus for concentrating plasma on a substrate surface during processing
11/13/1996EP0741909A1 Methods for improving semiconductor processing
11/12/1996US5573979 Sloped storage node for a 3-D dram cell structure
11/12/1996US5573596 Arc suppression in a plasma processing system
11/06/1996EP0741406A2 Laser assisted plasma chemical etching apparatus and method
11/05/1996US5571577 Method and apparatus for plasma treatment of a surface
11/05/1996US5571374 Method of etching silicon carbide
10/1996
10/31/1996WO1995003435A3 Method of ion bombarding a zinc or zinc alloy coated steel sheet before painting thereof
10/30/1996EP0740334A2 Isotropic silicon etch process that is highly selective to tungsten
10/30/1996EP0740333A2 High speed ashing method
10/30/1996EP0740327A2 Ion beam processing apparatus
10/29/1996US5569627 Process for etching copper containing metallic film and for forming copper containing metallic wiring
10/23/1996CN1134036A Method of manufacturing semiconductor device
10/22/1996US5567333 Thin film magnetic head, process for production thereof
10/22/1996US5567255 Solid annular gas discharge electrode
10/17/1996WO1996032741A1 Method for water vapor enhanced charged-particle-beam machining
10/16/1996EP0737759A1 Corrosion preventing structure
10/16/1996EP0737256A1 Microwave plasma reactor
10/15/1996US5565738 Plasma processing apparatus which uses a uniquely shaped antenna to reduce the overall size of the apparatus with respect to the plasma chamber
10/15/1996US5565737 Aliasing sampler for plasma probe detection
10/15/1996US5565074 Plasma reactor with a segmented balanced electrode for sputtering process materials from a target surface
10/15/1996US5565036 Apparatus and method for igniting plasma in a process module
10/09/1996CN1132930A Plasma treating device
10/08/1996US5562801 Method of etching an oxide layer
10/08/1996US5562775 Plasma downstream processing
10/02/1996EP0735574A1 Improved slit valve door
10/02/1996EP0735565A1 Method and apparatus for monitoring the dry etching of a dielectric film to a given thickness
10/02/1996CN1132407A Surface treatment method and system
09/1996
09/25/1996EP0734048A1 Procedure and device for coating or cleaning a substrate
09/25/1996EP0733130A1 Apparatus for heating or cooling wafers
09/24/1996US5558722 Plasma processing apparatus
09/18/1996EP0732729A2 Plasma processing apparatus and plasma processing method
09/17/1996US5556714 Removing halogen residues leftover from plasma etching wiring patterns on aluminum coated wafers, reaction with hydrogen gas
09/17/1996US5556500 Vacuum chambers, gases, exhaust systems, counter electrodes, supports, power supply and focus rings
09/12/1996WO1996027899A1 Method for plasma etching an oxide/polycide structure
09/11/1996EP0730532A1 Topology induced plasma enhancement for etched uniformity improvement
09/10/1996US5554257 Cleaning or etching semiconductors by reacting gases in vacuum; explosion, combustion, projecting
09/04/1996EP0636285B1 Stabilizer for switch-mode powered rf plasma processing
08/1996
08/28/1996EP0729176A2 Process of damage etching the backside of a semiconductor wafer with protected wafer frontside
08/28/1996EP0729175A1 Method for producing deep vertical structures in silicon substrates
08/28/1996EP0728298A1 Method of producing at least one recess in a surface of a substrate, device for carrying out the said method and use of the product thus obtained
08/21/1996EP0727504A2 Plasma coating process for improved bonding of coatings on substrates
08/14/1996EP0726600A2 Method of forming a structure for DRAM and structure formed thereby
08/14/1996EP0726596A2 Plasma etching method
08/14/1996EP0726595A2 Method for etching compound solid state material
08/14/1996EP0726102A1 Method for deforming a plate and plate suitable therefor
08/14/1996EP0711455A4 Shadow clamp
08/14/1996CA2169327A1 Method for deforming a plate and a plate suitable therefor
08/13/1996US5545436 CVD method and apparatus for making silicon oxide films
07/1996
07/30/1996US5540824 Plasma reactor with multi-section RF coil and isolated conducting lid
07/30/1996US5540800 Inductively coupled high density plasma reactor for plasma assisted materials processing
07/17/1996EP0721514A1 Magnetically enhanced multiple capacitive plasma generation apparatus and related method
07/11/1996WO1996021243A1 Method of etching conductive lines without undercutting
07/10/1996EP0721205A2 Method of etching an oxide layer with simultaneous deposition of a polymer layer
07/09/1996US5534751 Plasma etching apparatus utilizing plasma confinement
07/09/1996US5534231 Low frequency inductive RF plasma reactor
07/09/1996US5534110 Clamping a wafer in a plasma reacion chamber
07/09/1996US5534109 Method for etching HgCdTe substrate
07/09/1996US5534107 Using fluorine in the presence of ultraviolet radiation to produce fluorine and chlorine or bromine as a second gas for etching
07/09/1996US5534066 Controlling and monitoring concentration of a gas for microelectronics
07/03/1996EP0720227A2 Electrical connection structure on an integrated circuit device comprising a plug with an enlarged head
07/02/1996US5532190 Plasma treatment method in electronic device manufacture
06/1996
06/27/1996WO1996019910A1 High frequency induction plasma method and apparatus
06/27/1996DE19546569A1 Solder connection method for large scale integration and power semiconductor
06/27/1996CA2207655A1 Plasma treatment apparatus and methods
06/26/1996EP0718876A2 Improved plasma etching method
06/26/1996EP0625218B1 Process and device for surface-modification by physico-chemical reactions of gases or vapours on surfaces, using highly-charged ions
06/20/1996WO1996019096A1 Method and device for plasma processing
06/18/1996US5528451 Erosion resistant electrostatic chuck
06/18/1996US5527394 Apparatus for plasma enhanced processing of substrates
06/13/1996WO1996018207A1 Plasma reactor and method of operating the same
06/05/1996EP0715335A1 System for processing a workpiece in a plasma
06/04/1996US5523955 System for characterizing AC properties of a processing plasma
05/1996
05/23/1996WO1996015545A1 Inductive plasma reactor
05/21/1996US5518572 Plasma processing system and method
05/15/1996EP0711455A1 Shadow clamp
05/15/1996EP0619847B1 Method of coating metal using low temperature plasma and electrodeposition
05/14/1996US5516732 Wafer processing machine vacuum front end method and apparatus
05/14/1996US5515986 Plasma treatment apparatus and method for operating same
05/14/1996US5515985 Chlorine etching
05/14/1996US5515984 Method for etching PT film
05/08/1996EP0711100A1 Plasma production device, allowing a dissociation between microwave propagation and absorption zones
05/08/1996EP0711029A2 Microstructure and method of forming the same
05/08/1996EP0710978A1 Erosion resistant electrostatic chuck
05/08/1996EP0710977A1 Surface treatment method and system
05/08/1996EP0710298A1 Method of ion bombarding a zinc or zinc alloy coated steel sheet before painting thereof
05/08/1996EP0710161A1 Post treatment of a coated substrate with a gas containing excited halogen to remove residues
05/07/1996US5513765 Plasma generating apparatus and method
05/01/1996EP0710055A1 Plasma reactors for processing semi-conductor wafers
05/01/1996EP0709875A1 A processing chamber gas distribution manifold
04/1996
04/30/1996US5512872 Permanent magnet arrangement for use in magnetron plasma processing
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