Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23F - Non-mechanical removal of metallic material from surfaces; Inhibiting corrosion of metallic material; Inhibiting incrustation in general; Multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass  or or class › C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or
Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769)
10/1998
10/07/1998EP0742848B1 Plasma treatment in electronic device manufacture
10/06/1998US5818040 Neutral particle beam irradiation apparatus
10/06/1998US5817578 Method of cleaning vacuum processing apparatus
09/1998
09/30/1998EP0867913A1 Plasma processing system and plasma processing method
09/29/1998US5814239 Gas-phase etching and regrowth method for Group III-nitride crystals
09/29/1998US5814238 Method for dry etching of transition metals
09/24/1998WO1998042011A1 Uv/halogen metals removal process
09/23/1998EP0865664A1 Process for anisotropic plasma etching of different substrates
09/23/1998CN1193812A Plasma treatment method and manufacturing method of semiconductor device
09/23/1998CN1193811A Method for manufacturing semiconductor device in which etching end point is monitored and multi-layer wiring structure formed by the same
09/22/1998US5811022 Inductive plasma reactor
09/22/1998US5810936 Plasma-inert cover and plasma cleaning process and apparatus employing same
09/16/1998EP0865079A2 A method for removing redeposited veils from etched platinum surfaces
09/16/1998EP0865074A2 Process of making doped polysilicon layers and structures and process of patterning layers and layer structures which contain polysilicon
09/16/1998EP0865070A1 Method and apparatus for sputter etch conditioning a ceramic body
09/09/1998EP0796505B1 Plasma reactor and method of operating the same
09/09/1998EP0647163B1 A plasma cleaning method for removing residues in a plasma treatment chamber
09/08/1998US5804923 Plasma processing apparatus having a protected microwave transmission window
09/02/1998CN1192265A Passive gas substrate thermal conditioning apparatus and method
09/01/1998US5801971 Form simulation device and its simulating method by the use of the Monte Carlo method
09/01/1998US5800620 Plasma treatment apparatus
08/1998
08/26/1998EP0860856A1 RF plasma reactor with hybrid conductor and multi-radius dome ceiling
08/26/1998EP0728298B1 Method of producing at least one recess in a surface of a substrate as bed for a diaphragm by dry etching
08/26/1998CN1191463A Plasma etching apparatus and its etching method
08/25/1998US5798016 Using protective coating selected from scandinium oxide, alumina or yttria, etchants used are fluorohydrocarbons
08/20/1998WO1998036449A1 Etching gas and cleaning gas
08/18/1998US5795493 Laser assisted plasma chemical etching method
08/12/1998EP0858103A2 Method for etching Pt film of semiconductor device
08/12/1998CN1190251A Method for etching Pt film of semiconductor device
08/11/1998US5792671 Method of manufacturing semiconductor device
08/11/1998US5792324 Sputtering with an inert gas, reactive etching to form a by-product and reactive sputtering; covering power; reduction of sputtering bias voltage; decreasing mechanical and electrostatic stresses on target
08/11/1998US5792275 Converting original film into film susceptible to aerosl cleaning, removing film with aerosol jet
08/05/1998EP0856877A1 Process for forming integrated circuits using multistep plasma etching
08/04/1998US5789867 Apparatus and method for igniting plasma in a process module
07/1998
07/29/1998EP0855739A1 Tapered dielectric etch process for moat etchback
07/29/1998EP0855734A1 Method of focused ion beam (FIB)etching enhanced with 1,2-diiodoethane
07/28/1998US5786886 Interference removal
07/28/1998US5785877 Additive gas with oxygen or water vapor prevents reaction with container walls
07/28/1998US5785797 Method and apparatus for monitoring etching by products
07/22/1998EP0854205A1 Work surface treatment method and work surface treatment apparatus
07/21/1998US5783102 Negative ion deductive source for etching high aspect ratio structures
07/21/1998US5783048 Thin film on substrate; using magnet
07/21/1998US5783036 Method for dry etching metal films having high melting points
07/21/1998US5783023 Gas injector for use in semiconductor etching process
07/15/1998EP0748260A4 Ion beam process for deposition of highly abrasion-resistant coatings
07/14/1998US5781693 Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween
07/14/1998US5779926 Plasma process for etching multicomponent alloys
07/14/1998US5778968 For stabilizing the temperature of semiconductor wafers
07/08/1998CN1186873A Distribution plate for reaction chamber with multiple gas inlets and separate mass flow control loops
07/07/1998US5777289 RF plasma reactor with hybrid conductor and multi-radius dome ceiling
07/02/1998WO1998028459A1 Precision etching and coating system
07/01/1998EP0851472A2 Method for etching oxide during the fabrication of an integrated circuit
07/01/1998EP0515577B1 Making and testing an integrated circuit using high density probe points
06/1998
06/30/1998US5772772 Plasma diffusion control apparatus
06/25/1998DE19715501C1 Method for structuring thin metal layers.
06/23/1998US5770861 Apparatus for working a specimen
06/23/1998US5770273 Plasma coating process for improved bonding of coatings on substrates
06/23/1998US5770100 Method of treating samples
06/23/1998US5770099 Maintaining high temperature of plasma chamber interior walls to prevent deposition of carbon-silicon-fluorine material after plasma shutoff
06/23/1998US5770000 Plasma chamber having cathode and anode spaced apart from impurity-containing material (i.e., semiconductor) so that emission of ion impurities from the material is induced by applied electrical potential
06/17/1998CN1185029A Method for dry-etching polycide film
06/16/1998US5767577 Method of solder bonding and power semiconductor device manufactured by the method
06/16/1998US5766498 Anisotropic etching method and apparatus
06/16/1998US5766494 Etching method and apparatus
06/10/1998EP0846191A1 Plasma device and method utilizing azimuthally and axially uniform electric field
06/09/1998US5762814 Plasma processing method and apparatus using plasma produced by microwaves
06/09/1998US5762750 Magnetic neutral line discharged plasma type surface cleaning apparatus
06/09/1998US5762714 Plasma guard for chamber equipped with electrostatic chuck
06/03/1998EP0845680A1 Making and testing an integrated circuit using high density probe points
06/02/1998US5759416 Ablation using lasers
06/02/1998US5759334 Plasma processing apparatus
05/1998
05/27/1998EP0844314A2 Distribution plate for a reaction chamber
05/26/1998US5756400 Method and apparatus for cleaning by-products from plasma chamber surfaces
05/26/1998US5756236 Fabrication of high resolution aluminum ablation masks
05/20/1998EP0843336A2 Plasma etching method and apparatus
05/19/1998US5753886 Plasma treatment apparatus and method
05/19/1998US5753524 Method of forming a plateau and a cover on the plateau in particular on a semiconductor substrate
05/13/1998EP0841838A1 Plasma treatment apparatus and plasma treatment method
05/13/1998CN1038349C Device and method for accurate etching and removal of thin film
05/12/1998US5750987 Ion beam processing apparatus
05/12/1998US5750208 Method for plasma downstream processing
05/12/1998US5749389 Purgeable connection for gas supply cabinet
05/06/1998EP0840370A1 Low temperature aluminum reflow for multilevel metallization
05/06/1998EP0839929A1 Method and apparatus for minimizing deposition in an exhaust line
05/06/1998CN1181172A Plasma processing device and method
05/05/1998US5748297 Endpoint detecting apparatus in a plasma etching system
05/05/1998US5747935 Method and apparatus for stabilizing switch-mode powered RF plasma processing
05/05/1998US5746875 Gas injection slit nozzle for a plasma process reactor
04/1998
04/29/1998EP0838848A1 Plasma etching of a metal layer comprising copper
04/29/1998EP0838843A2 Parallel-plate electrode plasma reactor having inductive antenna and adjustable radial distribution of plasma ion density
04/29/1998EP0838839A2 Plasma processing apparatus
04/28/1998US5744049 Radio frequency, semiconductor etching
04/23/1998DE19746425A1 Insulator etching method for semiconductor manufacture
04/21/1998US5741742 Formation of aluminum-alloy pattern
04/16/1998WO1998015972A1 Process for anisotropic plasma etching of different substrates
04/14/1998US5738752 System and method for plasma etching
04/09/1998DE19641288A1 Verfahren zum anisotropen Plasmaätzen verschiedener Substrate A method for anisotropic plasma etching of different substrates
04/07/1998US5736002 Methods and equipment for anisotropic, patterned conversion of copper into selectively removable compounds and for removal of same
04/07/1998US5735993 Plasma processing apparatus for dry etching of semiconductor wafers
04/02/1998WO1998014036A1 Fluorine assisted stripping and residue removal in sapphire downstream plasma asher
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