| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 01/11/1989 | EP0298204A2 Plasma etching with a large molecular mass inert gas |
| 01/10/1989 | US4797178 Carbon tetrafluoride and oxygen as a process gas |
| 12/28/1988 | EP0296419A2 Xenon enhanced plasma etch |
| 12/27/1988 | US4793897 Selective thin film etch process |
| 12/21/1988 | EP0295581A1 Process for etching aluminum in a plasma |
| 12/15/1988 | WO1988009830A1 Process for etching with gaseous plasma |
| 12/13/1988 | US4790903 Intermittent etching process |
| 12/07/1988 | EP0293879A1 Surface treatment method and apparatus |
| 11/30/1988 | CN88203683U Decoating device for gold-plated articles |
| 11/29/1988 | US4787957 Plasma |
| 11/23/1988 | EP0292390A1 Process for the anisotropic etching of III-V materials: use in surface treatment before epitaxial deposition |
| 11/22/1988 | US4786362 Surface treatment, different aluminum alloys |
| 11/22/1988 | US4786360 Anisotropic etch process for tungsten metallurgy |
| 11/22/1988 | US4786359 Xenon enhanced plasma etch |
| 11/02/1988 | EP0289131A1 Method of dry etching aluminum |
| 10/26/1988 | EP0287843A1 Process for manufacturing printed-circuit boards |
| 10/18/1988 | US4778583 Semiconductor etching process which produces oriented sloped walls |
| 10/05/1988 | EP0285066A1 Process for the attack of the surface of a piece of indium phosphide |
| 10/05/1988 | EP0284795A2 Anisotropic etch process for tungsten metallurgy |
| 10/05/1988 | CN88101465A Method of eliminating undesirable carbon product deposited on inside of reaction chamber for cvd |
| 09/22/1988 | WO1988007261A1 Molecular beam etching system and method |
| 09/22/1988 | WO1988006978A1 Method and apparatus for ion etching and deposition |
| 09/21/1988 | EP0283306A2 Selective thin film etch process |
| 09/20/1988 | US4772356 Gas treatment apparatus and method |
| 08/31/1988 | EP0280539A1 A method of removing undesired carbon deposits from the inside of a CVD reaction chamber |
| 08/30/1988 | US4767641 High frequency discharge between two electrodes |
| 08/30/1988 | US4767496 Measuring electrical resistance and erosion on substrate; transmission by pulse-code-modulation and electromagnetic radiation |
| 08/25/1988 | WO1988006194A1 Energy intensive surface reactions using a cluster beam |
| 08/23/1988 | US4766009 Locally irradiated area contacted with confined plating or etching solution |
| 08/10/1988 | EP0277495A1 Process for making decorative or informative patterns on objects made of metal sheets with one or possibly several coatings |
| 08/02/1988 | US4761219 Electrode pair opposed in a vaccum vessel and radio frequency power source |
| 07/20/1988 | EP0275188A2 Improved plasma stripper with multiple contact point cathode |
| 07/19/1988 | US4758304 Method and apparatus for ion etching and deposition |
| 07/06/1988 | EP0273251A1 Method for controlling and checking an etch-process made by a plasma with active ions, radicals and/or neutral particles specially used for very high integrated semiconductor circuits |
| 07/05/1988 | CA1238987A1 Interferometric methods for device fabrication |
| 06/22/1988 | EP0272142A2 Magnetic field enhanced plasma etch reactor |
| 06/22/1988 | EP0272140A2 TEOS based plasma enhanced chemical vapor deposition process for deposition of silicon dioxide films. |
| 06/14/1988 | US4750945 Hardening by localized melting and resolidification; controlled distribution; networks; |
| 05/11/1988 | EP0266604A2 Anode plate for a parallel-plate reactive ion etching reactor |
| 05/04/1988 | EP0265872A2 Simultaneously etching personality and select |
| 05/04/1988 | EP0265764A1 Method and apparatus for radiation induced dry chemical etching |
| 04/26/1988 | US4740268 Magnetically enhanced plasma system |
| 04/26/1988 | US4740267 Energy intensive surface reactions using a cluster beam |
| 04/19/1988 | US4738748 Plasma processor and method for IC fabrication |
| 04/12/1988 | CA1235234A1 Method of manufacturing a semiconductor device, in which a semiconductor substrate is subjected to a treatment in a reaction gas |
| 04/05/1988 | US4736087 For the dry plasma processing of a single workpiece |
| 04/05/1988 | US4735920 Covering substrate with silicon, plasma etching with halogenated hydrocarbon and oxygen |
| 03/29/1988 | US4734158 Molecular beam etching system and method |
| 02/24/1988 | EP0256938A2 Lithographic technique using laser for fabrication of electronic components and the like |
| 02/03/1988 | EP0255265A2 Plasma etching process and apparatus |
| 02/02/1988 | US4723062 Hydrogen containing silicon nitride film over area to be cut with a laser beam |
| 01/07/1988 | EP0251825A1 Gas treatment apparatus and method |
| 12/15/1987 | US4713141 Anisotropic plasma etching of tungsten |
| 12/09/1987 | EP0248274A2 Plasma surface treatment method and apparatus |
| 12/09/1987 | EP0221164A4 Method and apparatus for producing large volume magnetoplasmas. |
| 12/08/1987 | US4711698 Silicon oxide thin film etching process |
| 12/02/1987 | EP0247603A2 A method for stripping a photo resist on an aluminium alloy |
| 12/01/1987 | CA1229816A1 Impregnation of aluminum interconnects with copper |
| 11/25/1987 | EP0246514A2 Deep trench etching of single crystal silicon |
| 11/17/1987 | US4707722 Semiconductors, nickel, radiation, absorbers |
| 10/06/1987 | US4698130 Using pulsed pressure cycle and halide gas |
| 09/16/1987 | EP0237448A1 Work pieces made of aluminium or its alloys, and of which at least one face presents at least one zone region resistant to wear |
| 09/09/1987 | EP0235770A2 Device for the plasma processing of substrates in a high frequency excited plasma discharge |
| 09/01/1987 | US4691078 Aluminum circuit to be disconnected and method of cutting the same |
| 09/01/1987 | CA1226376A1 Electron beam enhanced surface modification for making highly resolved structures |
| 08/18/1987 | US4687539 Dye lasers |
| 08/04/1987 | US4684437 Selective metal etching in metal/polymer structures |
| 08/04/1987 | US4684436 Method of simultaneously etching personality and select |
| 07/14/1987 | US4680084 Interferometric methods and apparatus for device fabrication |
| 07/08/1987 | EP0227903A2 A method of etching through a metal layer in a metal/polymer layered structure |
| 07/07/1987 | US4678540 Plasma etch process |
| 07/07/1987 | US4678539 Silicon nitride |
| 06/16/1987 | US4673456 Semiconductor etching or stripping |
| 05/13/1987 | EP0221164A1 Method and apparatus for producing large volume magnetoplasmas. |
| 05/12/1987 | US4664769 Photoelectric enhanced plasma glow discharge system and method including radiation means |
| 05/07/1987 | DE3635647A1 Plasma reactor for etching printed circuit boards or the like |
| 05/06/1987 | EP0220481A2 Photoelectric enhanced plasma glow discharge system |
| 04/29/1987 | EP0219826A2 Vacuum processing system |
| 04/29/1987 | EP0219697A2 Laser induced halogen gas etching of metal substrates |
| 04/01/1987 | EP0216603A2 Microwave apparatus for generating plasma afterglows |
| 04/01/1987 | EP0216157A2 A method of depositing metal contact regions on a silicon substrate |
| 03/31/1987 | CA1219975A1 Plasma etching reactor with reduced plasma potential |
| 03/24/1987 | US4652316 Production of grain oriented steel |
| 03/12/1987 | DE3629054A1 Apparatus for plasma etching of printed circuit boards or the like |
| 03/11/1987 | EP0213922A2 Planar magnetron sputtering device with combined circumferential and radial movement of magnetic fields |
| 03/03/1987 | US4647338 Method of manufacturing a semiconductor device, in which a semiconductor substrate is subjected to a treatment in a reaction gas |
| 02/24/1987 | US4645895 Method and apparatus for surface-treating workpieces |
| 02/17/1987 | US4643799 Method of dry etching |
| 02/17/1987 | US4643627 Vacuum transfer device |
| 02/10/1987 | US4642171 Phototreating apparatus |
| 02/04/1987 | EP0210858A2 Reactive ion etching deposition apparatus and method of using it |
| 02/03/1987 | CA1217532A1 Ion beam machining device |
| 01/21/1987 | EP0209307A1 Cleaning of metal articles |
| 01/20/1987 | US4637853 Hollow cathode enhanced plasma for high rate reactive ion etching and deposition |
| 01/20/1987 | US4637342 Vacuum processing apparatus |
| 01/07/1987 | EP0207767A2 Pulsed plasma apparatus and process |
| 01/06/1987 | US4634826 Method for producing electric circuits in a thin layer, the tool to implement the method, and products obtained therefrom |
| 01/06/1987 | US4634495 Dry etching process |
| 12/30/1986 | US4633051 Stable conductive elements for direct exposure to reactive environments |
| 12/30/1986 | EP0205874A2 Sputter device |