| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 01/11/1995 | EP0633713A1 Plasma reactor for a deposition and etching method |
| 01/10/1995 | US5380397 Method of treating samples |
| 01/04/1995 | EP0631839A1 Procedure for the realization of an aluminium layer structure on a substrate of alumium nitride |
| 01/04/1995 | EP0631711A1 System for characterizing ac properties of a processing plasma |
| 01/03/1995 | US5378653 Method of forming aluminum based pattern |
| 01/03/1995 | US5378509 Method for etching round templates |
| 12/29/1994 | CA2126807A1 Process for producing aluminized structures on an aluminium nitride substrate |
| 12/28/1994 | CN1027142C Liquid jet removal of plasam sprayed and sintered |
| 12/27/1994 | US5376228 Dry etching method |
| 12/27/1994 | US5376224 Method and apparatus for non-contact plasma polishing and smoothing of uniformly thinned substrates |
| 12/27/1994 | US5376223 Using hydrogen and argon plasma and specific electron cyclotron resonance parameters in oxygen-free environment |
| 12/27/1994 | US5376180 Apparatus for holding disk-shaped substrates in the vacuum chamber of a coating or etching apparatus |
| 12/22/1994 | WO1994029494A1 Microwave plasma reactor |
| 12/20/1994 | US5374327 Monitoring, adjustment using light emmission |
| 12/15/1994 | DE4319089A1 Method for tungsten contact hole filling by full-surface tungsten deposition with reduced layer thickness and back-etching with inverse loading effect |
| 12/13/1994 | US5372674 Electrode for use in a plasma assisted chemical etching process |
| 12/13/1994 | US5372673 Method for processing a layer of material while using insitu monitoring and control |
| 12/08/1994 | WO1994028426A1 Process for producing surface micromechanical structures |
| 12/06/1994 | US5370779 Electron cyclotron resonance etching or coating |
| 12/01/1994 | DE4416525A1 Process for increasing the wear resistance of workpiece surfaces and a workpiece treated by this process |
| 12/01/1994 | DE4317722A1 Process for the anisotropic etching of an aluminium-containing layer |
| 12/01/1994 | DE4317623A1 Process and apparatus for the anisotropic plasma etching of substrates |
| 11/30/1994 | EP0411061B1 Fe-Mn-Al-C ALLOYS AND THEIR TREATMENT |
| 11/30/1994 | EP0331718B1 Multiple electrode plasma reactor power distribution system |
| 11/29/1994 | US5369336 Plasma generating device |
| 11/29/1994 | US5368710 Method of treating an article with a plasma apparatus in which a uniform electric field is induced by a dielectric window |
| 11/29/1994 | US5368684 Etching method for a silicon-containing layer using hydrogen bromide |
| 11/23/1994 | EP0625218A1 Process and device for surface-modification by physico-chemical reactions of gases or vapours on surfaces, using highly-charged ions. |
| 11/22/1994 | US5367139 Methods and apparatus for contamination control in plasma processing |
| 11/22/1994 | US5366590 Dry etching method |
| 11/17/1994 | EP0624897A1 Electrode for use in a plasma assisted chemical etching process |
| 11/10/1994 | DE4412915A1 Plasma treatment plant and method of its operation |
| 11/10/1994 | DE4412902A1 Method for increasing the deposition rate, method for reducing the dust density in a plasma discharge chamber, and plasma chamber |
| 11/08/1994 | US5362526 Plasma-enhanced CVD process using TEOS for depositing silicon oxide |
| 11/08/1994 | US5362358 Dry etching apparatus and method of forming a via hole in an interlayer insulator using same |
| 11/08/1994 | US5362350 Copper wires |
| 11/02/1994 | EP0622835A1 Heterojunction compound semiconductor device and method of manufacturing the same |
| 11/02/1994 | EP0622477A1 Etching aluminum and its alloys using HC1, C1-containing etchant and N2 |
| 10/27/1994 | WO1994024697A1 PLASMA ETCH PROCESS AND TiSix LAYERS MADE USING THE PROCESS |
| 10/27/1994 | WO1994024692A1 Plasma shaping plug for control of sputter etching |
| 10/27/1994 | CA2159494A1 Plasma shaping plug for control of sputter etching |
| 10/20/1994 | DE4312014A1 Device for coating and/or etching substrates in a vacuum chamber |
| 10/19/1994 | EP0586579A4 Window for microwave plasma processing device. |
| 10/18/1994 | US5356514 Reactive etching in chlorine-containing gas while heated post-treating and purified water treatment |
| 10/18/1994 | US5356478 Using gas mixture of oxygen and chlorine |
| 10/11/1994 | US5354715 Exposing heated substrate surface to plasma of ozone, oxygen, tetraethyl orthosilicate in chamber at specified pressure |
| 10/11/1994 | US5354421 Dry etching method |
| 09/28/1994 | EP0617140A1 Substrate body of hard alloy with diamond coating of excellent adhesive strength |
| 09/27/1994 | US5350499 Method of producing microscopic structure |
| 09/27/1994 | US5350488 Process for etching high copper content aluminum films |
| 09/27/1994 | CA2058508C Method and apparatus for recovering substance adhered to object to be processed |
| 09/20/1994 | US5348616 Method for patterning a mold |
| 09/20/1994 | US5347696 Method for manufacturing a multi-layer capacitor |
| 09/14/1994 | EP0615147A1 Low reset voltage process for DMD |
| 09/13/1994 | US5346578 Integrated circuit fabrication |
| 09/06/1994 | US5344539 Electrochemical fine processing apparatus |
| 09/06/1994 | US5344526 Method for etching diamond |
| 09/06/1994 | CA1331866C Method and apparatus for ion etching and deposition |
| 09/01/1994 | DE4305750A1 Device for retaining flat, circular disc-shaped substrates in the vacuum chamber of a deposition or etching system |
| 09/01/1994 | DE4305748A1 Appliance for deposition onto, and/or etching of, substrates in a vacuum chamber |
| 08/30/1994 | US5342477 Forming from transparent material; depositing highly conductive material; etching |
| 08/18/1994 | WO1994018697A1 Microstructures and single mask, single-crystal process for fabrication thereof |
| 08/10/1994 | EP0609237A1 Harmonic and subharmonic isolator for plasma discharge |
| 08/09/1994 | US5336365 Polysilicon etching method |
| 08/09/1994 | US5336355 Methods and apparatus for confinement of a plasma etch region for precision shaping of surfaces of substances and films |
| 08/03/1994 | EP0608931A2 Reactive ion etching of indium tin oxide (ITO) |
| 07/27/1994 | EP0607797A1 An apparatus and method for enhanced inductive coupling to plasmas with reduced sputter contamination |
| 07/27/1994 | EP0607787A2 Device for coating or etching of substrates |
| 07/27/1994 | EP0607415A1 Hollow-anode glow discharge apparatus |
| 07/26/1994 | US5332441 Apparatus for gettering of particles during plasma processing |
| 07/21/1994 | WO1994016117A1 Device for the vacuum-plasma treatment of articles |
| 07/20/1994 | EP0606607A1 Method of manufacturing a multilayer capacitor |
| 07/20/1994 | CN1025508C Copper etch process using haldes |
| 07/19/1994 | US5330616 Forming a carbon film on a substrate, masking and etching by electric power using an oxygen containing etchant |
| 07/13/1994 | EP0606097A1 A permanent magnet arrangement for use in magnetron plasma processing |
| 07/12/1994 | US5328515 Chemical treatment plasma apparatus for forming a ribbon-like plasma |
| 07/06/1994 | EP0605123A2 Method for integrated circuit fabrication including linewidth control during etching |
| 07/05/1994 | US5326727 Method for integrated circuit fabrication including linewidth control during etching |
| 07/05/1994 | US5326431 Dry etching method utilizing (SN)x polymer mask |
| 07/05/1994 | US5326429 Process for making studless thin film magnetic head |
| 06/30/1994 | DE4340952A1 Cleaning process for tools, etc. prior to coating deposition |
| 06/23/1994 | WO1994014185A1 Wafer processing machine vacuum front end method and apparatus |
| 06/23/1994 | CA2150473A1 Wafer processing machine vacuum front end method and apparatus |
| 06/22/1994 | EP0602506A1 Plasma pressure control assembly |
| 06/22/1994 | CN1088272A New device and method for accurate etching and removal of thin film |
| 06/21/1994 | US5322985 Method for boring small holes in substrate material |
| 06/15/1994 | EP0601656A1 Device for the treatment of substrates at low temperature |
| 06/15/1994 | EP0601468A1 Process and electromagnetically coupled planar plasma apparatus for etching oxides |
| 06/14/1994 | US5320707 Dry etching method |
| 06/08/1994 | EP0600365A1 Electrode for use in plasma etching |
| 06/07/1994 | US5318662 Masking copper layer, introducing halogen radical, activating with non-pulsed light, converting copper to halide product, washing to remove |
| 06/03/1994 | CA2110414A1 Electrode for use in plasma etching |
| 05/25/1994 | EP0598128A1 Plasma processing apparatus |
| 05/18/1994 | EP0597792A2 Device and method for accurate etching and removal of thin film |
| 05/17/1994 | US5312778 Etching |
| 05/17/1994 | US5312529 Method of coating metal using low temperature plasma and electrodeposition |
| 05/17/1994 | US5312519 Method of cleaning a charged beam apparatus |
| 05/11/1994 | EP0596593A1 Plasma etch process |
| 05/11/1994 | EP0596551A1 Induction plasma source |
| 05/11/1994 | EP0417067B1 Energy intensive surface reactions using a cluster beam |