| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 07/29/1992 | EP0496681A1 Device for the distribution of microwave energy for excitation of a plasma |
| 07/29/1992 | EP0496564A1 Method and apparatus for etching diamond with plasma |
| 07/29/1992 | EP0359777B1 Process for etching with gaseous plasma |
| 07/22/1992 | EP0495524A1 System for processing a workpiece in a plasma and a process for generating such plasma |
| 07/07/1992 | US5127987 Patterning, dry etching, conveying in vacuum; semiconductor wafers; corrosion resistance |
| 07/01/1992 | EP0493278A1 Method of cleaning the surface of a substrate by a plasma |
| 07/01/1992 | EP0493122A2 Method and apparatus for recovering substance adhered to object to be processed |
| 06/30/1992 | US5126007 Masking with photoresist, exposure, reactive ion etching with mixture of oxygen and carbon tetrafluoride |
| 06/17/1992 | EP0490320A2 A method for producing a diffraction grating |
| 06/16/1992 | US5122251 High density plasma deposition and etching apparatus |
| 06/10/1992 | CN1016972B Method of eliminating undesirable carbon product deposited on inside of reaction chamber for cvd |
| 06/09/1992 | US5120395 Method for making a gas turbine engine component with a textured surface |
| 06/03/1992 | EP0488540A1 Method for etching a pattern in a layer of gold |
| 06/02/1992 | US5118383 Masking; chlorine gas etching at low pressure |
| 05/26/1992 | US5116782 Method and apparatus for processing a fine pattern |
| 05/12/1992 | US5112645 Vapor deposition on semiconductor substrate by photochemical reaction of gas |
| 05/05/1992 | US5110407 Surface fabricating device |
| 04/29/1992 | EP0482541A1 Large area cathodic device with equalized consumption |
| 04/28/1992 | US5108778 Semiconductors |
| 04/28/1992 | US5108542 Selective etching method for tungsten and tungsten alloys |
| 04/27/1992 | CA2054238A1 Large surface cathode arrangement of uniform consumption |
| 04/21/1992 | US5105761 Diffusion plasma-assisted chemical treatment apparatus |
| 04/16/1992 | WO1992005967A1 Method and apparatus for multi-colour laser engraving |
| 04/14/1992 | US5103557 Making and testing an integrated circuit using high density probe points |
| 04/07/1992 | US5103073 Device for laser treatment of an object |
| 04/07/1992 | US5102687 Process for surface treatment by plasma of a substrate supported by an electrode |
| 04/01/1992 | EP0478174A2 Silicon dioxide deposition method and apparatus |
| 04/01/1992 | EP0477906A2 Plasma processing apparatus using plasma produced by microwaves |
| 03/31/1992 | US5100505 Process for etching semiconductor devices |
| 03/31/1992 | US5100504 Method of cleaning silicon surface |
| 03/31/1992 | US5100499 Copper dry etch process using organic and amine radicals |
| 03/25/1992 | EP0476856A1 Method of forming electrode pattern |
| 03/25/1992 | EP0476479A2 Method of producing microscopic structure |
| 03/18/1992 | CN1015919B Treatment process for metallic anode reclamation |
| 03/05/1992 | DE4128780A1 Fine structure formation appts. - for plasma etching of substrates or layers comprising vacuum chamber, gas supply, plasma generator, holder, etc. |
| 03/05/1992 | DE4128779A1 Fine structure prodn. appts. for plasma etching of substrates - comprises vacuum chamber, reaction gas supply, plasma generator andsample holder for polyimide etching |
| 02/18/1992 | US5089442 Silicon dioxide deposition method using a magnetic field and both sputter deposition and plasma-enhanced cvd |
| 02/18/1992 | US5088697 Heat treating apparatus |
| 02/12/1992 | EP0470580A2 Plasma processing apparatus |
| 02/11/1992 | US5087857 Plasma generating apparatus and method using modulation system |
| 02/11/1992 | US5087341 Dry etching apparatus and method |
| 02/04/1992 | US5085727 Plasma etch apparatus with conductive coating on inner metal surfaces of chamber to provide protection from chemical corrosion |
| 02/04/1992 | CA1295215C Cleaning of metal articles |
| 01/29/1992 | EP0468071A1 Method of producing micromechanical sensors for the AFM/STM/MFM profilometry and micromechanical AFM/STM/MFM sensor head |
| 01/28/1992 | US5084125 Continuous processing, cleaning, removing deposits |
| 01/22/1992 | EP0467391A2 Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency-wave is applied |
| 01/22/1992 | EP0467046A2 Device for etching or crating |
| 01/21/1992 | US5082524 Addition of silicon tetrabromide to halogenated plasmas as a technique for minimizing photoresist deterioration during the etching of metal layers |
| 01/02/1992 | EP0463137A1 Method and device for treating a substrate with a plasma |
| 12/27/1991 | EP0462730A1 Method and apparatus for forming planar integrated circuit layers |
| 12/24/1991 | US5075256 Process for removing deposits from backside and end edge of semiconductor wafer while preventing removal of materials from front surface of wafer |
| 12/24/1991 | US5074955 Process for the anisotropic etching of a iii-v material and application to the surface treatment for epitaxial growth |
| 12/11/1991 | EP0390871A4 Plasma pinch system and method of using same |
| 12/04/1991 | EP0459137A2 Device for coating of substrates |
| 12/04/1991 | CN1015005B Production of metallic structures on nonconductors |
| 11/28/1991 | WO1991018412A1 Process and device for monitoring and controlling etching operations |
| 11/28/1991 | WO1991018283A1 Interference removal |
| 11/27/1991 | EP0458324A2 Multi-channel plasma discharge endpoint detection system and method |
| 11/27/1991 | EP0458205A2 Plasma etch apparatus with conductive coating on inner metal surfaces of chamber to provide protection from chemical corrosion and method of forming same |
| 11/21/1991 | DE4016211A1 Verfahren zur ueberwachung und steuerung eines aetzvorgangs und vorrichtung hierfuer Method for monitoring and controlling of etching and device for here |
| 11/14/1991 | WO1991017562A1 Plasma reaction chamber having conductive diamond-coated surfaces |
| 11/12/1991 | US5064522 Feed through for application of hf energy |
| 11/05/1991 | US5063330 Plasma reactor |
| 10/30/1991 | EP0453780A2 Apparatus for contamination control in processing apparatus containing voltage driven electrode |
| 10/23/1991 | EP0452493A1 Feeder for process gas |
| 10/17/1991 | WO1991015609A1 Case toughening of aluminum-lithium forgings |
| 10/16/1991 | EP0451351A1 Method for direct heating of a substrate holder |
| 10/15/1991 | US5057184 Scanning substrate surface to cause melting, bubble formation then collapse |
| 10/15/1991 | CA1290720C Production of metallic structures on inorganic non-conductors |
| 10/09/1991 | EP0450313A2 Laser etching of materials in liquids |
| 10/08/1991 | CA1290224C Method of etching aluminum alloys in semiconductor wafers |
| 10/01/1991 | US5053318 Coating substrate with photoresist, electroless plating of catalyst, exposure to radiation, development |
| 09/18/1991 | EP0446657A1 Method for preparing a shield to reduce particles in a physical vapor deposition chamber |
| 09/10/1991 | US5047115 Inorganic fluorine, oxidizing, and inert gas mixture |
| 09/03/1991 | US5045125 Case toughening of aluminum-lithium forgings |
| 08/22/1991 | WO1991012706A1 Making and testing an integrated circuit using high density probe points |
| 08/21/1991 | EP0442488A2 Improved process for rie etching silicon dioxide |
| 08/20/1991 | US5041188 Protective masking with silver or gold; preserves electrical properties |
| 08/14/1991 | EP0441368A1 Method and device for removing excess material from a sputtering chamber |
| 08/13/1991 | US5039388 Plasma forming electrode and method of using the same |
| 08/13/1991 | US5038713 Microwave plasma treating apparatus |
| 08/07/1991 | EP0439727A2 Process to make grooves in silicon substrates for high density integrated circuits |
| 08/07/1991 | EP0305411B1 Molecular beam etching system and method |
| 07/30/1991 | US5035768 Novel etch back process for tungsten contact/via filling |
| 07/25/1991 | WO1991011018A1 Method and device for treating a substrate with a plasma |
| 07/23/1991 | CA1286801C Etch back detection |
| 07/17/1991 | EP0436812A1 Copper etch process and printed circuit formed thereby |
| 07/16/1991 | US5032243 Method and apparatus for forming or modifying cutting edges |
| 07/16/1991 | US5032205 Plasma etching apparatus with surface magnetic fields |
| 07/11/1991 | WO1991010341A1 A low frequency inductive rf plasma reactor |
| 07/10/1991 | EP0436363A1 Regeneration of plasma initiator |
| 07/03/1991 | CN1052706A Copper etch process using halides |
| 06/28/1991 | CA2031926A1 Regenerating a plasma using oxygen |
| 06/27/1991 | WO1991009150A1 Method of and device for plasma treatment |
| 06/26/1991 | EP0433983A2 Copper etch process using halides |
| 06/19/1991 | CN1052264A Liquid jet removal of plasma sprayed and sintered |
| 06/18/1991 | US5024724 Dry-etching method |
| 06/18/1991 | US5024722 Process for fabricating conductors used for integrated circuit connections and the like |
| 06/13/1991 | DE3940820A1 Reactive ion etching - of aluminium alloy and titanium-tungsten layers using gas contg. chlorine and silicon tetra:chloride |
| 06/11/1991 | US5022979 Noncontamination, durability |