| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 01/07/1981 | EP0020776A1 Method of forming patterns |
| 01/06/1981 | US4243506 Plasma-etching apparatus |
| 01/06/1981 | US4243476 Bombardment of solid source by ion beam to form reactive gas |
| 12/30/1980 | CA1092727A1 Method for fabricating ultra-narrow metallic lines |
| 12/10/1980 | EP0019915A1 Method for preventing the corrosion of Al and Al alloys |
| 12/10/1980 | EP0019725A1 Deposition method using an energetic particle beam |
| 11/26/1980 | EP0019370A1 Plasma reactor apparatus and process for the plasma etching of a workpiece in such a reactor apparatus |
| 11/26/1980 | EP0019208A1 Method of making a passive electrooptic display device |
| 11/26/1980 | EP0019064A1 Chemical or electrochemical process for selectively removing material |
| 10/30/1980 | WO1980002353A1 Treating multilayer printed wiring boards |
| 10/28/1980 | US4230553 Lamination, metals, dielectrics |
| 10/21/1980 | US4229247 Glow discharge etching process for chromium |
| 10/15/1980 | EP0017143A1 Microwave plasma etching apparatus |
| 10/07/1980 | US4226666 Etching method employing radiation and noble gas halide |
| 10/07/1980 | US4226665 Device fabrication by plasma etching |
| 09/17/1980 | EP0015403A1 Process for reactive ion-etching of silicon |
| 09/16/1980 | US4222838 Radio frequency discharge, electrically insulating surface |
| 08/06/1980 | EP0013711A2 Process for the etching of chrome |
| 07/29/1980 | US4214946 No mask undercutting |
| 07/08/1980 | US4211601 Device fabrication by plasma etching |
| 06/25/1980 | EP0012327A1 Lithographic reactive ion etching method |
| 06/24/1980 | US4209357 Plasma reactor apparatus |
| 06/17/1980 | US4208241 Device fabrication by plasma etching |
| 06/17/1980 | US4208240 With coherent light to produce change in reflected radiation, response signals determine end-point |
| 06/10/1980 | US4207138 Mercury vapor leaching from microelectronic substrates |
| 06/10/1980 | US4207137 Method of controlling a plasma etching process by monitoring the impedance changes of the RF power |
| 05/20/1980 | US4203800 Reactive ion etching process for metals |
| 05/15/1980 | WO1980001020A1 Method of forming patterns |
| 04/16/1980 | EP0009558A1 Method and device for modifying a surface by means of a plasma |
| 04/15/1980 | US4198261 Method for end point detection during plasma etching |
| 03/05/1980 | EP0008348A1 A method of etching a surface |
| 03/05/1980 | EP0008347A1 A method of etching a surface |
| 02/26/1980 | US4190488 Etching method using noble gas halides |
| 02/12/1980 | CA1071579A1 End point control in plasma etching |
| 01/22/1980 | CA1070264A1 Process for the production of etched structures in a surface of a solid body by ionic etching |
| 01/15/1980 | US4183780 Photon enhanced reactive ion etching |
| 01/08/1980 | US4182646 Process of etching with plasma etch gas |
| 08/07/1979 | CA1059882A1 Gaseous plasma etching of aluminum and aluminum oxide |
| 07/31/1979 | CA1059465A1 Vacuum sputtering apparatus and method |
| 07/11/1979 | EP0002798A2 Process for the removal of a metallic layer from a semiconductor body by reactive ion etching |
| 04/17/1979 | US4149923 Apparatus for the treatment of wafer materials by plasma reaction |
| 02/13/1979 | US4139409 Laser engraved metal relief process |
| 01/02/1979 | US4132614 Etching by sputtering from an intermetallic target to form negative metallic ions which produce etching of a juxtaposed substrate |
| 09/26/1978 | US4116791 Method and apparatus for forming a deposit by means of ion plating using a magnetron cathode target as source of coating material |
| 07/04/1978 | US4098917 Method of providing a patterned metal layer on a substrate employing metal mask and ion milling |
| 06/27/1978 | US4097636 Metallized device |
| 06/13/1978 | US4094722 Semiconductors |
| 06/06/1978 | US4093503 Method for fabricating ultra-narrow metallic lines |
| 05/30/1978 | US4092442 Integrated circuits |
| 05/30/1978 | US4092210 Controlling rate of disintegration of masking layer by adding a reactive gas |
| 02/14/1978 | US4073669 Plasma etching |
| 01/24/1978 | US4070264 R. F. sputtering method and apparatus |
| 01/03/1978 | US4066491 Method of simultaneously etching multiple tapered viaducts in semiconductor material |
| 12/20/1977 | US4064030 Process for surface treating molded articles of fluorine resins |
| 12/06/1977 | US4061814 Method and masking structure for configurating thin layers |
| 11/08/1977 | US4057460 Plasma etching process |
| 09/27/1977 | US4051382 Activated gas reaction apparatus |
| 08/30/1977 | US4045318 Ultraviolet radiation, sputter etching |
| 06/21/1977 | US4030967 Gaseous plasma etching of aluminum and aluminum oxide |
| 05/31/1977 | US4026742 Plasma etching process for making a microcircuit device |
| 04/05/1977 | US4016062 Ion milling |
| 01/18/1977 | US4004044 Polysiloxanes, sputter etching |
| 11/30/1976 | US3994793 Masking, bromine, chlorine, hydrogen chloride, carbon tetrachloride, aluminum chloride |
| 10/05/1976 | US3984301 Sputter-etching method employing fluorohalogenohydrocarbon etching gas and a planar electrode for a glow discharge |
| 09/21/1976 | US3981791 Vacuum sputtering apparatus |
| 04/20/1976 | US3951709 "cold" plasma etching |
| 03/23/1976 | US3945902 Sputter etching a crystalline body to clean and deposit an oxide |
| 03/09/1976 | US3943047 Selective removal of material by sputter etching |
| 02/24/1976 | US3940506 Selective plasma etching and deposition |