| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 08/11/1993 | EP0515577A4 Making and testing an integrated circuit using high density probe points |
| 08/10/1993 | US5234527 Liquid level detecting device and a processing apparatus |
| 08/10/1993 | US5234526 Window for microwave plasma processing device |
| 08/10/1993 | US5234511 Rapidly solidified case toughend aluminum-lithium components |
| 08/04/1993 | EP0554079A2 A reactive gas for plasma assisted chemical etching and method for stable plasma etching of substrates over edges |
| 08/04/1993 | EP0553967A1 Semiconductor wafer dry cleaning method and apparatus using a light source |
| 08/04/1993 | EP0553704A1 Radio frequency induction plasma processing system utilizing a uniform field coil |
| 08/04/1993 | EP0553469A2 Plasma-etching process for the rapid and damage-free cleaning of reaction chambers and principally in the deposition or etching of layers on silicon substrats |
| 07/22/1993 | WO1993014237A1 Method of passivating treatment for prevention of corrosion of aluminium and aluminium alloy films after plasma etching |
| 07/20/1993 | US5228206 Cluster tool dry cleaning system |
| 07/13/1993 | US5226967 Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber |
| 07/07/1993 | EP0550186A1 Method to determine tool paths for thinning and correcting errors in thickness profiles of films |
| 07/07/1993 | EP0550058A2 A programmable multizone gas injector for single-wafer semiconductor processing equipment |
| 06/29/1993 | US5223687 Contacting the metal electrode with the surface of a substrate and moving the area where the electrode contacts the film; film of indium oxide or indium tin oxide |
| 06/29/1993 | US5223085 Etching with plasma formed by electron cyclotron resonance from mixture of halogen and hydrogen or hydrogen halide gas |
| 06/22/1993 | US5221427 Plasma generating device and method of plasma processing |
| 06/16/1993 | EP0546921A1 Gas photonanograph for fabrication and optical analysis of nanometer scale patterns |
| 06/16/1993 | EP0546852A1 Methods and apparatus for generating a plasma for "downstream" rapid shaping of surfaces of substrates and films |
| 06/16/1993 | EP0546842A1 Methods and apparatus for confinement of a plasma etch region for precision shaping of surfaces of substances |
| 06/01/1993 | US5216329 Device for distributing a microwave energy for exciting a plasma |
| 06/01/1993 | US5215864 Removing the dye materials and restore the color receptivity by a focussed laser beam |
| 05/27/1993 | WO1993010286A1 PRODUCTION OF CLEAN, WELL-ORDERED CdTe SURFACES USING LASER ABLATION |
| 05/27/1993 | WO1993010283A1 Method of coating metal using low temperature plasma and electrodeposition |
| 05/27/1993 | CA2123085A1 Method of coating metal using low temperature plasma and electrodeposition |
| 05/25/1993 | US5213658 Plasma processing method |
| 05/18/1993 | US5211825 Plasma processing apparatus and the method of the same |
| 05/12/1993 | EP0541160A1 Method of manufacturing a semiconductor device whereby contact windows are provided in an insulating layer comprising silicon nitride in two etching steps |
| 05/11/1993 | US5210055 Method for the plasma treatment of semiconductor devices |
| 05/11/1993 | CA1317644C Large area microwave plasma apparatus |
| 05/05/1993 | EP0540230A2 Method for forming patterned tungsten layers |
| 05/04/1993 | US5208644 Interference removal |
| 05/04/1993 | US5207868 Etching process for films of aluminum or its alloys |
| 04/27/1993 | US5205857 Placing object in enclosed atmosphere, heating and evacuating to evaporate and recover adhered substance |
| 04/20/1993 | US5203981 Vacuum-treatment apparatus |
| 04/20/1993 | US5203980 Large surface cathode arrangement of uniform consumption |
| 04/08/1993 | DE4132564A1 Plasma etching with microwave pre-excitation of the etching gas for mfr. of integrated semiconductor circuits - involves using excited, electrically neutral gas particles which are produced by plasma discharge and enter an etching reactor |
| 04/08/1993 | DE4132559A1 Plasma etching in-situ cleaning process for vacuum deposition chambers - with separate plasma discharge excitation of etch gas and admission of activated etch gas to chamber |
| 04/07/1993 | EP0535568A1 Metal strip surface cleaning apparatus |
| 04/07/1993 | EP0535540A2 Etching process for aluminium-containing coatings |
| 04/06/1993 | US5200028 Using two gaseous mixtures having different ratios of hydrogen bromide gas and a fluorine radical-donating gas; precise detection of end-point |
| 04/06/1993 | US5200017 Sample processing method and apparatus |
| 03/30/1993 | US5198724 Plasma processing method and plasma generating device |
| 03/18/1993 | WO1993005630A1 Harmonic and subharmonic isolator for plasma discharge |
| 03/16/1993 | US5194118 Masking and etching with an oxygen compound |
| 03/10/1993 | EP0530236A1 Process and device for monitoring and controlling etching operations. |
| 03/09/1993 | US5192610 Corrosion-resistant protective coating on aluminum substrate and method of forming same |
| 03/09/1993 | US5192393 Crystallization of silicon by neutralization and activation |
| 02/24/1993 | EP0528655A2 Dry-etching method and apparatus |
| 02/23/1993 | US5188702 A condcutive layer is laminated in a dielectric film having fine through-holes theirin, etching conductive layer to form dents, filling holes and dents with a metal by plating to form bump-like projection, removing conductive film by etching |
| 02/18/1993 | WO1993003590A1 Plasma processing apparatus |
| 02/17/1993 | EP0527290A1 Device for implementing a thin film process for the treatment of large area substrates |
| 02/17/1993 | EP0527133A1 Plasma reaction chamber having conductive diamond-coated surfaces. |
| 01/26/1993 | US5182495 Plasma processing method and apparatus using electron cyclotron resonance |
| 01/26/1993 | US5182000 Method of coating metal using low temperature plasma and electrodeposition |
| 01/26/1993 | US5181986 Plasma generator, microwaves, resonance |
| 01/21/1993 | WO1993001571A1 Antipilferage markers |
| 01/21/1993 | WO1993001328A1 Rapid-switching rotating disk reactor |
| 01/20/1993 | EP0523077A1 Case toughening of aluminum-lithium forgings |
| 01/13/1993 | EP0522532A2 Method for etching aluminium or aluminiums-alloys in the manufacture of semi-conductor devices |
| 01/13/1993 | EP0522296A2 Plasma processing system and method |
| 01/12/1993 | US5178738 Ion-beam sputtering apparatus and method for operating the same |
| 01/05/1993 | US5176792 Method for forming patterned tungsten layers |
| 01/05/1993 | US5176499 Photoetched cooling slots for diffusion bonded airfoils |
| 12/30/1992 | EP0520714A1 Photoetched cooling slots for diffusion bonded airfoils |
| 12/30/1992 | EP0520519A1 Plasma processing reactor and process for plasma etching |
| 12/29/1992 | US5175472 Power monitor of RF plasma |
| 12/25/1992 | CA2068149A1 Photoetched cooling slots for diffusion bonded airfoils |
| 12/23/1992 | WO1992022920A1 Device for processing substrates within a plasma |
| 12/10/1992 | WO1992022085A1 Window for microwave plasma processing device |
| 12/10/1992 | DE4118973A1 Vorrichtung zur plasmaunterstuetzten bearbeitung von substraten A plasma assisted processing of substrates |
| 12/09/1992 | EP0517165A1 Dry etching method utilizing (SN)x polymer mask |
| 12/02/1992 | EP0516480A2 Method for surface treatment with extra-low-speed ion beam |
| 12/02/1992 | EP0515577A1 Making and testing an integrated circuit using high density probe points |
| 12/01/1992 | US5167721 Liquid jet removal of plasma sprayed and sintered |
| 11/17/1992 | US5164331 Trifluoromethane and oxygen |
| 11/17/1992 | US5164017 Method for cleaning reactors used for gas-phase processing of workpieces |
| 11/11/1992 | EP0512677A2 Plasma treatment method and apparatus |
| 11/10/1992 | US5162633 Microwave-excited plasma processing apparatus |
| 11/10/1992 | US5162078 Method of producing microstructered metallic bodies |
| 11/03/1992 | US5160595 Arc-magnetron and the method of coating |
| 11/03/1992 | US5160402 Multi-channel plasma discharge endpoint detection method |
| 10/28/1992 | EP0510340A1 Method for removing material from a surface in a vacuum chamber |
| 10/21/1992 | EP0509342A2 Manufacturing process for wedge shaped structures |
| 10/14/1992 | EP0507885A1 A low frequency inductive rf plasma reactor |
| 09/30/1992 | EP0506304A1 Method and apparatus for hot-dipping steel strip |
| 09/15/1992 | US5147500 Dry etching method |
| 09/15/1992 | US5147497 Vacuum chamer having a supporting table which generates plasma, a temperature detecting means, a metal container in a direct current floating state, filter for removing high frequency component of signal and a temperature measuring mean |
| 09/15/1992 | US5147493 Plasma generating apparatus |
| 09/09/1992 | EP0502523A2 Method for anisotropic dry etching of aluminium as well as aluminium alloys containing path levels in integrated semiconductor circuits |
| 09/09/1992 | EP0502356A2 Photo-stimulated removal of trace metals |
| 09/08/1992 | US5145649 Apparatus for cleaning an optical element for use with a radiation beam |
| 09/08/1992 | CA1307356C Plasma pinch system and method of using same |
| 09/02/1992 | EP0501278A1 Method to produce masking |
| 09/02/1992 | EP0500620A1 Process for the production of metal microstructure bodies. |
| 09/01/1992 | US5143866 Dry etching method for refractory metals, refractory metal silicides, and other refractory metal compounds |
| 08/20/1992 | WO1992014258A1 High density plasma deposition and etching apparatus |
| 08/19/1992 | EP0411061A4 Fe-mn-al-c alloys and their treatment |
| 08/12/1992 | EP0498209A1 Dry etching method of a silicon based material, without use of a chlorofluorocarbon gas |
| 08/11/1992 | US5137610 Rotatably mounted cathode nested in Teflon spacers; quartz plate covering prevents sputtering of spacers |
| 07/30/1992 | DE4201661A1 Semiconductor integrated circuit mfr. - uses a deposited carbon@ film as intermediate layer to improve the accuracy of reproducing sub-micron dimensions |