| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 10/04/2000 | CN1268922A Method for forming a silicon layer on a surface |
| 10/03/2000 | US6127273 Process for anisotropic plasma etching of different substrates |
| 10/03/2000 | US6127271 Process for dry etching and vacuum treatment reactor |
| 10/03/2000 | US6125788 Plasma reactor with enhanced plasma uniformity by gas addition, reduced chamber diameter and reduced RF wafer pedestal diameter |
| 09/27/2000 | CN1267905A Dry etching method |
| 09/26/2000 | US6124211 Cleaning method |
| 09/26/2000 | CA2182247C Apparatus and method for treatment of substrate surface using plasma focused below orifice leading from chamber into substrate containing area |
| 09/20/2000 | EP1036210A1 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 09/13/2000 | EP1035757A1 Substrate electrode plasma generator and substance/material processing method |
| 09/13/2000 | EP1035570A2 Dry etching method |
| 09/13/2000 | CN1266463A Method and apparatus for treating metal surfaces by dry process |
| 09/12/2000 | US6118122 Ion beam working apparatus |
| 08/30/2000 | EP0586579B1 Microwave plasma processing device |
| 08/29/2000 | US6109208 Plasma generating apparatus with multiple microwave introducing means |
| 08/24/2000 | WO2000049651A1 Improved masking methods and etching sequences for patterning electrodes of high density ram capacitors |
| 08/24/2000 | WO2000049650A1 Iridium etching methods for anisotrophic profile |
| 08/24/2000 | WO2000049203A1 Method for processing metallic parts with an electric arc and apparatus for realising the same |
| 08/24/2000 | WO2000049202A2 Improved etching methods for anisotropic platinum profile |
| 08/23/2000 | EP0748518B1 Method of etching conductive lines without undercutting |
| 08/22/2000 | US6105534 Apparatus for plasma jet treatment of substrates |
| 08/17/2000 | DE19904305A1 Convex structure formation involves changing etching removal rate of base material as function of etching time depending on base material |
| 08/16/2000 | EP0730532B1 Topology induced plasma enhancement for etched uniformity improvement |
| 08/15/2000 | US6104487 Plasma etching with fast endpoint detector |
| 08/15/2000 | US6103630 Adding SF6 gas to improve metal undercut for hardmask metal etching |
| 08/15/2000 | US6103318 Physical deposition, e.g. evaporation, of a mask layer of silicon on a silica substrate, the mask having a thickness of >1 mu m; bombarding the mask layer with ions while depositing to reduce a compressive or tensile stress; etching |
| 08/15/2000 | US6101970 Plasma processing apparatus |
| 08/08/2000 | US6099687 Etching system |
| 08/01/2000 | US6096232 Dry etching system and dry etching method using plasma |
| 08/01/2000 | US6096161 Dry etching apparatus having means for preventing micro-arcing |
| 08/01/2000 | US6096160 Helicon wave plasma processing apparatus |
| 07/27/2000 | WO2000044037A1 Method of in-situ etching a hard mask and a metal layer in a single etcher |
| 07/27/2000 | DE19901002A1 Verfahren zum Strukturieren einer Schicht A method for patterning a layer |
| 07/25/2000 | US6092786 Gate valve |
| 07/20/2000 | WO2000042646A1 Method for structuring a layer |
| 07/19/2000 | CN1054656C Method of cleaning vacuum processing apparatus |
| 07/18/2000 | US6090719 Dry etching method for multilayer film |
| 07/18/2000 | US6090718 Dry etching method for semiconductor substrate |
| 07/18/2000 | US6090210 Multi-zone gas flow control in a process chamber |
| 07/18/2000 | US6089472 Shower head |
| 07/18/2000 | US6089181 Plasma processing apparatus |
| 07/12/2000 | EP0782483B1 Selective removal of material by irradiation |
| 07/11/2000 | US6088096 End-point detector for plasma etcher |
| 07/11/2000 | US6087265 Method for removing redeposited veils from etched platinum |
| 07/11/2000 | US6086777 Tantalum barrier metal removal by using CF4 /o2 plasma dry etch |
| 07/06/2000 | WO2000038935A1 Local vectorial particle cleaning |
| 07/05/2000 | EP0902961B1 Method for treating articles with a plasma jet |
| 07/04/2000 | US6084356 Plasma processing apparatus with a dielectric body in the waveguide |
| 07/04/2000 | US6083413 Hydrosilation; using halogen compound and organosilicon compound |
| 07/04/2000 | US6083412 Plasma etch apparatus with heated scavenging surfaces |
| 07/04/2000 | US6082374 Fluorine assisted stripping and residue removal in sapphire downstream plasma asher |
| 07/04/2000 | US6082295 Plasma etching chamber for manufacturing semiconductor devices |
| 07/04/2000 | US6082293 Plasma source |
| 06/27/2000 | US6080679 High-speed soft evacuation process and system |
| 06/27/2000 | US6080271 Plasma source for generating inductively coupled, plate-shaped plasma, having magnetically permeable core |
| 06/27/2000 | US6079357 Plasma processing apparatus |
| 06/20/2000 | US6077788 Method and apparatus for processing samples |
| 06/20/2000 | US6077787 Method for radiofrequency wave etching |
| 06/20/2000 | US6077777 Method for forming wires of semiconductor device |
| 06/20/2000 | US6077450 Method for etching platinum |
| 06/20/2000 | US6076483 Plasma processing apparatus using a partition panel |
| 06/13/2000 | US6074519 Plasma etching apparatus having a sealing member coupling an upper electrode to an etching chamber |
| 06/13/2000 | US6073636 Dry etcher apparatus and method of preventing residual reaction gas from condensing on wafers after etching |
| 06/08/2000 | WO2000033370A1 Dry etching |
| 06/08/2000 | WO1999067443A9 Methods for etching an aluminum-containing layer |
| 06/07/2000 | EP1006761A1 Plasma processor |
| 06/06/2000 | US6072147 Plasma processing system |
| 06/06/2000 | US6071829 Method of fabricating semiconductor components |
| 06/06/2000 | US6070552 Substrate processing apparatus |
| 05/31/2000 | EP1004136A1 Plasma processing apparatus |
| 05/30/2000 | US6069092 Etching silicon dioxide surface within heated chemical reactor using fluorohydrocarbon plasma generated by applying a radio frequency power to the lower electrode supporting the substrate |
| 05/30/2000 | US6069035 Techniques for etching a transition metal-containing layer |
| 05/25/2000 | WO2000029640A1 Method for residue-free anisotropic etching of aluminum and its alloys |
| 05/24/2000 | EP0832407A4 Passive gas substrate thermal conditioning apparatus and method |
| 05/16/2000 | US6063236 Vacuum processing system and method of removing film deposited on inner face of vacuum vessel in the vacuum processing system |
| 05/10/2000 | EP0999472A2 Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof |
| 05/09/2000 | US6060836 Plasma generating apparatus and ion source using the same |
| 05/03/2000 | EP0996974A1 Patterned copper etch for micron and submicron features, using enhanced physical bombardment |
| 05/03/2000 | EP0996770A1 Method and apparatus for treating metal surfaces by dry process |
| 04/27/2000 | WO2000024048A1 Method of etching patterned layers useful as masking during subsequent etching or for damascene structures |
| 04/27/2000 | WO2000024046A1 Plasma etching method |
| 04/25/2000 | US6054391 Masking with titanium |
| 04/25/2000 | US6054013 Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density |
| 04/18/2000 | US6051866 Microstructures and single mask, single-crystal process for fabrication thereof |
| 04/18/2000 | US6051150 Plasma etching method and method of manufacturing liquid crystal display panel |
| 04/11/2000 | US6049661 Method of simulating shape of sample after surface reaction processing, apparatus and recording medium |
| 04/06/2000 | WO2000019491A1 Method for cleaning a process chamber |
| 04/06/2000 | WO2000019483A1 Vacuum treatment chamber and method for treating surfaces |
| 04/04/2000 | US6046546 Stabilizer for switch-mode powered RF plasma |
| 04/04/2000 | US6046500 Method of controlling the spread of an adhesive on a circuitized organic substrate |
| 04/04/2000 | US6045667 Process and system for the treatment of substrates using ions from a low-voltage arc discharge |
| 04/04/2000 | US6045665 Efficiently prevents peeling of deposits formed on the surface of the inner walls of the thin-film formation apparatus and suppresses particle production without contaminating the inside of the thin-film forming device |
| 04/04/2000 | US6045618 Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment |
| 04/04/2000 | US6044850 Forming photoresist ad wiring |
| 04/04/2000 | US6044534 Semiconductor device manufacturing machine and method for manufacturing a semiconductor device by using the same manufacturing machine |
| 03/30/2000 | WO2000018198A1 Substrate electrode plasma generator and substance/material processing method |
| 03/29/2000 | EP0989595A2 Device for processing a surface of a substrate |
| 03/28/2000 | US6043608 Plasma processing apparatus |
| 03/28/2000 | US6041733 Plasma processing apparatus protected from discharges in association with secondary potentials |
| 03/28/2000 | CA2030936C Liquid jet removal of plasma sprayed and sintered coatings |
| 03/22/2000 | EP0986461A1 Method of forming a silicon layer on a surface |