| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 06/04/1997 | EP0777267A1 Oxide etch process with high selectivity to nitride suitable for use on surfaces of uneven topography |
| 06/04/1997 | EP0777258A2 Self-cleaning plasma processing reactor |
| 05/29/1997 | WO1997019580A1 Method of selectively removing a metallic layer from a non-metallic substrate |
| 05/28/1997 | EP0776032A2 Plasma etching method |
| 05/27/1997 | US5632821 Post treatment method for in-situ cleaning |
| 05/22/1997 | DE19646700A1 Vacuum treatment chamber |
| 05/21/1997 | EP0774778A2 Plasma etch with trifluoroacetic acid and derivatives |
| 05/21/1997 | EP0774772A1 Methods for physically etching silicon electrically conducting surfaces |
| 05/21/1997 | CN1150327A System and method for plasma etching |
| 05/21/1997 | CN1150240A Gas recovery unit |
| 05/14/1997 | EP0568696B1 PRODUCTION OF CLEAN, WELL-ORDERED CdTe SURFACES USING LASER ABLATION |
| 05/09/1997 | WO1997016580A1 Method of forming diamond-like carbon film (dlc), dlc film formed thereby, use of the same, field emitter array and field emitter cathodes |
| 05/07/1997 | EP0772222A1 Microwave plasma process apparatus and microwave plasma process method |
| 05/07/1997 | EP0771469A1 Method of and apparatus for microwave-plasma production |
| 05/06/1997 | US5627105 Plasma etch process and TiSix layers made using the process |
| 05/06/1997 | US5626714 Method for detecting etching endpoint and etching apparatus and etching system using the method thereof |
| 04/29/1997 | US5624583 Method of manufacturing semiconductor device |
| 04/24/1997 | WO1997015074A1 Method and device for detecting end point of plasma treatment, method and device for manufacturing semiconductor device, and semiconductor device |
| 04/24/1997 | WO1997015069A1 Metals removal process |
| 04/23/1997 | CN1148275A Thin film piezoelectric arrays with enhanced coupling and fabrication methods |
| 04/23/1997 | CN1148105A Plasma etching apparatus utilizing plasma confinement |
| 04/23/1997 | CN1148104A Cleaning system and method |
| 04/22/1997 | US5622635 Method for enhanced inductive coupling to plasmas with reduced sputter contamination |
| 04/22/1997 | US5622606 Gas inlet arrangement |
| 04/17/1997 | WO1997013646A1 Cleaning method |
| 04/16/1997 | EP0768702A1 Gas injection slit nozzle for a plasma process reactor |
| 04/16/1997 | EP0710161A4 Post treatment of a coated substrate with a gas containing excited halogen to remove residues |
| 04/16/1997 | EP0588992B1 Device for processing substrates within a plasma |
| 04/09/1997 | EP0767490A1 Method of etching silicon carbide |
| 04/09/1997 | EP0570484B1 System for generating a high density plasma |
| 04/09/1997 | CN1147026A Method of cleaning vacuum processing apparatus |
| 04/02/1997 | EP0733130A4 Apparatus for heating or cooling wafers |
| 04/01/1997 | US5616225 Use of multiple anodes in a magnetron for improving the uniformity of its plasma |
| 03/27/1997 | WO1997011587A1 Method and device for measuring ion flow in a plasma |
| 03/27/1997 | DE19614524A1 Plasma installation |
| 03/26/1997 | EP0764968A2 Method for radiofrequency wave etching |
| 03/25/1997 | US5614055 High density plasma CVD and etching reactor |
| 03/25/1997 | US5614026 Showerhead for uniform distribution of process gas |
| 03/25/1997 | US5614025 Plasma processing apparatus |
| 03/12/1997 | EP0762486A2 Etching of nitride crystal |
| 03/12/1997 | EP0762470A2 Apparatus and method for temperature control in plasma processing |
| 03/11/1997 | US5609690 Vacuum plasma processing apparatus and method |
| 03/06/1997 | WO1997004476A3 Method and apparatus for semiconductor etching and stripping |
| 03/04/1997 | US5607602 High-rate dry-etch of indium and tin oxides by hydrogen and halogen radicals such as derived from HCl gas |
| 03/04/1997 | US5607599 Boron trichloride and chlorine |
| 03/04/1997 | US5607542 Generation of plasma for reactive ion etching |
| 02/25/1997 | US5605637 Adjustable dc bias control in a plasma reactor |
| 02/25/1997 | US5605601 Method of manufacturing semiconductor device |
| 02/25/1997 | US5605600 Etch profile shaping through wafer temperature control |
| 02/25/1997 | US5605599 Method of generating plasma having high ion density for substrate processing operation |
| 02/25/1997 | US5605576 High frequency magnetron plasma apparatus |
| 02/19/1997 | EP0758691A1 Process for the chemical beam etching of a substrate |
| 02/18/1997 | US5604081 Method for producing a surface structure with reliefs |
| 02/12/1997 | EP0757918A2 Gas recovery unit |
| 02/11/1997 | US5602079 Method and apparatus for fabricating superconductor device |
| 02/11/1997 | CA2183099A1 Process for the chemical spray etching of a substrat |
| 02/06/1997 | WO1997004476A2 Method and apparatus for semiconductor etching and stripping |
| 02/05/1997 | EP0757374A1 Etching electrode and manufacturing process thereof |
| 02/05/1997 | EP0757291A2 Processing method and processing apparatus using fast atom beam |
| 01/30/1997 | WO1997002917A1 Highly efficient processing method based on high density radical reaction and using rotary electrode, apparatus therefor and rotating electrode used therefor |
| 01/29/1997 | CN1141501A High speed ashing method |
| 01/28/1997 | US5597439 Process gas inlet and distribution passages |
| 01/21/1997 | US5595627 Plasma etching method |
| 01/15/1997 | EP0753881A1 Plasma etching apparatus utilising plasma confinement |
| 01/15/1997 | EP0753876A2 Aliasing sampler for plasma probe detection |
| 01/15/1997 | EP0721514A4 Magnetically enhanced multiple capacitive plasma generation apparatus and related method |
| 01/07/1997 | US5591493 Structure and method for incorporating an inductively coupled plasma source in a plasma processing chamber |
| 01/07/1997 | US5591302 Forming cupric nitrate to be sublimed; semiconductors |
| 01/07/1997 | US5591301 Resonating a radiofrequency currents in coils of silicon with chlorine precursor in vacuum |
| 01/02/1997 | EP0751554A2 Method of in-situ cleaning of deposits from sputter clean chambers |
| 01/02/1997 | EP0751552A1 Sample processing apparatus |
| 01/02/1997 | EP0730532A4 Topology induced plasma enhancement for etched uniformity improvement |
| 01/02/1997 | EP0683921A4 Microstructures and single mask, single-crystal process for fabrication thereof. |
| 01/02/1997 | DE19522004A1 Method for producing partly movable micro structure(s) |
| 12/31/1996 | US5590051 Process simulation method, process simulator and chemical vapor deposition system employing the same |
| 12/31/1996 | US5588827 Passive gas substrate thermal conditioning apparatus and method |
| 12/27/1996 | EP0750375A1 Method for etching a mesa with a contact layer on a semiconductor substrate |
| 12/27/1996 | EP0737256A4 Microwave plasma reactor |
| 12/25/1996 | CN1138746A Treatment unit of gas heat-transfer plasma |
| 12/24/1996 | US5587039 Plasma etch equipment |
| 12/23/1996 | CA2179765A1 Process for producing a plate and for said plate a cover protected by a semiconductor substrate |
| 12/19/1996 | WO1996041109A1 Passive gas substrate thermal conditioning apparatus and method |
| 12/19/1996 | WO1996040472A1 Process equipment for razor blades with simultaneous or sequential deposition and etching capabilities |
| 12/18/1996 | EP0749153A1 Cleaning system and method |
| 12/18/1996 | EP0749149A2 Plasma processing apparatus |
| 12/18/1996 | EP0749148A2 Plasma processing apparatus |
| 12/18/1996 | EP0748518A1 Method of etching conductive lines without undercutting |
| 12/18/1996 | EP0748260A1 Ion beam process for deposition of highly abrasion-resistant coatings |
| 12/17/1996 | CA2104071C Device and method for accurate etching and removal of thin film |
| 12/11/1996 | EP0747928A1 Electrode designs for controlling uniformity profiles in plasma processing reactors |
| 12/11/1996 | EP0747141A2 Eliminating a film by chemical transformation and removing the converted film by means of aerosol cleaning |
| 12/10/1996 | US5582679 Enhanced metal etch process |
| 12/05/1996 | WO1996038311A1 Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure |
| 12/05/1996 | CA2222620A1 Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure |
| 12/04/1996 | EP0746017A2 Method of forming connection hole |
| 12/04/1996 | EP0746014A2 Method for dry-etching |
| 12/04/1996 | CN1137296A Apparatus for heating or cooling wafers |
| 12/03/1996 | US5580385 Structure and method for incorporating an inductively coupled plasma source in a plasma processing chamber |
| 12/03/1996 | US5579718 Slit valve door |
| 11/28/1996 | DE19518185A1 Micro-structuring of workpiece surface with agglomerate beam |