Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769)
03/2015
03/05/2015US20150059980 Plasma processing apparatus
02/2015
02/24/2015US8961805 Dry etching method for metal film
02/05/2015US20150037972 Methods and apparatuses for atomic layer cleaning of contacts and vias
02/04/2015CN104325597A 一种金属树脂复合体及其制备方法 One metal-resin composite and its preparation method
01/2015
01/28/2015CN101604630B 等离子蚀刻处理方法以及等离子蚀刻处理装置 Plasma etching processing method and a plasma etching processing apparatus
01/15/2015US20150017810 Dual chamber plasma etcher with ion accelerator
01/15/2015US20150014152 Selective sputtering for pattern transfer
01/07/2015CN104271804A 铝的电子束抛光 Electron beam polished aluminum
12/2014
12/30/2014US8921740 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support
12/24/2014CN104233305A 一种离子束刻蚀工件台 An ion beam etching workpiece table
12/11/2014US20140363978 Electron Beam-Induced Etching
12/10/2014CN104195576A 干蚀刻清洗剥离防护液 Dry etching cleaning liquid stripping protection
12/09/2014US8906196 Plasma processing apparatus and method for controlling the same
12/04/2014US20140353142 Substrate processing apparatus, etching method of metal film, and manufacturing method of magnetoresistive effect element
11/2014
11/27/2014US20140345803 Method and apparatus for stable plasma processing
11/25/2014US8894828 FIB process for selective and clean etching of copper
11/13/2014US20140332499 Endoluminal implantable surfaces, stents, and grafts and method of making the same
11/13/2014US20140332372 Plasma etching method
11/13/2014US20140332251 Metal Wiring and Method of Manufacturing the Same, and Metal Wiring Substrate and Method of Manufacturing the Same
11/06/2014US20140326698 Interconnect structure and method of making same
11/06/2014US20140326594 Extended lifetime ion source
11/04/2014US8879274 Method of manufacturing an electrical component
10/2014
10/28/2014US8871064 Electromagnet array in a sputter reactor
10/09/2014US20140299465 Solid surface smoothing method
10/02/2014WO2014159888A1 Methods of etching films comprising transition metals
09/2014
09/18/2014US20140263180 Apparatus and methods for pulsed photo-excited deposition and etch
09/18/2014US20140262755 Uv-assisted reactive ion etch for copper
09/01/2014CA2844084A1 Apparatus and process for nickel plating and sealing
07/2014
07/29/2014US8791513 Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same
07/23/2014CN102299068B 基板处理方法 The substrate processing method
07/16/2014CN103924192A 一种具有纳米微腔结构的金属银薄膜的制备方法 A method for preparing a thin film of metallic silver nanoparticles having a cavity structure
07/01/2014US8764952 Method for smoothing a solid surface
06/2014
06/03/2014US8741779 Plasma processing apparatus and plasma processing method
05/2014
05/29/2014US20140147623 Sacrificial Cover Layers for Laser Drilling Substrates and Methods Thereof
05/28/2014CN103820863A 石英衬底上多晶硅的刻蚀方法以及平面光波导的制作方法 Etching on a quartz substrate and method of making polysilicon planar waveguides
05/28/2014CN101165855B 基板平台和等离子处理装置 Substrate stage and a plasma processing apparatus
05/22/2014WO2014078800A1 System and method for selectively removing atoms
05/22/2014US20140140365 Sensor for differential calorimetric measurement, and method for manufacturing same
05/20/2014US8728585 Method for enhancing adhesion of thin film
05/14/2014CN103789771A 等离子体处理方法 The plasma processing method
05/14/2014CN103789257A 一种间充质干细胞的定向分化诱导方法 A method for inducing directed differentiation between mesenchymal stem cells
05/08/2014DE10345962B4 Substrat und Verfahren zum Bilden eines Substrats für eine Fluidausstoßvorrichtung Substrate and method for forming a substrate for a fluid ejection device
05/07/2014CN1950538B 围绕真空反应室的中央轴排列的可分别控制的电磁线圈组成的阵列 An array of electromagnetic coils can be controlled around the central axis of the vacuum reaction chamber arrangement consisting of
04/2014
04/30/2014DE102009012878B4 Schauerkopf und Substratbearbeitungsvorrichtung Shower head and substrate processing apparatus
04/30/2014CN101054673B Light shield plasma etching method using protective cover
04/16/2014CN102912346B Manufacturing method of valve forming mould covered with wear-resistant heat insulation film layer
04/10/2014WO2014055982A1 Bulk deposition for tilted mill protection
04/10/2014DE10340147B4 Trockenätzverfahren und Trockenätzvorrichtung Dry etching and dry etching
03/2014
03/26/2014CN103681230A Safe and precise cutting method for lower metal arranged wire
03/26/2014CN103668468A Silicon wafer polishing method
03/12/2014CN103628075A Plasma etching method
03/12/2014CN103628034A Preparation method of porous titanium dioxide thin film
02/2014
02/06/2014US20140034608 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support
01/2014
01/29/2014CN103545163A Method for treating semiconductor structures with residual fluorine or residual chlorine
01/23/2014DE102012107630B3 Magnetron sputtering device, useful in plant for treating strip-like substrate, comprises anode housing as etching surface of first surface of substrate to be treated, and magnet arrangement as second etching surface of substrate
01/22/2014CN103527632A Shaft supporting structure and manufacturing method thereof
01/08/2014CN102575360B Processing liquid for suppressing pattern collapse of fine metal structure and method for producing fine metal structure using same
01/08/2014CN102534622B Method for forming solar dry textured black silicon by plasma excitation
01/08/2014CN102516887B Polishing solution and plasma polishing process
01/01/2014CN102368469B Cover for forevacuum cavity of novel ICP (Inductively Coupled Plasma) etcher
01/01/2014CN102362006B Method for the ion beam treatment of a metal layer deposited on a substrate
12/2013
12/25/2013CN102332385B Mesh plate structure for ion neutralization
12/19/2013DE102012210003A1 Collecting device, used to sputter material during ion beam etching under vacuum, comprises ion beam sources arranged on each side of substrate to be etched, and surface areas, which reflect beam generated by ion source towards substrate
12/18/2013CN102260849B Cluster beam generating device and method thereof, and substrate processing device and method thereof
12/04/2013CN102732889B Method and apparatus for removing metal on wafer clamp
11/2013
11/26/2013US8593778 Apparatus for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation
11/19/2013US8585812 Oxygen displacement technology (ODT) to remove rust from iron and iron-based tools and structures
11/14/2013US20130302918 Plasma processing apparatus and plasma processing method
10/2013
10/23/2013CN103361690A Blind hole cleaning method of PCB (printed circuit board)
09/2013
09/26/2013WO2013142442A1 Electron beam polishing of aluminum
09/26/2013US20130248358 In-situ conditioning for vacuum processing of polymer substrates
09/18/2013CN103308963A Preparation method of light-transmitting plate or metal template with pits or bosses
09/17/2013US8536494 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support
09/03/2013US8524094 Masking material for dry etching
08/2013
08/29/2013DE102012101438A1 Method for cleaning process chamber of chemical vapor deposition (CVD) reactor, involves removing susceptor from process chamber, and cleaning process chamber cover at specific temperature
08/28/2013EP1640474B1 Thin film forming device
08/21/2013CN203144505U Cleaning device
08/21/2013CN103255420A Titanium aluminide article with improved surface finish
08/20/2013US8513137 Plasma processing apparatus and plasma processing method
08/20/2013US8512510 Plasma processing method and apparatus
08/01/2013WO2013110583A1 Method for deep micro-etching
07/2013
07/31/2013EP2619339A1 Method for removing mercury contamination from solid surfaces
07/31/2013CN1839349B Method for high-resolution processing of thin layers with electron beams
07/31/2013CN103229278A Method for treating metal film and treatment device
07/17/2013CN103205753A Smoothing method for free space transmitted near field optical induced surface microstructure
07/17/2013CN103204457A Production method of aluminum alloy bionic superhydrophobic surface
07/17/2013CN102473486B Metal laminated substrate for use as an oxide superconducting wire material, and manufacturing method therefor
07/17/2013CN102352512B Method for preparing high-adhesion diamond coating with pulse laser
07/11/2013DE102012200211A1 Vorrichtung und Verfahren zur Oberflächenbearbeitung eines Substrates An apparatus and method for surface processing a substrate
07/10/2013CN103192561A Micro / nano textured diamond-like-ionic liquid composite film and preparation method thereof
07/03/2013CN103184433A Gas diffusion homogenization device and plasma process equipment using same
07/03/2013CN102486465B Multifunctional ion beam sputtering and etching and in-situ physical property analysis system
06/2013
06/26/2013CN102162099B Gas injection system for etching profile control
06/26/2013CN102157425B Ring assembly for substrate processing chamber
06/20/2013US20130153415 Combinatorial RF Biasing for Selectable Spot-Site Isolation
06/12/2013CN102183509B Plasma monitoring method and plasma monitoring device
06/05/2013CN103128448A Laser processing method and laser processing device
06/05/2013CN102191502B Gas shower structure and substrate processing apparatus
06/05/2013CN101425450B Gas supply device, substrate processing apparatus and substrate processing method
05/2013
05/29/2013CN101244945B Components for substrate processing apparatus and manufacturing method thereof
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