| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 04/01/1998 | EP0833367A2 Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal |
| 04/01/1998 | EP0832407A1 Passive gas substrate thermal conditioning apparatus and method |
| 04/01/1998 | EP0801606A4 Cleaning method |
| 04/01/1998 | EP0677595B1 Device for the vacuum-plasma treatment of articles |
| 03/31/1998 | US5733419 Electrodes, counterelectrodes, plasma discharge |
| 03/31/1998 | US5733405 Plasma processing apparatus |
| 03/26/1998 | DE19637194A1 Gasgemisch und Verfahren zum Trockenätzen von Metallen, insbesondere Kupfer, bei niedrigen Temperaturen Gas mixture and process for dry etching of metals, in particular copper, at low temperatures |
| 03/25/1998 | EP0831516A2 Device and method for processing a plasma to alter the surface of a substrate using neutrals |
| 03/25/1998 | CN1177204A Etching method |
| 03/25/1998 | CN1177169A Method for forming patterned metallic layer in thin film magnetic head |
| 03/25/1998 | CN1177168A Surface modification of magnetic heads |
| 03/24/1998 | US5730808 Producing solar cells by surface preparation for accelerated nucleation of microcrystalline silicon on heterogeneous substrates |
| 03/19/1998 | WO1998011276A1 Gas mixture and method of dry etching metals, in particular copper, at low temperatures |
| 03/18/1998 | EP0828618A1 Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure |
| 03/18/1998 | CN1176486A Surface wave plasma processing apparatus |
| 03/17/1998 | US5728608 Sulfur hexafluoride and chlorine |
| 03/17/1998 | US5728227 Method for removing a diffusion coating from a nickel base alloy |
| 03/10/1998 | US5726067 Method of and apparatus for monitoring etching by-products |
| 03/10/1998 | US5725677 Dry cleaning process for cleaning a surface |
| 03/04/1998 | EP0827182A2 Surface wave plasma processing apparatus |
| 03/04/1998 | CN1174898A Low pressure and low power Cl2/HCl process for sub-micron metal etching |
| 02/28/1998 | CA2214250A1 Device for cathodic cleaning of wire |
| 02/18/1998 | EP0824269A2 Method for etching an Al metallization by a C12/HC1 based plasma |
| 02/17/1998 | US5719073 Microstructures and single mask, single-crystal process for fabrication thereof |
| 02/17/1998 | US5718796 Vapor phase etching in vessel which also contains an endpoint detector |
| 02/12/1998 | WO1998006128A1 Dry etching method and device used for the same |
| 02/12/1998 | WO1998006126A1 Method and device for dry etching |
| 02/11/1998 | EP0823726A1 Process for plasma enhanced anisotropic etching of metals, metal oxides and their mixtures |
| 02/11/1998 | EP0823279A2 Method and apparatus for treating exhaust gases from CVD, PECVD or plasma etch reactors |
| 02/10/1998 | US5717294 For processing a target surface of a substrate |
| 02/10/1998 | US5716485 Electrode designs for controlling uniformity profiles in plasma processing reactors |
| 02/10/1998 | US5716484 Contaminant reduction improvements for plasma etch chambers |
| 02/04/1998 | EP0822584A2 Method of surface treatment of semiconductor substrates |
| 02/04/1998 | EP0822572A1 Method and apparatus for plasma treatment of a surface |
| 02/03/1998 | US5714031 Topology induced plasma enhancement for etched uniformity improvement |
| 01/28/1998 | EP0821396A2 Method and apparatus for measuring etch uniformity of a semiconductor |
| 01/28/1998 | EP0821085A1 Apparatus for introducing gas into a rapid thermal processing chamber |
| 01/28/1998 | EP0821084A1 Multi-zone gas flow control in a process chamber |
| 01/28/1998 | EP0820641A1 Method for water vapor enhanced charged-particle-beam machining |
| 01/27/1998 | US5711850 Plasma processing apparatus |
| 01/27/1998 | US5711849 Process optimization in gas phase dry etching |
| 01/21/1998 | EP0820093A1 Etching organic antireflective coating from a substrate |
| 01/21/1998 | EP0820087A2 RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
| 01/21/1998 | CN1170777A Apparatus and method of preventing residual reaction gas from dry etcher |
| 01/20/1998 | US5709784 Process and apparatus for workpiece coating |
| 01/20/1998 | US5709519 Plasma processing apparatus |
| 01/15/1998 | WO1998001899A1 Cleaning gas |
| 01/13/1998 | US5707487 Method of manufacturing semiconductor device |
| 01/08/1998 | WO1998000859A1 Method and apparatus for etching a semiconductor wafer |
| 01/08/1998 | WO1998000858A1 Plasma etch reactor and method |
| 01/08/1998 | DE19727253A1 Multiple or single junction photovoltaic device especially solar cell |
| 01/08/1998 | CA2259976A1 Plasma etch reactor and method |
| 01/08/1998 | CA2259972A1 Method and apparatus for etching a semiconductor wafer |
| 01/07/1998 | EP0817256A1 A wafer chuck for inducing an electrical bias across wafer heterojunctions |
| 01/07/1998 | EP0817237A2 Methods and apparatus for treating workpieces with plasmas |
| 01/07/1998 | EP0817236A2 Plasma etching electrode and process for production thereof |
| 01/07/1998 | EP0741909A4 Methods for improving semiconductor processing |
| 01/06/1998 | US5705443 Etching method for refractory materials |
| 01/06/1998 | US5705081 Etching method |
| 01/06/1998 | US5705080 Plasma-inert cover and plasma cleaning process |
| 12/31/1997 | CN1169094A Plasma source |
| 12/30/1997 | US5702564 Flow rate of chlorine plasma is reduced during high density chlorine plasma etching of conductive pattern when the conductive material is substantially removed from the open field |
| 12/30/1997 | US5702562 Monitoring simultaneously plasma emission wavelengths and emission intensities; calculating etching rate and selectivity ratio of etched film and base film |
| 12/30/1997 | US5702530 Distributed microwave plasma reactor for semiconductor processing |
| 12/29/1997 | EP0814501A2 Method for etching metal silicide with high selectivity to polysilicon |
| 12/29/1997 | EP0814500A2 Method for etching polycide structures |
| 12/29/1997 | EP0814495A2 Adjusting DC bias voltage in plasma chamber |
| 12/29/1997 | EP0814179A1 Method for removing a diffusion coating from a nickel base alloy |
| 12/29/1997 | EP0813930A2 Method for repairing a nickel base superalloy article |
| 12/24/1997 | CN1168535A Plasma etching method in manufacturing process of semiconductor device |
| 12/18/1997 | DE19654178A1 Verfahren zur Plasmaätzung bei der Herstellung eines Halbleiterbauelements A method of plasma etching in the manufacture of a semiconductor device |
| 12/17/1997 | EP0813227A2 RF plasma processors |
| 12/16/1997 | US5698928 Thin film piezoelectric arrays with enhanced coupling and fabrication methods |
| 12/16/1997 | US5698473 From high energy plasma and densified in presence of oxygen to form highly planar interlevel dielectric |
| 12/16/1997 | US5698113 Two step dry etching process first removes sio2 overlay with fluorine-containing gas, then removes mo/si layers with chlorine-containing gas |
| 12/16/1997 | US5698071 Etching aftertreatment under vacuum |
| 12/10/1997 | EP0811704A1 Surface modification of magnetic heads |
| 12/10/1997 | EP0799557A4 High frequency induction plasma method and apparatus |
| 12/10/1997 | CA2207154A1 Inductively coupled source for deriving substantially uniform plasma flux |
| 12/09/1997 | US5695602 Process of etching silicon nitride layer by using etching gas containing sulfur hexafluoride, hydrogen bromide and oxygen |
| 12/09/1997 | US5695570 Purification by covering with water, radiating with ultraviolet light, drainage, drying with nitrogen |
| 12/09/1997 | US5695569 Removal of metal contamination |
| 12/09/1997 | US5695566 Apparatus and method for plasma-processing |
| 12/04/1997 | WO1997046057A1 Plasma treatment apparatus and plasma treatment method |
| 12/04/1997 | WO1997045857A1 Apparatus for plasma jet treatment of substrates |
| 12/04/1997 | WO1997045856A1 Method for treating articles with a plasma jet |
| 12/03/1997 | EP0810816A1 Balanced source for plasma system |
| 12/03/1997 | EP0507885B1 A low frequency inductive rf plasma reactor |
| 12/03/1997 | CN1166864A Method of forming diamond-like carbon film (DLC), DLC film formed thereby, use of the same, field emitter array and field emitter cathodes |
| 12/02/1997 | US5693238 Method for improving the rate of a plasma enhanced vacuum treatment |
| 12/02/1997 | US5693234 Method for producing at least one recess in a surface of a substrate apparatus for carrying out the said method and use of the product thus obtained |
| 12/02/1997 | US5693182 Method for damage etching the back side of a semiconductor disk having a protected front side |
| 12/02/1997 | US5693180 Ion milling with silicon tetrachloride and chloride gas mixture |
| 12/02/1997 | US5693179 Contaminant reduction improvements for plasma etch chambers |
| 11/26/1997 | EP0809283A2 Method of treating wafers |
| 11/26/1997 | EP0809274A1 Apparatus and method for manufacturing an electronic device |
| 11/26/1997 | EP0808918A2 Plasma processing apparatus and processing method |
| 11/26/1997 | EP0594714B1 Antipilferage markers |
| 11/26/1997 | CN1166145A Selective removal of material by irradiation |
| 11/25/1997 | US5690050 Plasma treating apparatus and plasma treating method |