| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 12/30/1986 | EP0205557A1 Process for fabricating a device. |
| 12/16/1986 | US4629635 Vapor deposition |
| 12/10/1986 | EP0204538A2 Phototreating method and apparatus therefor |
| 12/02/1986 | US4626312 Splitting the voltage; insulated chuck and counter electrodes |
| 11/26/1986 | EP0202907A2 In-situ photoresist capping process for plasma etching |
| 11/20/1986 | WO1986006923A1 Method and apparatus for producing large volume magnetoplasmas |
| 11/11/1986 | US4622095 Laser stimulated halogen gas etching of metal substrates |
| 11/11/1986 | US4622094 Method of controlling dry etching by applying an AC voltage to the workpiece |
| 11/05/1986 | EP0200133A2 Plasma etching reactor |
| 10/29/1986 | EP0199114A2 Manufacture of metallic structures on inorganic non-conductors |
| 10/21/1986 | US4618477 Uniform plasma for drill smear removal reactor |
| 10/21/1986 | US4618398 Plasma mixture of boron trichloride, chlorine, hydrocarbon to etch aluminum or its alloys |
| 10/15/1986 | CN86102468A Production of metallic structures on nonconductors |
| 10/14/1986 | US4617087 Method for differential selective deposition of metal for fabricating metal contacts in integrated semiconductor circuits |
| 10/14/1986 | US4617079 Improved low frequency etching, uniformity |
| 09/23/1986 | US4613401 Hydrocarbon halide and alcohol |
| 09/23/1986 | US4613400 In-situ photoresist capping process for plasma etching |
| 09/03/1986 | EP0192656A1 Interferometric methods for device fabrication. |
| 08/19/1986 | US4606788 Methods of and apparatus for forming conductive patterns on a substrate |
| 08/14/1986 | WO1986003887A3 Process for fabricating a device |
| 07/23/1986 | EP0188208A2 Plasma reactor chamber |
| 07/23/1986 | EP0188207A2 System for generating uniform gas flow in a plasma reactor chamber |
| 07/23/1986 | EP0188206A2 System for generating a substantially uniform plasma |
| 07/22/1986 | US4601807 Reactor for plasma desmear of high aspect ratio hole |
| 07/15/1986 | US4600686 Method of forming a resist mask resistant to plasma etching |
| 07/15/1986 | US4600464 Plasma etching reactor with reduced plasma potential |
| 07/08/1986 | US4598663 Apparatus for treating the inside surface of an article with an electric glow discharge |
| 07/03/1986 | WO1986003887A2 Process for fabricating a device |
| 07/02/1986 | EP0186419A2 Method of dry etching or film formation |
| 07/02/1986 | EP0049272B1 Fabrication of microminiature devices using plasma etching of silicon with fluorine-containing gaseous compounds |
| 06/18/1986 | EP0184917A1 Plasma reactor vessel and process |
| 06/10/1986 | US4594263 Exposing nickel to acid solution; baking |
| 06/10/1986 | CA1205780A1 Ion beam deposition or etching re rubber-metal adhesion |
| 06/03/1986 | US4592800 Method of inhibiting corrosion after aluminum etching |
| 05/13/1986 | US4588675 Vapor deposition of metal film onto substrate, impregnation with polymerizable material, and polymerization |
| 05/13/1986 | US4588490 Etching-deposition system, high plasma density |
| 04/23/1986 | EP0178336A1 Vacuum transfer device |
| 04/22/1986 | US4584078 Method of producing fine particles |
| 03/26/1986 | EP0175456A2 Phototreating apparatus |
| 03/25/1986 | US4578559 Plasma etching method |
| 03/19/1986 | EP0174673A1 Method of manufacturing a semiconductor device, in which a semiconductor substrate is subjected to a treatment in a reaction gas |
| 03/18/1986 | US4576678 Pattern forming method |
| 03/13/1986 | WO1986001591A1 Interferometric methods for device fabrication |
| 03/12/1986 | EP0174249A1 A dry etching method for a chromium or chromium oxide film |
| 03/04/1986 | US4574179 Ion beam machining device |
| 02/11/1986 | US4569717 Method of surface treatment |
| 01/29/1986 | EP0169680A1 Magnetron sputter etching system |
| 01/28/1986 | US4566941 Reactive ion etching method |
| 01/28/1986 | US4566937 Electron beam enhanced surface modification for making highly resolved structures |
| 01/22/1986 | EP0168509A1 Manufacture of connection holes in plastic plates and application of the method |
| 01/08/1986 | EP0166893A1 Dry-etching process |
| 12/17/1985 | US4559100 Microwave plasma etching apparatus |
| 12/10/1985 | US4557797 Suppressing reflections from substrate into top resist layer without degrading pattern transfer |
| 12/10/1985 | US4557796 Using compound with methyl or methylene group |
| 11/12/1985 | CA1196599A1 Magnetically enhanced plasma process and apparatus |
| 11/06/1985 | EP0160220A1 Plasma etching apparatus |
| 11/05/1985 | US4551221 Consumable electrode, specifically designed solenoid |
| 10/16/1985 | EP0158536A2 Methods of and apparatus for forming conductive patterns on a substrate |
| 10/15/1985 | US4547261 Anisotropic etching of aluminum |
| 10/15/1985 | US4547248 Automatic shutoff valve |
| 10/09/1985 | EP0157052A1 Low resistivity tungsten silicon composite film |
| 10/01/1985 | CA1194385A1 Device fabrication using gas-solid processes |
| 09/25/1985 | EP0155668A2 Plasma sculpturing with a non-planar sacrificial layer |
| 09/24/1985 | US4543465 Microwave plasma source having improved switching operation from plasma ignition phase to normal ion extraction phase |
| 09/11/1985 | EP0154572A2 Method of manufacturing thin film elastic circuits, tool for carrying out this method and products obtained |
| 09/11/1985 | EP0154483A2 Improved pulsed plasma process |
| 08/27/1985 | US4538067 Single grid focussed ion beam source |
| 08/21/1985 | EP0151947A2 Method of plasma etching |
| 08/13/1985 | US4534921 Bombarding with ions to remove suface contaminants |
| 08/07/1985 | EP0150358A2 Laser induced dry chemical etching of metals |
| 08/06/1985 | CA1191479A1 Two step plasma etching |
| 07/31/1985 | EP0149779A2 Laser induced chemical etching of metals with excimer lasers |
| 07/24/1985 | EP0149415A2 Reactive plasma process for etching chromium films with high chromium oxide and glass impurity content |
| 07/17/1985 | EP0148448A2 Etching method |
| 07/16/1985 | US4529474 Using gas mixture of carbon tetrafluoride and oxygen |
| 07/02/1985 | CA1189767A1 End-point detection in plasma etching of phosphosilicate glass |
| 06/19/1985 | EP0145015A2 Dry etching method and apparatus |
| 06/04/1985 | US4521275 Using bromine and chlorine compound |
| 05/08/1985 | EP0140755A2 A plasma processor for IC fabrication |
| 05/08/1985 | EP0139835A2 Plasma reactor apparatus and method |
| 05/07/1985 | US4515652 Plasma sculpturing with a non-planar sacrificial layer |
| 04/30/1985 | US4514275 Apparatus for physical vapor deposition |
| 04/23/1985 | US4512841 RF Coupling techniques |
| 04/17/1985 | EP0137747A2 Improvements in or relating to the production of grain oriented steel |
| 04/16/1985 | US4511429 Process for dry etching of aluminum and its alloy |
| 03/27/1985 | EP0135118A2 Method of producing fine particles |
| 03/26/1985 | US4507189 Process of physical vapor deposition |
| 03/19/1985 | US4505782 Plasma reactive ion etching of aluminum and aluminum alloys |
| 03/12/1985 | US4504574 Method of forming a resist mask resistant to plasma etching |
| 03/12/1985 | CA1183803A1 Inhibiting corrosion of aluminum metallization |
| 03/06/1985 | EP0133621A1 Dry-etching process and its use |
| 03/05/1985 | US4503334 Method of using an electron beam |
| 03/05/1985 | US4502914 Semiconductors |
| 02/27/1985 | EP0133452A2 Reactive ion etching method |
| 01/29/1985 | US4496425 Technique for determining the end point of an etching process |
| 01/29/1985 | US4496423 Blocking plasma discharge with glass filler between porous alumiunum plugs |
| 01/29/1985 | US4496420 Process for plasma desmear etching of printed circuit boards and apparatus used therein |
| 01/29/1985 | US4496419 Fine line patterning method for submicron devices |
| 01/23/1985 | EP0132015A2 An ion beam machining device |
| 01/22/1985 | US4495090 Gas mixtures for aluminum etching |