Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23F - Non-mechanical removal of metallic material from surfaces; Inhibiting corrosion of metallic material; Inhibiting incrustation in general; Multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass  or or class › C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or
Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769)
09/1999
09/14/1999US5951814 A portion of electrode consumed by plasma is formed of metal silicon or glassy carbon and the remaining portion is formed of a carbon material covered with a film of glassy carbon material; capable of reducing dust generation
09/08/1999EP0940839A2 Etching or coating devices
09/08/1999EP0939972A1 Plasma etch reactor and method
09/08/1999CN1228196A Plasma etch reactor and method
09/08/1999CN1227877A Laser shock peening using low energy laser
09/07/1999US5948570 Process for dry lithographic etching
09/07/1999US5948294 Device for cathodic cleaning of wire
09/07/1999US5948224 Method of controlling a treatment process and vacuum treatment apparatus
09/07/1999US5948168 Distributed microwave plasma reactor for semiconductor processing
09/02/1999DE19808206A1 Low pressure gas discharge treatment of wafers for lacquer removal, cleaning or etching
09/01/1999EP0938741A1 Vacuum plasma processor having coil whth intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil
09/01/1999CN1227668A Method and apparatus for etching a semiconductor wafer
08/1999
08/31/1999US5946082 Interference removal
08/25/1999EP0938079A2 Studless thin film magnetic head and process for making the same
08/25/1999CN1226740A Plasma processing apparatus
08/24/1999US5942854 Electron-beam excited plasma generator with side orifices in the discharge chamber
08/24/1999US5942075 Plasma processing apparatus
08/18/1999CN1225938A Gas for removing deposit and removal method using same
08/17/1999US5939149 Method of forming hydrogen-free diamond like carbon (DLC) films
08/17/1999US5938854 Exposing surface with contaminants to steady state radio frequency uniform glow dischage plasma for set period of time
08/12/1999DE19839612A1 Plasma generator, esp. for processes such as etching, cleaning and thin film production on semiconducting surfaces
08/10/1999US5936413 Method and device for measuring an ion flow in a plasma
08/10/1999US5935460 Method of performing high-efficiency machining by high-density radical reaction using a rotating electrode, device for performing the method and the rotating electrode used therefor
08/10/1999US5935454 Forming condensates at prescribed positions on a substrate and dry etching the substrate using the condensates thus formed as an etching mask
08/10/1999US5935374 Electronic device fabrication apparatus
08/04/1999EP0933438A1 Laser shock peening using low energy laser
08/03/1999US5932120 Laser shock peening using low energy laser
07/1999
07/28/1999CN1224234A Method for etching silicon layer
07/27/1999US5929570 Micro-wave plasma device with a metal cooling wire wrapped around the insulating tube
07/27/1999US5928965 Method for dry-etching of silicon substrate
07/27/1999US5928963 Plasma etching method
07/27/1999US5928528 Plasma treatment method and plasma treatment system
07/27/1999US5928426 Method and apparatus for treating exhaust gases from CVD, PECVD or plasma etch reactors
07/22/1999WO1999036956A1 Etching methods for anisotropic platinum profile
07/22/1999WO1999036276A1 Surface modification of medical implants
07/22/1999CA2307612A1 Surface modification of medical implants
07/21/1999EP0930376A1 Method of processing substrate
07/20/1999US5926743 Process for chlorine trifluoride chamber cleaning
07/20/1999US5926736 Forming barrier layer within hole, forming metal plug, forming cap layer over plug, heating so that metal in hole flows to eliminate void
07/20/1999US5925265 Exerting the actions of an electric field and a magnetic field on a processing gas; high etch selectivity between a mask and an underlying layer
07/20/1999US5925212 Apparatus and method for attaining repeatable temperature versus time profiles for plasma heated interactive parts used in mass production plasma processing
07/15/1999WO1999035667A1 Plasma treatment for producing electron emitters
07/14/1999EP0928499A1 Method for detecting the transition of different materials in semiconductor structures
07/13/1999US5922179 Apparatus for etching and coating sample specimens for microscopic analysis
07/13/1999US5922134 Simultaneous discharge device
07/08/1999WO1999034419A1 Etching process
07/07/1999CN1221807A In-situ monitoring plasma etching apparatus, its in-situ monitoring method, and in-situ cleaning method for removing residues in plasma ething chamber
07/06/1999US5919382 Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor
07/06/1999US5919336 Apparatus for fabricating semiconductor device and method for fabricating semiconductor device
07/01/1999WO1999033086A1 Techniques for etching a transition metal-containing layer
06/1999
06/30/1999EP0925605A1 Method and apparatus for etching a semiconductor wafer
06/29/1999US5916822 Method of etching a substrate by means of chemical beams
06/29/1999US5916411 Carbon electrode, cooling device in contact with electrode, temperature sensor, heat insulator covering, temperature controller
06/23/1999EP0924753A2 Etching method
06/23/1999EP0924282A1 Gas for removing a deposit and its use
06/23/1999CN1220483A Etching method
06/22/1999US5914568 For processing a target substrate
06/22/1999US5914277 Masking and dry etching smooth film of organic antireflectivity coating and underlying metallic wiring layer
06/17/1999WO1999029922A1 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
06/17/1999WO1999009587A3 Method of etching copper for semiconductor devices
06/15/1999US5911852 Plasma processing apparatus
06/10/1999DE19854198A1 Substrate plasma processor with processing chamber for the substrate
06/08/1999US5910864 Thin film magnetic head having non-linear rails
06/08/1999US5910341 Method of controlling the spread of an adhesive on a circuitized organic substrate
05/1999
05/25/1999US5907077 Method and apparatus for treatment of freon gas
05/20/1999DE19852256A1 Etching of platinum film to form electrode
05/19/1999EP0917187A2 Method of etching aluminium-based layer
05/14/1999WO1999009587A9 Method of etching copper for semiconductor devices
05/11/1999US5902403 Method and apparatus for cleaning a chamber
05/05/1999CN1215912A Plasm processing device and method
05/04/1999US5900699 Plasma generator with a shield interposing the antenna
05/04/1999US5900288 Method for improving substrate adhesion in fluoropolymer deposition processes
05/04/1999US5900163 Methods for performing plasma etching operations on microelectronic structures
05/04/1999US5900161 Apparatus and method for detecting end point of post treatment
05/04/1999US5898994 Method for repairing a nickel base superalloy article
04/1999
04/27/1999US5897923 Plasma treatment device
04/27/1999US5897740 Plasma processing system
04/27/1999US5897713 Plasma generating apparatus
04/21/1999EP0909837A2 Chemical vapor deposition apparatus and cleaning method thereof
04/21/1999CN1214537A Plasma etching method for forming hole in masked silicon dioxide
04/20/1999US5895937 Tapered dielectric etch in semiconductor devices
04/20/1999US5895551 Plasma etching apparatus
04/20/1999US5895548 High power microwave plasma applicator
04/14/1999EP0908535A1 Process for cleaning a substrate and apparatus for carrying out the process
04/07/1999EP0907203A2 Patterning method
04/07/1999CN1213161A Method for etching silicon dioxide containing layer
04/07/1999CN1213157A Methods for performing planarization and recess etches and apparatus therefor
04/06/1999US5891351 Method for forming pattern on steel substrate by reactive ion etching
04/06/1999US5891350 Adjusting DC bias voltage in plasma chambers
04/06/1999US5891349 Plasma enhanced CVD apparatus and process, and dry etching apparatus and process
04/06/1999US5891348 Process gas focusing apparatus and method
04/01/1999WO1999016117A1 Method and apparatus for plasma processing, and method for manufacturing semiconductor substrate
03/1999
03/31/1999EP0905758A2 Methods for performing planarization and recess etches and apparatus therefor
03/31/1999EP0905757A2 Improved techniques for etching a silicon dioxide-containing layer
03/31/1999CN1212456A Plasma processing method and apparatus
03/30/1999US5888907 Plasma processing method
03/30/1999US5888410 Dry etching method and manufacturing method of manufacturing EL element using same
03/30/1999US5888337 Endpoint detector for plasma etching
03/30/1999US5887481 Cathode sputtering targets with a low level of particle emission, precursors of these targets, and processes for obtaining them
03/30/1999CA2063967C Method and apparatus for hot-dipping steel strip
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