| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 02/13/2002 | EP0894154A4 RECOVERY OF Mo/Si MULTILAYER COATED OPTICAL SUBSTRATES |
| 02/13/2002 | EP0868836A4 Fluorine assisted stripping and residue removal in sapphire downstream plasma asher |
| 02/12/2002 | US6346915 Plasma processing method and apparatus |
| 02/07/2002 | US20020014597 Appartus for surface modification of polymer, metal and ceramic materials using ion beam |
| 02/06/2002 | EP1178134A1 Process and apparatus for the continuous plasma treatment of metallic substrates |
| 01/31/2002 | US20020011465 Etching metal oxide film by supplying first etching gas to film to remove metallic element from film, supplying second etching gas to film to remove secong metallic element |
| 01/30/2002 | CN1078742C Plasma processing apparatus for dry etching of semiconductor wafers |
| 01/24/2002 | US20020008208 Ion beam apparatus and sample processing method |
| 01/24/2002 | US20020008083 Dry etching method |
| 01/24/2002 | US20020008082 Local etching apparatus and local etching method |
| 01/24/2002 | US20020008079 Dry etching method for iridium electrode |
| 01/24/2002 | US20020007914 Etching and cleaning apparatus |
| 01/22/2002 | US6340639 Plasma process apparatus and plasma process method for substrate |
| 01/22/2002 | US6339997 Plasma processing apparatus |
| 01/17/2002 | WO2002005317A2 Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures |
| 01/17/2002 | US20020005252 Plasma etching apparatus and plasma etching method |
| 01/10/2002 | US20020002947 Inductive coupling plasma processing apparatus |
| 01/03/2002 | US20020001861 Electrostatic protection circuit |
| 01/03/2002 | US20020000368 Vacuum treatment chamber and method for treating surfaces |
| 01/03/2002 | US20020000197 Vacuum processing apparatus and multi-chamber vacuum processing apparatus |
| 01/02/2002 | EP1166344A1 Method of in-situ etching a hard mask and a metal layer in a single etcher |
| 01/02/2002 | EP1166322A1 Plasma processing method and apparatus with control of rf bias |
| 12/27/2001 | US20010055886 Dry etching method |
| 12/27/2001 | US20010054599 Etching method |
| 12/25/2001 | US6333272 Gas distribution apparatus for semiconductor processing |
| 12/25/2001 | US6333269 Plasma treatment system and method |
| 12/25/2001 | US6332947 Plasma processing apparatus and plasma processing method using the same |
| 12/25/2001 | US6332425 Surface treatment method and system |
| 12/20/2001 | WO2001096955A2 A method and apparatus for etching metal layers on substrates |
| 12/20/2001 | US20010053610 Method of plasma etching thin films of difficult to dry etch materials |
| 12/20/2001 | US20010053605 Apparatus and method for reducing differential sputter rates |
| 12/20/2001 | US20010052322 Plasma process device |
| 12/20/2001 | DE10052889A1 Plasmabearbeitungseinrichtung und Plasmabearbeitungsverfahren für Substrate Plasma processing apparatus and plasma processing method for substrates |
| 12/19/2001 | EP1164628A2 Processing system and method |
| 12/19/2001 | CN1327260A Technological process of semiconductor metal etching |
| 12/19/2001 | CN1076518C Plasma treating device |
| 12/13/2001 | US20010051232 Plasma processing method |
| 12/11/2001 | US6329298 Apparatus for treating samples |
| 12/11/2001 | US6328864 Vacuum processing apparatus |
| 12/11/2001 | US6328810 Removing loose contamination from hardware surfaces; selectively applying reactive metal and filler to preselected portion of hardware surfaces; heating to cause reaction between combustion products and reactive metal; cooling |
| 12/06/2001 | WO2001093322A1 Plasma processing device and processing method |
| 12/06/2001 | US20010048981 High speed plasma vapor deposition; exhaustion ventilation gas |
| 12/05/2001 | EP1160849A2 Method of anisotropic plasma etching using non-chlorofluorocarbon, fluorine-based chemistry |
| 12/04/2001 | US6325018 Flat antenna having openings provided with conductive materials accommodated therein and plasma processing apparatus using the flat antenna |
| 11/29/2001 | US20010046790 Etching mask and magnetic head device |
| 11/29/2001 | US20010046769 Waferless seasoning process |
| 11/29/2001 | DE10025550A1 Plasma etching process used in the production of Fe-RAMs comprises applying a polyimide mask before the structure is etched |
| 11/28/2001 | EP1158576A2 Method for etching a compound metal oxide film and processing apparatus |
| 11/28/2001 | EP1158565A2 Toroidal plasma source for plasma processing |
| 11/27/2001 | US6323132 Etching methods for anisotropic platinum profile |
| 11/27/2001 | US6322662 Plasma treatment system |
| 11/22/2001 | US20010044214 Method for dry-etching a titanium nitride containing multilayer film |
| 11/22/2001 | US20010044213 Method of anisotropic etching of substrates |
| 11/21/2001 | EP1156135A2 Vacuum processing apparatus |
| 11/20/2001 | US6320321 Ion beam processing apparatus for processing work piece with ion beam being neutralized uniformly |
| 11/20/2001 | US6319419 Method of manufacturing member for thin-film formation apparatus and the member for the apparatus |
| 11/20/2001 | US6319367 Plasma treatment for producing electron emitters |
| 11/20/2001 | US6319326 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 11/15/2001 | US20010041453 Process for patterning conductive line without after-corrosion |
| 11/15/2001 | US20010041449 Method and apparatus for plasma etching |
| 11/15/2001 | US20010040091 Method and apparatus for sputter etch conditioning a ceramic body |
| 11/14/2001 | EP1152906A1 Local vectorial particle cleaning |
| 11/13/2001 | US6316369 Corrosion-resistant system and method for a plasma etching apparatus |
| 11/13/2001 | US6315913 Structuring method |
| 11/13/2001 | US6315819 Apparatus for making exhaust gas non-toxic |
| 11/06/2001 | US6313430 Plasma processing apparatus and plasma processing method |
| 11/06/2001 | US6312569 Chemical vapor deposition apparatus and cleaning method thereof |
| 11/06/2001 | US6311638 Plasma processing method and apparatus |
| 11/01/2001 | US20010036741 Local etching apparatus and local etching method |
| 10/25/2001 | WO2001080297A1 Plasma processing apparatus |
| 10/25/2001 | WO2001078873A1 Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas |
| 10/25/2001 | US20010032708 Electrode plate for plasma etching equipment for forming uniformly-etched surface |
| 10/25/2001 | US20010032707 Dry etching system for patterning target layer at high reproducibility and method of dry etching used therein |
| 10/23/2001 | US6306770 Method and apparatus for plasma etching |
| 10/23/2001 | US6306312 Method for etching a gold metal layer using a titanium hardmask |
| 10/23/2001 | US6306245 Plasma etching apparatus |
| 10/18/2001 | US20010031310 Plasma treatment apparatus |
| 10/18/2001 | US20010030025 Plasma treatment method and apparatus |
| 10/16/2001 | US6303511 Wafer flattening process |
| 10/16/2001 | US6303392 Etching mask, method of making same, etching method, magnetic head device and method of manufacturing same |
| 10/16/2001 | US6302995 Local etching apparatus |
| 10/10/2001 | EP1143496A1 Plasma etching method |
| 10/04/2001 | US20010027030 Method for cleaning a process chamber |
| 10/04/2001 | US20010027029 Thin-film patterning method, manufacturing method of thin-film device and manufacturing method of thin-film magnetic head |
| 10/02/2001 | US6297468 Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal |
| 10/02/2001 | US6297165 Etching and cleaning methods |
| 09/27/2001 | US20010023663 Mechanically softened tissues and towels; increased surface fuzziness |
| 09/26/2001 | EP0902962B1 Apparatus for plasma jet treatment of substrates |
| 09/25/2001 | US6294026 Distribution plate for a reaction chamber with multiple gas inlets and separate mass flow control loops |
| 09/20/2001 | WO2000049650A9 Iridium etching methods for anisotrophic profile |
| 09/20/2001 | US20010022293 Plasma processing equipment and plasma processing method using the same |
| 09/20/2001 | US20010022157 Inductive-coupled plasma apparatus employing shield and method for manufacturing the shield |
| 09/19/2001 | EP1134774A2 Plasma processing apparatus |
| 09/18/2001 | US6291793 Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal |
| 09/13/2001 | WO2001067501A1 Apparatus and method for reducing differential sputter rates |
| 09/13/2001 | DE10011275A1 Verfahren zur Oberflächenaktivierung bahnförmiger Werkstoffe A process for surface activation of web-shaped materials |
| 09/12/2001 | EP1132946A1 Ion beam processing apparatus |
| 09/12/2001 | EP1132495A1 Plasma-inert cover and plasma cleaning process and apparatus employing same |
| 09/12/2001 | EP1132148A2 Process for activating the surface of a web-like material |
| 09/11/2001 | US6286454 Plasma process device |