| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 05/15/2003 | WO2002101113A9 Method and device for treating a substrate |
| 05/14/2003 | EP0748260B1 Ion beam process for deposition of highly abrasion-resistant coatings |
| 05/14/2003 | CN1108630C Method for manufacturing semiconductor device having metal silicide film |
| 05/13/2003 | US6562186 Apparatus for plasma processing |
| 05/08/2003 | WO2003038153A1 Process for low temperature, dry etching, and dry planarization of copper |
| 05/08/2003 | WO2003003404A3 Process chamber components having textured internal surfaces and method of manufacture |
| 05/08/2003 | US20030086840 To apply plasma processing on a substrate such as a semiconductor |
| 05/08/2003 | US20030085197 Etching method and apparatus |
| 05/07/2003 | EP1307607A1 Method and device for plasma treatment of moving metal substrates |
| 05/06/2003 | US6558507 Plasma processing apparatus |
| 05/01/2003 | WO2003036704A1 Method and apparatus for the etching of photomask substrates using pulsed plasma |
| 05/01/2003 | US20030080091 Method of processing a sample surface having a masking material and an anti-reflective film using a plasma |
| 04/29/2003 | US6554952 Method and apparatus for etching a gold metal layer using a titanium hardmask |
| 04/29/2003 | US6554205 Gas polishing method, gas polishing nozzle and polishing apparatus |
| 04/24/2003 | WO2003034463A2 Tunable multi-zone gas injection system |
| 04/24/2003 | US20030077856 Semiconductor device manufacturing method |
| 04/22/2003 | US6551447 Inductive plasma reactor |
| 04/17/2003 | WO2003032434A1 Plasma production device and method and rf driver circuit |
| 04/17/2003 | WO2002025697A3 Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto |
| 04/17/2003 | US20030070620 Tunable multi-zone gas injection system |
| 04/17/2003 | CA2463528A1 Plasma production device and method and rf driver circuit |
| 04/15/2003 | US6548414 Method of plasma etching thin films of difficult to dry etch materials |
| 04/15/2003 | US6547978 Method of heating a semiconductor substrate |
| 04/10/2003 | WO2003029521A1 Method for removing at least one area of a layer of a component consisting of metal or a metal compound |
| 04/09/2003 | EP1300875A1 Plasma processing device |
| 04/09/2003 | EP1299904A2 Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures |
| 04/08/2003 | US6544894 Method of producing chromium mask |
| 04/03/2003 | US20030064590 Method of plasma etching platinum |
| 04/02/2003 | EP1298230A1 Process for removing corrosion products from metallic parts |
| 04/01/2003 | US6541380 Plasma etching process for metals and metal oxides, including metals and metal oxides inert to oxidation |
| 04/01/2003 | US6540930 Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases |
| 03/27/2003 | WO2002101113B1 Method and device for treating a substrate |
| 03/27/2003 | US20030060048 Chemically enhanced focused ion beam micro-machining of copper |
| 03/27/2003 | US20030059720 Masking methods and etching sequences for patterning electrodes of high density RAM capacitors |
| 03/27/2003 | US20030057182 Window for allowing end point of etching process to be detected and etching device comprising the same |
| 03/26/2003 | EP1296353A2 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 03/26/2003 | CN1405857A Plasma etching device using plasma confining device |
| 03/25/2003 | US6538387 Substrate electrode plasma generator and substance/material processing method |
| 03/25/2003 | US6537462 Ruthenium and ruthenium dioxide removal method and material |
| 03/25/2003 | US6537460 Method for detecting an end point of etching in a plasma-enhanced etching process |
| 03/25/2003 | US6537417 Apparatus for processing samples |
| 03/25/2003 | US6537415 Apparatus for processing samples |
| 03/20/2003 | US20030052079 Etching of a specimen, such as a laminated film containing nickel iron alloy, at a high rate and temperature |
| 03/18/2003 | US6534416 Control of patterned etching in semiconductor features |
| 03/18/2003 | US6533534 Manufacturing flat active display screens by increased rate of plasma enhanced chemical vapor deposition method and thereby lowering for coating treatment exposure to ion impact |
| 03/18/2003 | US6532796 Method of substrate temperature control and method of assessing substrate temperature controllability |
| 03/13/2003 | WO2003021659A1 Methods and apparatus for etching metal layers on substrates |
| 03/13/2003 | US20030049937 Apparatus and method for surface treatment to substrate |
| 03/13/2003 | US20030049934 Methods and apparatus for etching metal layers on substrates |
| 03/12/2003 | EP1290495A2 A method and apparatus for etching metal layers on substrates |
| 03/12/2003 | CN1102962C Laser shock peening using low energy laser |
| 03/06/2003 | WO2003019639A1 Treating device using treating gas, and method of operating the same |
| 03/06/2003 | WO2003019629A2 Process for charged particle beam micro-machining of copper |
| 03/06/2003 | WO2002046483A3 Silver stain removal from dna detection chips by cyanide etching or sonication |
| 03/06/2003 | US20030045113 Fabrication method of semiconductor integrated circuit device |
| 03/05/2003 | EP1289003A1 Plasma processing apparatus |
| 02/27/2003 | US20030038688 Device and method for coupling two circuit components which have different impedances |
| 02/27/2003 | US20030038113 Process for charged particle beam micro-machining of copper |
| 02/26/2003 | CN1399316A Post-treatment process of dry etched metal film and integral etching and photoresist-eliminating system |
| 02/26/2003 | CN1398782A One-dimensional hydrogen-storing carbon nano-material etched via microwave plasma and its prepn process |
| 02/25/2003 | US6524432 Parallel-plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density |
| 02/20/2003 | US20030036282 Etching end point judging device |
| 02/13/2003 | US20030030144 Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same |
| 02/11/2003 | US6517670 Etching and cleaning apparatus |
| 02/06/2003 | US20030026917 Process chamber components having textured internal surfaces and method of manufacture |
| 02/06/2003 | US20030024646 Plasma etching apparatus and plasma etching method |
| 02/04/2003 | US6514866 Chemically enhanced focused ion beam micro-machining of copper |
| 02/04/2003 | US6514582 Quartz glass member for use in dry etching and dry etching system equipped with the same |
| 02/04/2003 | US6514375 Dry etching endpoint detection system |
| 02/04/2003 | US6513452 Adjusting DC bias voltage in plasma chamber |
| 01/30/2003 | US20030022494 Plasma etching process for metals and metal oxides relates inert to oxidation |
| 01/30/2003 | US20030021910 Plasma vapor deposition using microwaves |
| 01/30/2003 | US20030019841 Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases |
| 01/29/2003 | EP0880694B1 Ultrasonic sputtering target testing method |
| 01/28/2003 | US6511584 Configuration for coating a substrate by means of a sputtering device |
| 01/23/2003 | US20030015287 Inner wall protection member for chamber and plasma procressing apparatus |
| 01/21/2003 | US6508913 Gas distribution apparatus for semiconductor processing |
| 01/21/2003 | US6508199 Plasma processing apparatus |
| 01/15/2003 | EP1274499A1 Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas |
| 01/14/2003 | US6506686 Plasma processing apparatus and plasma processing method |
| 01/09/2003 | WO2003003404A2 Process chamber components having textured internal surfaces and method of manufacture |
| 01/07/2003 | US6503367 Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma |
| 01/07/2003 | US6503364 Plasma processing apparatus |
| 01/02/2003 | US20030003757 Method of etching tungsten or tungsten nitride in semiconductor structures |
| 01/02/2003 | US20030003374 Generating a plasma of a processing gas comprising carbon monoxide and a chlorine containing gas, and etching exposed portions of the metal layer of a metal photomask |
| 01/02/2003 | US20030000646 Plasma reactor |
| 12/31/2002 | US6500314 Precise control and increased density range of the plasma |
| 12/31/2002 | US6499492 Plasma process apparatus with in situ monitoring, monitoring method, and in situ residue cleaning |
| 12/26/2002 | US20020195422 Absorbing halogen gas onto exposed surface, removing , then etching/milling; semiconductors |
| 12/19/2002 | WO2002101113A1 Method and device for treating a substrate |
| 12/19/2002 | WO2002086932B1 Magnetic mirror plasma source |
| 12/19/2002 | US20020190657 Wafer area pressure control for plasma confinement |
| 12/18/2002 | EP1267396A2 Magnetically patterning conductors |
| 12/18/2002 | EP1046186B1 Plasma treatment for producing electron emitters |
| 12/18/2002 | CN1096313C Method and device for selective removal of material by irradiation |
| 12/12/2002 | WO2002086937B1 Dipole ion source |
| 12/12/2002 | DE10126986A1 Treating, e.g. etching, a substrate in an electric arc vaporizing device comprises adjusting the metal ion density per target by partially covering the target |
| 12/10/2002 | US6492774 Wafer area pressure control for plasma confinement |
| 12/10/2002 | US6492280 Method and apparatus for etching a semiconductor wafer with features having vertical sidewalls |
| 12/10/2002 | US6492068 Etching method for production of semiconductor devices |