| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 04/29/2004 | US20040079485 Inductively coupled plasma generating apparatus incorporating serpentine coil antenna |
| 04/29/2004 | DE19509284B4 Vorrichtung zur Erzeugung eines ebenen Plasmas unter Verwendung variierender Magnetpole A device for generating a planar plasma using varying magnetic poles |
| 04/28/2004 | EP1413765A2 Compressor wheel assembly |
| 04/27/2004 | US6726847 Silver stain removal by chemical etching and sonication |
| 04/22/2004 | US20040074869 Fluorine free integrated process for etching aluminum including chamber dry clean |
| 04/21/2004 | CN1490855A Dry etching table with verticle wash cleaner |
| 04/20/2004 | US6723652 Dry etching method and method of manufacturing semiconductor apparatus |
| 04/20/2004 | US6723571 Semiconductor device manufacturing method |
| 04/20/2004 | US6723202 Worktable device and plasma processing apparatus for semiconductor process |
| 04/15/2004 | US20040071613 Plasma processing apparatus |
| 04/15/2004 | US20040069746 Removing tantalum cap with a fluorine reactive ion etch; and, treating the sensor with an argon/hydrogen reactive ion etch. |
| 04/15/2004 | DE10340147A1 Verfahren und Vorrichtung zum Verarbeiten eines Substrats und darin verwendete Platte Method and apparatus for processing a substrate used therein and plate |
| 04/14/2004 | CN1146024C Plasma etching method for forming hole in maked silicon dioxide |
| 04/14/2004 | CN1146018C Methods for performing planarization and recess etches and apparatus therefor |
| 04/13/2004 | US6719875 Plasma process apparatus |
| 04/08/2004 | WO2004008477A3 Heating jacket for plasma etching reactor, and etching method using same |
| 04/07/2004 | EP1405330A2 Process chamber components having textured internal surfaces and method of manufacture |
| 04/07/2004 | EP0771469B1 Method of and apparatus for microwave-plasma production |
| 04/07/2004 | CN1144896C Plasma treating apparatus |
| 03/30/2004 | US6713368 Etching mask and magnetic head device |
| 03/30/2004 | US6712020 Toroidal plasma source for plasma processing |
| 03/25/2004 | US20040058554 Dry etching method |
| 03/25/2004 | US20040058528 Selective dry etching of tantalum and tantalum nitride |
| 03/25/2004 | US20040056249 Chemically enhanced focused ion beam micro-machining of copper |
| 03/25/2004 | DE19716480B4 Verfahren zum Herstellen einer Vorrichtung mit einem Hohlraum zur Aufnahme eines Lichtwellenleiters A method of manufacturing a device having a cavity for receiving an optical fiber |
| 03/24/2004 | EP1401015A1 Selective dry etching of tantalum and tantalum nitride |
| 03/23/2004 | US6709609 Plasma heating of a substrate with subsequent high temperature etching |
| 03/11/2004 | US20040045675 Plasma etching apparatus |
| 03/11/2004 | US20040045669 Plasma processing method and apparatus |
| 03/11/2004 | DE4126216B4 Vorrichtung für Dünnschichtverfahren zur Behandlung großflächiger Substrate Apparatus for thin-film processes for the treatment of large area substrates |
| 03/11/2004 | DE10338292A1 Etching metal layer for semiconductor device, comprises etching exposed portions of metal layer with etching gas formed by mixing chlorine and nitrogen |
| 03/04/2004 | WO2003100110A3 Method for removing at least one partial area of a component made of metal or a metallic compound |
| 03/04/2004 | US20040043526 Method of patterning a layer of magnetic material |
| 03/04/2004 | US20040040932 Method and apparatus for processing substrate and plate used therein |
| 03/03/2004 | EP1392882A1 Method and device for treating a substrate |
| 03/03/2004 | CN1479936A Wafer area pressure control for plasma confinement |
| 03/03/2004 | CN1479175A Method for etching surface material with induced chemical reaction by focused electron beam on surface |
| 03/02/2004 | US6700458 Device and method for coupling two circuit components which have different impedances |
| 03/02/2004 | CA2154357C Microstructures and single-mask, single-crystal process for fabrication thereof |
| 02/26/2004 | US20040038547 Method of etching a metal layer using a mask, a metallization method for a semiconductor device, a method of etching a metal layer, and an etching gas |
| 02/25/2004 | EP1391140A1 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support |
| 02/25/2004 | EP1390964A1 Dipole ion source |
| 02/25/2004 | EP1390558A1 Penning discharge plasma source |
| 02/25/2004 | CN1478291A Chamber configuration for confining plasma |
| 02/19/2004 | US20040033425 Irradiating with at least one beam of molecules, at least one beam of photons and at least one beam of electrons |
| 02/19/2004 | US20040033311 Method for removing coating from power unit components and device for carrying out the method |
| 02/17/2004 | US6692648 Method of plasma heating and etching a substrate |
| 02/12/2004 | US20040027718 Method for seed layer removal for magnetic heads |
| 02/12/2004 | US20040027302 Radial antenna and plasma processing apparatus comprising the same |
| 02/12/2004 | US20040026412 Method and device for plasma treatment of moving metal substrates |
| 02/12/2004 | US20040026375 Exposing layer of copper by etching layer of silicon nitride on copper layer with etching gas constituted of trifluoromethane and oxygen, oxygen suppressing oxidation of copper layer during etching |
| 02/12/2004 | US20040026369 Method of etching magnetic materials |
| 02/12/2004 | US20040026040 Plasma processing apparatus |
| 02/12/2004 | DE19706763B4 Verfahren zum Ätzen einer Metallschicht A method for etching a metal layer |
| 02/12/2004 | DE19636288B4 Verfahren zur Plasmaätzung bei der Herstellung eines Halbleiterbauelements A method of plasma etching in the manufacture of a semiconductor device |
| 02/11/2004 | EP1388159A1 Magnetic mirror plasma source |
| 02/10/2004 | US6689283 Dry etching method, microfabrication process and dry etching mask |
| 02/05/2004 | US20040020894 High selectivity etching of a lead overlay structure |
| 02/03/2004 | US6685848 Method and apparatus for dry-etching half-tone phase-shift films half-tone phase-shift photomasks and method for the preparation thereof and semiconductor circuits and method for the fabrication thereof |
| 01/29/2004 | US20040016508 Plasma etching apparatus and plasma etching method |
| 01/28/2004 | EP1383939A1 Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases |
| 01/22/2004 | WO2004008477A2 Heating jacket for plasma etching reactor, and etching method using same |
| 01/22/2004 | US20040011379 Silicon oxyfluoride film is formed on a wafer using a plasma vapor deposition method; film remaining inside chamber is cleaned up using a gas containing nitrogen trifluoride |
| 01/21/2004 | CN1135606C Dry etching method |
| 01/15/2004 | US20040009668 Process for planarizing upper surface of damascene wiring structure for integrated circuit structures |
| 01/15/2004 | US20040009617 Plasma etching apparatus and plasma etching method |
| 01/15/2004 | US20040007985 Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions |
| 01/14/2004 | EP1381257A2 Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions |
| 01/14/2004 | CN1468441A Gas distribution apparatus for semiconductor processing |
| 01/14/2004 | CN1134830C Process for copper etch back |
| 01/13/2004 | US6676843 Magnetically patterning conductors |
| 01/13/2004 | US6676804 Method and apparatus for plasma processing |
| 01/08/2004 | WO2004003256A1 Anisotropic dry etching of cu-containing layers |
| 01/08/2004 | US20040004056 Method of etching a film of magnetic material and method of manufacturing a thin-film magnetic head |
| 01/06/2004 | US6673262 Comprising hypofluorite which dissociates more easily than, for example, each of cf4, c2f6, c4f8, and nf3 |
| 01/01/2004 | US20040001964 Method of manufacturing a structure having pores |
| 01/01/2004 | US20040000535 Process for etching photomasks |
| 12/31/2003 | CN1464075A Process for reclaiming polycarbonate substrate from abandoned optical discs |
| 12/30/2003 | US6669810 Method for detecting etching endpoint, and etching apparatus and etching system using the method thereof |
| 12/25/2003 | US20030235995 Method of increasing selectivity to mask when etching tungsten or tungsten nitride |
| 12/24/2003 | WO2003107384A1 Stabilization of electronegative plasmas with feedback control of rf generator systems |
| 12/24/2003 | CN1132233C Plasma processing method and appts. |
| 12/24/2003 | CN1132232C Method for plasma etching in process for fabrication of semiconductor device |
| 12/18/2003 | US20030232453 Conductive thin film, a capacitor using the same and a method of manufacturing thereof |
| 12/16/2003 | US6664123 Method for etching metal layer on a scale of nanometers |
| 12/16/2003 | US6663747 Apparatus and method for enhancing the uniform etching capability of an ion beam grid |
| 12/11/2003 | US20030228755 Method for metal patterning and improved linewidth control |
| 12/11/2003 | US20030226819 Single trench alternating phase shift mask fabrication |
| 12/10/2003 | CN1130760C Method for etching silicon dioxide containing layer |
| 12/09/2003 | US6660127 Apparatus for plasma etching at a constant etch rate |
| 12/04/2003 | WO2003100110A2 Method for removing at least one partial area of a component made of metal or a metallic compound |
| 12/04/2003 | US20030224620 Method and apparatus for smoothing surfaces on an atomic scale |
| 12/04/2003 | US20030221781 Milling apparatus |
| 12/03/2003 | EP1367144A1 Process for removing portions of a metallic article |
| 12/03/2003 | CN1460287A 等离子体处理装置 Plasma processing apparatus |
| 12/02/2003 | US6656849 Plasma reactor |
| 12/02/2003 | US6656846 Apparatus for processing samples |
| 11/27/2003 | US20030219984 Method of etching a magnetic material |
| 11/20/2003 | WO2003095703A1 ZnSe DIFFRACTION TYPE OPTICAL COMPONENT AND METHOD FOR FABRICATING THE SAME |
| 11/20/2003 | WO2003019629A3 Process for charged particle beam micro-machining of copper |