Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23F - Non-mechanical removal of metallic material from surfaces; Inhibiting corrosion of metallic material; Inhibiting incrustation in general; Multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass  or or class › C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or
Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769)
11/2003
11/20/2003US20030213559 Stabilization of electronegative plasmas with feedback control of RF generator systems
11/19/2003EP1363164A1 Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
11/18/2003US6649076 Method for performing plasma process on particles
11/18/2003US6649075 Method and apparatus for measuring etch uniformity of a semiconductor wafer
11/18/2003US6648976 Apparatus and method for plasma processing
11/13/2003WO2003065419A3 Plasma etching of ni-containing materials
11/13/2003US20030209519 Layer-by-layer etching apparatus using neutral beam and method of etching using the same
11/12/2003EP1360880A1 Plasma unit and method for generation of a functional coating
11/11/2003US6645872 Chemically enhanced focused ion beam micro-machining of copper
11/05/2003EP0939972A4 Plasma etch reactor and method
11/05/2003EP0925605A4 Method and apparatus for etching a semiconductor wafer
11/04/2003US6641705 Apparatus and method for reducing differential sputter rates
10/2003
10/30/2003WO2003089990A2 Process for etching photomasks
10/30/2003WO2003038153A8 Process for low temperature, dry etching, and dry planarization of copper
10/30/2003US20030203640 Plasma etching apparatus
10/30/2003US20030203157 Carbon-doped hard mask and method of passivating structures during semiconductor device fabrication
10/30/2003US20030200929 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film
10/29/2003CN1126154C Method of manufacturing active array display device
10/28/2003US6638403 Plasma processing apparatus with real-time particle filter
10/28/2003US6638392 Plasma process apparatus
10/16/2003WO2003085172A2 Method of etching a magnetic material and for fabricating a mram device
10/16/2003US20030192864 Plasma processing apparatus and method
10/08/2003EP1350265A1 Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures
10/08/2003EP0781618B1 Highly efficient processing method based on high density radical reaction and using rotary electrode, apparatus therefor and rotating electrode used therefor
10/08/2003CN1447399A Etching method for reducing discharge amount of exhaust gas
10/08/2003CN1123918C Stripping method for metallic electrodes of semiconductor device
10/01/2003CN1445827A Electric liquid processing device
09/2003
09/25/2003US20030179496 Magnetic head and method of making the same using an etch-stop layer for removing portions of the capping layer
09/25/2003US20030178300 Method of manufacturing an object in a vacuum recipient
09/24/2003EP1345704A1 Method and apparatus for applying controlled succession of thermal spikes or shockwaves through a medium
09/24/2003CN1122302C Process for patterning conductive line without after corrosion
09/23/2003US6624084 Plasma processing equipment and plasma processing method using the same
09/18/2003US20030173332 Method of forming electrode for saw device
09/18/2003US20030173029 Plasma processing apparatus
09/17/2003CN1121712C Method for etching Pt film of semiconductor device
09/16/2003US6621660 Thin film magnetic head
09/16/2003US6620335 Plasma etch reactor and method
09/16/2003US6620331 Method of etching an opening
09/11/2003US20030170998 Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the method
09/10/2003EP1342510A2 Process for stripping of engine elements and device for process execution
09/10/2003CN1441959A Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures
09/10/2003CN1441083A Surface processer
09/03/2003EP1341220A2 Semiconductor device manufacturing method
08/2003
08/28/2003US20030162402 Method of through-etching substrate
08/28/2003US20030162401 Semiconductor device manufacturing method
08/28/2003US20030159307 Substrate processing apparatus
08/27/2003CN1119385C Gas for removing deposit and removal method using same
08/26/2003US6610463 Method of manufacturing structure having pores
08/20/2003EP1336189A1 Device, set and method for carrying a gas or a liquid to a surface through a tube
08/20/2003CN1437225A Dry itching process for gallium nitrid compound semiconductor, etc.
08/20/2003CN1437223A Plasma processing method and apparatus
08/19/2003US6607988 Manufacturing method of semiconductor integrated circuit device
08/19/2003US6607985 Gate stack and etch process
08/19/2003US6607790 Plasma-enhanced vapor deposition of halogen and silicon dioxide from tetraethoxysilane and halogen compound
08/14/2003US20030150710 Plasma production device and method and RF driver circuit
08/07/2003WO2003065419A2 Plasma etching of ni-containing materials
08/07/2003US20030148623 Plasma processing device
08/05/2003US6602435 Etching method
07/2003
07/31/2003US20030143858 Process for the plasma etching of materials not containing silicon
07/30/2003EP0832407B1 Passive gas substrate thermal conditioning apparatus and method
07/23/2003CN1431686A Method of etching silicon in high ratio between depth and width
07/23/2003CN1115596C Light receiving member and its prodn. tech, electrophotographic appts. and electrophotographic method
07/22/2003US6596551 Etching end point judging method, etching end point judging device, and insulating film etching method using these methods
07/17/2003US20030132198 Method and apparatus for treating surface of semiconductor
07/15/2003US6593244 Process for etching conductors at high etch rates
07/10/2003US20030127118 Cleaning gas
07/08/2003US6590179 Plasma processing apparatus and method
07/08/2003US6589435 Plasma etching method
07/03/2003WO2003032434B1 Plasma production device and method and rf driver circuit
07/03/2003US20030121891 Ruthenium and ruthenium dioxide removal method and material
07/02/2003EP1324371A1 Plasma processing apparatus
07/02/2003EP1323179A2 Wafer area pressure control for plasma confinement
07/02/2003EP1323178A2 Gas distribution apparatus for semiconductor processing
07/02/2003CN1113236C Ultrasonic cathode sputtering target testing method
07/01/2003US6586049 Patterning method using mask and manufacturing method for composite type thin film magnetic head using the patterning method
07/01/2003US6585907 Method for manufacturing a shield for an inductively-couple plasma apparatus
06/2003
06/26/2003US20030116530 Method for forming a groove and method for manufacturing an optical waveguide element
06/25/2003EP1320875A1 Gas compositions for cleaning the interiors of reactors as well as for etching films of silicon-containing compounds
06/24/2003US6582470 Surface modification of medical implants
06/19/2003WO2003050862A1 Plasma etching method
06/19/2003WO2003034463A3 Tunable multi-zone gas injection system
06/19/2003US20030114015 Apparatus for fabricating a semiconductor device and method of doing the same
06/18/2003EP1319239A2 Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto
06/17/2003US6579806 Method of etching tungsten or tungsten nitride in semiconductor structures
06/12/2003US20030109138 Method of etching tantalum
06/11/2003CN1422983A Reinforced coin product and its making method
06/10/2003US6576404 Carbon-doped hard mask and method of passivating structures during semiconductor device fabrication
06/10/2003US6576152 Dry etching method
06/05/2003WO2002059882A3 Method for seed layer removal for magnetic heads
06/05/2003US20030102286 Surface treatment process
06/05/2003US20030102087 Plasma processing apparatus and processing method
06/05/2003US20030102086 Apparatus and method for enhancing the uniform etching capability of an ion beam grid
06/04/2003CN1110862C Thin film piezoelectric array with enhanced coupling and fabrication method thereof
06/04/2003CN1110843C Method for etching silicon layer
05/2003
05/29/2003US20030098292 Process for low temperature, dry etching, and dry planarization of copper
05/29/2003US20030098291 Layer-by-layer etching apparatus using neutral beam and etching method using the same
05/29/2003US20030098126 Etching apparatus using neutral beam
05/28/2003EP1315201A1 Radial antenna and plasma processing apparatus comprising the same
05/22/2003US20030094366 Plasma processing apparatus with real-time particle filter
05/20/2003US6566169 Method and apparatus for local vectorial particle cleaning
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