| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 09/16/2004 | DE102004008334A1 Verfahren zum lokalen Ätzen eines Substrats und Vorrichtung zur Durchführung des Verfahrens A method for locally etching a substrate and apparatus for carrying out the method |
| 09/15/2004 | CN1529994A Method and apparatus for controlling spatial temperature distribution across surface of workpiece support |
| 09/09/2004 | US20040173759 Device, set and method for carrying a gas or a liquid to a surface through a tube |
| 09/09/2004 | US20040173758 Ion source and ion beam device |
| 09/09/2004 | US20040173570 Method of etching magnetic and ferroelectric materials using a pulsed bias source |
| 09/09/2004 | US20040173568 capable of precise etching of very fine etching target areas of the magnetic material with target widths of 150 nm or less; significantly reducing the ratio of the flow rate of carbon monoxide gas relative to the total flow rate of the reactive gas |
| 09/08/2004 | EP1454705A1 Thermal treatment of a workpiece made of metal, in particular aluminium |
| 09/08/2004 | CN1526515A Reaction bombardment method for improving surface finish degree of diamond |
| 09/02/2004 | US20040171272 Method of etching metallic materials to form a tapered profile |
| 09/02/2004 | US20040168766 Monitoring, controlling gas supply ; evacuated enclosure; controlling circulation ratio |
| 09/01/2004 | EP1451892A1 Plasma production device and method and rf driver circuit |
| 09/01/2004 | CN1524812A Surface treatment method of forming die, the forming die and optical elements |
| 08/31/2004 | US6784112 Method for surface treatment of silicon based substrate |
| 08/31/2004 | US6783998 Conductive thin film, a capacitor using the same and a method of manufacturing thereof |
| 08/31/2004 | US6783628 Plasma processing apparatus |
| 08/26/2004 | WO2004071722A1 Microedged shaving surface and a method for making the same |
| 08/26/2004 | WO2004050936A3 Method for cleaning a process chamber |
| 08/26/2004 | US20040163764 Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor |
| 08/26/2004 | US20040163591 Coating agent, plasma-resistant component having coating film formed by the coating agent, plasma processing device provided with the plasma-resistant component |
| 08/25/2004 | EP1274499A4 Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas |
| 08/25/2004 | CN1523212A Compressor wheel assembly |
| 08/25/2004 | CN1163949C Low pressure and low power Cl2/HCl process for sub-micron metal etching |
| 08/24/2004 | US6780341 Apparatus and method for enhancing the uniform etching capability of an ion beam grid |
| 08/24/2004 | US6780278 Plasma processing apparatus with reduced parasitic capacity and loss in RF power |
| 08/19/2004 | WO2004070813A1 Plasma processing apparatus and method |
| 08/19/2004 | WO2004070808A1 Plasma treating device, and plasma treating device electrode plate, and electrode plate producing method |
| 08/19/2004 | WO2004053197A9 Metal engraving method, article, and apparatus |
| 08/18/2004 | CN1522457A Chamber components having textured surfaces and method of manufacture |
| 08/18/2004 | CN1521805A Plasma processing device, annular element and plasma processing method |
| 08/17/2004 | US6777342 Method of plasma etching platinum |
| 08/17/2004 | US6777045 Chamber components having textured surfaces and method of manufacture |
| 08/12/2004 | US20040155592 Magnetic mirror plasma source |
| 08/11/2004 | EP1444726A1 Method and apparatus for the etching of photomask substrates using pulsed plasma |
| 08/11/2004 | EP1444717A2 Tunable multi-zone gas injection system |
| 08/11/2004 | CN1161824C PLasma etch reactor and method |
| 08/10/2004 | US6774569 Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions |
| 08/05/2004 | US20040151841 Forming mixed oxide interface; heating spraying |
| 08/05/2004 | US20040149208 Particle control device and particle control method for vacuum processing apparatus |
| 08/05/2004 | DE10345962A1 Substrat und Verfahren zum Bilden eines Substrats für eine Fluidausstoßvorrichtung Substrate and method for forming a substrate for a fluid ejection device |
| 08/04/2004 | CN1517216A Substrate for fluid jet device and method for forming substrate |
| 08/03/2004 | US6770214 Etching a boron trichloride plasma |
| 07/27/2004 | US6767838 Method and apparatus for treating surface of semiconductor |
| 07/22/2004 | US20040141027 Substrate and method of forming substrate for fluid ejection device |
| 07/20/2004 | US6764924 Process for producing a tool insert for injection molding a part with single-stage microstructures |
| 07/20/2004 | US6764606 Method and apparatus for plasma processing |
| 07/20/2004 | US6764575 Magnetron plasma processing apparatus |
| 07/15/2004 | US20040137733 GCIB processing of integrated circuit interconnect structures |
| 07/14/2004 | EP1437424A2 Method and apparatus for smoothing surfaces on an atomic scale |
| 07/14/2004 | CN1512272A Method for producing semiconductor device using argon fluoride exposure light source |
| 07/08/2004 | US20040132287 Dry etch process for copper |
| 07/08/2004 | US20040129675 Method and device for treating a substrate |
| 07/07/2004 | CN1156898C Method and apparatus for etching gold metal layer using titanium hardmask |
| 07/06/2004 | US6759263 Method of patterning a layer of magnetic material |
| 07/01/2004 | US20040127037 Method for fabricating semiconductor device using ArF photolithography capable of protecting tapered profile of hard mask |
| 07/01/2004 | US20040124176 Palsma etchingm method |
| 06/30/2004 | EP1432847A1 Method for removing at least one area of a layer of a component consisting of metal or a metal compound |
| 06/29/2004 | US6755935 Plasma processing apparatus |
| 06/24/2004 | WO2004053197A2 Metal engraving method, article, and apparatus |
| 06/24/2004 | US20040118823 Laser-induced plasma micromachining |
| 06/23/2004 | EP1430987A1 Laser-induced plasma micromachining |
| 06/23/2004 | CN1507652A Coating agent, plasma-resistant component having coating film fomed by the coating agent, plasma processing device provided with the plasma-resistant component |
| 06/23/2004 | CN1506172A Dry cleaning method for plasma reaction chamber |
| 06/17/2004 | WO2004050936A2 Method for cleaning a process chamber |
| 06/17/2004 | US20040115071 Compressor wheel assembly |
| 06/17/2004 | US20040112863 Method of enhancing surface reactions by local resonant heating |
| 06/17/2004 | US20040112857 Metal dry etch using electronic field |
| 06/17/2004 | DE10255988A1 Verfahren zum Reinigen einer Prozesskammer A method of cleaning a process chamber |
| 06/16/2004 | EP0683921B1 Microstructures and single mask, single-crystal process for fabrication thereof |
| 06/16/2004 | CN1505694A Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases |
| 06/16/2004 | CN1505112A Inductive coupling plasma etching machine platform and electrode arrangement thereof |
| 06/16/2004 | CN1154172C Outline-control method for etching metal layer |
| 06/16/2004 | CN1154161C Plasma processing apparatus |
| 06/16/2004 | CN1154158C Method for manufacturing semiconductor device in which etching end point is monitored and multi-layer wiring structure formed by the same |
| 06/15/2004 | US6749770 Heating; plasma etching |
| 06/10/2004 | WO2004049420A1 Plasma processing apparatus and method |
| 06/10/2004 | WO2004049419A1 Plasma processing method and apparatus |
| 06/10/2004 | WO2003089990A3 Process for etching photomasks |
| 06/09/2004 | CN1503330A Method for manufacturing semiconductor device and multi-layer wiring structure formed by the same |
| 06/08/2004 | US6747239 Plasma processing apparatus and method |
| 06/03/2004 | US20040104507 Process for producing a tool insert for injection molding a part with single-stage microstructures |
| 06/02/2004 | EP1423870A2 Process for charged particle beam micro-machining of copper |
| 05/27/2004 | WO2004044954A2 Gcib processing of integrated circuit interconnect structures |
| 05/27/2004 | US20040101767 Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof |
| 05/26/2004 | EP1422193A1 Process to fabricate a Tool Insert for Injection Moulding a Piece with one-level microstructures |
| 05/26/2004 | EP0986461A4 Method of forming a silicon layer on a surface |
| 05/20/2004 | US20040097091 Gas for removing deposit and removal method using same |
| 05/20/2004 | US20040094504 Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof |
| 05/19/2004 | EP0846191A4 Plasma device and method utilizing azimuthally and axially uniform electric field |
| 05/19/2004 | CN1498057A Induction coupling plasma generating equipment containing zigzag coil antenna |
| 05/18/2004 | US6736931 Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor |
| 05/18/2004 | US6736930 Microwave plasma processing apparatus for controlling a temperature of a wavelength reducing member |
| 05/11/2004 | US6734983 Sensor body for detecting monitor light; plurality of detachable collector barrels to guide |
| 05/06/2004 | US20040084416 Plasma treatment, ashing treatment and/or hot water rinse treatment |
| 05/06/2004 | US20040084151 Magnetron plasma etching apparatus |
| 05/05/2004 | CN1148789C Method and apparatus for etching semiconductor wafer |
| 05/05/2004 | CN1148466C Apparatus and method of removing residual reaction gas from dry etcher |
| 05/04/2004 | US6730370 Method and apparatus for processing materials by applying a controlled succession of thermal spikes or shockwaves through a growth medium |
| 05/04/2004 | US6730369 Using electron cyclotron resonance; bent waveguide maintaining constant relative positioning |
| 05/04/2004 | US6730237 Absorbing halogen gas onto exposed surface, removing , then etching/milling; semiconductors |
| 04/29/2004 | US20040079729 Process for etching metal layer |