| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 01/06/2005 | WO2005001161A1 Mask material for reactive ion etching, mask and dry etching method |
| 01/06/2005 | US20050003673 Thin film resistor etch |
| 01/06/2005 | US20050003672 Method and apparatus for smoothing surfaces on an atomic scale |
| 01/06/2005 | US20050001527 Plasma processing apparatus |
| 01/06/2005 | US20050000442 Upper electrode and plasma processing apparatus |
| 01/05/2005 | CN1182952C Micro structure and its manufacture method |
| 01/04/2005 | US6838389 High selectivity etching of a lead overlay structure |
| 01/04/2005 | US6838384 Thin-film patterning method, manufacturing method of thin-film device and manufacturing method of thin-film magnetic head |
| 01/04/2005 | US6838126 Method for forming I-carbon film |
| 12/30/2004 | US20040265703 Method for dry etching photomask material |
| 12/30/2004 | US20040262264 Improved cd uniformity of chrome etch to photomask process |
| 12/29/2004 | WO2004114357A1 Method and device for removing layers in some areas of glass plates |
| 12/28/2004 | US6835665 Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the method |
| 12/28/2004 | US6835276 Window for allowing end point of etching process to be detected and etching device comprising the same |
| 12/23/2004 | US20040259367 Etching of chromium layers on photomasks utilizing high density plasma and low frequency RF bias |
| 12/23/2004 | DE10324570A1 Surface treatment by spark erosion of metal or metal compounds, especially from the surface of an engine with an aluminum-silicate cylinder running surface, whereby the cylinder itself acts as the cathode for plasma formation |
| 12/21/2004 | US6833769 Voltage controlled capacitive elements having a biasing network |
| 12/21/2004 | US6833079 Method of etching a shaped cavity |
| 12/16/2004 | US20040253817 Structure manufacturing method |
| 12/15/2004 | EP1097257B1 Methods for etching an aluminum-containing layer |
| 12/15/2004 | CN1180460C 蚀刻方法 Etching method |
| 12/14/2004 | US6830702 Single trench alternating phase shift mask fabrication |
| 12/09/2004 | US20040244817 Method for removing at least one area of a layer of a component consisting of metal or a metal compound |
| 12/09/2004 | DE10360969A1 Verfahren zum Trockenätzen eines mehrlagigen Schichtmaterials A method for dry etching of a multilayer coating material |
| 12/08/2004 | EP1484788A1 High-frequency power supply structure and plasma cvd device using the same |
| 12/08/2004 | EP1392882B1 Method for treating a substrate |
| 12/07/2004 | US6827871 Ruthenium and ruthenium dioxide removal method and material |
| 12/02/2004 | US20040238492 Planarization with reduced dishing |
| 12/02/2004 | US20040238126 Plasma processing apparatus with reduced parasitic capacity and loss in RF power |
| 12/01/2004 | CN1551305A Plasma processing apparatus and control method thereof |
| 12/01/2004 | CN1551302A Upper electrode and plasma processing device |
| 12/01/2004 | CN1550575A Method of dry-etching a multi-layer film material |
| 11/30/2004 | US6824655 Process for charged particle beam micro-machining of copper |
| 11/30/2004 | US6823815 Wafer area pressure control for plasma confinement |
| 11/25/2004 | WO2004102650A1 Plasma processing device |
| 11/25/2004 | WO2004102634A2 Metal mems devices and methods of making same |
| 11/25/2004 | US20040235199 Method for fabricating a nanoarray using the self-assembly of supramolecules and staining of metals |
| 11/25/2004 | US20040231597 Apparatus and method for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation |
| 11/25/2004 | CA2522606A1 Metal mems devices and methods of making same |
| 11/24/2004 | CN1550037A Process for charged particle beam micro-machining of copper |
| 11/24/2004 | CN1549874A Method for removing at least one area of a layer of a component consisting of metal or a metal compound |
| 11/24/2004 | CN1549298A Corona disposal equipment |
| 11/23/2004 | US6822245 Ion beam apparatus and sample processing method |
| 11/23/2004 | US6821901 Method of through-etching substrate |
| 11/23/2004 | US6821451 Dry etching method, microfabrication process and dry etching mask |
| 11/23/2004 | US6821450 Substrate and method of forming substrate for fluid ejection device |
| 11/23/2004 | US6821377 Plasma processing apparatus |
| 11/18/2004 | WO2004099875A2 Etching of chromium layers on photomasks utilizing high density plasma and low frequency rf bias |
| 11/18/2004 | US20040226924 Method of thermal processing of a metal workpiece |
| 11/18/2004 | US20040226914 Apparatus and method for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation |
| 11/18/2004 | US20040226911 Low-temperature etching environment |
| 11/18/2004 | US20040226815 Plasma processing apparatus and control method thereof |
| 11/16/2004 | US6818560 Plasma processing apparatus and plasma processing method |
| 11/11/2004 | US20040222185 a combination of a gas containing a carbonyl group, a gas with a halogen element, and an electron donating gas is used as an etching gas; better etching rate and anisotropy |
| 11/11/2004 | US20040221812 Method and apparatus for processing materials by applying a controlled succession of thermal spikes or shockwaves through a growth medium |
| 11/11/2004 | DE10313502A1 Walzprodukt, Verfahren und Vorrichtung zu dessen Herstellung sowie Verwendung des Walzproduktes Rolled product, method and apparatus for its production and use of the rolled product |
| 11/10/2004 | EP1475848A1 Process for defining a chalcogenide material layer, in particular in a process for manufacturing phase change memory cells |
| 11/10/2004 | EP1475461A1 Methods for etching an aluminum-containing layer |
| 11/10/2004 | CN2654619Y Lower electrode substrate pressing device for etching machine |
| 11/09/2004 | US6815365 Plasma etching apparatus and plasma etching method |
| 11/09/2004 | US6814838 Induction coil generates treatment plasma in discharge chamber located in interior of coil; with slotted screen; semiconductors |
| 11/04/2004 | US20040217367 Znse diffraction type optical component and method for fabricating the same |
| 11/04/2004 | US20040217087 Boron trichloride-based plasma etch |
| 11/03/2004 | EP1473105A2 Apparatus and method for removal of surface oxides via fluxless technique involving electron attachement and remote ion generation |
| 10/28/2004 | WO2004093178A1 Method for etching chromium thin film and method for producing photomask |
| 10/28/2004 | WO2004093175A1 Hydrogen plasma downflow processing method and hydrogen plasma downflow processing apparatus |
| 10/28/2004 | WO2004053197A3 Metal engraving method, article, and apparatus |
| 10/28/2004 | WO2003085172A3 Method of etching a magnetic material and for fabricating a mram device |
| 10/27/2004 | CN1540323A Plasma Monitoring method, plasma monitor and plasma treatment appts. |
| 10/21/2004 | US20040209477 Methods for substrate orientation |
| 10/21/2004 | US20040209476 Method of fabricating a magneto-resistive random access memory (MRAM) device |
| 10/21/2004 | US20040209471 Method for fabricating liquid crystal display panel array |
| 10/21/2004 | US20040207074 Metal MEMS devices and methods of making same |
| 10/21/2004 | US20040206724 Plasma etching metal layer made up of tantalum, titanium and hafnium and tantalum silicon nitride, titanium or tungsten nitride. Fluorine gasmixture with etch selectivity for hafnium gas. Computer readable medium with nitrides and plasma etching |
| 10/20/2004 | EP1469511A2 Method of fabricating a magneto-resistive random access memory (MRAM) device |
| 10/20/2004 | CN1538507A Gas distribution system of semiconductor machine table gas reaction chamber and method |
| 10/19/2004 | US6806198 Gas-assisted etch with oxygen |
| 10/19/2004 | US6805807 Adaptive GCIB for smoothing surfaces |
| 10/14/2004 | US20040203249 Dummy copper deprocessing |
| 10/14/2004 | US20040200805 Metal engraving method, article, and apparatus |
| 10/07/2004 | WO2004086143A2 Multi-step process for etching photomasks |
| 10/07/2004 | WO2004085084A1 Rolled product, method and device for the production thereof, and use of the same |
| 10/06/2004 | EP1465243A2 Dummy copper deprocessing |
| 09/30/2004 | US20040192062 Process to pattern thick TiW metal layers using uniform and selective etching |
| 09/30/2004 | US20040192059 Method for etching a titanium-containing layer prior to etching an aluminum layer in a metal stack |
| 09/30/2004 | US20040188380 Dry etch process to edit copper lines |
| 09/29/2004 | CN1533445A Method and device for treating substrate |
| 09/29/2004 | CN1532895A Substrate supporting structure |
| 09/23/2004 | WO2004081967A1 Method for etching a sample and etching system |
| 09/23/2004 | US20040185636 Method of forming a substrste having a surface comprising at least one of Pt, Pd, Co and Au in at least one of element and alloy forms |
| 09/23/2004 | US20040183610 System and method for tuning an oscillator |
| 09/23/2004 | US20040183453 Plasma processing apparatus |
| 09/23/2004 | US20040182513 Measurement of etching |
| 09/23/2004 | DE10310524A1 Sample etching method for use in a plasma etching installation in which the flow to the reaction chamber is first set and stabilized using an inert reference gas |
| 09/22/2004 | EP0865664B1 Process for anisotropic plasma etching of different substrates |
| 09/21/2004 | US6794757 Structure and method of forming an enlarged head on a plug to eliminate the enclosure requirement |
| 09/21/2004 | US6793832 Plasma etching method |
| 09/16/2004 | WO2004079045A1 Dry etching method for magnetic material, magnetic material and magnetic recording medium |
| 09/16/2004 | US20040180158 Chamber having components with textured surfaces and method of manufacture |
| 09/16/2004 | US20040177517 Microedged shaving surface and a method for making the same |