Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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11/23/2005 | EP1597035A1 Microedged shaving surface and a method for making the same |
11/23/2005 | EP1383939B1 Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases |
11/22/2005 | US6967334 Ion source and ion beam device |
11/17/2005 | WO2005108000A1 A method of laser etching a structure by first radiating areas of the structure for altering the crystallinity |
11/17/2005 | US20050254289 Magnetic memory device and method of manufacturing the same |
11/17/2005 | US20050252885 Plasma etching method and apparatus |
11/17/2005 | US20050252529 Low temperature CVD chamber cleaning using dilute NF3 |
11/17/2005 | DE102004020768A1 Plasmareaktor mit hoher Produktivität Plasma reactor with high productivity |
11/16/2005 | EP1595973A1 Low temperature CVD chamber cleaning using dilute NF3 |
11/16/2005 | CN1696350A Method for removing coat layer on surface of coated hard alloy |
11/16/2005 | CN1227389C In-situ monitoring plasma etching apparatus and method |
11/16/2005 | CN1227385C Apparatus for surface modification of polymer, metal and ceramic materials using ion bean |
11/15/2005 | US6965138 Magnetic memory device and method of manufacturing the same |
11/10/2005 | US20050250337 Selective dry etching of tantalum and tantalum nitride |
11/10/2005 | US20050249643 Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas |
11/09/2005 | EP1594161A1 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
11/02/2005 | CN1691138A Thin-film magnetic head and manufacturing method, head gimbal assembly with thin-film magnetic head, and magnetic disk apparatus |
11/01/2005 | US6960533 Method of processing a sample surface having a masking material and an anti-reflective film using a plasma |
11/01/2005 | US6960413 Multi-step process for etching photomasks |
10/27/2005 | US20050237669 Manufacturing method of thin-film magnetic head, thin-film magnetic head, head gimbal assembly with thin-film magnetic head, and magnetic disk apparatus with head gimbal assembly |
10/27/2005 | US20050236379 Etching |
10/27/2005 | US20050236374 Device for processing welding wire |
10/20/2005 | WO2005098086A2 Remote chamber methods for removing surface deposits |
10/20/2005 | US20050230838 Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same |
10/20/2005 | US20050230046 Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto |
10/19/2005 | EP1587131A2 Plasma reactor with high productivity |
10/19/2005 | EP1586405A1 Cyclic structure formation method and surface treatment method |
10/19/2005 | CN1224298C Electric plasma processing device |
10/13/2005 | WO2005095670A2 Remote chamber methods for removing surface deposits |
10/13/2005 | US20050227470 Method for manufacturing a semiconductor device having a W/WN/polysilicon layered film |
10/13/2005 | US20050224456 Anisotropic dry etching of cu-containing layers |
10/13/2005 | US20050224344 Plasma processing apparatus and method |
10/13/2005 | US20050224178 Heating jacket for plasma etching reactor, and etching method using same |
10/13/2005 | DE102004012848A1 Device for optionally reactive plasma etching of mostly flat objects including a hollow cathode, an anode and a magnetic device useful useful in coating technology for production of clean surfaces prior to coating |
10/13/2005 | DE102004012847A1 Device for optionally reactive plasma etching of flat objects useful in coating technology for production of clean surfaces prior to coating |
10/13/2005 | DE102004012846A1 Removing hot gas corrosion protection layers on especially turbine blades involves reactive or non-reactive vacuum etching with component in contact with high density plasma from which gas ions are extracted using negative bias potential |
10/12/2005 | CN1681093A Method for manufacturing a semiconductor device having a W/WN/polysilicon layered film |
10/11/2005 | US6953005 Plasma processing apparatus utilizing a surface wave plasma |
10/06/2005 | WO2005094140A1 Plasma generating equipment |
10/05/2005 | CN1677624A Plasma processing device and method thereof |
09/29/2005 | WO2005090638A2 Remote chamber methods for removing surface deposits |
09/29/2005 | US20050211670 Providing a nickel-containing layer overlying a substrate;introducing gas comprising a carbonyl gas and a hydrogen halide gas;forming plasma from said process gas; etching nickel-containing layer by exposing nickel-containing layer to plasma |
09/29/2005 | US20050211385 Method and apparatus for controlling spatial temperature distribution |
09/27/2005 | US6949174 Milling apparatus |
09/22/2005 | US20050205524 Method of manufacturing tape wiring substrate |
09/22/2005 | DE19901002B4 Verfahren zum Strukturieren einer Schicht A method for patterning a layer |
09/21/2005 | CN1671270A Method of manufacturing tape wiring substrate |
09/14/2005 | CN1219419C Substrate electrode material processing apparatus and method |
09/13/2005 | US6942813 Method of etching magnetic and ferroelectric materials using a pulsed bias source |
09/07/2005 | EP1569806A2 Metal engraving method, article, and apparatus |
09/06/2005 | US6939795 Selective dry etching of tantalum and tantalum nitride |
09/01/2005 | US20050191437 Method of forming a catalytic surface comprising at least one of Pt, Pd, Co and Au in at least one of elemental and alloy forms |
08/30/2005 | US6936180 Thin-film patterning method, manufacturing method of thin-film device and manufacturing method of thin-film magnetic head |
08/25/2005 | WO2005078782A1 Plasma processing apparatus and plasma processing method |
08/24/2005 | EP1565933A2 Gcib processing of integrated circuit interconnect structures |
08/24/2005 | EP1565592A2 Method for cleaning a process chamber |
08/23/2005 | US6934032 Copper oxide monitoring by scatterometry/ellipsometry during nitride or BLOK removal in damascene process |
08/23/2005 | US6933460 Method and device for plasma treatment of moving metal substrates |
08/23/2005 | US6933025 Chamber having components with textured surfaces and method of manufacture |
08/11/2005 | US20050174200 Fabrication method of multiple band surface acoustic wave devices |
08/11/2005 | US20050173404 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support |
08/11/2005 | US20050173403 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support |
08/11/2005 | US20050172904 Plasma processing apparatus and plasma processing method |
08/10/2005 | CN1653581A Stabilization of electronegative plasmas with feedback control of RF generator systems |
08/09/2005 | US6927940 Method for seed layer removal for magnetic heads |
08/09/2005 | US6926800 Plasma etching method and apparatus |
08/09/2005 | US6926799 Etching apparatus using neutral beam |
08/04/2005 | WO2005071721A1 Plasma etching process |
08/04/2005 | US20050170196 Substrate having catalyst layer thereon and method of cleaning reaction chamber using the same |
08/03/2005 | CN1212883C One-dimensional hydrogen-storing carbon nano-material etched via microwave plasma and its prepn process |
08/02/2005 | US6924023 Method of manufacturing a structure having pores |
07/28/2005 | WO2005069701A1 Plasma processing apparatus |
07/28/2005 | US20050164513 Plasma etch reactor and method |
07/27/2005 | EP1557879A2 Method of forming connection hole |
07/26/2005 | US6921491 Method for forming a groove and method for manufacturing an optical waveguide element |
07/20/2005 | CN1641841A Plasma processing method and apparatus |
07/19/2005 | US6919280 Method of removing magnetoresistive sensor cap by reactive ion etching |
07/19/2005 | US6919168 Etching noble metal electrode using plasma etchant |
07/14/2005 | WO2005017949A3 Method for high-resolution processing of thin layers with electron beams |
07/14/2005 | US20050154482 Plasma processing method and apparatus |
07/14/2005 | US20050153516 Method for etching upper metal of capacitator |
07/13/2005 | CN1639831A Tunable multi-zone gas injection system |
07/13/2005 | CN1638598A Plasma treatment device and substrate surface treatment device |
07/13/2005 | CN1210768C Plasma processing device |
07/06/2005 | CN1209799C Method of etching silicon in high ratio between depth and width |
06/30/2005 | WO2004099875A3 Etching of chromium layers on photomasks utilizing high density plasma and low frequency rf bias |
06/29/2005 | EP1432847B8 Method for removing at least one area of a layer of a component consisting of metal or a metal compound |
06/28/2005 | US6911779 Magnetic mirror plasma source |
06/28/2005 | US6911346 Method of etching a magnetic material |
06/23/2005 | US20050133162 Plasma processing apparatus and plasma processing method |
06/21/2005 | US6908562 Method of forming electrode for saw device |
06/16/2005 | WO2005055680A1 Method of manufacturing an electrical component |
06/16/2005 | US20050127032 Master for concavo-convex pattern transfer and method for manufacturing stamp for manufacturing information recording medium |
06/16/2005 | US20050126918 Surface treatment process for enhancing a release rate of metal ions from a sacrificial electrode and a related sacrificial electrode |
06/16/2005 | US20050126711 Plasma processing apparatus |
06/15/2005 | CN1628340A Method for seed layer removal for magnetic heads |
06/15/2005 | CN1626718A Method for making sliding part and said sliding part, and sewing machine |
06/14/2005 | US6905969 Plasma etch reactor and method |
06/14/2005 | US6905663 Heating, supplying catalyst, reduction using steam, hydrogen and methane |
06/14/2005 | US6905625 Plasma processing method and apparatus |