Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769)
11/2005
11/23/2005EP1597035A1 Microedged shaving surface and a method for making the same
11/23/2005EP1383939B1 Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases
11/22/2005US6967334 Ion source and ion beam device
11/17/2005WO2005108000A1 A method of laser etching a structure by first radiating areas of the structure for altering the crystallinity
11/17/2005US20050254289 Magnetic memory device and method of manufacturing the same
11/17/2005US20050252885 Plasma etching method and apparatus
11/17/2005US20050252529 Low temperature CVD chamber cleaning using dilute NF3
11/17/2005DE102004020768A1 Plasmareaktor mit hoher Produktivität Plasma reactor with high productivity
11/16/2005EP1595973A1 Low temperature CVD chamber cleaning using dilute NF3
11/16/2005CN1696350A Method for removing coat layer on surface of coated hard alloy
11/16/2005CN1227389C In-situ monitoring plasma etching apparatus and method
11/16/2005CN1227385C Apparatus for surface modification of polymer, metal and ceramic materials using ion bean
11/15/2005US6965138 Magnetic memory device and method of manufacturing the same
11/10/2005US20050250337 Selective dry etching of tantalum and tantalum nitride
11/10/2005US20050249643 Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas
11/09/2005EP1594161A1 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
11/02/2005CN1691138A Thin-film magnetic head and manufacturing method, head gimbal assembly with thin-film magnetic head, and magnetic disk apparatus
11/01/2005US6960533 Method of processing a sample surface having a masking material and an anti-reflective film using a plasma
11/01/2005US6960413 Multi-step process for etching photomasks
10/2005
10/27/2005US20050237669 Manufacturing method of thin-film magnetic head, thin-film magnetic head, head gimbal assembly with thin-film magnetic head, and magnetic disk apparatus with head gimbal assembly
10/27/2005US20050236379 Etching
10/27/2005US20050236374 Device for processing welding wire
10/20/2005WO2005098086A2 Remote chamber methods for removing surface deposits
10/20/2005US20050230838 Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same
10/20/2005US20050230046 Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto
10/19/2005EP1587131A2 Plasma reactor with high productivity
10/19/2005EP1586405A1 Cyclic structure formation method and surface treatment method
10/19/2005CN1224298C Electric plasma processing device
10/13/2005WO2005095670A2 Remote chamber methods for removing surface deposits
10/13/2005US20050227470 Method for manufacturing a semiconductor device having a W/WN/polysilicon layered film
10/13/2005US20050224456 Anisotropic dry etching of cu-containing layers
10/13/2005US20050224344 Plasma processing apparatus and method
10/13/2005US20050224178 Heating jacket for plasma etching reactor, and etching method using same
10/13/2005DE102004012848A1 Device for optionally reactive plasma etching of mostly flat objects including a hollow cathode, an anode and a magnetic device useful useful in coating technology for production of clean surfaces prior to coating
10/13/2005DE102004012847A1 Device for optionally reactive plasma etching of flat objects useful in coating technology for production of clean surfaces prior to coating
10/13/2005DE102004012846A1 Removing hot gas corrosion protection layers on especially turbine blades involves reactive or non-reactive vacuum etching with component in contact with high density plasma from which gas ions are extracted using negative bias potential
10/12/2005CN1681093A Method for manufacturing a semiconductor device having a W/WN/polysilicon layered film
10/11/2005US6953005 Plasma processing apparatus utilizing a surface wave plasma
10/06/2005WO2005094140A1 Plasma generating equipment
10/05/2005CN1677624A Plasma processing device and method thereof
09/2005
09/29/2005WO2005090638A2 Remote chamber methods for removing surface deposits
09/29/2005US20050211670 Providing a nickel-containing layer overlying a substrate;introducing gas comprising a carbonyl gas and a hydrogen halide gas;forming plasma from said process gas; etching nickel-containing layer by exposing nickel-containing layer to plasma
09/29/2005US20050211385 Method and apparatus for controlling spatial temperature distribution
09/27/2005US6949174 Milling apparatus
09/22/2005US20050205524 Method of manufacturing tape wiring substrate
09/22/2005DE19901002B4 Verfahren zum Strukturieren einer Schicht A method for patterning a layer
09/21/2005CN1671270A Method of manufacturing tape wiring substrate
09/14/2005CN1219419C Substrate electrode material processing apparatus and method
09/13/2005US6942813 Method of etching magnetic and ferroelectric materials using a pulsed bias source
09/07/2005EP1569806A2 Metal engraving method, article, and apparatus
09/06/2005US6939795 Selective dry etching of tantalum and tantalum nitride
09/01/2005US20050191437 Method of forming a catalytic surface comprising at least one of Pt, Pd, Co and Au in at least one of elemental and alloy forms
08/2005
08/30/2005US6936180 Thin-film patterning method, manufacturing method of thin-film device and manufacturing method of thin-film magnetic head
08/25/2005WO2005078782A1 Plasma processing apparatus and plasma processing method
08/24/2005EP1565933A2 Gcib processing of integrated circuit interconnect structures
08/24/2005EP1565592A2 Method for cleaning a process chamber
08/23/2005US6934032 Copper oxide monitoring by scatterometry/ellipsometry during nitride or BLOK removal in damascene process
08/23/2005US6933460 Method and device for plasma treatment of moving metal substrates
08/23/2005US6933025 Chamber having components with textured surfaces and method of manufacture
08/11/2005US20050174200 Fabrication method of multiple band surface acoustic wave devices
08/11/2005US20050173404 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support
08/11/2005US20050173403 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support
08/11/2005US20050172904 Plasma processing apparatus and plasma processing method
08/10/2005CN1653581A Stabilization of electronegative plasmas with feedback control of RF generator systems
08/09/2005US6927940 Method for seed layer removal for magnetic heads
08/09/2005US6926800 Plasma etching method and apparatus
08/09/2005US6926799 Etching apparatus using neutral beam
08/04/2005WO2005071721A1 Plasma etching process
08/04/2005US20050170196 Substrate having catalyst layer thereon and method of cleaning reaction chamber using the same
08/03/2005CN1212883C One-dimensional hydrogen-storing carbon nano-material etched via microwave plasma and its prepn process
08/02/2005US6924023 Method of manufacturing a structure having pores
07/2005
07/28/2005WO2005069701A1 Plasma processing apparatus
07/28/2005US20050164513 Plasma etch reactor and method
07/27/2005EP1557879A2 Method of forming connection hole
07/26/2005US6921491 Method for forming a groove and method for manufacturing an optical waveguide element
07/20/2005CN1641841A Plasma processing method and apparatus
07/19/2005US6919280 Method of removing magnetoresistive sensor cap by reactive ion etching
07/19/2005US6919168 Etching noble metal electrode using plasma etchant
07/14/2005WO2005017949A3 Method for high-resolution processing of thin layers with electron beams
07/14/2005US20050154482 Plasma processing method and apparatus
07/14/2005US20050153516 Method for etching upper metal of capacitator
07/13/2005CN1639831A Tunable multi-zone gas injection system
07/13/2005CN1638598A Plasma treatment device and substrate surface treatment device
07/13/2005CN1210768C Plasma processing device
07/06/2005CN1209799C Method of etching silicon in high ratio between depth and width
06/2005
06/30/2005WO2004099875A3 Etching of chromium layers on photomasks utilizing high density plasma and low frequency rf bias
06/29/2005EP1432847B8 Method for removing at least one area of a layer of a component consisting of metal or a metal compound
06/28/2005US6911779 Magnetic mirror plasma source
06/28/2005US6911346 Method of etching a magnetic material
06/23/2005US20050133162 Plasma processing apparatus and plasma processing method
06/21/2005US6908562 Method of forming electrode for saw device
06/16/2005WO2005055680A1 Method of manufacturing an electrical component
06/16/2005US20050127032 Master for concavo-convex pattern transfer and method for manufacturing stamp for manufacturing information recording medium
06/16/2005US20050126918 Surface treatment process for enhancing a release rate of metal ions from a sacrificial electrode and a related sacrificial electrode
06/16/2005US20050126711 Plasma processing apparatus
06/15/2005CN1628340A Method for seed layer removal for magnetic heads
06/15/2005CN1626718A Method for making sliding part and said sliding part, and sewing machine
06/14/2005US6905969 Plasma etch reactor and method
06/14/2005US6905663 Heating, supplying catalyst, reduction using steam, hydrogen and methane
06/14/2005US6905625 Plasma processing method and apparatus
1 ... 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 ... 48