| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 06/07/2006 | EP1664924A2 Method for high-resolution processing of thin layers with electron beams |
| 06/07/2006 | CN1784510A Mask material for reactive ion etching, mask and dry etching method |
| 06/07/2006 | CN1783431A Plasma processing apparatus |
| 06/07/2006 | CN1783430A Capacitive coupling plasma processing apparatus |
| 06/07/2006 | CN1783429A Plasma control method and plasma control apparatus |
| 06/07/2006 | CN1782133A Sulfur hexafluoride remote plasma source clean |
| 06/01/2006 | US20060112976 Method for removing at least one partial area of a component made of metal or a metallic compound |
| 05/31/2006 | CN1779938A Method and apparatus for controlling temperature of a substrate |
| 05/31/2006 | CN1779924A Wafer bevel polymer removal |
| 05/31/2006 | CN1779921A Internal focusing ring for etching plasma |
| 05/31/2006 | CN1779905A Substrate processing system |
| 05/31/2006 | CN1778993A High-precision sculpturing method of thick aluminium by dry method |
| 05/31/2006 | CN1778990A Surface treatment for improving metal welding performance and work pieces therefrom |
| 05/31/2006 | CN1257999C Apparatus for exhaust white powder elimination in substrate processing |
| 05/25/2006 | US20060108323 Dry etching method |
| 05/24/2006 | CN1776889A Focus ring, plasma etching apparatus and plasma etching method |
| 05/23/2006 | US7048869 Etching silicon oxide with fluorohydrocarbon or fluorine; controlling temperature |
| 05/23/2006 | US7048866 Metal/ceramic bonding article and method for producing same |
| 05/18/2006 | US20060102587 supplying plasma excitation power to a dry etching gas comprising Cl2 and O2 to excite plasma in chamber so that a chemical species is generated, etching a light-shielding film; add He to the dry etching gas in order to stabilize the plasma; used in semiconductor device |
| 05/11/2006 | US20060096706 Dry etching apparatus and a method of manufacturing a semiconductor device |
| 05/04/2006 | WO2005098086A3 Remote chamber methods for removing surface deposits |
| 05/04/2006 | WO2005095670A3 Remote chamber methods for removing surface deposits |
| 05/03/2006 | CN1767146A Substrate processing apparatus, pressure control method for substrate processing apparatus |
| 05/03/2006 | CN1767145A Vacuum treatment device |
| 05/02/2006 | US7037732 Method and device for cutting wire formed on semiconductor substrate |
| 04/27/2006 | DE102004019741B4 Plasmareaktor zur Oberflächenmodifikation von Gegenständen A plasma reactor for surface modification of articles |
| 04/26/2006 | CN1763913A Substrate processing apparatus and substrate processing method |
| 04/26/2006 | CN1763912A Gas diffusion plate |
| 04/26/2006 | CN1253927C Substrate supporting structure |
| 04/20/2006 | DE102004049825A1 To remove the protective coating from the surface of an aircraft engine gas turbine vane, for surface repair, the coating is broken down by a chemical for removal by blasting while untreated surfaces are shrouded against chemical attack |
| 04/20/2006 | DE102004049233A1 Verfahren zur Mikrostrukturierung von Substraten aus Flachglas A process for micro-structuring of substrates made of plate glass |
| 04/19/2006 | CN1761032A Plasma processing apparatus and plasma processing method |
| 04/19/2006 | CN1760407A Method for preparing thin film of transparent hydrophobic born nitride |
| 04/18/2006 | USRE39064 Electronic device manufacturing apparatus and method for manufacturing electronic device |
| 04/18/2006 | US7029591 Planarization with reduced dishing |
| 04/13/2006 | WO2005090638A3 Remote chamber methods for removing surface deposits |
| 04/11/2006 | US7026253 Method for fabricating semiconductor device using ArF photolithography capable of protecting tapered profile of hard mask |
| 03/29/2006 | EP1640109A2 Method of laser machining of coated sheets |
| 03/29/2006 | EP1639619A1 Method and device for removing layers in some areas of glass plates |
| 03/29/2006 | CN1248549C Induction coupling plasma generating equipment containing zigzag coil antenna |
| 03/28/2006 | US7018934 Methods and apparatus for etching metal layers on substrates |
| 03/28/2006 | US7018015 Substrate and method of forming substrate for fluid ejection device |
| 03/23/2006 | US20060060565 Method of etching metals with high selectivity to hafnium-based dielectric materials |
| 03/22/2006 | EP1638139A1 Plasma processing device |
| 03/22/2006 | CN1750231A Method and apparatus for removing material from a substrate surface |
| 03/21/2006 | US7014959 CD uniformity of chrome etch to photomask process |
| 03/21/2006 | US7014958 Method for dry etching photomask material |
| 03/16/2006 | WO2006027928A1 Photomask blank, photomask and method for producing those |
| 03/16/2006 | DE10201992B4 Vorrichtung zur plasmagestützten Bearbeitung von Oberflächen planarer Substrate Apparatus for plasma-assisted processing of surfaces of planar substrates |
| 03/15/2006 | EP1345704A4 Method and apparatus for applying controlled succession of thermal spikes or shockwaves through a medium |
| 03/15/2006 | CN1748295A Dry etching method and information recording medium |
| 03/14/2006 | US7010917 Compressor wheel assembly |
| 03/09/2006 | US20060049137 Multi-step process for etching photomasks |
| 03/09/2006 | DE102004041812A1 Reaktor zum Erzeugen von Oberflächenreaktionen und dessen Verwendung A reactor for generation of surface reactions and the use thereof |
| 03/08/2006 | CN1744248A Variable frequency corrosion method of low-voltage anode foil for electrolytic capacitor |
| 03/07/2006 | US7008877 Etching of chromium layers on photomasks utilizing high density plasma and low frequency RF bias |
| 02/28/2006 | US7005242 Magnetic head and method of making the same using an etch-stop layer for removing portions of the capping layer |
| 02/22/2006 | EP1391140A4 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support |
| 02/21/2006 | US7001698 forming a fine pattern, which permits the reduction of the dimensional difference due to the coexistence of coarse and dense patterns within a plane, such as a dry-etching using reactive ion etching gas and a reducing gas |
| 02/15/2006 | CN1734710A Semiconductor processing equipment having tiled ceramic liner |
| 02/08/2006 | CN1730718A Method for physically splash plating multilayer superhard thin film through magnetic control or unequilibrated type magnetic control |
| 02/07/2006 | US6995335 Method of thermal processing of a metal workpiece |
| 02/02/2006 | WO2006011954A2 Diagnostic plasma measurement device having patterned sensors and features |
| 02/01/2006 | CN1727082A Low temperature CVD chamber cleaning using dilute NF3 |
| 02/01/2006 | CN1240116C Dry etching table with vertical wash cleaner |
| 01/31/2006 | US6991847 Light emitting photonic crystals |
| 01/26/2006 | WO2005090638A9 Remote chamber methods for removing surface deposits |
| 01/25/2006 | CN1725306A Method of dry etching, method of manufacturing magnetic recording medium, and magnetic recording medium |
| 01/19/2006 | WO2006006991A1 Method and processing system for controlling a chamber cleaning process |
| 01/19/2006 | WO2006006526A1 Method and device for treating outer periphery of base material |
| 01/19/2006 | US20060014394 Process for low temperature, dry etching, and dry planarization of copper |
| 01/18/2006 | CN1237579C Method for plasma corrosion of irdium-tantalum-oxide electrode, and method for cleaning after corrosion |
| 01/11/2006 | CN1720347A Method for cleaning a process chamber |
| 01/05/2006 | US20060000803 Plasma processing method and apparatus |
| 01/04/2006 | EP1610913A1 Rolled product, method and device for the production thereof, and use of the same |
| 01/04/2006 | CN1717790A Plasma processing method and apparatus |
| 01/04/2006 | CN1717788A Plasma processing method and apparatus |
| 12/29/2005 | US20050284842 Method of dry etching, method of manufacturing magnetic recording medium, and magnetic recording medium |
| 12/29/2005 | US20050284571 Dry-etching method and apparatus |
| 12/29/2005 | US20050284570 Diagnostic plasma measurement device having patterned sensors and features |
| 12/22/2005 | US20050280331 Two-axis device and manufacturing method therefor |
| 12/22/2005 | US20050279457 Plasma processing apparatus and method, and plasma control unit |
| 12/22/2005 | US20050279456 Plasma reactor with high productivity |
| 12/22/2005 | US20050279384 Method and processing system for controlling a chamber cleaning process |
| 12/22/2005 | US20050279382 Method for cleaning a process chamber |
| 12/22/2005 | DE102004031842A1 Inorganic layer removing method for e.g. machining headlight components involves producing plasma jet in working gas containing reactive gas by atmospheric discharge, and directing jet towards inorganic layer to partially melt layer |
| 12/21/2005 | EP1608010A2 Method of forming connection hole |
| 12/21/2005 | EP1608000A2 RF plasma processor |
| 12/15/2005 | WO2005118907A1 Variable quadruple electromagnet array, particularly used in a multi-step process for forming a metal barrier in a sputter reactor |
| 12/15/2005 | US20050276928 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
| 12/15/2005 | DE4412915B4 Plasmabehandlungsanlage, Verfahren zu deren Betrieb und Verwendung derselben Plasma treatment equipment, process for their operation and use of the same |
| 12/14/2005 | CN1231300C Dry cleaning method for plasma reaction chamber |
| 12/08/2005 | US20050272227 Plasma processing apparatus and method |
| 12/08/2005 | US20050269293 Seasoning method for etch chamber |
| 12/07/2005 | EP1602122A1 Method for etching a sample and etching system |
| 12/01/2005 | US20050266593 Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method |
| 12/01/2005 | US20050263390 A tantalum nitride/Ta barrier is first sputter deposited with high target power and wafer bias, argon etching is performed with even higher wafer bias. a flash step is applied with reduced target power and wafer bias; different magnetic field distributions |
| 12/01/2005 | DE10204222B4 Verfahren zur Seitenwandpassivierung beim Plasmaätzen A method for sidewall passivation during plasma etching |
| 11/24/2005 | US20050257891 Plasma processing apparatus |
| 11/24/2005 | US20050257743 Plasma processing apparatus and method |