| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 08/15/2007 | CN2935468Y Improved semiconductor etching machine table |
| 08/15/2007 | CN2935467Y Anti-corrosion aluminum element with multi-coating |
| 08/15/2007 | CN101017771A Gas supply apparatus, substrate processing apparatus and gas supply method |
| 08/15/2007 | CN101017769A Plasma processing apparatus and plasma processing method |
| 08/15/2007 | CN101016630A Plasma etching of tapered structures |
| 08/14/2007 | US7256130 Process for defining a chalcogenide material layer, in particular in a process for manufacturing phase change memory cells |
| 08/08/2007 | CN101013660A Gas supply device, substrate processing apparatus and gas supply method |
| 08/02/2007 | US20070175586 Plasma Processing Apparatus And Plasma Processing Method |
| 08/01/2007 | CN2929958Y Improved semiconductor machine |
| 08/01/2007 | CN1329962C Flat panel display manufacturing apparatus |
| 08/01/2007 | CN101010631A Photomask blank, photomask and method for producing those |
| 08/01/2007 | CN101008072A Apparatus and method to confine plasma and to enhance flow conductance |
| 07/26/2007 | US20070173048 Method of manufacturing an electrical component |
| 07/25/2007 | EP1811335A1 Photomask blank, photomask and method for producing those |
| 07/25/2007 | CN1328413C Method for removing at least one area of a layer of a component consisting of metal or a metal compound |
| 07/25/2007 | CN101005013A Pressure reduction vessel and pressure reduction processing apparatus |
| 07/19/2007 | US20070163993 Planarization with reduced dishing |
| 07/19/2007 | DE102006002758A1 Verfahren und Vorrichtung zur selektiven Entfernung von siliziumhaltigen Kontaminationen auf optischen Oberflächen Method and apparatus for the selective removal of silicon-containing contaminants on optical surfaces |
| 07/18/2007 | CN1327284C Display |
| 07/11/2007 | CN1996549A Cleaning method for TFT dry carving technology |
| 07/11/2007 | CN1326224C Interferometric endpoint detection in a substrate etching process |
| 07/10/2007 | CA2227873C Method for removal of surface layers of metallic coatings |
| 07/04/2007 | EP1802452A2 Optical element with an opaque chrome coating having an aperture and method of making same |
| 07/04/2007 | CN1993303A Dry etching method, method for forming fine structure, mold and method for producing same |
| 07/04/2007 | CN1992153A Base plate processing device and base plate processing method |
| 07/04/2007 | CN1324649C 真空容器 Vacuum vessel |
| 07/03/2007 | US7238294 Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface |
| 06/21/2007 | US20070137572 Plasma processing apparatus |
| 06/20/2007 | CN1983515A Substrate processing apparatus and lid supporting apparatus for the substrate processing apparatus |
| 06/20/2007 | CN1322559C Plasma processor |
| 06/20/2007 | CN1322539C Wafer area pressure control for plasma confinement and method, device |
| 06/14/2007 | WO2007044798A3 Optical metrological scale and laser-based manufacturing method therefor |
| 06/14/2007 | DE102005058869A1 Verfahren und Vorrichtung zur Beschichtung von Bändern Method and apparatus for coating of strips |
| 06/13/2007 | CN1321080C Surface treatment method of forming die, the forming die and optical elements |
| 06/12/2007 | US7229563 Providing a nickel-containing layer overlying a substrate;introducing gas comprising a carbonyl gas and a hydrogen halide gas;forming plasma from said process gas; etching nickel-containing layer by exposing nickel-containing layer to plasma |
| 06/06/2007 | CN1975999A Stage, substrate processing apparatus, plasma processing apparatus, control method |
| 06/05/2007 | US7226867 Method of etching a metal layer using a mask, a metallization method for a semiconductor device, a method of etching a metal layer, and an etching gas |
| 05/31/2007 | US20070119811 Masking material for dry etching |
| 05/30/2007 | CN1970841A Process for adjusting thimble of process chamber in semiconductor etching device |
| 05/30/2007 | CN1318917C Method for producing semiconductor device using argon fluoride exposure light source |
| 05/29/2007 | US7223699 Plasma etch reactor and method |
| 05/24/2007 | WO2004102634A3 Metal mems devices and methods of making same |
| 05/24/2007 | US20070117246 Metal mems devices and methods of making same |
| 05/24/2007 | US20070113978 Plasma processing apparatus and method |
| 05/23/2007 | EP1788115A1 Method for enhancing adhesion of thin film |
| 05/23/2007 | EP1200980B8 Adaptive gas cluster ion beam for smoothing surfaces |
| 05/23/2007 | CN1967773A Etching method of ditch road device |
| 05/22/2007 | US7220362 Planarization with reduced dishing |
| 05/16/2007 | EP1374286B1 Diffuser and rapid cycle chamber |
| 05/16/2007 | CN1962948A Method of eliminating aluminium film on the surface of CD |
| 05/09/2007 | CN2899105Y Catching ring |
| 05/09/2007 | CN1959932A A method of cooling a wafer support at a uniform temperature in a plasma reactor |
| 05/09/2007 | CN1958170A Gas supplying unit and substrate processing apparatus |
| 05/08/2007 | US7214327 Anisotropic dry etching of Cu-containing layers |
| 05/02/2007 | EP1565933A4 Gcib processing of integrated circuit interconnect structures |
| 05/02/2007 | CN2895436Y Production equipment for metal plate-band surface modification |
| 05/02/2007 | CN1956143A Capacity coupling plasma reactor with temperature uniform distribution wafer supporting |
| 05/02/2007 | CN1314005C Manufacturing method of magnetic recording medium and magnetic recording medium |
| 05/02/2007 | CN1313894C Partial pressure control system, flow rate control system and shower plate used for partial pressure control system |
| 04/26/2007 | US20070090092 Method and device for removing layers in some areas of glass plates |
| 04/26/2007 | US20070089835 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 04/25/2007 | CN1953141A Fabrication method of semiconductor device |
| 04/25/2007 | CN1312736C Method for making semiconductor device |
| 04/24/2007 | US7208422 Plasma processing method |
| 04/18/2007 | EP1775053A2 Apparatus for generating a negatively charged ionic reducing gas |
| 04/18/2007 | EP1775052A2 Apparatus for generating a negatively charged ionic reducing gas |
| 04/18/2007 | EP1774054A1 Variable quadruple electromagnet array, particularly used in a multi-step process for forming a metal barrier in a sputter reactor |
| 04/18/2007 | CN1950538A Variable quadruple electromagnet array, particularly used in a multi-step process for forming a metal barrier in a sputter reactor |
| 04/11/2007 | EP1166322B1 Plasma processing method and apparatus with control of rf bias |
| 04/11/2007 | CN1946509A A method of laser etching a structure by first radiating areas of the structure for altering the crystallinity |
| 04/11/2007 | CN1945807A Apparatus for controlling temperature of a substrate |
| 04/11/2007 | CN1945793A Apparatus and method for treating a substrate with plasma, and facility for manufacturing semiconductor devices |
| 04/11/2007 | CN1310290C Upper electrode and plasma processing device |
| 04/10/2007 | US7201174 Silicon oxyfluoride film is formed on a wafer using a plasma vapor deposition method; film remaining inside chamber is cleaned up using a gas containing nitrogen trifluoride |
| 04/05/2007 | DE102006029425A1 Sealing component in processing device, includes high elastic pressure decreasing container containing polymeric material eroding substance useful in plasma treatment technology includes first inner element resistant to eroding material |
| 04/04/2007 | EP1444717B1 Tunable multi-zone gas injection system |
| 04/04/2007 | CN1942603A Method and processing system for controlling a chamber cleaning process |
| 04/04/2007 | CN1941284A 等离子体处理室 Plasma processing chamber |
| 03/29/2007 | DE102006040593A1 Einstellbare Elektrodenanordnung zur Verwendung bei der Behandlung von Substraten unterschiedlicher Breite in einem Plasma-Behandlungssystem Adjustable electrode assembly for use in the treatment of substrates of different widths in a plasma treatment system |
| 03/28/2007 | CN1937882A Radiofrequency system control method and its radiofrequency matching box |
| 03/27/2007 | US7196449 Two-axis device and manufacturing method therefor |
| 03/22/2007 | US20070062558 Apparatus and method for surface treatment to substrate |
| 03/22/2007 | DE10151724B4 Verfahren und Vorrichtung zum Korrigieren eines Musterfilms auf einem Halbleitersubstrat Method and apparatus for correcting a pattern film on a semiconductor substrate |
| 03/21/2007 | CN1934913A Plasma generating equipment |
| 03/21/2007 | CN1933142A Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method |
| 03/21/2007 | CN1932077A Apparatus and methods for using high frequency chokes in a substrate deposition apparatus |
| 03/21/2007 | CN1306567C Plasma processing apparatus and control method thereof |
| 03/01/2007 | DE10351059B4 Verfahren und Vorrichtung zur Ionenstrahlbearbeitung von Oberflächen Method and device for ion beam processing of surfaces |
| 02/28/2007 | EP1200980B1 Adaptive gas cluster ion beam for smoothing surfaces |
| 02/28/2007 | CN1921068A Particle sticking prevention apparatus and plasma processing apparatus |
| 02/28/2007 | CN1302548C Magnetic memory device and method of manufacturing the same |
| 02/27/2007 | US7182879 Plasma processing method |
| 02/21/2007 | CN1917164A Electrostatically clamped edge ring for plasma processing |
| 02/15/2007 | US20070034601 Surface treating method and surface-treating apparatus |
| 02/14/2007 | CN1913099A Chamber for vacuum processing device and device having the chamber |
| 02/14/2007 | CN1300830C Dry itching process for gallium nitrid compound semiconductor, etc. |
| 02/14/2007 | CN1300829C Static etching method and apparatus therefor |
| 02/08/2007 | US20070029281 Gas for removing deposit and removal method using same |
| 02/08/2007 | DE4412902B4 Verfahren zur plasmaunterstützten, chemischen Dampfabscheidung und Vakuumplasmakammer A method for plasma-enhanced, chemical vapor deposition and vacuum plasma chamber |
| 02/07/2007 | CN1909193A Plasma etching apparatus |