| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 10/18/2006 | CN1846871A Single-admission and double-area adjustable nozzle |
| 10/12/2006 | US20060226553 Selective isotropic etch for titanium-based materials |
| 10/11/2006 | EP1710327A2 Method of selective etching by using a focused ion beam, an electron beam or a laser beam |
| 10/11/2006 | CN1846300A Plasma processing device |
| 10/11/2006 | CN1845307A Electrostatic chuck for accelerating wafer etching uniformity |
| 10/11/2006 | CN1845299A Device for controlling D.C. bias on wafer |
| 10/11/2006 | CN1845298A Air flow distribution equalized etching apparatus |
| 10/11/2006 | CN1843635A Gas supply nozzle with improved homogeneity of air current |
| 10/11/2006 | CN1279513C Method for seed layer removal for magnetic heads |
| 10/11/2006 | CN1279155C Detergent |
| 10/10/2006 | US7118665 halogen ions implanted into micropores on surface prevents the electrode from generating a passive film, and which enhances the release rate of metal ions from the electrode, so as to extend the lifetime of the electrode |
| 10/05/2006 | US20060219949 Fib milling of copper over organic dielectrics |
| 10/04/2006 | CN1842244A Plasma processing apparatus |
| 10/04/2006 | CN1841654A Device and method for controlling temperature of a mounting table, a program therefor, and a processing apparatus including same |
| 10/04/2006 | CN1840740A Plasma processing device |
| 10/04/2006 | CN1840323A Disk templet manufacturing method |
| 10/04/2006 | CN1278393C Gas distribution system of semiconductor machine table gas reaction chamber and method |
| 10/04/2006 | CN1277951C Surface processer |
| 10/03/2006 | US7115511 GCIB processing of integrated circuit interconnect structures |
| 09/27/2006 | CN1839349A Method for high-resolution processing of thin layers with electron beams |
| 09/27/2006 | CN1838387A Etching method and apparatus |
| 09/27/2006 | CN1838386A Plasma processing device |
| 09/27/2006 | CN1838381A Method for electrically discharging substrate, substrate processing apparatus and program |
| 09/20/2006 | CN1835205A Substrate mounting table, substrate processing apparatus and substrate processing method |
| 09/20/2006 | CN1835203A Substrate supporting member and substrate processing apparatus |
| 09/20/2006 | CN1835200A Vacuum apparatus, method for measuring a leak rate thereof, program used in measuring the leak rate and storage medium storing the program |
| 09/20/2006 | CN1835193A Atmospheric transfer chamber, processed object transfer method, program for performing the transfer method, and storage medium storing the program |
| 09/20/2006 | CN1276478C Coating agent, plasma-resistant component having coating film fomed by the coating agent, plasma processing device provided with the plasma-resistant component |
| 09/20/2006 | CN1276124C Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases |
| 09/19/2006 | US7107998 Method for preventing and cleaning ruthenium-containing deposits in a CVD apparatus |
| 09/14/2006 | WO2006095577A1 Metal material and its manufacturing method, thin-film device and its manufacturing method, element-side substrate and its manufacturing method, and liquid crystal display and its manufacturing method |
| 09/14/2006 | DE4324325B4 Verfahren zur Herstellung eines Bauelementes, optisches Bauelement, Verwendung desselben und Vakuumbehandlungsanlage zu seiner Herstellung A method for producing a component, an optical component, using the same and vacuum treatment plant for its production |
| 09/13/2006 | CN1832106A Temperature control system and substrate processing apparatus |
| 09/12/2006 | US7104217 Plasma processing apparatus |
| 09/06/2006 | EP1698215A1 Method of manufacturing an electrical component |
| 09/06/2006 | CN1828843A Dielectric etch method with high source and low bombardment plasma providing high etch rates |
| 09/06/2006 | CN1828825A Gas supply member and plasma processing apparatus |
| 09/05/2006 | US7100263 Structure manufacturing method |
| 08/30/2006 | CN1825537A Apparatus including 4-way valve for fabricating semiconductor device, method of controlling valve, and method of fabricating semiconductor device using the apparatus |
| 08/30/2006 | CN1825536A Substrate processing apparatus and substrate processing method |
| 08/30/2006 | CN1825535A Vacuum processor |
| 08/24/2006 | WO2006068805A9 Method and apparatus for controlling spatial temperature distribution |
| 08/23/2006 | CN1822315A Substrate processing apparatus, control method adopted in substrate processing apparatus and program |
| 08/23/2006 | CN1821448A Plasma processing apparatus and components thereof, and method for detecting life span of the components |
| 08/23/2006 | CN1270871C Reaction bombardment method for improving surface finish degree of diamond |
| 08/22/2006 | US7095299 Fabrication method of multiple band surface acoustic wave devices |
| 08/22/2006 | US7094702 Layer-by-layer etching apparatus using neutral beam and method of etching using the same |
| 08/22/2006 | US7094315 Chamber configuration for confining a plasma |
| 08/17/2006 | DE10200279B4 Gasinjektor-Anordnung mit Gasinjektoren aus einem Keramikmaterialblock mit Gasinjektorlöchern, die sich durch diesen erstrecken, und ein die Gasinjektor-Anordnung enthaltenes Ätzgerät Gas injector assembly with gas injectors of a ceramic block with Gasinjektorlöchern extending therethrough, and the gas injector arrangement contained etcher |
| 08/16/2006 | CN1819119A Silicon member and method of manufacturing the same |
| 08/16/2006 | CN1819113A Vacuum processing apparatus and method of using the same |
| 08/09/2006 | CN1815690A Vacuum processing apparatus |
| 08/09/2006 | CN1815689A Plasma processing apparatus |
| 08/09/2006 | CN1815685A Plasma processing apparatus and methods for removing extraneous material from selected areas on a substrate |
| 08/03/2006 | US20060169673 Plasma processing method and apparatus |
| 08/03/2006 | US20060169670 Method for etching a sample and etching system |
| 08/02/2006 | CN1268178C Plasma generation system |
| 08/02/2006 | CN1267576C Treatment of plasma |
| 07/27/2006 | WO2006078338A2 Process and apparatus for cleaning and/or coating conductive metal surfaces using electro-plasma processing |
| 07/27/2006 | WO2006077390A1 Improved method and apparatus for monitoring a microstructure etching process |
| 07/27/2006 | US20060166506 Mask material for reactive ion etching, mask and dry etching method |
| 07/27/2006 | US20060164784 Apparatus and method for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation |
| 07/27/2006 | US20060163203 Methods and apparatus for etching metal layers on substrates |
| 07/26/2006 | EP1683889A1 Surface treatment method and device |
| 07/26/2006 | CN1808691A Vacuum processing apparatus |
| 07/20/2006 | US20060157449 Plasma processing apparatus and a plasma processing method |
| 07/20/2006 | DE102005001651A1 Etching system, especially plasma-etching system, has process chamber which on internal wall side is lined with at least one annular chamber component of ceramic material |
| 07/19/2006 | CN1806310A Method and device for removing layers in some areas of glass plates |
| 07/19/2006 | CN1265442C Buffer of manometer inductor for dry etch reaction chamber |
| 07/18/2006 | US7079370 Apparatus and method for removal of surface oxides via fluxless technique electron attachment and remote ion generation |
| 07/18/2006 | US7078337 Selective isotropic etch for titanium-based materials |
| 07/18/2006 | US7077973 Methods for substrate orientation |
| 07/18/2006 | CA2204812C Method for removing a diffusion coating from a nickel base alloy |
| 07/18/2006 | CA2204811C Method for repairing a nickel base superalloy article |
| 07/13/2006 | DE102005025101B3 Device for cleaning interior of vacuum chamber, used e.g. for physical or chemical vapor deposition, comprising carrier with electrode(s) connected to D.C. source, for electrostatically fixing contaminants |
| 07/11/2006 | US7074498 Influence of surface geometry on metal properties |
| 07/05/2006 | EP0841838B1 Plasma treatment apparatus and plasma treatment method |
| 07/04/2006 | US7071110 Process for the plasma etching of materials not containing silicon |
| 06/29/2006 | WO2006068805A1 Method and apparatus for controlling spatial temperature distribution |
| 06/29/2006 | DE10115492B4 Verfahren zur Aufbereitung einer Reaktionskammer Process for the preparation of a reaction chamber |
| 06/28/2006 | CN1795287A Thin film forming device and thin film forming method |
| 06/28/2006 | CN1794422A Opening/closing mechanism for vacuum processing apparatus and vacuum processing apparatus using the same |
| 06/22/2006 | US20060132969 Magnetic head and method of making the same using an etch-stop layer for removing portions of the capping layer |
| 06/21/2006 | CN1791972A 等离子体处理装置 Plasma processing apparatus |
| 06/21/2006 | CN1790659A Support ring assembly |
| 06/21/2006 | CN1790615A Components for substrate processing apparatus and manufacturing method thereof |
| 06/21/2006 | CN1790613A Plasma processing method |
| 06/21/2006 | CN1790611A Apparatus for manufacturing flat-panel display |
| 06/20/2006 | US7064076 Process for low temperature, dry etching, and dry planarization of copper |
| 06/20/2006 | US7063922 Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof |
| 06/15/2006 | US20060124587 Method for fabricating semiconductor device using ArF photolithography capable of protecting tapered profile of hard mask |
| 06/14/2006 | EP1670048A1 Method and device for flattening surface of solid |
| 06/14/2006 | DE102004061269A1 Verfahren zum Reinigen eines Werkstückes mit Halogenionen A method of cleaning a workpiece with halogen ions |
| 06/14/2006 | CN1788104A Thin film forming device and thin film forming method |
| 06/14/2006 | CN1787183A Plasma etching method |
| 06/14/2006 | CN1787182A Method for reducing sediment of reacting chamber |
| 06/14/2006 | CN1787170A Gas supply unit, substrate processing apparatus, and supply gas setting method |
| 06/13/2006 | US7060196 supplying charge particle beams; using oxidizer; removal of copper |
| 06/13/2006 | US7060194 Dry etching method for magnetic material |
| 06/08/2006 | US20060118523 Planarization with reduced dishing |